公开(公告)号：US20150213995A1

公开(公告)日：2015-07-30

申请号：US14162802

申请日：2014-01-24

Applicant: Keysight Technologies, Inc.

Inventor： Lawrence P. Muray ,  Scott W. Indermuehle ,  James P. Spallas ,  Ying Wu ,  Dimitri Klyachko

IPC: H01J37/05 ,  G01T1/36 ,  H01J37/28

CPC classification number: H01J37/04 ,  H01J37/05 ,  H01J37/20 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/04735 ,  H01J2237/1205 ,  H01J2237/2007 ,  H01J2237/202 ,  H01J2237/2442 ,  H01J2237/2445

Abstract: A scanning electron microscopy (SEM) and energy dispersive spectroscopy (EDS) apparatus that includes a scanning electron microscope, an x-ray detector, and an auxiliary acceleration voltage source. The scanning electron microscope includes a sample holder, and a layered electron beam column arranged to output an electron beam towards the sample holder at an initial beam energy. The auxiliary acceleration voltage source is to apply an auxiliary acceleration voltage between the sample holder and the layered electron beam column to accelerate the electron beam to a final beam energy. At the final beam energy, the electron beam is capable of generating x-rays at multiple wavelengths from a larger range of atomic species than the electron beam at the initial beam energy.

Abstract translation: 包括扫描电子显微镜，X射线检测器和辅助加速电压源的扫描电子显微镜（SEM）和能量色散光谱（EDS）装置。 扫描电子显微镜包括样品保持器和分层电子束柱，其被布置成以初始光束能量朝向样品保持器输出电子束。 辅助加速电压源是在样品架和分层电子束柱之间施加辅助加速电压，以将电子束加速到最终的束能。 在最终光束能量下，电子束能够在起始光束能量下从原子物质的范围比电子束产生多个波长的x射线。

公开(公告)号：US08937004B2

公开(公告)日：2015-01-20

申请号：US13866315

申请日：2013-04-19

Applicant: Varian Semiconductor Equipment Associates, Inc.

Inventor： Anthony Renau ,  Ludovic Godet ,  Timothy J. Miller ,  Joseph C. Olson ,  Vikram Singh ,  James Buonodono ,  Deepak A. Ramappa ,  Russell J. Low ,  Atul Gupta ,  Kevin M. Daniels

IPC: H01L21/26 ,  H01L21/42 ,  B01J19/08 ,  H01J37/317 ,  H01J37/32 ,  H01L31/0224 ,  H01L31/068 ,  H01L21/223

CPC classification number: B01J19/081 ,  H01J37/3171 ,  H01J37/32357 ,  H01J37/32422 ,  H01J37/32623 ,  H01J2237/0453 ,  H01J2237/1205 ,  H01L21/2236 ,  H01L31/022425 ,  H01L31/068 ,  H01L31/08 ,  H01L31/1804 ,  Y02E10/547 ,  Y02P70/521

Abstract: A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.

Abstract translation: 等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。 该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。 该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。 该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。

公开(公告)号：US08884225B2

公开(公告)日：2014-11-11

申请号：US13665623

申请日：2012-10-31

Applicant: Ebara Corporation

Inventor： Tsutomu Karimata ,  Tatsuya Kohama ,  Shoji Yoshikawa ,  Masahiro Hatakeyama

IPC: H01J37/28 ,  H01J37/26 ,  H01J37/073 ,  H01J37/12

CPC classification number: H01J37/261 ,  H01J37/073 ,  H01J37/12 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/036 ,  H01J2237/062 ,  H01J2237/06333 ,  H01J2237/1205 ,  H01J2237/1518 ,  H01J2237/186 ,  H01J2237/2443 ,  H01J2237/2817

Abstract: An electron beam inspection device observes a sample by irradiating the sample set on a stage with electron beams and detecting the electron beams from the sample. The electron beam inspection device has one electron column which irradiates the sample with the electron beams, and detects the electron beams from the sample. In this one electron column, a plurality of electron beam irradiation detecting systems are formed which each form electron beam paths in which the electron beams with which the sample is irradiated and the electron beams from the sample pass. The electron beam inspection device inspects the sample by simultaneously using a plurality of electron beam irradiation detecting systems and simultaneously irradiating the sample with the plurality of electron beams.

Abstract translation: 电子束检查装置通过用电子束照射载物台上的样品并检测来自样品的电子束来观察样品。 电子束检查装置具有一个电子管，用电子束照射样品，并检测来自样品的电子束。 在该一个电子柱中，形成多个电子束照射检测系统，每个电子束照射检测系统形成电子束路径，其中照射样品的电子束和来自样品的电子束通过。 电子束检查装置通过同时使用多个电子束照射检测系统来检查样品，同时用多个电子束照射样品。

公开(公告)号：US08829465B2

公开(公告)日：2014-09-09

申请号：US14118963

申请日：2012-05-10

Applicant: Koichi Tsunoda

Inventor： Koichi Tsunoda

IPC: H01J37/12 ,  H01J37/00 ,  H01J37/317

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support intervenes between the first electrode and the second electrode to electrically insulate the first and second electrodes from each other and to support the first and second electrodes in a predetermined positional relationship. A side surface of the support intervenes between the first electrode and the second electrode and includes a non-flat portion having at least one of a projected portion and a depressed portion, and includes a tapered portion. A taper angle formed by the tapered portion and the surface having the aperture of the second electrode is greater than zero degree and less than ninety degrees.

