公开(公告)号：US20050271893A1

公开(公告)日：2005-12-08

申请号：US10996520

申请日：2004-11-23

Applicant: Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

Inventor： Boris Kobrin ,  Jeffrey Chinn ,  Romuald Nowak ,  Richard Yi

IPC: B05D3/14 ,  B05D7/00 ,  B05D7/24 ,  B21D39/00 ,  B32B9/00 ,  B32B15/04 ,  C23C16/00 ,  C23C16/02 ,  C23C16/40 ,  C23C16/448 ,  C23C16/455 ,  C23C16/56

CPC classification number: C23C16/0227 ,  B05D1/185 ,  B05D1/60 ,  B05D3/142 ,  B05D3/145 ,  B05D7/52 ,  B05D7/56 ,  B82Y30/00 ,  B82Y40/00 ,  C03C17/42 ,  C03C23/006 ,  C23C16/0245 ,  C23C16/0272 ,  C23C16/401 ,  C23C16/402 ,  C23C16/448 ,  C23C16/4485 ,  C23C16/455 ,  C23C16/45557 ,  C23C16/56 ,  Y10T428/12618 ,  Y10T428/12632 ,  Y10T428/24 ,  Y10T428/24355 ,  Y10T428/24967 ,  Y10T428/24975 ,  Y10T428/261 ,  Y10T428/265 ,  Y10T428/31663 ,  Y10T428/31667

Abstract: An improved vapor-phase deposition method and apparatus for the application of multilayered films/coatings on substrates is described. The method is used to deposit multilayered coatings where the thickness of an oxide-based layer in direct contact with a substrate is controlled as a function of the chemical composition of the substrate, whereby a subsequently deposited layer bonds better to the oxide-based layer. The improved method is used to deposit multilayered coatings where an oxide-based layer is deposited directly over a substrate and a SAM organic-based layer is directly deposited over the oxide-based layer. Typically a series of alternating layers of oxide-based layer and organic-based layer are applied.

Abstract translation: 描述了一种用于在基底上施加多层膜/涂层的改进的气相沉积方法和装置。 该方法用于沉积与衬底直接接触的氧化物基层的厚度作为衬底的化学组成的函数来控制多层涂层，由此随后沉积的层更好地结合到氧化物基层。 改进的方法用于沉积多层涂层，其中氧化物基层直接沉积在衬底上，并且基于氧化物的层直接沉积SAM有机基层。 通常，应用一系列交替层的氧化物基层和基于有机的层。

公开(公告)号：US06888979B2

公开(公告)日：2005-05-03

申请号：US09834744

申请日：2001-04-12

Applicant: Behrang Behin ,  Michael J. Daneman ,  Chuang-Chia Lin ,  Boris Kobrin ,  Murali Chaparala ,  Gary Zalewski

Inventor： Behrang Behin ,  Michael J. Daneman ,  Chuang-Chia Lin ,  Boris Kobrin ,  Murali Chaparala ,  Gary Zalewski

IPC: B81B3/00 ,  B81C99/00 ,  G02B6/12 ,  G02B6/32 ,  G02B6/35 ,  G02B26/08 ,  G02B6/26

CPC classification number: G02B26/0841 ,  B81B3/0008 ,  B81B2201/045 ,  B81B2203/0181 ,  B81B2203/058 ,  B81C1/00214 ,  G02B6/32 ,  G02B6/3514 ,  G02B6/3518 ,  G02B6/3548 ,  G02B6/357 ,  G02B6/358 ,  G02B6/3584 ,  G02B2006/12104

Abstract: A microelectromechanical (MEMS) apparatus has a base and a flap with a portion coupled to the base so that the flap may move out of the plane of the base between first and second position. The base may have a cavity with largely vertical sidewalls that contact a portion of the flap when the flap is in the second position Electrodes may be placed on the vertical sidewalls and electrically isolated from the base to provide electrostatic clamping of the flap to the sidewall. The base may be made from a substrate portion of a silicon-on-insulator (SOI) wafer and the flap defined from a device layer of the SOI wafer. The flap may be connected to the base by one or more flexures such as torsional beams. An array of one or more of such structures may be used to form an optical switch.

