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111.发明授权公开(公告)号：US10127651B2
公开(公告)日：2018-11-13
申请号：US15356729
申请日：2016-11-21
摘要： Criticality of a detected defect can be determined based on context codes. The context codes can be generated for a region, each of which may be part of a die. Noise levels can be used to group context codes. The context codes can be used to automatically classify a range of design contexts present on a die without needing certain information a priori.
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公开(公告)号：US10096478B2
公开(公告)日：2018-10-09
申请号：US13860230
申请日：2013-04-10
发明人： Gildardo Delgado , Gary Janik
IPC分类号： H01L21/00 , H01L21/26 , G01J1/42 , G01N21/956 , G01J1/02
摘要： The present invention for imaging sensor rejuvenation may include a rejuvenation illumination system configured to selectably illuminate a portion of an imaging sensor of an imaging system with illumination suitable for at least partially rejuvenating the imaging sensor degraded by exposure to at least one of extreme ultraviolet light or deep ultraviolet light; and a controller communicatively coupled to the rejuvenation illumination system and configured to direct the rejuvenation illumination system to illuminate the imaging sensor for one or more illumination cycles during a non-imaging state of the imaging sensor.
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113.发明授权公开(公告)号：US10088345B1
公开(公告)日：2018-10-02
申请号：US13693769
申请日：2012-12-04
发明人： Chuanyong Huang , Raymond Chu , Gordana Neskovic , Dieter Wilk , Christian Wolters , Tim Mahatdejkul
摘要： The present disclosure is directed to a method for designing an aperture in a mask for inspecting a wafer. The method includes the steps of scanning a collection plane of the wafer at a plurality of points and collecting data for at least a part of the wafer. The method also includes the step of mapping the data. A further step of the method includes configuring the aperture based on the mapped data.
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公开(公告)号：US10074036B2
公开(公告)日：2018-09-11
申请号：US14884670
申请日：2015-10-15
发明人： Yanwei Liu , Hawren Fang
CPC分类号： G06K9/6218 , G03F1/84 , G06K9/036 , G06T7/001 , G06T7/41 , G06T7/60 , G06T2207/20056 , G06T2207/30148
摘要： Disclosed are methods and apparatus for inspecting a photolithographic reticle. Modeled images of a plurality of target features of the reticle are obtained based on a design database for fabricating the reticle. An inspection tool is used to obtain a plurality of actual images of the target features of the reticle. The modelled and actual images are binned into a plurality of bins based on image properties of the modelled and actual images, and at least some of the image properties are affected by one or more neighbor features of the target features on the reticle in a same manner. The modelled and actual images from at least one of the bins are analyzed to generate a feature characteristic uniformity map for the reticle.
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公开(公告)号：US10072921B2
公开(公告)日：2018-09-11
申请号：US14960121
申请日：2015-12-04
IPC分类号： G01B11/24 , G01B11/00 , G03F7/00 , G01N21/956 , G01N21/21
CPC分类号： G01B11/002 , G01B11/24 , G01B2210/56 , G01N21/956 , G01N2021/213 , G03F7/00
摘要： A spectroscopic beam profile metrology system simultaneously detects measurement signals over a large wavelength range and a large range of angles of incidence (AOI). In one aspect, a multiple wavelength illumination beam is reshaped to a narrow line shaped beam of light before projection onto a specimen by a high numerical aperture objective. After interaction with the specimen, the collected light is passes through a wavelength dispersive element that projects the range of AOIs along one direction and wavelength components along another direction of a two-dimensional detector. Thus, the measurement signals detected at each pixel of the detector each represent a scatterometry signal for a particular AOI and a particular wavelength. In another aspect, a hyperspectral detector is employed to simultaneously detect measurement signals over a large wavelength range, range of AOIs, and range of azimuth angles.
