Abstract:
A method for operating a semiconductor structure is provided. The semiconductor structure includes a first conductor extending in a first direction, a second conductor extending in a second direction different from the first direction, and a dielectric layer between the first conductor and the second conductor. The method for operating the semiconductor structure comprises following steps. A current is provided to flow in the first direction in the first conductor.
Abstract:
A memory device is described that includes a three-dimensional array of memory cells having a plurality of levels of memory cells accessed by a plurality of word lines, and a plurality of bit lines. Control circuitry is coupled to the plurality of word lines and the plurality of bit lines. The control circuitry is adapted for programming a selected memory cell in a selected level of the array and on a selected word line, by hot carrier generation assisted FN tunneling, while inhibiting disturb in unselected memory cells in unselected levels and in the selected level and on unselected word lines by self-boosting.
Abstract:
A charge storage memory is configured in a NAND array, and includes NAND strings coupled to bit lines via string select switches and includes word lines. A controller is configured to produce a bias for performing an operation on a selected cell of the NAND array. The bias includes charging the bit line while the string select switches are closed, such as to not introduce noise into the strings caused by such bit line charging. The semiconductor body regions in memory cells that are on both sides of the memory cells in the NAND strings that are coupled to a selected word line are coupled to reference voltages such that they are pre-charged while the word lines of the strings in the array are transitioned to various voltages during the operation.
Abstract:
A 3D memory device includes a plurality of ridge-shaped stacks, in the form of multiple strips of conductive material separated by insulating material, arranged as bit lines which can be coupled through decoding circuits to sense amplifiers. The strips of conductive material have side surfaces on the sides of the ridge-shaped stacks. A plurality of conductive lines arranged as word lines which can be coupled to row decoders, extends orthogonally over the plurality of ridge-shaped stacks. The conductive lines conform to the surface of the stacks. Memory elements lie in a multi-layer array of interface regions at cross-points between side surfaces of the conductive strips on the stacks and the conductive lines. The memory elements are programmable, like the anti-fuses or charge trapping structures. The 3D memory is made using only two critical masks for multiple layers.
Abstract:
A three-dimensional stacked IC device includes a stack of at least first, second, third and fourth contact levels at an interconnect region. Each contact level has a conductive layer and an insulation layer. First, second, third and fourth electrical conductors pass through portions of the stack of contact levels. The first, second, third and fourth electrical conductors are in electrical contact with the first, second, third and fourth conductive layers, respectively. A dielectric sidewall spacer circumferentially surrounds the second, third and fourth electrical conductors so that the second, third and fourth electrical conductors only electrically contact the respective second, third and fourth conductive layers.
Abstract:
A three-dimensional AND flash memory device includes a gate stack structure, a charge storage structure, a first conductive pillar and a second conductive pillar, an insulating pillar, and a channel pillar. The gate stack structure includes gate layers and insulating layers stacked alternately with each other. The first and second conductive pillars extend through the gate stack structure. The channel pillar extends through the gate stack structure. The charge storage structure is disposed between the gate stack structure and the channel pillar. The channel pillar includes: a first part and a second part connected each other. The first part is located between the charge storage structure and the insulating pillar. The second part includes a first region electrically connected to the first conductive pillar, and a second region electrically connected to the second conductive pillar. A curvature of the first part is smaller than a curvature of the second part.
Abstract:
Methods, devices, systems, and apparatus for three-dimensional semiconductor structures are provided. In one aspect, a semiconductor device includes: a semiconductor substrate, multiple conductive layers vertically stacked on the semiconductor substrate, and multiple transistors. The multiple conductive layers include a first conductive layer, a second conductive layer, and a third conductive layer that are sequentially stacked together. The multiple transistors include a first transistor and a second transistor in the first conductive layer and a third transistor in the third conductive layer. Each transistor includes a first terminal, a second terminal, and a gate terminal. First terminals of the first, second, and third transistors are conductively coupled to a first conductive node in the second conductive layer.
Abstract:
A memory device and a data approximation search method thereof are proposed. The memory device includes a plurality of selection switch pairs, a plurality of memory cell string pairs, a sense amplifier, and a page buffer. The selection switch pairs receive multiple search data pairs, respectively. The memory cell string pairs are respectively coupled to a global bit line through the selection switch pairs. Each of the memory cell string pairs determines whether to provide current on the global bit line according to stored data of a selected memory cell pair and each of the search data pairs. The sense amplifier obtains multiple search results according to the current on the global bit line and at least one reference currents respectively corresponding to at least one similarity. The page buffer records the search results and generates similarity information by accumulating the search results.
Abstract:
A memory cell circuit, a memory cell array structure and a manufacturing method thereof are provided. The memory cell circuit includes a first transistor, a second transistor and a capacitor. The first transistor has a first end electrically coupled to a bit line, and a gate of the first transistor is electrically coupled to a primary word line. The second transistor has a first end electrically coupled to a second end of the first transistor, and a gate of the second transistor is electrically coupled to an auxiliary word line. A first end of the capacitor is electrically coupled to a second end of the second transistor and a second end of the capacitor receives a reference voltage.
Abstract:
A memory device, such as three dimension AND Flash memory, including a plurality of word line decoding circuit areas, a plurality of common power rails and a plurality of power drivers is provided. The word line decoding circuit areas are arranged in an array, and form a plurality of isolation areas, wherein each of the isolation areas is disposed between two adjacent word line decoding circuit areas. Each of the common power rails is disposed along the isolation areas. The power drivers respectively correspond to the word line decoding circuit areas. Each of the power drivers is disposed between each of the power driving circuit areas and each of the corresponding isolation areas, wherein each of the power drivers is configured to provide a common power to the word line decoding circuit areas.