公开(公告)号：US06620299B1

公开(公告)日：2003-09-16

申请号：US09868636

申请日：2001-06-27

申请人： Fred Fietzke ,  Klaus Goedicke ,  Siegfried Schiller

发明人： Fred Fietzke ,  Klaus Goedicke ,  Siegfried Schiller

IPC分类号： C23C1434

CPC分类号： C23C14/352 ,  H01J37/3405

摘要： Process and device for coating substrates utilizing bipolar pulsed magnetron sputtering in the frequency range between 10 and 100 kHz, wherein the device includes at least three magnetron sources. Each of the at least three magnetron sources includes a target. At least two of the targets are connected to a potential-free bipolar power supply device. The at least three targets are arranged relative to the substrates in such a way that the substrates are located at least partially inside a discharge current during a coating of the substrates. A switching device is adapted to connect the targets to the bipolar power supply device. A technological predetermined program is used for controlling the switching device. The switching device connects at least two of the targets at a time to the bipolar power supply device according to the technologically predetermined program.

摘要翻译： 在10至100kHz的频率范围内使用双极性脉冲磁控溅射涂覆基底的方法和装置，其中该装置包括至少三个磁控管源。 至少三个磁控管源中的每一个包括目标。 至少两个目标连接到无电压双极电源装置。 至少三个目标相对于基板被布置成使得在基板的涂覆期间基板至少部分地位于放电电流的内部。 开关装置适于将目标连接到双极电源装置。 技术预定程序用于控制切换装置。 开关装置根据技术上预定的程序一次将至少两个目标物连接到双极电源装置。

公开(公告)号：US06596368B1

公开(公告)日：2003-07-22

申请号：US09647053

申请日：2001-01-30

申请人： Jöm-Steffen Liebig ,  Klaus Goedicke ,  Volker Kirchhoff ,  Gerhard Keller ,  Richard Bosmans ,  Pascal Comble

发明人： Jöm-Steffen Liebig ,  Klaus Goedicke ,  Volker Kirchhoff ,  Gerhard Keller ,  Richard Bosmans ,  Pascal Comble

IPC分类号： B32B302

CPC分类号： C23C14/0036 ,  G02B1/115 ,  Y10S428/90 ,  Y10T428/31507

摘要： An organic substrate having optically-active layers deposited by magnetron sputtering and a preparation process for it are provided. Gas pressure used for carrying out better adhesion by sputtering is high, comprised between 0.8 and 5.0 Pa. Sputtering is particularly suitable for targets of Si, Ti, Zr and organic substrates with or without anti-abrasive coating. Improved adhesion of thin films is obtained.

摘要翻译： 提供了通过磁控溅射沉积光学活性层的有机基板及其制备方法。 用于通过溅射进行更好粘附的气体压力高，介于0.8和5.0Pa之间。溅射特别适用于具有或不具有抗磨蚀涂层的Si，Ti，Zr和有机基材的靶。 获得了改进的薄膜粘附性。

公开(公告)号：US06554971B2

公开(公告)日：2003-04-29

申请号：US09987123

申请日：2001-11-13

申请人： Olaf Zywitzki ,  Klaus Goedicke ,  Fred Fietzke ,  Siegfried Schiller ,  Torbjörn Selinder ,  Mats Ahlgren

发明人： Olaf Zywitzki ,  Klaus Goedicke ,  Fred Fietzke ,  Siegfried Schiller ,  Torbjörn Selinder ,  Mats Ahlgren

IPC分类号： C23C1434

CPC分类号： C04B41/009 ,  C04B41/5046 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C14/08 ,  C23C14/081 ,  C23C28/044 ,  C23C28/42 ,  C23C30/005 ,  C04B41/4529 ,  C04B41/5061 ,  C04B41/5068 ,  C04B35/00 ,  C04B35/583

摘要： The present invention describes a coating cutting tool for metal machining and a process for producing such tools. The coating is composed of one or more layers of refractory compounds of which at least one layer consists of nanocrystalline aluminum spinel of the type (Me)xAl2O3+x where Me is a second metal and 0

公开(公告)号：US06316061B1

公开(公告)日：2001-11-13

申请号：US09583621

申请日：2000-05-31

申请人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

发明人： Gerd Andler ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Christoph Metzner

IPC分类号： B05D306

CPC分类号： C23C14/30 ,  C23C14/06 ,  F16C17/02 ,  F16C33/121 ,  F16C33/124 ,  F16C33/14 ,  Y10S384/912

摘要： A half bearing has a backing member and at least one metallic overlay, which is applied by electron beam vapour deposition and which comprises at least one finely dispersed component in a matrix material, the atomic weight of which component is greater than that of the matrix material, wherein the concentration of the finely dispersed component (7) decreases continuously from the apex area (8) of the half bearing (1) towards the area (9) of the partial surfaces. The method is characterised in that, during the coating process, an inert gas pressure of 0.1 to 5 Pa is set in the apex area of the bearing shell.

