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111.发明授权公开(公告)号：US08384881B2
公开(公告)日：2013-02-26
申请号：US12238964
申请日：2008-09-26
CPC分类号： G03F7/70725 , G03F7/70783 , G03F9/7003
摘要： A lithographic apparatus is described, the apparatus comprising an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, a chuck constructed to hold the substrate table; a positioning device for, in use, displacing the chuck; a control unit configured to control the positioning device, wherein the control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck, prior to aligning the patterning device.
摘要翻译： 描述了光刻设备，该设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上;卡盘，被构造成夹持所述基板台; 用于在使用中移动卡盘的定位装置; 控制单元，被配置为控制所述定位装置，其中所述控制单元布置成驱动所述定位装置，以在对准所述图案形成装置之前通过基本上动态的力来激励所述卡盘以使卡盘变形。
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公开(公告)号：US08269949B2
公开(公告)日：2012-09-18
申请号：US12563838
申请日：2009-09-21
申请人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
发明人： Marcus Martinus Petrus Adrianus Vermeulen , Andre Bernardus Jeunink , Erik Roelof Loopstra , Joost Jeroen Ottens , Rene Theodorus Petrus Compen , Peter Smits , Martijn Houben , Hendrikus Johannes Marinus Van Abeelen , Antonius Arnoldus Meulendijks , Rene Wilhelmus Antonius Hubertus Leenaars
CPC分类号： G03F7/70716 , G03F7/70775
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a mirror block provided with a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate, wherein the mirror block is constructed and arranged to reduce slip between the mirror block and the substrate table. Slip can occur if the acceleration of the mirror block is high and the substrate table slips locally with respect to the mirror block. Slip may lead to exposure errors since the position of the substrate is no longer determined with the desired accuracy.
摘要翻译： 光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 设置有构造成保持基板的基板台的反射镜块; 以及投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上，其中所述反射镜块被构造和布置成减小所述反射镜块和所述基板台之间的滑动。 如果镜面块的加速度高，并且衬底台相对于镜面块局部滑动，则可能发生滑移。 滑动可能导致曝光误差，因为不再以所需精度确定基板的位置。
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公开(公告)号：US08154708B2
公开(公告)日：2012-04-10
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
发明人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC分类号： G03B27/58
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20110222033A1
公开(公告)日：2011-09-15
申请号：US13046283
申请日：2011-03-11
申请人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
发明人： Nicolaas Ten Kate , Johannes Henricus Wilhelmus Jacobs , Joost Jeroen Ottens , Bastiaan Andreas Wilhelmus Hubertus Knarren , Thibault Simon Mathieu Laurent , Robbert Jan Voogd , Giovanni Francisco Nino , Johan Gertrudis Cornelis Kunnen , Marinus Jan Remie
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03F7/7085
摘要： A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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公开(公告)号：US20110075118A1
公开(公告)日：2011-03-31
申请号：US12891375
申请日：2010-09-27
申请人： Johannes Henricus Wilhelmus JACOBS , Nicolaas Ten Kate , Joost Jeroen Ottens , Gerrit Van Donk , Johannes Ven Es
发明人： Johannes Henricus Wilhelmus JACOBS , Nicolaas Ten Kate , Joost Jeroen Ottens , Gerrit Van Donk , Johannes Ven Es
CPC分类号： G03B27/52 , G03F7/70341 , G03F7/70875
摘要： A lithographic apparatus is provided that includes a substrate holder configured to hold a substrate, and a heat pipe to maintain the substrate holder at a substantially uniform temperature. The heat pipe has a chamber containing a liquid reservoir and a vapor space, and a heating element at least partly in contact with liquid in the chamber.
摘要翻译： 提供了一种光刻设备，其包括被配置为保持基板的基板保持器和用于将基板保持器维持在基本上均匀的温度的热管。 热管具有容纳液体储存器和蒸汽空间的室，以及在室中至少部分地与液体接触的加热元件。
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公开(公告)号：US20110007285A1
公开(公告)日：2011-01-13
申请号：US12698932
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/58
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20100321653A1
公开(公告)日：2010-12-23
申请号：US12872842
申请日：2010-08-31
申请人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
发明人： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
摘要翻译： 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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公开(公告)号：US07639345B2
公开(公告)日：2009-12-29
申请号：US11252230
申请日：2005-10-18
申请人： Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
发明人： Joost Jeroen Ottens , Aschwin Lodewijk Hendricus Johannes Van Meer , Wim Tjibbo Tel , Jacob Willem Vink , Rene Theodorus Petrus Compen , Petrus Johannes Gerrits
CPC分类号： G03F7/70916 , G03F7/7065 , G03F7/707 , G03F9/7003
摘要： The invention provides a height detecting apparatus for a lithographic apparatus. The height mapping apparatus includes a height mapping unit for providing at least one height map of a top surface of an object to be placed in a radiation beam of the lithographic apparatus, the object to be clamped by a clamping force applied thereto on a support constructed to support the object. The height mapping apparatus also includes a control unit for controlling the mapping unit to provide the at least one height map of the object relative to at least two different clamping pressure levels.
