公开(公告)号：US08144739B2

公开(公告)日：2012-03-27

申请号：US12605306

申请日：2009-10-23

申请人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

发明人： Efrain Figueroa ,  William N. Partlo ,  John Martin Algots

IPC分类号： H01S3/10

CPC分类号： H01S3/08009 ,  G01J3/02 ,  G01J3/0237 ,  G01J3/027 ,  G01J3/06 ,  G01J3/14 ,  G01J3/18 ,  G01J2003/1208 ,  G02B5/1828 ,  H01S3/08004 ,  H01S3/1055 ,  H01S3/1067

摘要： The bandwidth selection mechanism includes a first actuator mounted on a second face of a dispersive optical element, the second face being opposite from a reflective face, the first actuator having a first end coupled to a first end block and a second end coupled to a second end block, the first actuator being operative to apply equal and opposite forces to the first end block and the second end block to bend the body of the dispersive optical element along the longitudinal axis of the body and in a first direction normal to the reflective face of the dispersive optical element. The bandwidth selection mechanism also includes a second actuator being operative to apply equal and opposite forces to bend the body along the longitudinal axis of the body, in a second direction perpendicular to the reflective face of the dispersive optical element.

摘要翻译： 所述带宽选择机构包括安装在分散光学元件的第二面上的第一致动器，所述第二面与反射面相对，所述第一致动器具有联接到第一端块的第一端和耦合到第二端的第二端 第一致动器可操作以对第一端块和第二端块施加相等且相反的力，以沿着主体的纵向轴线并沿垂直于反射面的第一方向弯曲分散光学元件的主体 的色散光学元件。 带宽选择机构还包括第二致动器，其可操作以在垂直于分散光学元件的反射面的第二方向上施加相等且相反的力沿着身体的纵向轴线弯曲身体。

公开(公告)号：US07920616B2

公开(公告)日：2011-04-05

申请号：US11980172

申请日：2007-10-30

申请人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

发明人： Daniel J. W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

IPC分类号： H01S3/22

CPC分类号： H01S3/2383 ,  G03F7/70583 ,  H01S3/0057 ,  H01S3/08036 ,  H01S3/08059 ,  H01S3/10092 ,  H01S3/225 ,  H01S3/2325

摘要： A method/apparatus may comprise a laser light source which may comprise a solid state seed laser system producing a seed laser output having a nominal center wavelength at a pulse repetition rate; a first and a second gas discharge laser amplifier gain medium each operating at a pulse repetition rate less than that of the seed laser system; a beam divider providing each of the respective first and second amplifier gain mediums with seed laser output pulses; a frequency converter modifying the nominal center wavelength of the output of the seed laser to essentially the nominal center wavelength of the amplifier gain medium; a beam combiner combining the outputs of the respective amplifier gain mediums to provide a light source output having the pulse repetition rate of the seed laser; a coherence buster operating on either or both of the output of the seed laser or amplifier gain mediums.

摘要翻译： 方法/装置可以包括激光光源，其可以包括固态种子激光器系统，其产生具有脉冲重复率的标称中心波长的种子激光器输出; 第一和第二气体放电激光放大器增益介质，每个以比种子激光器系统的脉冲重复频率工作; 一个分束器，为每个相应的第一和第二放大器增益介质提供种子激光输出脉冲; 变频器将种子激光器的输出的标称中心波长修改为基本上放大器增益介质的标称中心波长; 组合各个放大器增益介质的输出以提供具有种子激光器的脉冲重复率的光源输出的光束组合器; 在种子激光器或放大器增益介质的输出中的任一个或两者上工作的相干致动器。

公开(公告)号：US20100309939A1

公开(公告)日：2010-12-09

申请号：US12806308

申请日：2010-08-10

申请人： Robert N. Jacques ,  William N. Partlo ,  Daniel J. W. Brown

发明人： Robert N. Jacques ,  William N. Partlo ,  Daniel J. W. Brown

IPC分类号： H01S3/13

CPC分类号： H01S3/225 ,  H01S3/08022 ,  H01S3/09702 ,  H01S3/1301 ,  H01S3/134 ,  H01S3/2308 ,  H01S3/2366

摘要： A method and apparatus are disclosed for controlling bandwidth in a multi-portion laser system comprising a first line narrowed oscillator laser system portion providing a line narrowed seed pulse to an amplifier laser system portion, may comprise utilizing a timing difference curve defining a relationship between a first laser system operating parameter other than bandwidth and the timing difference and also a desired point on the curve defining a desired timing difference, wherein each unique operating point on the curve corresponds to a respective bandwidth value; determining an actual offset from the timing difference at the desired point on the curve to an actual operating point on the curve; determining an error between the actual offset and a desired offset corresponding to a desired bandwidth; modifying the firing differential timing to remove the error between the actual offset and the desired offset.