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公开(公告)号：US10068323B2
公开(公告)日：2018-09-04
申请号：US15290990
申请日：2016-10-11
发明人： Kaushik Sah , Andrew James Cross
IPC分类号： G06T7/00 , H01L21/66 , H01L21/033
摘要： A design aware system, method, and computer program product are provided for detecting overlay-related defects in multi-patterned fabricated devices. In use, a design of a multi-patterned fabricated device is received by a computer system. Then, the computer system automatically determines from the design one or more areas of the design that are prone to causing overlay errors. Further, an indication of the determined one or more areas is output by the computer system to an inspection system for use in inspecting a multi-patterned device fabricated in accordance with the design.
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公开(公告)号：US10062543B2
公开(公告)日：2018-08-28
申请号：US15170881
申请日：2016-06-01
发明人： Ajay Gupta , Thanh Huy Ha , Olivier Moreau , Kumar Raja
CPC分类号： H01J37/222 , G03F7/70633 , H01J2237/221 , H01J2237/24578 , H01J2237/31798
摘要： Methods and systems for determining overlay error between different patterned features of a design printed on a wafer in a multi-patterning step process are provided. For multi-patterning step designs, the design for a first patterning step is used as a reference and designs for each of the remaining patterning steps are synthetically shifted until the synthetically shifted designs have the best global alignment with the entire image based on global image-to-design alignment. The final synthetic shift of each design for each patterning step relative to the design for the first patterning step provides a measurement of relative overlay error between any two features printed on the wafer using multi-patterning technology.
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公开(公告)号：US10062157B2
公开(公告)日：2018-08-28
申请号：US15342432
申请日：2016-11-03
发明人： Stilian Ivanov Pandev , Alexander Kuznetsov , Gregory R. Brady , Andrei V. Shchegrov , Noam Sapiens , John J. Hench
CPC分类号： G06T7/0004 , G01B2210/56 , G01N21/211 , G01N21/255 , G01N21/84 , G01N21/8422 , G01N2201/06113 , G03F7/70625 , G03F7/70633 , G06T7/60 , G06T2207/10004 , G06T2207/30148
摘要： Disclosed are apparatus and methods for determining a structure or process parameter value of a target of interest on a semiconductor wafer. A plurality of collection patterns are defined for a spatial light beam controller positioned at a pupil image plane of a metrology tool. For each collection pattern, a signal is collected from a sensor of the metrology tool, and each collected signal represents a combination of a plurality of signals that the spatial light beam controller samples, using each collection pattern, from a pupil image of the target of interest. The collection patterns are selected so that the pupil image is reconstructable based on the collection patterns and their corresponding collection signals. The collected signal for each of the collection patterns is analyzed to determine a structure or process parameter value for the target of interest.
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公开(公告)号：US10062012B1
公开(公告)日：2018-08-28
申请号：US14885859
申请日：2015-10-16
发明人： Allen Park , Michael Lennek
CPC分类号： G06K9/6267 , G06K9/4604 , G06K9/52 , G06T7/0004 , G06T7/001 , G06T7/60 , G06T2207/30148
摘要： Methods and systems for finding patterns in a design for a specimen are provided. One system includes one or more computer subsystems configured for searching for a target pattern in a design for a specimen to thereby find multiple instances of the target pattern in the design. The one or more computer subsystems are also configured for separating the multiple instances of the target pattern into different groups based on information for surrounding patterns within a predefined window around the target pattern such that each of the different groups corresponds to a different combination of the target pattern and the surrounding patterns.
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公开(公告)号：US10032620B2
公开(公告)日：2018-07-24
申请号：US14699781
申请日：2015-04-29
发明人： Lauren Wilson , Anant Chimmalgi , Matthew Panzer , Ilya Bezel
摘要： A laser-sustained plasma light source includes a plasma lamp configured to contain a volume of gas and receive illumination from a pump laser in order to generate a plasma. The plasma lamp includes one or more transparent portions transparent to illumination from the pump laser and at least a portion of the broadband radiation emitted by the plasma. The one or more transparent portions are formed from a transparent material having elevated hydroxide content above 700 ppm.
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