摘要翻译： 半轴承具有背衬构件和至少一个金属覆盖层，其通过电子束气相沉积施加，并且其包含至少一种精细分散的基体材料中的组分，该组分的原子量大于基体材料的原子量 ，其中所述细分散组分（7）的浓度从所述半轴承（1）的顶点区域（8）朝向所述部分表面的区域（9）连续地减小。 该方法的特征在于，在涂覆过程中，在轴承壳体的顶点区域中设置0.1至5Pa的惰性气体压力。

公开(公告)号：US6086963A

公开(公告)日：2000-07-11

申请号：US125106

申请日：1998-09-02

申请人： Klaus Goedicke ,  Bert Scheffel ,  Christoph Metzner

发明人： Klaus Goedicke ,  Bert Scheffel ,  Christoph Metzner

IPC分类号： C03C17/00 ,  C23C14/54 ,  C23C14/24 ,  C23C15/54

CPC分类号： C23C14/54 ,  C03C17/002

摘要： The vacuum vaporization process is controlled using recoil force of the evaporating particles as the measurable variable by measuring the rate of evaporation. The vaporizer vessel is arranged in the vacuum chamber with the aid of force transducers, and the signal emanating from the force transducers can be used to control, for example, the electrical energy to heat the vaporizing material, the beam deflection or the fill level in the vaporizer, with the sensors not coming into contact with the vapor. Vacuum vaporization processes, particularly for vapor deposition of functional coatings on tools and sheet substrates, can be controlled with this method and device.

摘要翻译： PCT No.PCT / DE97 / 00267 Sec。 371日期：1998年9月2日 102（e）1998年9月2日PCT PCT 1997年2月7日提交PCT公布。 公开号WO97 / 30187 日期1997年8月21日通过测量蒸发速率，通过蒸发颗粒的反冲力作为可测量的变量控制真空蒸发过程。 蒸发器容器借助于力传感器布置在真空室中，并且来自力传感器的信号可用于控制例如电能以加热气化材料，光束偏转或填充水平 蒸发器，传感器不与蒸气接触。 这种方法和装置可以控制真空汽化过程，特别是用于工具和片材基底上的功能涂层的气相沉积。

公开(公告)号：US6068890A

公开(公告)日：2000-05-30

申请号：US903746

申请日：1997-07-31

申请人： Fritz Kaumle ,  Reinhold Separautzki ,  Klaus Goedicke ,  Fred Fietzke

发明人： Fritz Kaumle ,  Reinhold Separautzki ,  Klaus Goedicke ,  Fred Fietzke

IPC分类号： B60B3/00 ,  B05D5/06 ,  B05D7/14 ,  B32B15/08 ,  C23C14/02 ,  C23C14/34 ,  C23C14/35 ,  C23C28/00

CPC分类号： C23C28/32 ,  B05D5/068 ,  C23C28/00 ,  C23C28/345 ,  Y10S428/923 ,  Y10S428/925 ,  Y10S428/926 ,  Y10S428/936 ,  Y10S428/938 ,  Y10T428/12007 ,  Y10T428/12028 ,  Y10T428/12986 ,  Y10T428/26

摘要： The invention relates to a method for gloss coating articles or a portion of an article's surface and articles produced from this method. A corrosion-inhibiting polishing base coat is applied in a known fashion, after which a high-gloss layer produced by atomization, preferably magnetron atomization, is applied. Then, a transparent, wear-resistant top coat layer is applied in a known fashion. The articles can also be pretreated, if desired, and given a protective or other layers. By using this method, parts for vehicles, especially vehicle wheels, can be produced in a great variety of colors and with improved qualities.

摘要翻译： 本发明涉及一种用于光泽涂布制品或一部分制品表面的方法以及由该方法生产的制品。 以已知的方式施加防腐蚀抛光底涂层，之后施加通过雾化产生的高光泽层，优选磁控管雾化。 然后，以已知的方式施加透明耐磨面漆层。 如果需要，也可以对制品进行预处理，并给予保护层或其它层。 通过使用这种方法，可以以各种各样的颜色和改进的品质生产用于车辆，特别是车轮的部件。

公开(公告)号：US6063245A

公开(公告)日：2000-05-16

申请号：US989246

申请日：1997-12-12

申请人： Peter Frach ,  Klaus Goedicke ,  Michael Junghahnel ,  Torsten Winkler ,  Friedel Haese ,  Dieter W. Meyer ,  Manfred Muller ,  Harald Strecker

