公开(公告)号：US20060049757A1

公开(公告)日：2006-03-09

申请号：US11043280

申请日：2005-01-27

申请人： Tatsuya Miyake ,  Keizo Suzuki ,  Masatoshi Shiiki ,  Tsuyoshi Fujita ,  Seiichi Tsuchida

发明人： Tatsuya Miyake ,  Keizo Suzuki ,  Masatoshi Shiiki ,  Tsuyoshi Fujita ,  Seiichi Tsuchida

IPC分类号： H01J17/49

CPC分类号： H01J11/42 ,  H01J11/36 ,  H01J11/44 ,  H01J2211/361 ,  H01J2211/442 ,  H01J2211/444

摘要： A plasma display panel includes plural discharge cells and a barrier rib layer which defines the discharge cells. Each discharge cells has two opposing electrodes on front and rear substrates, respectively, for generating discharge therebetween, discharge gas and phosphor films. The barrier rib layer is fabricated as a sheet separate from the substrates, is provided with openings each forming a discharge space, and is sandwiched between the substrates. The following relationships are satisfied: 0.1≦S2/S1≦0.4; 100 Torr×mm≦pd≦400 Torr×mm; and 0.2 mm≦d, where S1 is an area of a projection of a space occupied by one discharge cell onto the front substrate, S2 is an area of a portion of the front substrate for projecting light from the discharge cell, p is a pressure of the discharge gas, and d is a distance between the electrodes.

摘要翻译： 等离子体显示面板包括多个放电单元和限定放电单元的隔壁层。 每个放电单元在前基板和后基板上分别具有两个相对电极，用于在其间产生放电，放电气体和磷光体膜。 阻挡肋层被制造为与基板分开的片材，设置有各自形成放电空间的开口，并且夹在基板之间。 满足以下关系：0.1 <= S 2 / S 1 <= 0.4; 100 Torrxmm <= pd <= 400 Torrxmm; 和0.2mm <= d，其中S 1是由一个放电单元占据到前基板上的空间的投影面积，S 2是用于投射来自放电单元的光的前基板的一部分的面积，p 是放电气体的压力，d是电极之间的距离。

公开(公告)号：US06332425B1

公开(公告)日：2001-12-25

申请号：US09525124

申请日：2000-03-14

申请人： Naoyuki Kofuji ,  Shin Arai ,  Kazunori Tsujimoto ,  Tatsumi Mizutani ,  Keizo Suzuki ,  Kenichi Mizuishi

发明人： Naoyuki Kofuji ,  Shin Arai ,  Kazunori Tsujimoto ,  Tatsumi Mizutani ,  Keizo Suzuki ,  Kenichi Mizuishi

IPC分类号： C23C1600

CPC分类号： H01J37/32623 ,  H01J37/32706

摘要： A pulse voltage of duty ratio 5% or below and repetition frequency 400 KHz or above is supplied in order to suppress the notch, charge build-up damage, subtrench and bowing due to the electron shading phenomenon. Thus, a cycle for accelerating electrons occurs in the substrate bias, so that the electron shading phenomenon does not occur.

公开(公告)号：US06231777B1

公开(公告)日：2001-05-15

申请号：US08548613

申请日：1995-10-26

申请人： Naoyuki Kofuji ,  Shin Arai ,  Kazunori Tsujimoto ,  Tatsumi Mizutani ,  Keizo Suzuki ,  Kenichi Mizuishi

发明人： Naoyuki Kofuji ,  Shin Arai ,  Kazunori Tsujimoto ,  Tatsumi Mizutani ,  Keizo Suzuki ,  Kenichi Mizuishi

IPC分类号： H01L21302

CPC分类号： H01J37/32623 ,  H01J37/32706

摘要： A pulse voltage of duty ratio 5% or below and repetition frequency 400 KHz or above is supplied in order to suppress the notch, charge build-up damage, subtrench and bowing due to the electron shading phenomenon. Thus, a cycle for accelerating electrons occurs in the substrate bias, so that the electron shading phenomenon does not occur.

摘要翻译： 提供占空比的5％以下的脉冲电压和400KHz以上的重复频率，以便抑制由于电子阴影现象引起的缺口，电荷积聚损伤，子扳手和弯曲。 因此，在衬底偏压中发生用于加速电子的循环，使得不发生电子阴影现象。

公开(公告)号：US5927746A

公开(公告)日：1999-07-27

申请号：US854190

申请日：1997-05-09

申请人： Fuminori Komiya ,  Sakashi Hattori ,  Keizo Suzuki

发明人： Fuminori Komiya ,  Sakashi Hattori ,  Keizo Suzuki

IPC分类号： B60R21/16 ,  B60R21/20 ,  B60R21/203 ,  B60R21/217 ,  B62D1/04 ,  B62D1/11

CPC分类号： B60R21/2037 ,  B62D1/04

摘要： A steering wheel which strengthens and simplifies a structure supporting a pad, to which an air bag apparatus is attached, at a cored bar. A cored bar is integrally formed with a bridge (engaging piece) formed by leg portions, which stand upright from spokes or the like, and a crossbar (pressing portion), which is bent and formed from the leg portions. A bracket for a pad, to which an air bag apparatus is attached, is mounted at the space between the boss portion of the cored bar and the crossbar. When the air bag apparatus is operated, impact force applied in a vehicle operator's direction is supported by the bridge (engaging piece) via the bracket.

