公开(公告)号：US20230279539A1

公开(公告)日：2023-09-07

申请号：US18142283

申请日：2023-05-02

Applicant: ASM IP Holding B.V.

Inventor： Paul Ma ,  Roghayyeh Lotfi ,  Jaebeom Lee ,  Eric Christopher Stevens ,  Amit Mishra

IPC: C23C16/06 ,  C23C16/455 ,  C23C28/00 ,  C23C16/30 ,  C23C16/32

CPC classification number: C23C16/06 ,  C23C16/45527 ,  C23C28/341 ,  C23C16/303 ,  C23C16/305 ,  C23C16/32

Abstract: Methods and systems for forming molybdenum layers on a surface of a substrate and structures and devices formed using the methods are disclosed. Exemplary methods include forming an underlayer prior to forming the molybdenum layer. The underlayer can be used to manipulate stress in the molybdenum layer and/or reduce a nucleation temperature and/or deposition temperature of a step of forming the molybdenum layer.

公开(公告)号：US20210102292A1

公开(公告)日：2021-04-08

申请号：US17060507

申请日：2020-10-01

Applicant: ASM IP Holding B.V.

Inventor： Xing Lin ,  Peipei Gao ,  Prajwal Nagaraj ,  Mingyang Ma ,  Wentao Wang ,  Ion Hong Chao ,  Alexandros Demos ,  Paul Ma ,  Hichem M'Saad

IPC: C23C16/455 ,  C23C16/40

Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.

公开(公告)号：US12006572B2

公开(公告)日：2024-06-11

申请号：US17060507

申请日：2020-10-01

Applicant: ASM IP Holding B.V.

Inventor： Xing Lin ,  Peipei Gao ,  Prajwal Nagaraj ,  Mingyang Ma ,  Wentao Wang ,  Ion Hong Chao ,  Alexandros Demos ,  Paul Ma ,  Hichem M'Saad

IPC: H01J37/32 ,  C23C16/40 ,  C23C16/455 ,  C23C16/50

CPC classification number: C23C16/45582 ,  C23C16/403 ,  C23C16/405 ,  C23C16/45536 ,  C23C16/45565 ,  C23C16/50 ,  H01J37/32357 ,  H01J37/3244

Abstract: A reactor system including a gas distribution assembly and method of using the reactor system are disclosed. The gas distribution assembly includes a gas distribution device, a gas expansion area, and a showerhead plate downstream of the gas distribution device and the expansion area.

公开(公告)号：US20240165681A1

公开(公告)日：2024-05-23

申请号：US18509375

申请日：2023-11-15

Applicant: ASM IP Holding B.V.

Inventor： Jereld Lee Winkler ,  Paul Ma ,  Eric James Shero ,  Shubham Garg ,  Jonathan Bakke ,  Todd Dunn ,  Jacqueline Wrench ,  Shuaidi Zhang

IPC: B08B9/08 ,  B08B9/46

CPC classification number: B08B9/0813 ,  B08B9/46 ,  B08B2209/08

Abstract: Various embodiments of the present technology may provide methods and apparatus for cleaning a source vessel. The source vessel may be filled or partially filled with a solvent to form a solution. The solution is removed from the source vessel and contained in a waste vessel that is connected to the source vessel. The waste vessel may have a bellow or other mechanism inside of it to create a negative pressure in the waste vessel to pull the solution out of the source vessel and into the waste vessel. Alternatively, a liquid pump may be used to pull the solution from the source vessel to the waste vessel.

公开(公告)号：US20230343596A1

公开(公告)日：2023-10-26

申请号：US18135799

申请日：2023-04-18

Applicant: ASM IP Holding B.V.

Inventor： Jaebeom Lee ,  Charith Eranga Nanayakkara ,  Roghayyeh Lotfi ,  Paul Ma

IPC: H01L21/285 ,  H01L21/768

CPC classification number: H01L21/28568 ,  H01L21/76877

Abstract: Methods for forming structures with reduced feature (e.g., line) bending are provided. Exemplary methods include using a cyclic deposition process, forming a layer comprising one or more of molybdenum, tungsten, and ruthenium, and providing a nitrogen-containing reactant to the reaction chamber to form a transient surface species. Use of the nitrogen-containing reactant is thought to mitigate metal interactions that are thought to contribute to feature bending.

公开(公告)号：US11674220B2

公开(公告)日：2023-06-13

申请号：US17376238

申请日：2021-07-15

Applicant: ASM IP Holding B.V.

