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    RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD
    11.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD 审中-公开
    辐射敏感树脂组合物和抗蚀剂图案形成方法

    公开(公告)号：US20160363859A1

    公开(公告)日：2016-12-15

    申请号：US15155123

    申请日：2016-05-16

    Applicant: JSR CORPORATION

    Inventor： Hayato NAMAI

    IPC: G03F7/039 ,  G03F7/32 ,  G03F7/038 ,  G03F7/20

    CPC classification number: G03F7/325 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/322

    Abstract: A radiation-sensitive resin composition comprises: a polymer having a structural unit that comprises an acid-labile group; a radiation-sensitive acid generator; and a salt that comprises an onium cation, and HCO3−, CO32− or a combination thereof. The onium cation is preferably a sulfonium cation, an ammonium cation, an iodonium cation, a phosphonium cation, a diazonium cation or a combination thereof. The onium cation is preferably a cation represented by formula (b-1) or formula (b-2). The acid generated from the radiation-sensitive acid generator is preferably a sulfonic acid, an imide acid, an amide acid, a methide acid or a combination thereof.

    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND
    12.
    发明申请
    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND 有权
    光电组合物，电阻形成方法，酸扩散控制剂和化合物

    公开(公告)号：US20150309406A9

    公开(公告)日：2015-10-29

    申请号：US14486532

    申请日：2014-09-15

    Applicant: JSR CORPORATION

    Inventor： Hayato NAMAI

    IPC: G03F7/038 ,  G03F7/30

    CPC classification number: G03F7/038 ,  C07D211/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

    Abstract: A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.

    Abstract translation: 一种光致抗蚀剂组合物，其含有：包含酸不稳定基团的聚合物; 辐射敏感酸发生器; 和含有式（1）表示的化合物的酸扩散控制剂。 在式（1）中，R 1，R 2和R 3各自独立地表示氢原子或碳原子数为1〜10的一价烃基。 A表示通过组合氢原子，碳原子数1〜30的直链烃基，碳原子数3〜30的脂肪族烃基或其组合而得到的化合价n的基团。 -O - ， - CO - ， - COO - ， - SO 2 O-，-NRSO 2 - ， - NRSO 2 O-，-NRCO-或其组合; 和n个氮原子作为式（1）中的羰基的结合位点，其中构成A的原子的原子质量之和不小于120.n是1至4的整数。

    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND
    14.
    发明申请
    PHOTORESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, ACID DIFFUSION CONTROL AGENT, AND COMPOUND 有权

    公开(公告)号：US20150004544A1

    公开(公告)日：2015-01-01

    申请号：US14486532

    申请日：2014-09-15

    Applicant: JSR CORPORATION

    Inventor： Hayato NAMAI

    IPC: G03F7/038 ,  G03F7/30

    CPC classification number: G03F7/038 ,  C07D211/46 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0388 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/30

    Abstract: A photoresist composition containing: a polymer including an acid-labile group; a radiation-sensitive acid generator; and an acid diffusion control agent that contains a compound represented by a formula (1). In the formula (1), R1, R2 and R3 each independently represent a hydrogen atom or a monovalent hydrocarbon group having 1 to 10 carbon atoms. A represents a group having a valency of n that is obtained by combining: a hydrogen atom, a linear hydrocarbon group having 1 to 30 carbon atoms, an alicyclic hydrocarbon group having 3 to 30 carbon atoms or a combination thereof; —O—, —CO—, —COO—, —SO2O—, —NRSO2—, —NRSO2O—, —NRCO— or a combination thereof; and n nitrogen atoms as a binding site to the carbonyl group in the formula (1), in which a sum of atomic masses of the atoms constituting A is no less than 120. n is an integer of 1 to 4.

    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND
    15.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND COMPOUND 有权

    公开(公告)号：US20220334481A1

    公开(公告)日：2022-10-20

    申请号：US17854048

    申请日：2022-06-30

    Applicant: JSR CORPORATION

    Inventor： Takuhiro TANIGUCHI ,  Katsuaki NISHIKORI ,  Hayato NAMAI ,  Kazuya KIRIYAMA ,  Ken MARUYAMA

    IPC: G03F7/039 ,  C08G75/20

    Abstract: A radiation-sensitive resin composition includes: a polymer including a structural unit including an acid-labile group; and a compound represented by formula (1). R1, R2, and R3 each independently represent a halogen atom, a hydroxy group, a nitro group, or a monovalent organic group having 1 to 20 carbon atoms; X1, X2, and X3 each independently represent a group represented by formula (2); a sum of d, e, and f is no less than 1; R4 represents a hydrocarbon group having 1 to 20 carbon atoms and R5 represents a hydrocarbon group having 1 to 20 carbon atoms, or R4 and R5 taken together represent a heterocyclic structure having 4 to 20 ring atoms, together with the sulfur atom to which R4 and R5 bond; n is 0 or 1; A− represents a monovalent sulfonic acid anion; and Y represents —COO—, —OCO—, or —N(R7)CO—.

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