中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

20 records (took 0.036 seconds)

    UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME
    12.
    发明申请
    UNDERLAY FILM COMPOSITION FOR IMPRINTS AND METHOD OF FORMING PATTERN AND PATTERN FORMATION METHOD USING THE SAME 有权
    用于印刷的底膜组合物和使用其形成图案和图案形成方法的方法

    公开(公告)号：US20140220353A1

    公开(公告)日：2014-08-07

    申请号：US14245491

    申请日：2014-04-04

    Applicant: FUJIFILM CORPORATION

    Inventor： Kunihiko KODAMA ,  Shinji TARUTANI ,  Yuichiro ENOMOTO ,  Tadashi OOMATSU ,  Takayuki ITO ,  Hirotaka KITAGAWA ,  Akiko HATTORI

    IPC: G03F7/09

    CPC classification number: G03F7/094 ,  G03F7/0002 ,  Y10T428/31504

    Abstract: Provided is the pattern formability and line edge roughness of the resultant substrate.An underlay film composition for imprints comprising a compound (A) and a solvent (B), the compound (A) having at least either one of a group (Ka) capable of covalently bonding and/or interacting with a substrate, and, a group (Kb) capable of covalently bonding and/or interacting with a curable composition for imprints, an Ohnishi parameter (Z) calculated from (equation 1) of 3.8 or larger, and a molecular weight of 400 or larger: the Ohnishi parameter=(total number of atoms)/(number of carbon atoms−number of oxygen atoms)  (Equation 1)

    Abstract translation: 提供了所得基板的图案成形性和线边缘粗糙度。 包含化合物（A）和溶剂（B）的印迹用底胶膜组合物，具有能够与底物共价键合和/或相互作用的基团（Ka）中的至少一种的化合物（A），和 能够与用于印记的可固化组合物共价键合和/或相互作用的组（Kb），由（式1）计算为3.8或更大，分子量为400或更大的Ohnishi参数（Z）：Ohnishi参数=（ 总原子数）/（碳原子数 - 氧原子数）（式1）

    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT
    14.
    发明申请
    PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT 审中-公开
    图案形成方法，电子设备生产方法和加工代理

    公开(公告)号：US20160195814A1

    公开(公告)日：2016-07-07

    申请号：US15069300

    申请日：2016-03-14

    Applicant: FUJIFILM Corporation

    Inventor： Yuichiro ENOMOTO ,  Ryosuke UEBA ,  Michihiro SHIRAKAWA ,  Hajime FURUTANI ,  Akiyoshi GOTO ,  Masafumi KOJIMA

    IPC: G03F7/40 ,  G03F7/32 ,  G03F7/20

    CPC classification number: G03F7/405 ,  G03F7/20 ,  G03F7/322 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0273

    Abstract: There is provided a pattern formation method comprising: a step (1) of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition which contains a resin of which, due to a polarity being increased by an action of an acid, solubility decreases with respect to a developer which includes an organic solvent; a step (2) of exposing the film to an actinic ray or radiation; a step (3) of forming a target process pattern by developing the film using a developer which includes an organic solvent; and a step (4) of obtaining a processed pattern by applying a processing agent which includes a compound (x) which has at least one of a primary amino group and a secondary amino group with respect to the target process pattern.

    Abstract translation: 提供了一种图案形成方法，包括：使用光化射线敏感或辐射敏感性树脂组合物形成膜的步骤（1），其包含由于通过酸的作用而极性增加的树脂， 相对于包含有机溶剂的显影剂，溶解度降低; 将膜暴露于光化射线或辐射的步骤（2）; 通过使用包含有机溶剂的显影剂显影该膜来形成目标工艺图案的步骤（3）; 以及通过应用包括相对于目标工艺图案具有伯氨基和仲氨基中的至少一个的化合物（x）的处理剂来获得加工图案的步骤（4）。

    CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN
    17.
    发明申请
    CURABLE COMPOSITION FOR IMPRINT, PATTERN-FORMING METHOD AND PATTERN 有权
    用于印刷，图案形成方法和图案的可固化组合物

    公开(公告)号：US20140255662A1

    公开(公告)日：2014-09-11

    申请号：US14212807

    申请日：2014-03-14

    Applicant: FUJIFILM CORPORATION

    Inventor： Yuichiro ENOMOTO ,  Kunihiko KODAMA ,  Shinji TARUTANI

    IPC: C09D11/00 ,  B41J11/00

    CPC classification number: C09D11/38 ,  B41J11/0015 ,  B41J11/002 ,  C08F2/44 ,  C08F2/50 ,  C08L33/00 ,  C09D11/101 ,  C09D11/30 ,  C09D133/16 ,  C09D183/06 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/027 ,  Y10T428/24802

    Abstract: Provide a curable composition for imprint, which is improved in the surface roughness of the cured film. A curable composition for imprint comprising a polymerizable compound (A), a polymerization initiator (B), and a non-polymerizable compound (C), the non-polymerizable compound (C) comprising at least one species of surfactant (C1) which contains 20% by mass or more of fluorine atom, and, at least one species of polymer (C2) which contains 3% by mass or more and less than 20% by mass of fluorine atom and/or 5% by mass or more and less than 40% by mass of silicon atom, and has a weight-average molecular weight (Mw) of 1,000 to 100,000.

    Abstract translation: 提供用于印记的可固化组合物，其改善了固化膜的表面粗糙度。 一种包含可聚合化合物（A），聚合引发剂（B）和不可聚合化合物（C））的用于印迹的可固化组合物，所述非可聚合化合物（C）包含至少一种表面活性剂（C1） 20质量％以上的氟原子和至少1种含有3质量％以上且小于20质量％的氟原子和/或5质量％以上的聚合物（C2） 超过40质量％的硅原子，并且具有1,000至100,000的重均分子量（Mw）。

    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM
    20.
    发明申请
    PATTERN FORMING METHOD, CHEMICAL AMPLIFICATION RESIST COMPOSITION AND RESIST FILM 有权
    图案形成方法，化学放大电阻组合物和电阻膜

    公开(公告)号：US20130045365A1

    公开(公告)日：2013-02-21

    申请号：US13656960

    申请日：2012-10-22

    Applicant: FUJIFILM CORPORATION

    Inventor： Keita KATO ,  Shinji TARUTANI ,  Sou KAMIMURA ,  Yuichiro ENOMOTO ,  Kaoru IWATO

    IPC: G03F7/20 ,  B32B3/30 ,  G03F7/004

    CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/2041 ,  G03F7/325

    Abstract: A pattern forming method comprising: (i) a step of forming a film from a chemical amplification resist composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer, wherein the resist composition contains: (A) a resin, (B) a nonionic compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a crosslinking agent, and (D) a solvent.

    Abstract translation: 一种图案形成方法，包括：（i）从化学放大抗蚀剂组合物形成膜的步骤，（ii）曝光所述膜的步骤，和（iii）通过使用含有机溶剂的显影膜的步骤 显影剂，其中抗蚀剂组合物包含：（A）树脂，（B）在用光化射线或辐射照射时能够产生酸的非离子化合物，（C）交联剂和（D）溶剂。

Patent Agency Ranking