Abstract:
A microstructure includes a mass; a base member in which the mass is movably contained. The mass includes a surface, which is exposed out of the base member, and a stopper wire, which is arranged above the surface of the mass so as to inhibit over move of the mass.
Abstract:
A first axis MEM tunneling/capacitive sensor and method of making same. Cantilever beam structures for at least two orthogonally arranged sensors and associated mating structures are defined on a first substrate or wafer, the at least two orthogonally arrange sensors having orthogonal directions of sensor sensitivity. A resonator structure of at least a third sensor is also defined, the third sensor being sensitive in a third direction orthogonal to the orthogonal directions of sensor sensitivity of the two orthogonally arranged sensors and the resonator structure having a mating structure thereon. Contact structures for at least two orthogonally arranged sensors are formed together with mating structures on a second substrate or wafer, the mating structures on the second substrate or wafer being of a complementary shape to the mating structures on the first substrate or wafer.
Abstract:
A micro-gyroscope (10) having closed loop output operation by a control voltage (Vty), that is demodulated by a drive axis (x-axis) signal Vthx of the sense electrodes (S1, S2), providing Coriolis torque rebalance to prevent displacement of the micro-gyroscope (10) on the output axis (y-axis) Vthynull0. Closed loop drive axis torque, Vtx maintains a constant drive axis amplitude signal, Vthx. The present invention provides independent alignment and tuning of the micro-gyroscope by using separate electrodes and electrostatic bias voltages to adjust alignment and tuning. A quadrature amplitude signal, or cross-axis transfer function peak amplitude is used to detect misalignment that is corrected to zero by an electrostatic bias voltage adjustment. The cross-axis transfer function is either Vthy/Vty or Vtnx/Vtx. A quadrature signal noise level, or difference in natural frequencies estimated from measurements of the transfer functions is used to detect residual mistuning, that is corrected to zero by a second electrostatic bias voltage adjustment.
Abstract:
A vibrator includes a vibratable body of a flat plate shape and four notches provided from four parts of the outer periphery of said vibrating body with approximately equal intervals to a center of said vibratable body. A vibrating gyroscope includes the vibrator, as well as a drive unit and a detecting unit.
Abstract:
A gyroscope system can detect the amount of movement of the system. The gyroscope system includes a circuit that has a number of different features and detects movement independent of any circuit parameters. The first feature uses a feedback loop to compensate for difference in Q factors between the circuits. Another feature regulates the amplitude of the resonator. Yet another feature extracts the rotation rate signals from the gyroscope in a new way.
Abstract:
A semiconductor accelerometer includes a mass portion formed at a center of a silicon plate, a frame portion formed around the circumference of the silicon plate so as to surround the mass portion and a diaphragm portion formed in the silicon plate between the mass portion and the frame portion so as to bridge the mass portion with the frame portion, one of major surfaces of the silicon plate serving as a common continuous major surface for the mass portion, frame portion and diaphragm portion. Piezoresistance elements are formed on the common continuous major surface at the diaphraqm portion and an additional Au film is formed on the common continuous major surface at the mass portion. The additional Au film constitutes in combination with the mass portion a weight which responds to an acceleration acting thereon. The mass of the additional Au film is selected in such a manner that the center of gravity of the weight is located within an area in the mass portion having a depth corresponding to the thickness of the diaphragm portion.
Abstract:
An acceleration sensor includes: a semiconductor substrate that includes a support substrate and a semiconductor layer; a first-direction movable electrode; a second-direction movable electrode; a first-direction fixed electrode; a second-direction fixed electrode; and a support member. The acceleration sensor is configured to detect acceleration in a first direction in the surface direction of the semiconductor substrate and acceleration in a second direction orthogonal to the first direction and parallel to the surface direction. The first-direction movable electrode and the first-direction fixed electrode are provided such that an angle formed by an extended direction of the first-direction movable electrode and the first-direction fixed electrode and the second direction is sin−1(d/L)[deg], and the second-direction movable electrode and the second-direction fixed electrode are provided such that an angle formed by an extended direction of the second-direction movable electrode and the second-direction fixed electrode and the first direction is sin−1(d/L)[deg].
Abstract:
There are provided an inertial sensor module having a hermetic seal formed of metal and a multi-axis sensor employing the same. The inertial sensor module includes: a sensor main body including a plurality of wirings connected to any one of a driving electrode of a sensor and a sensing electrode of the sensor and formed on a substrate for a lower cap by a wafer level package (WLP) scheme to detect an inertial force; a substrate for an upper cap bonded on the sensor main body to protect the sensor main body; and a hermetic seal formed of metal isolated from the wiring and interposed into the sensor main body and the substrate for the upper cap by performing the bonding by metal bonding.
Abstract:
Embodiments of the invention provide a MEMS sensor, including a mass body, a flexible beam coupled with the mass body, and a support part coupled with the flexible beam and floatably supporting the mass body. According to at least one embodiment, the flexible beam is provided with a sensing device configured to detect a physical amount depending on a displacement of the mass body, and a connection part between the flexible beam and the support part is provided with a reinforcement part to relax stress concentration in response to rigidity reinforcement.
Abstract:
Disclosed herein is an acceleration sensor including: a mass; a flexible beam on which an electrode or a piezoresistive element is disposed and the mass is coupled; and a support part connecting to and supporting the flexible beam and having therein a stress isolating slit facing the mass, wherein the mass, the flexible beam and the support part are formed by coupling first and second substrates, wherein the first substrate has a first masking pattern formed thereon corresponding to the flexible beam, the mass and the support part and the second substrate has a second masking pattern formed thereon corresponding to the mass and the support part.