公开(公告)号：US20070139629A1

公开(公告)日：2007-06-21

申请号：US11312660

申请日：2005-12-21

Applicant: Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

Inventor： Timotheus Sengers ,  Nicolaas Johannes Van Asten ,  Wilhelmus Box ,  Tjarko Van Empel ,  Leon Levasier ,  Erik Loopstra ,  Marcel Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC: G03B27/42

CPC classification number: G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

Abstract: A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

Abstract translation: 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。

公开(公告)号：US20060280829A1

公开(公告)日：2006-12-14

申请号：US11150465

申请日：2005-06-13

Applicant: Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

Inventor： Yvonne Kruijt-Stegeman ,  Aleksey Kolesnychenko ,  Erik Loopstra ,  Johan Dijksman ,  Helmar Santen ,  Sander Wuister

IPC: B28B11/08

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: A lithographic apparatus is disclosed that has an imprint template or a template holder configured to hold an imprint template, and a substrate table arranged to receive a substrate, the apparatus further comprising walls which together with the substrate table and the imprint template or the template holder, are configured to form an enclosed space which is substantially sealed from a surrounding area.

Abstract translation: 公开了一种光刻设备，其具有构造成保持压印模板的压印模板或模板保持器，以及布置成接收衬底的衬底台，该设备还包括与衬底台和压印模板或模板保持器一起的壁 被构造成形成从周围区域基本密封的封闭空间。

公开(公告)号：US20060266244A1

公开(公告)日：2006-11-30

申请号：US11139991

申请日：2005-05-31

Applicant: Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

Inventor： Yvonne Kruijt-Stegeman ,  Aleksey Kolensnychenko ,  Helmar Santen ,  Erik Loopstra

IPC: B41F1/34

CPC classification number: B41F1/34 ,  B41F1/18 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/00 ,  G03F9/7042 ,  G03F9/7084 ,  H05K1/0269 ,  H05K3/0008 ,  H05K2201/09918 ,  H05K2203/0108

Abstract: An imprint lithography apparatus is disclosed that has a substrate table configured to hold a substrate, a template holder configured to hold an imprint template, the imprint template or the template holder having a template alignment mark configured to be imprinted onto the substrate table or onto a substrate to form an imprinted alignment mark, the imprint template having a functional pattern, and the template alignment mark and the functional pattern having a known spatial relationship, and an alignment sensor configured to determine the location of the imprinted alignment mark.

Abstract translation: 公开了一种压印光刻设备，其具有被配置为保持基板的基板台，配置成保持压印模板的模板保持器，压印模板或模板保持器，其具有被配置为印刷到基板台上的模板对准标记 基板以形成压印的对准标记，所述印模模板具有功能图案，并且所述模板对准标记和所述功能图案具有已知的空间关系，以及对准传感器，其被配置为确定所述打印的对准标记的位置。

公开(公告)号：US20060023194A1

公开(公告)日：2006-02-02

申请号：US10899295

申请日：2004-07-27

Applicant: Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

Inventor： Erik Loopstra ,  Leon Levasier ,  Rene Oesterholt

IPC: G03B27/58

CPC classification number: G03F7/70775 ,  G03F7/70458 ,  G03F7/70516 ,  G03F9/7011 ,  G03F9/7019

Abstract: Lithographic apparatus includes a substrate table and a motion control system for controlling a movement of the substrate table. The motion control system includes at least 3 position detectors constructed for detecting a position of the substrate table. For measuring a position and orientation of the substrate table, each position detector comprises an optical encoder of a single dimensional or multi dimensional type, the optical encoders being arranged for providing together at least 6 position values, at least one position value being provided for each of the 3 dimensions. 3 or more of the at least 3 optical encoders being connected to the substrate table at different locations in the 3 dimensional coordinate system. The motion control system is arranged to calculate the position of the substrate table in the 3 dimensional coordinate system from a subset of at least 3 of the 6 position values and to calculate an orientation of the substrate table with respect to the coordinate system from another subset of at least 3 of the 6 position values. Further, a method for calibrating the position detectors is described.

Abstract translation: 光刻设备包括用于控制衬底台的移动的衬底台和运动控制系统。 运动控制系统包括构造用于检测衬底台的位置的至少3个位置检测器。 为了测量衬底台的位置和取向，每个位置检测器包括一维或多维类型的光学编码器，光学编码器被布置为一起提供至少6个位置值，为每个位置值提供至少一个位置值 的三维。 所述至少3个光学编码器中的3个或更多个在所述三维坐标系中的不同位置连接到所述基板台。 运动控制系统被布置为从6个位置值中的至少3个的子集计算三维坐标系中的衬底台的位置，并且从另一个子集计算相对于坐标系的衬底台的取向 至少6个位置值中的3个。 此外，描述了用于校准位置检测器的方法。

公开(公告)号：US20060017894A1

公开(公告)日：2006-01-26

申请号：US10896000

申请日：2004-07-22

Applicant: Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

Inventor： Tjarko Adriaan Van Empel ,  Erik Loopstra ,  Antonius Van Der Net ,  Yuri Johannes Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC: G03B27/52

CPC classification number: G03F7/70933 ,  G03F7/70908

Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.