Abstract translation: 微机电（MEMS）装置具有底座和翼片，其中一部分联接到基座，使得翼片可在第一和第二位置之间移动离开基座的平面。 底座可以具有一个具有很大垂直侧壁的空腔，当翼片处于第二位置时，电极可以被放置在垂直侧壁上并与基座电隔离以提供瓣片向侧壁的静电夹持。 基底可以由绝缘体上硅（SOI）晶片的衬底部分和从SOI晶片的器件层限定的瓣形成。 翼片可以通过一个或多个挠曲件（例如扭转梁）连接到基座。 可以使用一个或多个这样的结构的阵列来形成光学开关。

公开(公告)号：US09645504B2

公开(公告)日：2017-05-09

申请号：US13416716

申请日：2012-03-09

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03F1/26 ,  G03F1/92 ,  G03F7/20 ,  G03F7/22 ,  G03B27/42

CPC classification number: G03F7/703 ,  G03B27/42 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/704

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

公开(公告)号：US20120282554A1

公开(公告)日：2012-11-08

申请号：US13553602

申请日：2012-07-19

Applicant: Boris Kobrin ,  Ian McMackin

Inventor： Boris Kobrin ,  Ian McMackin

IPC: G03F7/22 ,  G03B27/58

CPC classification number: G03B27/42 ,  G03F7/703 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/704

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

Abstract translation: 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可旋转掩模来对辐射敏感材料成像。 通常，可旋转掩模包括圆筒。 纳米图案技术利用近场光刻技术，其中用于图案化衬底的掩模与衬底接触或接近。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中旋转圆柱表面包括金属纳米孔或纳米颗粒。

公开(公告)号：US20120274004A1

公开(公告)日：2012-11-01

申请号：US13546436

申请日：2012-07-11

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: B29C59/16 ,  B82Y40/00

CPC classification number: G03F7/2035 ,  B82Y40/00 ,  G03F1/0007 ,  G03F1/0084 ,  G03F1/34 ,  G03F1/50 ,  G03F1/60 ,  G03F7/0012 ,  G03F7/2014 ,  G03F7/2032

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a movable nanostructured film is used to image a radiation-sensitive material. The nanopatterning technique makes use of Near-Field photolithography, where the nanostructured film used to modulate light intensity reaching radiation-sensitive layer. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a movable film comprises metal nano holes or nanoparticles.

Abstract translation: 本发明的实施例涉及在大面积基板的纳米图案中有用的方法和装置，其中使用可移动的纳米结构膜来对辐射敏感材料成像。 纳米图案技术利用近场光刻技术，其中纳米结构膜用于调制到达辐射敏感层的光强度。 近场光刻可以使用弹性体相移掩模，或者可以采用表面等离子体激元技术，其中可移动膜包括金属纳米孔或纳米颗粒。

公开(公告)号：US20120162629A1

公开(公告)日：2012-06-28

申请号：US13416716

申请日：2012-03-09

Applicant: Boris Kobrin

Inventor： Boris Kobrin

IPC: G03B27/08 ,  G03B27/12

CPC classification number: G03F7/703 ,  G03B27/42 ,  G03F7/70325 ,  G03F7/7035 ,  G03F7/70358 ,  G03F7/704

Abstract: Embodiments of the invention relate to methods and apparatus useful in the nanopatterning of large area substrates, where a rotatable mask is used to image a radiation-sensitive material. Typically the rotatable mask comprises a cylinder. The nanopatterning technique makes use of Near-Field photolithography, where the mask used to pattern the substrate is in contact or close proximity with the substrate. The Near-Field photolithography may make use of an elastomeric phase-shifting mask, or may employ surface plasmon technology, where a rotating cylinder surface comprises metal nano holes or nanoparticles.

公开(公告)号：US08178162B2

公开(公告)日：2012-05-15

申请号：US12592183

申请日：2009-11-19

Applicant: Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Richard C. Yi ,  Jeffrey D. Chinn

IPC: C23C16/00

CPC classification number: B82Y30/00 ,  C23C16/0227 ,  C23C16/402

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of films/coatings on substrates. The method provides for the addition of a precise amount of each of the reactants to be consumed in a single reaction step of the coating formation process. In addition to the control over the amount of reactants added to the process chamber, the present invention requires precise control over the total pressure (which is less than atmospheric pressure) in the process chamber, the partial vapor pressure of each vaporous component present in the process chamber, the substrate temperature, and typically the temperature of a major processing surface within said process chamber. Control over this combination of variables determines a number of the characteristics of a film/coating or multi-layered film/coating formed using the method. By varying these process parameters, the roughness and the thickness of the films/coatings produced can be controlled.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在基底上施加膜/涂层。 该方法提供在涂层形成过程的单个反应步骤中添加精确量的每种待消耗的反应物。 除了控制添加到处理室中的反应物的量之外，本发明需要精确控制处理室中的总压力（其小于大气压），存在于处理室中的每种气态组分的部分蒸气压 处理室，衬底温度以及典型地在所述处理室内的主处理表面的温度。 对这种变量组合的控制决定了使用该方法形成的膜/涂层或多层膜/涂层的许多特性。 通过改变这些工艺参数，可以控制所生产的膜/涂层的粗糙度和厚度。