公开(公告)号：US20090296758A1

公开(公告)日：2009-12-03

申请号：US11982217

申请日：2007-10-31

申请人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

发明人： Daniel J.W. Brown ,  William N. Partlo ,  Richard L. Sandstrom

IPC分类号： H01S3/10 ,  H01S3/13

CPC分类号： G03F7/7055 ,  H01S3/225 ,  H01S3/2308

摘要： An apparatus/method may comprise a line narrowed pulsed lithography laser light source which may comprise: a seed pulse providing laser system which may comprise: a first pulsed seed laser producing seed pulses at a rate of X kHz; a second pulsed seed laser producing seed pulses at a rate of X kHz; an amplification system which may comprise: a first amplifier gain system which may comprise a first and a second pulsed gas discharge amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the first seed laser; a second amplifier gain system which may comprise a first and a second pulsed amplifier gain medium, each with a nominal center wavelength in the UV range, and each operating at ½ X kHz on output pulses from the second seed laser.

摘要翻译： 一种装置/方法可以包括线窄的脉冲光刻激光光源，其可以包括：提供激光系统的种子脉冲，其可以包括：以X kHz的速率产生种子脉冲的第一脉冲种子激光器; 第二脉冲种子激光器以XkHz的速率产生种子脉冲; 放大系统，其可以包括：第一放大器增益系统，其可以包括第一和第二脉冲气体放电放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自 第一种子激光器 第二放大器增益系统，其可以包括第一和第二脉冲放大器增益介质，每个具有在UV范围内的标称中心波长，并且每个在来自第二种子激光器的输出脉冲上以1/2 X kHz工作。

公开(公告)号：US07369596B2

公开(公告)日：2008-05-06

申请号：US11447502

申请日：2006-06-05

申请人： Thomas D Steiger ,  William N. Partlo

发明人： Thomas D Steiger ,  William N. Partlo

IPC分类号： H01S3/22 ,  H01S3/223 ,  H01S3/03

CPC分类号： H01S3/225 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038

摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

摘要翻译： 公开了一种用于气体放电激光器的室，并且可以包括具有壁的室壳体，该壁具有围绕室容积的内表面和外表面，该壁还形成有孔口。 对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。 构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。 腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

公开(公告)号：US07346093B2

公开(公告)日：2008-03-18

申请号：US10808157

申请日：2004-03-23

申请人： Richard L. Sandstrom ,  John Martin Algots ,  Joshua C. Brown ,  Raymond F. Cybulski ,  John Dunlop ,  James K. Howey ,  Richard G. Morton ,  Xiaojiang Pan ,  William N. Partlo ,  Firas F. Putris ,  Tom A. Watson ,  Thomas A. Yager

发明人： Richard L. Sandstrom ,  John Martin Algots ,  Joshua C. Brown ,  Raymond F. Cybulski ,  John Dunlop ,  James K. Howey ,  Richard G. Morton ,  Xiaojiang Pan ,  William N. Partlo ,  Firas F. Putris ,  Tom A. Watson ,  Thomas A. Yager

IPC分类号： H01S3/08 ,  H01S3/22

CPC分类号： H01S3/02 ,  G01J1/429 ,  G01J9/02 ,  G03F7/70025 ,  G03F7/70575 ,  G03F7/70933 ,  H01S3/0057 ,  H01S3/0071 ,  H01S3/036 ,  H01S3/038 ,  H01S3/0385 ,  H01S3/0401 ,  H01S3/041 ,  H01S3/08009 ,  H01S3/08036 ,  H01S3/0812 ,  H01S3/097 ,  H01S3/0971 ,  H01S3/0975 ,  H01S3/1024 ,  H01S3/104 ,  H01S3/105 ,  H01S3/1055 ,  H01S3/1305 ,  H01S3/134 ,  H01S3/139 ,  H01S3/22 ,  H01S3/2207 ,  H01S3/223 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256 ,  H01S3/2258 ,  H01S3/2333 ,  H01S3/2366

摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.