Abstract translation: 公开了一种光刻设备。 该装置包括投影系统，其配置成将图案化的辐射束投影到基板的目标部分上。 投影系统包括壳体和布置在壳体中的多个光学元件。 该设备还包括用于将调节气体供给到壳体的入口和用于从壳体排出调节气体的排气口，以在壳体中提供气体调节环境。 提供至少一个门，用于提供气体环境与环境气氛的通信。 门被设置成将经调节的气体预定的泄漏提供给环境大气。

公开(公告)号：US20050231043A1

公开(公告)日：2005-10-20

申请号：US10825224

申请日：2004-04-16

Applicant: Johannes Petrus Martinus Vermeulen ,  Henricus Wilhelmus Janssen ,  Erik Loopstra

Inventor： Johannes Petrus Martinus Vermeulen ,  Henricus Wilhelmus Janssen ,  Erik Loopstra

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  H02K3/04 ,  H02K41/00 ,  H02K41/03

CPC classification number: H02K41/03 ,  G03F7/70758 ,  H02K3/04

Abstract: A coil assembly has at least two coils which are arranged in a common plane, and partially overlap in crossover sections of the coils. The crossover sections have a reduced height, which results in a reduced total height of the coil assembly. This leads to a more compact coil assembly, and hence to better dynamic characteristics of a positioning device in which the coil assembly is applied.

Abstract translation: 线圈组件具有布置在公共平面中的至少两个线圈，并且在线圈的交叉部分中部分重叠。 交叉部分具有降低的高度，这导致线圈组件的总高度减小。 这导致更紧凑的线圈组件，并且因此导致施加线圈组件的定位装置的更好的动态特性。

公开(公告)号：US20050105069A1

公开(公告)日：2005-05-19

申请号：US10715828

申请日：2003-11-19

Applicant: Erik Loopstra ,  Dominicus Adrianus Franken

Inventor： Erik Loopstra ,  Dominicus Adrianus Franken

IPC: G03F7/20 ,  G03B27/42

CPC classification number: G03F7/709 ,  G03F7/70258 ,  G03F7/70833

Abstract: A lithographic projection apparatus is disclosed. The apparatus includes an illumination system for providing a beam of radiation used to irradiate a patterning device, and a first support that supports the patterning device. The patterning device capable of patterning the beam of radiation. The apparatus also includes a second support that supports a substrate, a projection system for projecting the patterned beam of radiation onto a target portion of the substrate, and a projection system positioning module that controls at least one of a position and an orientation of the projection system based on at least one of a velocity and an acceleration of the projection system.

Abstract translation: 公开了一种光刻投影装置。 该装置包括用于提供用于照射图案形成装置的辐射束的照明系统和支撑图案形成装置的第一支撑件。 能够图案化辐射束的图案形成装置。 该装置还包括支撑基板的第二支撑件，用于将图案化的辐射束投射到基板的目标部分上的投影系统，以及投影系统定位模块，其控制投影的位置和取向中的至少一个 基于投影系统的速度和加速度中的至少一个的系统。

公开(公告)号：US10481500B2

公开(公告)日：2019-11-19

申请号：US13197065

申请日：2011-08-03

Applicant: Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

Inventor： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

IPC: G03B27/42 ,  G03F7/20 ,  G02B17/06

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

公开(公告)号：US20120069312A1

公开(公告)日：2012-03-22

申请号：US13197065

申请日：2011-08-03

Applicant: Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

Inventor： Hans-Juergen Mann ,  Wilhelm Ulrich ,  Erik Loopstra ,  David R. Shafer

IPC: G03F7/20 ,  G03B27/70 ,  G02B17/06

CPC classification number: G03F7/70233 ,  G02B17/0647 ,  G02B17/0652 ,  G02B17/0663 ,  G03F7/7015 ,  G03F7/7025

Abstract: An imaging optical system has a plurality of mirrors which image an object field in an object plane in an image field in an image plane. The imaging optical system has a pupil obscuration. The last mirror in the beam path of the imaging light between the object field and the image field has a through-opening for the passage of the imaging light. A penultimate mirror of the imaging optical system in the beam path of the imaging light between the object field and the image field has no through-opening for the passage of the imaging light. The result is an imaging optical system that provides a combination of small imaging errors, manageable production and a good throughput for the imaging light.

Abstract translation: 成像光学系统具有多个反射镜，其对图像平面中的图像场中的物体平面中的物体场进行成像。 成像光学系统具有光瞳遮蔽。 在物场和图像场之间的成像光的光束路径中的最后一个反射镜具有用于成像光通过的通孔。 在物场和图像场之间的成像光的光束路径中的成像光学系统的倒数第二反射镜没有通过成像光通过的通孔。 结果是成像光学系统提供成像光的小成像误差，可管理的生产和良好的吞吐量的组合。

公开(公告)号：US20070273851A1

公开(公告)日：2007-11-29

申请号：US11440437

申请日：2006-05-25

Applicant: Jozef Finders ,  Erik Loopstra

Inventor： Jozef Finders ,  Erik Loopstra

IPC: G03B27/52

CPC classification number: G03B27/522 ,  G03F7/70258 ,  G03F7/70875

Abstract: A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.

Abstract translation: 公开了一种光刻设备，其具有被配置为向图案形成装置供应能量以加热图案形成装置以形成图案形成装置的期望热变形图案的加热器，以及被配置为在对应于所需热量的装置中实现光学校正的控制器 畸变图案，以减少图案形成装置的热变形对图案的影响。