发明人： Peter Frach ,  Klaus Goedicke ,  Michael Junghahnel ,  Torsten Winkler ,  Friedel Haese ,  Dieter W. Meyer ,  Manfred Muller ,  Harald Strecker

IPC分类号： C23C14/00 ,  C23C14/06 ,  C23C14/35 ,  C23C14/34

CPC分类号： C23C14/352 ,  C23C14/0036 ,  C23C14/0605

摘要： A procedure and apparatus for the application of carbon layers using reactive magnetron sputtering is described. The process includes sputtering of at least two targets made of carbon in a reactive atmosphere with a pulsed energy feed. During a pattern period of the pulses all targets (magnetrons) are once switched on as an anode and at least one target is switched as an anode at all times Various embodiments include detection and limitation of the "microarcs"; executing of regeneration processes according to fixed predetermined time intervals for at least 5 seconds. In one embodiment a microarc is detected on a magnetron and if a next pulse-off time is more than a selected time period away, then the magnetron is connected to a positive pole of the power supply. In another embodiment of the invention a pulsed negative voltage is applied to a substrate being sputtered by connecting the substrate to a negative pole of a pulsed power supply having a positive pole connected to a positive pole of a power supply for a magnetron. In another embodiment of the invention there is an electrode insulated from an installation mass which is connected to at least one positive pole of a power supply during the periodic pausing sputtering of substrates for regeneration.

摘要翻译： 描述了使用反应性磁控溅射应用碳层的方法和装置。 该方法包括在反应性气氛中用脉冲能量进料溅射由碳制成的至少两个靶。 在脉冲的图案周期期间，所有目标（磁控管）一次作为阳极接通，并且至少一个目标始终作为阳极切换。各种实施例包括检测和限制“微型”; 根据固定的预定时间间隔执行至少5秒的再生处理。 在一个实施例中，在磁控管上检测到微弧，并且如果下一个脉冲关闭时间大于所选择的时间段，则磁控管连接到电源的正极。 在本发明的另一个实施例中，通过将衬底连接到具有连接到用于磁控管的电源的正极的正极的脉冲电源的负极来将脉冲负电压施加到正在溅射的衬底上。 在本发明的另一个实施例中，存在与在用于再生的衬底的周期性暂停溅射期间连接到电源的至少一个正极的安装质量绝缘的电极。

公开(公告)号：US5698314A

公开(公告)日：1997-12-16

申请号：US445521

申请日：1995-05-22

申请人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

发明人： Klaus Goedicke ,  Gunter Hotzsch ,  Fred Fietzke ,  Olaf Zywitzki ,  Siegfried Schiller ,  Jonathan Reschke ,  Wolfgang Hempel

IPC分类号： C04B35/622 ,  C04B41/50 ,  C04B41/52 ,  C04B41/87 ,  C04B41/89 ,  C23C14/00 ,  C23C14/08

CPC分类号： C04B41/87 ,  C04B35/62222 ,  C04B41/5031 ,  C04B41/52 ,  C04B41/89 ,  C23C14/0036 ,  C23C14/081 ,  Y10T428/2916

摘要： Compound body of a vacuum coated sintered material and a process for its production. Such compound bodies, when coated in a known manner, have a carrier of sintered material coated with a layer that is thermally, mechanically and chemically unstable, with their surface showings cracks and being partially porous. These shortcomings are overcome via an improved eco-friendly vacuum deposition process, wherein at least one layer of a material, having an outer layer of Al.sub.2 O.sub.3, is applied to the carrier of sintered material at a maximum of 800.degree. C., with this layer being completely crystalline and comprised of an .alpha.Al.sub.2 O.sub..sub.3 phase and possibly of a .gamma.Al.sub.2 O.sub.3 phase with a (440) texture, having a compressive stress of at least 1 GPa and a hardness of at least 20 GPa, with the Al.sub.2 O.sub.3 layer being deposited via reactive magnetron sputtering, wherein the magnetrons are pulse driven, the pulse frequency lies between 20 and 100 Khz and the deposition rate is at least 1 nm/s, with the resulting compound bodies being utilized for cutting treatments, particularly as cemented carbide inserts.