摘要翻译： 公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座 从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。 该装置可以包括具有细长杆的挠曲力机构。 力机构可以预应力挠曲。 镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。 光栅可以使用电磁感应元件或磁敏元件进行主动调谐。 可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

公开(公告)号：US20070280323A1

公开(公告)日：2007-12-06

申请号：US11447502

申请日：2006-06-05

申请人： Thomas D. Steiger ,  William N. Partlo

发明人： Thomas D. Steiger ,  William N. Partlo

IPC分类号： H01S3/03 ,  H01S3/22 ,  H01S3/223

CPC分类号： H01S3/225 ,  H01S3/03 ,  H01S3/036 ,  H01S3/038

摘要： A chamber for a gas discharge laser is disclosed and may include a chamber housing having a wall, the wall having an inside surface surrounding a chamber volume and an outside surface, the wall also being formed with an orifice. For the chamber, at least one electrical conductor may extend through the orifice to pass an electric current into the chamber volume. A member may be disposed between the conductor and the wall for preventing gas flow through the orifice to allow a chamber pressure to be maintained in the volume. The chamber may further comprise a pressurized compartment disposed adjacent to the orifice for maintaining a pressure on at least a portion of the outside surface of the wall to reduce bowing of the wall near the orifice due to chamber pressure.

摘要翻译： 公开了一种用于气体放电激光器的室，并且可以包括具有壁的室壳体，该壁具有围绕室容积的内表面和外表面，该壁还形成有孔口。 对于腔室，至少一个电导体可以延伸通过孔口以将电流传递到腔体积中。 构件可以设置在导体和壁之间，用于防止气体流过孔口，以允许室压力保持在容积中。 腔室可以进一步包括邻近孔口设置的加压隔室，用于在壁的外表面的至少一部分上保持压力，以减小由于腔室压力而在孔口附近的壁的弯曲。

公开(公告)号：US07109503B1

公开(公告)日：2006-09-19

申请号：US11067099

申请日：2005-02-25

申请人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

发明人： Norbert R. Bowering ,  Bjorn A. M. Hansson ,  Alexander N. Bykanov ,  Oleh Khodykin ,  Alexander I. Ershov ,  William N. Partlo

IPC分类号： G01J1/00

CPC分类号： G03F7/70925 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70916 ,  G21K2201/06 ,  H05G2/001

摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.

摘要翻译： 公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。 在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。 管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。 在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。 在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

公开(公告)号：US06661826B2

公开(公告)日：2003-12-09

申请号：US10164885

申请日：2002-06-07

申请人： Richard C. Ujazdowski ,  Timothy S. Dyer ,  William N. Partlo ,  Michael Altheim ,  Brian Strate ,  Thomas Hofmann

发明人： Richard C. Ujazdowski ,  Timothy S. Dyer ,  William N. Partlo ,  Michael Altheim ,  Brian Strate ,  Thomas Hofmann

IPC分类号： H01S3223

CPC分类号： G03F7/70025 ,  G03F7/70041 ,  G03F7/70483 ,  H01S3/036 ,  H01S3/038 ,  H01S3/225

摘要： A feedthrough structure of a gas discharge laser chamber conducts electric power through the wall of a sealed gas enclosure to a single piece elongated electrode inside the enclosure. The feedthrough structure includes a single piece integrated main insulator larger than the electrode. The main insulator is compressed between the electrode and the wall of the enclosure. The surfaces forming interfaces between the electrode and the single piece insulator are the insulator and the wall are all very smooth to permit the parts to expand and contract as the chamber temperature varies. The feedthrough structure also provides mechanical support and alignment for the electrode and includes seals to prevent gas leakage around the feedthrough structure.

公开(公告)号：US06359922B1

公开(公告)日：2002-03-19

申请号：US09421701

申请日：1999-10-20

申请人： William N. Partlo ,  Xiaojiang Pan ,  Eckehard D. Onkels

发明人： William N. Partlo ,  Xiaojiang Pan ,  Eckehard D. Onkels

IPC分类号： H01S322

CPC分类号： H01S3/2366 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70575 ,  H01S3/036 ,  H01S3/073 ,  H01S3/225 ,  H01S3/2333

摘要： A single chamber gas discharge laser system having a pulse power source for producing electrical discharges at the rate of at least 1000 pulses per second. The discharge along with laser optics create two short lived gain media, one for producing a seed beam and the other for amplifying the seed beam. Laser gas circulation around a chamber circulation path is provided and the electrodes and discharges are arranged so that debris from one of the gain media is not circulated to the other gain media during discharges until the debris has made a loop around at least 90% of the chamber circulation path.

摘要翻译： 具有用于以每秒至少1000个脉冲的速率产生放电的脉冲电源的单室气体放电激光器系统。 放射与激光光学器件一起产生两个短寿命增益介质，一个用于产生种子束，另一个用于放大种子束。 提供了围绕室循环路径的激光气体循环，并且电极和排出物被布置成使得来自增益介质之一的碎屑在排放期间不循环到另一增益介质，直到碎片已经围绕至少90％的循环 室循环路径。