公开(公告)号：US07075620B2

公开(公告)日：2006-07-11

申请号：US10820103

申请日：2004-04-08

申请人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

发明人： Jan Evert Van Der Werf ,  Mark Kroon ,  Wilhelmus Cornelis Keur ,  Vadim Yevgenyevich Banine ,  Hans Van Der Laan ,  Johannes Hubertus Josephina Moors ,  Erik Roelof Loopstra

IPC分类号： G01B11/00

CPC分类号： G03F7/70558 ,  G01J1/58 ,  G03F7/70741 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70983

摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.

摘要翻译： 光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。

公开(公告)号：US07061574B2

公开(公告)日：2006-06-13

申请号：US10985037

申请日：2004-11-10

申请人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

发明人： Levinus Pieter Bakker ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevitch Ivanov ,  Konstantin Nikolaevitch Koshelev ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： B82Y10/00 ,  G03F7/70166 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic projection apparatus is provided. The apparatus includes a radiation system for providing a beam of radiation, and a support for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a particle supply unit for supplying getter particles into the beam of radiation in order to act as a getter for contamination particles in the beam of radiation. The getter particles have a diameter of at least about 1 nm.

摘要翻译： 提供光刻投影装置。 该装置包括用于提供辐射束的辐射系统和用于支撑图案形成装置的支撑件。 图案形成装置用于根据期望的图案对辐射束进行图案化。 该装置还包括用于保持基板的基板台，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及用于将吸气剂颗粒供应到辐射束中的颗粒供应单元，以用作 吸收剂用于辐射束中的污染颗粒。 吸气剂颗粒具有至少约1nm的直径。

公开(公告)号：US07030958B2

公开(公告)日：2006-04-18

申请号：US10748849

申请日：2003-12-31

申请人： Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

发明人： Cornelis Petrus Andreas Marie Luijkx ,  Vadim Yevgenyevich Banine ,  Hako Botma ,  Martinus Van Duijnhoven ,  Markus Franciscus Antonius Eurlings ,  Heine Melle Mulder ,  Johannes Hendrik Everhardus Aldegonda Muijderman ,  Cornelis Jacobus Van Duijn ,  Jan Jaap Krikke

IPC分类号： G03B27/52

CPC分类号： G03F7/70191 ,  G03F7/70066 ,  G03F7/70116 ,  G03F7/70558

摘要： An optical attenuator device operates to remove a part of a beam of radiation having a higher than average intensity using at least one optical attenuator element. The device has application in a radiation system, and/or a lithographic apparatus, in particular a scanning lithographic apparatus, wherein the optical attenuator element(s) are provided in a central part of the beam, for example perpendicularly to a scanning direction.

摘要翻译： 光衰减器装置使用至少一个光衰减器元件来操作以去除具有高于平均强度的辐射束的一部分。 该装置具有应用于辐射系统和/或光刻设备，特别是扫描光刻设备中，其中光学衰减器元件设置在光束的中心部分，例如垂直于扫描方向。

公开(公告)号：US06836530B2

公开(公告)日：2004-12-28

申请号：US10163262

申请日：2002-06-05

申请人： Wolfgang Singer ,  Markus Weiss ,  Bernd Kleemann ,  Karlfried Osterried ,  Johannes Wangler ,  Frank Melzer ,  Andreas Heisler ,  Vadim Yevgenyevich Banine

发明人： Wolfgang Singer ,  Markus Weiss ,  Bernd Kleemann ,  Karlfried Osterried ,  Johannes Wangler ,  Frank Melzer ,  Andreas Heisler ,  Vadim Yevgenyevich Banine

IPC分类号： G21K500

CPC分类号： G03F7/70158 ,  G03F7/702 ,  G21K1/06

摘要： There is provided an illumination system for wavelengths of ≦100 nm, having an object plane and a field plane. The illumination system includes a grating element having a plurality of gratings, and a diaphragm. The diaphragm is arranged after the grating element in a beam path from the object plane to the field plane.

摘要翻译： 提供了具有物体平面和场平面的<= 100nm波长的照明系统。 照明系统包括具有多个光栅的光栅元件和隔膜。 隔膜设置在从物体平面到场平面的光束路径中的光栅元件之后。

公开(公告)号：US09594306B2

公开(公告)日：2017-03-14

申请号：US14002000

申请日：2011-12-21

申请人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

发明人： Vadim Yevgenyevich Banine ,  Wilhelmus Petrus De Boeij ,  Antonius Johannes Josephus Van Dijsseldonk Van Dijsseldonk ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Andrei Mikhailovich Yakunin

IPC分类号： G03F7/20 ,  B82Y10/00 ,  G21K1/06 ,  H05G2/00

CPC分类号： G03F7/70191 ,  B82Y10/00 ,  G02B1/11 ,  G02B5/1838 ,  G02B5/281 ,  G02B5/283 ,  G03F7/70008 ,  G03F7/702 ,  G03F7/70308 ,  G03F7/70575 ,  G21K1/062 ,  G21K1/067 ,  G21K2201/061 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

摘要： A lithographic apparatus for patterning a beam of radiation and projecting it onto a substrate, comprising at least two spectral purity filters configured to reduce the intensity of radiation in the beam of radiation in at least one undesirable range of radiation wavelength, wherein the two spectral purity filters are provided with different radiation filtering structures from each other.