摘要翻译： 一种方向盘，其加强和简化支撑安装有安全气囊装置的垫的结构在芯棒处。 芯棒与由腿部等立起的腿部形成的桥（接合片）和由腿部弯曲形成的横杆（按压部）一体地形成。 用于安装气囊装置的垫的支架安装在芯棒的凸台部分和横杆之间的空间处。 当气囊装置操作时，通过支架支撑在车辆操作者方向上的冲击力由桥（接合件）支撑。

公开(公告)号：US5891252A

公开(公告)日：1999-04-06

申请号：US766818

申请日：1996-12-13

申请人： Ken'etsu Yokogawa ,  Tetsuo Ono ,  Kazunori Tsujimoto ,  Naoshi Itabashi ,  Masahito Mori ,  Shinichi Tachi ,  Keizo Suzuki

发明人： Ken'etsu Yokogawa ,  Tetsuo Ono ,  Kazunori Tsujimoto ,  Naoshi Itabashi ,  Masahito Mori ,  Shinichi Tachi ,  Keizo Suzuki

IPC分类号： C23C16/00 ,  H01J37/32

CPC分类号： H01J37/3222 ,  H01J37/32082 ,  H01J37/32678 ,  H01J2237/3341

摘要： A plasma processing apparatus in which power consumption is reduced, which can generate uniform plasma in a large range and in which minute processing in high etching selectivity and in high aspect ratio is enabled is disclosed. High density plasma is generated in a vacuum vessel housing a processed sample utilizing an electron cyclotron resonance phenomenon caused by an electromagnetic wave in an ultra-high frequency band and a magnetic field and the surface of the processed sample is etched using this plasma. An electromagnetic wave in an ultra-high frequency band for generating plasma is radiated from a planar conductive plate consisting of graphite or silicon which is arranged opposite to the surface of the processed sample into space inside the vacuum vessel. High density plasma in the low degree of dissociation can be generated by using an electromagnetic wave in an ultra-high frequency band and as a result, the controllability of etching reaction can be enhanced. Further, a radical effective in etching can be increased by reaction between the surface of a planar conductive plate for radiating an electromagnetic wave and plasma.

公开(公告)号：US5401357A

公开(公告)日：1995-03-28

申请号：US937781

申请日：1992-09-01

申请人： Hidekazu Okuhira ,  Tetsuo Ono ,  Susumu Hiraoka ,  Keizo Suzuki ,  Junji Shigeta ,  Hiroshi Masuda ,  Mitsuhiro Mori ,  Takuma Tanimoto ,  Shinichi Nakatsuka ,  Katsuhiko Mitani

发明人： Hidekazu Okuhira ,  Tetsuo Ono ,  Susumu Hiraoka ,  Keizo Suzuki ,  Junji Shigeta ,  Hiroshi Masuda ,  Mitsuhiro Mori ,  Takuma Tanimoto ,  Shinichi Nakatsuka ,  Katsuhiko Mitani

IPC分类号： H01L21/205 ,  H01L21/285 ,  H01L21/302 ,  H01L21/306 ,  H01L21/3065 ,  H01L21/308 ,  H01L21/316 ,  H01L21/331 ,  H01L21/335 ,  H01L21/338 ,  H01L29/205 ,  H01L29/73 ,  H01L29/737 ,  H01L29/778 ,  H01L29/812 ,  B44C1/22

CPC分类号： H01L29/66318 ,  H01L21/28587 ,  H01L21/30621 ,  H01L21/3081 ,  H01L21/31654 ,  H01L29/66462

摘要： A method may be used to dry etch a sample including a plurality of regions different from each other in the photo-absorption of a light having a specified wavelength using an etching gas plasma. The method is capable of selectively etching the desired material from a plurality of materials having different types of band gap energies or from a plurality of materials having different band gap energies. The method includes a step of irradiating a light having the specified wavelength on the sample for reducing an etching rate of a region having a large photo-absorption coefficient to the light, thereby selectively etching a region having a small photo-absorption coefficient to the light.

摘要翻译： 在使用蚀刻气体等离子体对具有特定波长的光的光吸收中，可以使用一种方法来干蚀刻包括彼此不同的多个区域的样品。 该方法能够从具有不同类型的带隙能量的多种材料或具有不同带隙能量的多种材料中选择性地蚀刻所需的材料。 该方法包括在样品上照射具有特定波长的光以降低对光具有大的光吸收系数的区域的蚀刻速率的步骤，从而选择性地将具有小的光吸收系数的区域蚀刻到光 。

公开(公告)号：US5108778A

公开(公告)日：1992-04-28

申请号：US511946

申请日：1990-04-16

申请人： Keizo Suzuki ,  Susumu Hiraoka ,  Tatsumi Mizutani ,  Shigeru Nishimatsu

发明人： Keizo Suzuki ,  Susumu Hiraoka ,  Tatsumi Mizutani ,  Shigeru Nishimatsu

IPC分类号： C23C16/48 ,  C23F4/00 ,  C30B33/00

CPC分类号： C23C16/48 ,  C23F4/00 ,  C30B33/00

摘要： Disclosed are a surface treatment method and apparatus in which an active species beam that contains active species having translational energy in a range of 0.01-100 eV as at least a partial constituent thereof constructs at least a part of treatment means.