公开(公告)号：US07955704B2

公开(公告)日：2011-06-07

申请号：US12611639

申请日：2009-11-03

Applicant: Michael D. Lowery ,  Laurent Hoffmann ,  Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

Inventor： Michael D. Lowery ,  Laurent Hoffmann ,  Boris Kobrin ,  Romuald Nowak ,  Jeffrey Chinn ,  Richard Yi

IPC: A61F2/16

CPC classification number: B82Y30/00 ,  A61L27/34 ,  A61L29/085 ,  A61L31/10 ,  B82Y40/00 ,  Y10T428/261 ,  Y10T428/31667 ,  C08L71/02

Abstract: An intraocular lens with a hydrophilic polymer coating composition and method of preparing same are provided. Specifically, a composition suitable for reducing tackiness in intraocular lenses is provided wherein an acrylic intraocular lens is treated by vapor deposition with an alkoxy silyl terminated polyethylene glycol polymer composition.

Abstract translation: 提供具有亲水性聚合物涂料组合物的眼内透镜及其制备方法。 具体地说，提供一种适用于降低人工晶状体粘合性的组合物，其中丙烯酸类眼内透镜用烷氧基甲硅烷基封端的聚乙二醇聚合物组合物气相沉积处理。

公开(公告)号：US07695775B2

公开(公告)日：2010-04-13

申请号：US11295129

申请日：2005-12-05

Applicant: Boris Kobrin ,  Jeffrey D. Chinn ,  Romuald Nowak

Inventor： Boris Kobrin ,  Jeffrey D. Chinn ,  Romuald Nowak

IPC: H05H1/00 ,  B05D3/04 ,  B05D3/10 ,  B05D3/06

CPC classification number: B05D1/60 ,  B05D3/064 ,  B82Y30/00

Abstract: We have developed an improved vapor-phase deposition method and apparatus for the application of layers and coatings on various substrates. The method and apparatus are useful in the fabrication of biofunctional devices, Bio-MEMS devices, and in the fabrication of microfluidic devices for biological applications. In one important embodiment, a siloxane substrate surface is treated using a combination of ozone and UV radiation to render the siloxane surface more hydrophilic, and subsequently a functional coating is applied in-situ over the treated surface of the siloxane substrate.

Abstract translation: 我们已经开发了一种改进的气相沉积方法和装置，用于在各种基底上施加层和涂层。 该方法和装置可用于制造生物功能装置，生物MEMS装置以及制造用于生物应用的微流体装置。 在一个重要的实施方案中，使用臭氧和UV辐射的组合处理硅氧烷底物表面，以使硅氧烷表面更亲水，随后在硅氧烷底物的处理表面上原位施加功能性涂层。

公开(公告)号：US20100068489A1

公开(公告)日：2010-03-18

申请号：US12150249

申请日：2008-04-24

Applicant: Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

Inventor： Boris Kobrin ,  Romuald Nowak ,  Jeffrey D. Chinn

IPC: B32B5/00 ,  B32B9/00 ,  B05D5/12 ,  B28B7/38

CPC classification number: C23C16/403 ,  B81B3/0075 ,  B81C99/0085 ,  B81C2201/0153 ,  B81C2201/112 ,  C23C16/405 ,  C23C16/45525

Abstract: The carbon-doped metal oxide films described provide a low coefficient of friction, typically ranging from about 0.05 to about 0.4. Applied over a silicon substrate, for example, the carbon-doped metal oxide films provide anti-stiction properties, where the measured work of adhesion for a coated MEMS cantilever beam is less than 10 μJ/m2. The films provide unexpectedly low water vapor transmission. In addition, the carbon-doped metal oxide films are excellent when used as a surface release coating for nanoimprint lithography. The carbon content in the carbon-doped metal oxide films ranges from about 5 atomic % to about 20 atomic %.

Abstract translation: 所述的碳掺杂的金属氧化物膜提供低摩擦系数，通常为约0.05至约0.4。 施加在硅衬底上，例如，碳掺杂的金属氧化物膜提供抗静电性质，其中测量的涂覆的MEMS悬臂梁的粘附力小于10μJ/ m 2。 这些膜提供了意想不到的低水蒸汽传输。 此外，当用作纳米压印光刻的表面剥离涂层时，碳掺杂的金属氧化物膜是优异的。 碳掺杂的金属氧化物膜中的碳含量为约5原子％至约20原子％。