摘要翻译： 一种光刻设备，用于将辐射束图案化并将其投影到衬底上，包括至少两个光谱纯度滤光器，其被配置为在至少一个不期望的辐射波长范围内降低辐射束中的辐射强度，其中两个光谱纯度 过滤器具有彼此不同的辐射过滤结构。

公开(公告)号：US09411250B2

公开(公告)日：2016-08-09

申请号：US13062872

申请日：2009-04-30

申请人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

发明人： Vadim Yevgenyevich Banine ,  Erik Roelof Loopstra ,  Vladimir Vitalevich Ivanov ,  Vladimir Mihailovitch Krivtsun

IPC分类号： G03F7/20 ,  H05G2/00

CPC分类号： G03F7/70916 ,  G03F7/70175 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005

摘要： A radiation system is configured to generate a radiation beam. The radiation system includes a radiation source configured to generate a plasma that emits radiation and debris, and a radiation collector configured to direct collected radiation to a radiation beam emission aperture. A magnetic field generator is configured to generate a magnetic field with a gradient in magnetic field strength to direct the plasma away from the radiation collector.

摘要翻译： 辐射系统被配置为产生辐射束。 辐射系统包括被配置为产生发射辐射和碎屑的等离子体的辐射源，以及被配置为将收集的辐射引导到辐射束发射孔径的辐射收集器。 磁场发生器被配置为产生具有磁场强度梯度的磁场，以将等离子体引导离开辐射收集器。

公开(公告)号：US20140253894A1

公开(公告)日：2014-09-11

申请号：US14346530

申请日：2012-08-23

申请人： Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

发明人： Jan Bernard Plechelmus Van Schoot ,  Hermanus Johannes Maria Kreuwel ,  Vadim Yevgenyevich Banine ,  Andrei Mikhailovich Yakunin ,  Johannes Hubertus Josephina Moors ,  Olav Waldimir Frijns ,  Gerardus Hubertus Petrus Maria Swinkels ,  Ivo Vanderhallen ,  Uwe Bruno Heini Stamm

IPC分类号： H05G2/00 ,  G03F7/20

CPC分类号： G03F7/70058 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.

摘要翻译： 一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。 预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。 主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。 收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。 激光辐射的第一束基本上沿着光轴指向燃料流。

公开(公告)号：US20140160452A1

公开(公告)日：2014-06-12

申请号：US14233361

申请日：2012-07-20

申请人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

发明人： Pieter Willem Herman De Jager ,  Vadim Yevgenyevich Banine ,  Arno Jan Bleeker ,  Harmen Klaas Van Der Schoot ,  Lucas Henricus Johnannes Stevens ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Sander Frederik Wuister

IPC分类号： B41C1/10

CPC分类号： B41C1/1091 ,  C23C14/28 ,  G03F7/70375 ,  G03F7/70383

摘要： A lithographic apparatus is disclosed that includes a modulator to modulate a plurality of beams according to a desired pattern and a donor structure on to which the modulated beams impinge. The donor structure is configured such that the impinging modulated beams cause a donor material to be transferred from the donor structure to the substrate.

摘要翻译： 公开了一种光刻设备，其包括根据期望的图案调制多个光束的调制器和被调制的光束照射到的施主结构。 供体结构被配置为使得入射的调制光束使施主材料从施主结构转移到衬底。

公开(公告)号：US08685632B2

公开(公告)日：2014-04-01

申请号：US13058788

申请日：2009-07-13

申请人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

发明人： Antonius Theodorus Wilhelmus Kempen ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra

IPC分类号： G03F7/20 ,  G21K1/00

CPC分类号： G03F7/2008 ,  G03F7/70575 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/00

摘要： A lithographic apparatus includes a source configured to generate a radiation beam comprising desired radiation and undesired radiation using a plasma, an illumination system configured to condition the radiation beam and to receive hydrogen gas during operation of the lithographic apparatus, and a support structure constructed to hold a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. A substrate table is constructed to hold a substrate, and a projection system is configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus is configured such that the radiation beam on entering the projection system includes at least 50% of the undesired radiation that is generated by the plasma and includes wavelengths of radiation that interact with the hydrogen gas to generate hydrogen radicals.

摘要翻译： 光刻设备包括被配置为产生包含期望辐射和使用等离子体的不期望辐射的辐射束的源，被配置为调节辐射束并在光刻设备操作期间接收氢气的照明系统，以及构造成保持 图案形成装置。 图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束。 衬底台被构造成保持衬底，并且投影系统被配置为将图案化的辐射束投影到衬底的目标部分上。 光刻设备被配置为使得进入投影系统的辐射束包括由等离子体产生的不期望辐射的至少50％，并且包括与氢气相互作用以产生氢自由基的辐射波长。

公开(公告)号：US20140055764A1

公开(公告)日：2014-02-27

申请号：US13973703

申请日：2013-08-22

申请人： Pieter Willem Herman DE JAGER ,  Vadim Yevgenyevich Banine ,  Jozef Petrus Henricus Benschop ,  Cheng-Qun Gui ,  Johannes Onvlee ,  Erwin John Van Zwet

发明人： Pieter Willem Herman DE JAGER ,  Vadim Yevgenyevich Banine ,  Jozef Petrus Henricus Benschop ,  Cheng-Qun Gui ,  Johannes Onvlee ,  Erwin John Van Zwet

IPC分类号： G03F7/20

CPC分类号： G03F7/70183 ,  G03F7/70275 ,  G03F7/70291 ,  G03F7/70391 ,  G03F7/704

摘要： In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator may be moveable with respect the exposure area and/or the projection system may have an array of lenses to receive the plurality of beams, the array of lenses moveable with respect to the exposure area.

摘要翻译： 在一个实施例中，公开了一种光刻设备，其包括调制器，该调制器被配置为将基板的曝光区域暴露于根据期望图案调制的多个光束;以及投影系统，该投影系统被配置为将经调制的光束投影到基板上。 调制器可以相对于曝光区域可移动，和/或投影系统可以具有用于接收多个光束的透镜阵列，透镜阵列可相对于曝光区域移动。