公开(公告)号：US20200272053A1

公开(公告)日：2020-08-27

申请号：US16871131

申请日：2020-05-11

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Yuushi MATSUMURA ,  Hiroki NAKATSU ,  Kazunori TAKANASHI ,  Hiroki NAKAGAWA

IPC: G03F7/11 ,  C09D7/63 ,  C07D251/24 ,  H01L21/027

Abstract: A composition for resist underlayer film formation, includes a compound represented by formula (1) and a solvent. Ar1 represents an aromatic heterocyclic group having a valency of m and having 5 to 20 ring atoms; m is an integer of 1 to 11; Ar2 is a group bonding to a carbon atom of the aromatic heteroring in Ar1 and represents an aromatic carbocyclic group having 6 to 20 ring atoms and having a valency of (n+1) or an aromatic heterocyclic group having 5 to 20 ring atoms and having a valency of (n+1); n is an integer of 0 to 12; and R1 represents a monovalent organic group having 1 to 20 carbon atoms, a hydroxy group, a halogen atom, or a nitro group. Ar1Ar2R1)n)m   (1)

公开(公告)号：US20200012193A1

公开(公告)日：2020-01-09

申请号：US16564499

申请日：2019-09-09

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Goji Wakamatsu ,  Tsubasa Abe ,  Ichihiro Miura ,  Kengo Ehara ,  Hiroki Nakatsu ,  Hiroki Nakagawa

IPC: G03F7/039 ,  G03F7/09 ,  G03F7/20 ,  C08G61/12 ,  C08G61/04

Abstract: A composition for resist underlayer film formation contains: a compound having a partial structure represented by the following formula (1); and a solvent. In the formula (1): X represents a group represented by formula (i), (ii), (iii) or (iv). In the formula (i): R1 and R2 each independently represent a hydrogen atom, a substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms, or a substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms provided that at least one of R1 and R2 represents the substituted or unsubstituted monovalent aliphatic hydrocarbon group having 1 to 20 carbon atoms or the substituted or unsubstituted aralkyl group having 7 to 20 carbon atoms; or R1 and R2 taken together represent a part of a ring structure having 3 to 20 ring atoms together with the carbon atom to which R1 and R2 bond.

公开(公告)号：US20190243247A1

公开(公告)日：2019-08-08

申请号：US16388238

申请日：2019-04-18

Applicant: JSR CORPORATION

Inventor： Naoya NOSAKA ,  Goji Wakamatsu ,  Tsubasa Abe ,  Yuushi Matsumura ,  Yoshio Takimoto ,  Shin-ya Nakafuji ,  Kazunori Sakai

IPC: G03F7/11 ,  C08G61/02 ,  C09D165/00 ,  G03F7/16 ,  G03F7/20 ,  G03F7/26 ,  C07C35/37 ,  C07C33/28 ,  C07C35/44 ,  C07C43/166 ,  H01L21/027 ,  H01L21/308

CPC classification number: G03F7/11 ,  C07C33/28 ,  C07C35/37 ,  C07C35/44 ,  C07C43/166 ,  C07C2602/42 ,  C07C2603/20 ,  C07C2603/50 ,  C07C2603/54 ,  C08F299/02 ,  C08G61/02 ,  C08G2261/1414 ,  C08G2261/1422 ,  C08G2261/1424 ,  C08G2261/148 ,  C09D165/00 ,  G03F7/162 ,  G03F7/168 ,  G03F7/20 ,  G03F7/26 ,  H01L21/027 ,  H01L21/0273 ,  H01L21/3065 ,  H01L21/3081

Abstract: A composition for resist underlayer film formation contains a compound having a group represented by formula (1), and a solvent. R1 represents an organic group having 2 to 10 carbon atoms and having a valency of (m+n), wherein the carbon atoms include two carbon atoms that are adjacent to each other, with a hydroxy group or an alkoxy group bonding to one of the two carbon atoms, and with a hydrogen atom bonding to another of the two carbon atoms; L1 represents an ethynediyl group or a substituted or unsubstituted ethenediyl group; R2 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; n is an integer of 1 to 3; * denotes a bonding site to a moiety other than the group represented by the formula (1) in the compound; and m is an integer of 1 to 3.

公开(公告)号：US20180207983A1

公开(公告)日：2018-07-26

申请号：US15742735

申请日：2016-07-21

Applicant: JSR CORPORATION

Inventor： Takumi ADACHI ,  Ryoji TANAKA ,  Takaomi MATSUMOTO ,  Fumihiro TOYOKAWA ,  Naoya NOSAKA

IPC: B60C1/00 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08L9/06

CPC classification number: B60C1/0016 ,  B60C1/0025 ,  C08C19/02 ,  C08F8/04 ,  C08F236/10 ,  C08F297/04 ,  C08F2800/20 ,  C08K3/06 ,  C08K3/36 ,  C08K5/47 ,  C08K5/548 ,  C08L9/06 ,  C08F236/06 ,  C08F212/08 ,  C08L15/00

Abstract: Provided is a hydrogenated conjugated diene polymer which is a hydrogenated product of a conjugated diene polymer comprising a structural unit derived from a conjugated diene compound and a structural unit derived from an aromatic vinyl compound, wherein the conjugated diene compound includes butadiene, the hydrogenated conjugated diene polymer is obtained by hydrogenating a polymer in which a vinyl bond content in the structural unit derived from butadiene is 50 mol % or less, an amount of the structural unit derived from the aromatic vinyl compound is 5 to 25 mass % with respect to entire structural units derived from monomers of the polymer, and a hydrogenation rate of the structural unit derived from butadiene is 91% to 99%.

公开(公告)号：US20170137663A9

公开(公告)日：2017-05-18

申请号：US15059372

申请日：2016-03-03

Applicant: JSR CORPORATION

Inventor： Goji WAKAMATSU ,  Naoya NOSAKA ,  Yuushi MATSUMURA ,  Yoshio TAKIMOTO ,  Tsubasa ABE ,  Toru KIMURA

IPC: C09D161/14 ,  G03F7/36 ,  G03F7/11

CPC classification number: C09D161/14 ,  C08G8/20 ,  C08G8/36 ,  C08G14/04 ,  C08G14/12 ,  C09D161/34 ,  G03F7/11 ,  G03F7/36

Abstract: A composition comprises a compound and a solvent. The compound comprises a carbon-carbon triple bond-containing group, and at least one partial structure having an aromatic ring. A total number of benzene nuclei constituting the aromatic ring in the at least one partial structure is no less than 4. The at least one partial structure preferably comprises a partial structure represented by formula (1). The sum of p1, p2, p3 and p4 is preferably no less than 1. At least one of R1 to R4 preferably represents a monovalent carbon-carbon triple bond-containing group. The at least one partial structure also preferably comprises a partial structure represented by formula (2). The sum of q1, q2, q3 and q4 is preferably no less than 1. At least one of R5 to R8 preferably represents a monovalent carbon-carbon triple bond-containing group.