公开(公告)号：US4886571A

公开(公告)日：1989-12-12

申请号：US302334

申请日：1989-01-27

申请人： Keizo Suzuki ,  Susumu Hiraoka ,  Shigeru Nishimatsu

发明人： Keizo Suzuki ,  Susumu Hiraoka ,  Shigeru Nishimatsu

IPC分类号： H01L21/302 ,  C23C16/44 ,  C23C16/455 ,  H01L21/205 ,  H01L21/3065

CPC分类号： C23C16/45565 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45591 ,  Y10S156/914

摘要： An apparatus for surface treating a sample article with activated particles, comprising a reaction chamber in which a sample article to be surface processed is placed, means for introducing a reaction gas into the reaction chamber, an activation surface properly set in the reaction chamber and arranged capable of activating at least one part of the particles composing the reaction gas, and means for evacuating the used reaction gas out of the reaction chamber.

摘要翻译： 一种用于用活化颗粒表面处理样品的装置，包括其中放置待表面处理样品的反应室，用于将反应气体引入反应室的装置，适当地设置在反应室中的活化表面， 能够活化至少一部分构成反应气体的粒子，以及将所使用的反应气体从反应室排出的装置。

公开(公告)号：US4436581A

公开(公告)日：1984-03-13

申请号：US370147

申请日：1982-04-20

申请人： Sadayuki Okudaira ,  Hiroji Saida ,  Yoshio Sakai ,  Shigeru Nishimatsu ,  Keizo Suzuki

发明人： Sadayuki Okudaira ,  Hiroji Saida ,  Yoshio Sakai ,  Shigeru Nishimatsu ,  Keizo Suzuki

IPC分类号： C23F4/00 ,  H01L21/3065 ,  H01L21/3213 ,  H01L21/308

CPC分类号： H01L21/32137 ,  H01L21/3065

摘要： A plurality of silicon regions different in impurity concentration from each other are simultaneously subjected to dry etching in such a manner that neutral particles in a plasma do not substantially participate in etching and therefore etching is performed substantially by ions. Thus, the silicon regions different in impurity concentration from each other can be etched at substantially the same etching rate, independently of impurity concentration.

摘要翻译： 将杂质浓度彼此不同的多个硅区域同时进行干蚀刻，使得等离子体中的中性粒子基本上不参与蚀刻，因此蚀刻基本上由离子进行。 因此，杂质浓度彼此不同的硅区域可以以与杂质浓度无关的蚀刻速率基本相同。

公开(公告)号：US20090079672A1

公开(公告)日：2009-03-26

申请号：US12175636

申请日：2008-07-18

申请人： Norihiro UEMURA ,  Shunichiro Nobuki ,  Shirun Ho ,  Keizo Suzuki ,  Masatoshi Shiiki

发明人： Norihiro UEMURA ,  Shunichiro Nobuki ,  Shirun Ho ,  Keizo Suzuki ,  Masatoshi Shiiki

IPC分类号： G09G3/28

CPC分类号： H01J11/30 ,  G09G3/293 ,  G09G3/2986 ,  G09G2320/043 ,  H01J11/12

摘要： There is provided a PDP, in which the deterioration in the address discharge timelag with age is suppressed, which is bright, has guaranteed life, can stably be driven, is of low power consumption, high definition, and high image quality. There is provided a pair of sustaining discharge electrodes on the front substrate extending in a row direction for forming a display line, a floating electrode not connected to an external electrode is arranged on the same substrate as the pair of sustaining discharge electrode so as not to pass through a center line extending in a column direction and dividing the discharge cell into two equal parts, thereby intensifying the local potential of an area of the MgO surface not influenced by the sputtering by the sustaining discharge in the address discharge, promoting the electron emission from this area, and suppressing the deterioration of the address discharge timelag.

摘要翻译： 提供了一种等离子体显示面板，其具有寿命长，可以稳定地驱动，具有低功耗，高清晰度，高图像质量等特点，能够抑制随着时间的地址放电时间表的劣化。 在前方基板上设置有一对维持放电电极，该电极沿着行方向延伸以形成显示线，不与外部电极连接的浮动电极设置在与该对维持放电电极相同的基板上，从而不 通过沿列方向延伸的中心线，并将放电单元分成两部分，从而通过在寻址放电中的维持放电强化不受溅射影响的MgO表面的局部电位，促进电子发射 并且抑制地址放电时间的劣化。