Abstract translation: 带电粒子束透镜包括包括具有至少一个孔的表面的第一电极和包括具有至少一个孔的表面的第二电极。 支撑件介于第一电极和第二电极之间，以使第一和第二电极彼此电绝缘，并以预定的位置关系支撑第一和第二电极。 支撑体的侧表面介于第一电极和第二电极之间，并且包括具有突出部分和凹陷部分中的至少一个的非平坦部分，并且包括锥形部分。 由锥形部分和具有第二电极孔径的表面形成的锥角大于零度且小于九十度。

公开(公告)号：US20140151571A1

公开(公告)日：2014-06-05

申请号：US14005175

申请日：2012-03-14

Applicant: Takahisa Kato ,  Yutaka Setomoto

Inventor： Takahisa Kato ,  Yutaka Setomoto

IPC: H01J37/12

CPC classification number: H01J37/12 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31774

Abstract: In a charged particle beam lens according to the present invention, the orientations of through-holes formed in electrodes and precision of forming the through-holes are determined in accordance with the degree of influences of the surfaces of the electrodes on the aberration of the lens.

Abstract translation: 在根据本发明的带电粒子束透镜中，形成在电极中的通孔的取向和形成通孔的精度根据电极表面对透镜的像差的影响程度来确定 。

公开(公告)号：US08723134B2

公开(公告)日：2014-05-13

申请号：US12914252

申请日：2010-10-28

Applicant: Roland Janzen

Inventor： Roland Janzen

IPC: H01J37/153

CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1516 ,  H01J2237/1532

Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.

Abstract translation: 描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。 校正原理与普通多极校正器相似。 但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。

公开(公告)号：US08716672B2

公开(公告)日：2014-05-06

申请号：US13835154

申请日：2013-03-15

Applicant: Canon Kabushiki Kaisha

Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

IPC: H01J3/14 ,  H01J3/12 ,  H01J1/46

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

公开(公告)号：US20140103223A1

公开(公告)日：2014-04-17

申请号：US14118963

申请日：2012-05-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Koichi Tsunoda

IPC: H01J37/12

CPC classification number: H01J37/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/03 ,  H01J2237/1205

Abstract: A charged particle beam lens includes a first electrode including a surface having at least one aperture and a second electrode including a surface having at least one aperture. A support intervenes between the first electrode and the second electrode to electrically insulate the first and second electrodes from each other and to support the first and second electrodes in a predetermined positional relationship. A side surface of the support intervenes between the first electrode and the second electrode and includes a non-flat portion having at least one of a projected portion and a depressed portion and includes a tapered portion. A taper angle formed by the tapered portion and the surface having the aperture of the second electrode is greater than zero degrees and less than ninety degrees.

Abstract translation: 带电粒子束透镜包括包括具有至少一个孔的表面的第一电极和包括具有至少一个孔的表面的第二电极。 支撑件介于第一电极和第二电极之间，以使第一和第二电极彼此电绝缘，并以预定的位置关系支撑第一和第二电极。 支撑体的侧表面介于第一电极和第二电极之间，并且包括具有突出部分和凹陷部分中的至少一个的非平坦部分，并且包括锥形部分。 由锥形部分和具有第二电极孔径的表面形成的锥角大于零度且小于九十度。

公开(公告)号：US20140077096A1

公开(公告)日：2014-03-20

申请号：US14023308

申请日：2013-09-10

Applicant: CANON KABUSHIKI KAISHA

Inventor： Takashi Shiozawa ,  Kazushige Utsumi ,  Toshiro Yamanaka

IPC: H01J3/18

CPC classification number: H01J3/18 ,  H01J37/12 ,  H01J2237/1205 ,  H01J2237/1207 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: An electrostatic lens unit of the present disclosure includes an electrostatic lens fixed to a fixing member. The electrostatic lens has a plurality of electrodes arranged apart from each other by a spacing member and each having a through hole through which a charged beam passes. The electrostatic lens is fixed to the fixing member at a position, on a side where the charged beam goes out, shifted from a center of a thickness of the electrostatic lens in a direction of an optical axis.Part of a surface of the electrostatic lens on the side where the charged beam enters is connected to the fixing member via a supporting member.

Abstract translation: 本公开的静电透镜单元包括固定到固定构件的静电透镜。 静电透镜具有通过间隔构件彼此分开布置的多个电极，每个电极具有带电束通过的通孔。 静电透镜在被充电光束出射的一侧的位置处，在静电透镜的厚度中心沿光轴的方向固定在固定部件上。 静电透镜在充电束进入侧的表面的一部分经由支撑构件连接到固定构件。

公开(公告)号：US08648318B2

公开(公告)日：2014-02-11

申请号：US13071225

申请日：2011-03-24

Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

IPC: H01J37/317 ,  H01J37/147 ,  H01J37/26

CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。