Inventor： Paul Ma ,  Roghayyeh Lotfi ,  Jaebeom Lee ,  Eric Christopher Stevens ,  Amit Mishra

IPC: C23C16/06 ,  C23C16/455 ,  C23C28/00 ,  C23C16/30 ,  C23C16/32

CPC classification number: C23C16/06 ,  C23C16/303 ,  C23C16/305 ,  C23C16/32 ,  C23C16/45527 ,  C23C28/341

Abstract: Methods for forming molybdenum layers on a surface of a substrate and structures and devices formed using the methods are disclosed. Exemplary methods include forming an underlayer prior to forming the molybdenum layer. The underlayer can be used to manipulate stress in the molybdenum layer and/or reduce a nucleation temperature and/or deposition temperature of a step of forming the molybdenum layer.

公开(公告)号：US20230175126A1

公开(公告)日：2023-06-08

申请号：US18072773

申请日：2022-12-01

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Yingzong Bu ,  Paul Ma ,  Shubham Garg

IPC: C23C16/44 ,  C23C16/458 ,  C23C16/455

CPC classification number: C23C16/4405 ,  C23C16/4583 ,  C23C16/45565 ,  C23C16/45578 ,  H01L21/68757

Abstract: A reactor can include a reaction chamber, a substrate support configured to support a substrate on a top side of the substrate support, and an elongate delivery apparatus disposed within the reaction chamber. The substrate support may be actuated to an upper position and to a lower position along a vertical axis within the reaction chamber. The substrate support may have a maximum horizontal dimension from the vertical axis along a horizontal axis substantially orthogonal to the vertical axis. The elongate delivery apparatus may have an inner horizontal dimension greater than the maximum horizontal dimension of the substrate support. The delivery apparatus can allow gas to pass through an interior of the delivery apparatus. The delivery apparatus can include a plurality of apertures. Each of the plurality of apertures can allow passage of the gas from the interior of the delivery apparatus into the reaction chamber.

公开(公告)号：US20240401194A1

公开(公告)日：2024-12-05

申请号：US18676023

申请日：2024-05-28

Applicant: ASM IP Holding B.V.

Inventor： Shuaidi Zhang ,  Mustafa Muhammad ,  Moataz Bellah Mousa ,  Paul Ma ,  Jonathan Bakke ,  Todd Robert Dunn ,  Eric James Shero ,  Jereld Lee Winkler ,  YoungChol Byun ,  Shubham Garg ,  Jacqueline Wrench

IPC: C23C16/448 ,  C23C16/455 ,  C23C16/52 ,  H01L21/67

Abstract: The current disclosure relates to example method, system and apparatus for coupling a delivery vessel disposed at a first location on a substrate processing platform to a remote refill vessel disposed in a second location remote from the substrate processing platform via a first chemical delivery line, storing a chemical in the remote refill vessel in a first phase, changing the chemical in the remote refill vessel to a second phase, transporting the chemical in the second phase, to the delivery vessel via the first chemical delivery line, heating the first chemical delivery line to a first temperature equal to or above a phase change temperature of the chemical, and coupling the delivery vessel to an accumulator via a second chemical delivery line.

公开(公告)号：US20230349040A1

公开(公告)日：2023-11-02

申请号：US18141694

申请日：2023-05-01

Applicant: ASM IP Holding B.V.

Inventor： Moataz Bellah Mousa ,  Jiyeon Kim ,  Jaebeom Lee ,  Charith Eranga Nanayakkara ,  Paul Ma ,  Chuandao Wang ,  YoungChol Byun ,  Jacqueline Wrench ,  Guannan Chen

IPC: C23C16/22 ,  C23C16/455 ,  C23C16/04 ,  C23C16/06

CPC classification number: C23C16/22 ,  C23C16/45525 ,  C23C16/045 ,  C23C16/06

Abstract: A method and system for forming a structure are disclosed. An exemplary method includes providing a substrate comprising a plurality of gaps within a first reaction chamber, forming a doped adhesion film on the surface of a substrate and within the plurality of gaps, wherein the doped adhesion film comprises a first material and a second material, and depositing a metal overlying the doped adhesion film. Exemplary methods can further include a step of depositing a nucleation layer overlying the doped adhesion film. An exemplary system can perform the method of forming the structure.

公开(公告)号：US20230089167A1

公开(公告)日：2023-03-23

申请号：US17946304

申请日：2022-09-16

Applicant: ASM IP Holding B.V.

Inventor： Jianqiu Huang ,  Gnyanesh Trivedi ,  Yingzong Bu ,  Todd Dunn ,  Thomas Fitzgerald ,  Akshay Phadnis ,  Paul Ma

IPC: C23C16/44

Abstract: Gas-phase reactor systems and methods of cleaning same are disclosed. Exemplary systems include a cleaning gas diffuser within a reaction chamber to facilitate cleaning of components, such as a susceptor, within the reaction chamber. The cleaning gas diffuser can be configured to provide a flow of a cleaning reactant over one or more surfaces within the reaction chamber.