摘要翻译： 真空涂覆烧结材料的复合体及其制造方法。 这种复合体以已知的方式涂覆时，具有涂覆有热，机械和化学不稳定的层的烧结材料的载体，其表面显示出裂纹并且是部分多孔的。 通过改进的环保真空沉积工艺克服了这些缺点，其中至少一层具有Al 2 O 3外层的材料最多在800℃下施加到烧结材料的载体上，该层 是完全结晶的，并且由αAl 2 O 3相和可能具有（440）织构的γAl 2 O 3相组成，具有至少1GPa的压缩应力和至少20GPa的硬度，Al 2 O 3层通过反应性沉积 磁控管溅射，其中磁控管是脉冲驱动的，脉冲频率在20和100KHz之间，并且沉积速率为至少1nm / s，所得到的复合体用于切割处理，特别是作为硬质合金刀片。

公开(公告)号：US06444086B1

公开(公告)日：2002-09-03

申请号：US09555905

申请日：2000-08-31

申请人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

发明人： Gerd Andler ,  Wolfgang Wixwat-Ernst ,  Christoph Metzner ,  Jens-Peter Heinss ,  Klaus Goedicke ,  Siegfried Schiller

IPC分类号： C23F100

CPC分类号： C23C14/50 ,  C23C14/022 ,  C23C14/568 ,  F16C33/14

摘要： Existing devices for vacuum coating substrates having different shapes, either in continuous or hatch facilities, are equipped in such a way that several coatings are applied after a coating process. The slide bearings are to be coated with several coats and the coating materials used and the conditions related thereto require the use of several coating techniques. This relates inter alia to conveyance parameters. Existing facilities fail to meet these requirements. According to the invention, such a device comprises several aligned processing chambers. Slide bearings which are held together by positive and non-positive fit in tempered carrier bodies are displaced through said chambers comprising pretreatment, atomization and evaporation chambers using a conveyance system adapted to this process. A tempering device for the carrier bodies is connected upstream from the coating track. Corresponding inlet and outlet channels enable air-to-air conveyance.

摘要翻译： 在连续或舱口设施中具有不同形状的真空涂覆基材的现有装置以这样的方式装备，使得在涂覆工艺之后施加若干涂层。 滑动轴承应涂覆几层，所用的涂层材料和相关条件需要使用几种涂层技术。 这尤其涉及输送参数。 现有设施不符合这些要求。 根据本发明，这种装置包括几个对准的处理室。 通过正和非正配合保持在回火承载体中的滑动轴承通过适于该过程的输送系统而被移动通过包括预处理，雾化和蒸发室的所述室。 用于承载体的回火装置连接在涂层轨迹的上游。 相应的入口和出口通道可进行空气 - 空气输送。

公开(公告)号：US06436546B1

公开(公告)日：2002-08-20

申请号：US09607632

申请日：2000-06-30

申请人： Josephus Gertudis Wilhelmus Pierre Gulikers ,  Peter Malobabic ,  Erwin Hochreiter ,  Klaus Goedicke ,  Jörn-Steffen Liebig

发明人： Josephus Gertudis Wilhelmus Pierre Gulikers ,  Peter Malobabic ,  Erwin Hochreiter ,  Klaus Goedicke ,  Jörn-Steffen Liebig

IPC分类号： C23C1400

CPC分类号： C23C14/0015 ,  C23C14/0042 ,  C23C14/025 ,  C23C14/083 ,  C23C14/505 ,  C23C14/56 ,  Y10T428/24273 ,  Y10T428/2495

摘要： The invention discloses a method for coating foil comprised of nickel or a nickel alloy by sputtering a layer comprised of a metal compound on the foil in a vacuum. The foil is treated in an argon plasma with a pressure of 1031 3 to 10−2 millibar, for a variable time with a variable rate, and with energy of the plasma ions. A chromium oxide layer or a layer containing chromium oxide is successively sputtered by means of a reactive magnetron atomizing of at least one target comprised of chromium or an alloy containing chromium. The layer is sputtered with at least one atomization source in an argon-oxygen mixture with a pressure of 10−3 to 10−2 millibar. The operating point is constantly maintained in given boundaries and the foil is bonded in a defined thermal contact with a thermal buffer when the foil is being coated. The foil is coated until a given interference color pertaining to an interference of a first or second order is reached on the foil.

摘要翻译： 本发明公开了一种通过在真空中将由金属化合物构成的层溅射在箔上的由镍或镍合金组成的箔的方法。 箔片在氩等离子体中以1031 3至10-2毫巴的压力处理，具有可变速率和等离子体离子的能量。 通过至少一种由铬或含有铬的合金构成的靶的反应性磁控管雾化，依次溅射氧化铬层或含有氧化铬的层。 该层在氩气 - 氧气混合物中用10-3至10-2毫巴的压力溅射至少一个雾化源。 工作点始终保持在给定的边界上，并且当箔被涂覆时，箔以热定型的热接触结合。 涂覆箔，直到在箔上达到与第一或第二顺序的干涉有关的给定干涉色。