摘要翻译： 本发明提供一种用于光刻设备的高度检测装置。 高度测绘装置包括高度测绘单元，用于提供待放置在光刻设备的辐射束中的待放置物体的顶表面的至少一个高度图，待施加到其上的夹持力夹持在被构造的支撑体上 支持对象。 高度测绘装置还包括控制单元，用于控制映射单元以相对于至少两个不同的夹紧压力水平提供对象的至少一个高度图。
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119.发明授权公开(公告)号：US07595496B2
公开(公告)日：2009-09-29
申请号：US11812801
申请日：2007-06-21
申请人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
发明人： Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Jeroen Pieter Starreveld , Wouterus Johannes Petrus Maria Maas , Willem Jurrianus Venema , Boris Menchtchikov
IPC分类号： G21K5/00
CPC分类号： G03F7/70616 , G03F7/70783 , G03F7/70875
摘要： A method and apparatus of correcting thermally-induced field deformations of a lithographically exposed substrate, is presented herein. In one embodiment, the method includes exposing a pattern onto a plurality of fields of a substrate in accordance with pre-specified exposure information and measuring attributes of the fields to assess deformation of the fields induced by thermal effects of the exposing process. The method further includes determining corrective information based on the measured attributes, and adjusting the pre-specified exposure information, based on the corrective information, to compensate for the thermally-induced field deformations. Other embodiments include the use of predictive models to predict thermally-induced effects on the fields and thermographic imaging to determine temperature variations across a substrate.
摘要翻译： 本文介绍了一种校正光刻曝光的基底的热诱导场变形的方法和装置。 在一个实施例中，该方法包括根据预先指定的曝光信息将图案曝光到基板的多个场上，并测量场的属性以评估由曝光过程的热效应引起的场的变形。 该方法还包括基于所测量的属性来确定校正信息，并且基于校正信息调整预定曝光信息，以补偿热诱导的场变形。 其他实施例包括使用预测模型来预测对场的热诱导效应和热成像以确定跨越衬底的温度变化。
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公开(公告)号：US07564536B2
公开(公告)日：2009-07-21
申请号：US11268777
申请日：2005-11-08
申请人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
发明人： Joost Jeroen Ottens , Marcus Emile Joannes Boonman , Thomas Josephus Maria Castenmiller , Andre Bernardus Jeunink
CPC分类号： G03F7/70783 , G03F7/707 , H01L21/682 , Y10S269/903
摘要： A lithographic apparatus is disclosed that includes an article support constructed to support a first article, capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam, in a beam path of the radiation beam or a second article to be placed in a beam path of the patterned radiation beam, the article support having a plurality of supporting protrusions on which the first article or the second article is disposed in use, wherein the plurality of supporting protrusions are constructed to define a support zone to provide a plane of support for the first article or the second article, so that when the first article or the second article is subjected to a thermal load the support zone allows at least a portion of the first article or the second article to expand or contract to reduce the build up of a mechanical stress in the first article or second article, respectively, while maintaining the first article or second article substantially fixed to the article support, and a position sensor configured to determine a position offset, in a direction lying in the plane of the support zone, of the first article or the second article over a period of time, and a projection system configured to project a patterned radiation beam onto a target portion of a second article.
摘要翻译： 公开了一种光刻设备，其包括构造成支撑第一制品的物品支撑件，该第一物品能够在其横截面中赋予具有图案的辐射束以形成图案化的辐射束，在辐射束的光束路径中或第二物品 被放置在图案化的辐射束的光束路径中，物品支撑件具有多个支撑突起，第一物品或第二物品在使用中设置在该支撑突起上，其中多个支撑突起构造成限定支撑区域 为第一物品或第二物品提供支撑平面，使得当第一物品或第二物品经受热负荷时，支撑区允许第一物品或第二物品的至少一部分膨胀或收缩 以分别在第一制品或第二制品中分别减少机械应力的累积，同时保持第一制品或第二制品基本固定 以及位置传感器，被配置为在一段时间内确定第一物品或第二物品在位于支撑区域的平面中的方向上的位置偏移;以及投影系统，被配置为投影 图案化的辐射束到第二物品的目标部分上。
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