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公开(公告)号：US5059502A
公开(公告)日：1991-10-22
申请号：US434783
申请日：1989-11-13
申请人： Narihito Kojima , Hiroshi Nagame , Mitsuru Seto , Shunpei Yamazaki , Shigenori Hayashi , Noriya Ishida , Naoki Hirose , Mari Sasaki , Junichi Takeyama
发明人： Narihito Kojima , Hiroshi Nagame , Mitsuru Seto , Shunpei Yamazaki , Shigenori Hayashi , Noriya Ishida , Naoki Hirose , Mari Sasaki , Junichi Takeyama
CPC分类号： G03G5/14704 , G03G5/08285
摘要： An electrophotographic photoconductor comprises an electroconductive substrate, an organic photoconductive layer formed on the electroconductive substrate, and a protective layer formed on the organic photoconductive layer, comprising carbon or a carbon-based material as its main component, in which the difference in the Vickers hardness between the organic photoconductive layer and the protective layer is 2500 Kg/mm.sup.2 or less, and the oxygen concentration at the interface or in the vicinity of the interface between the organic photoconductive layer and the protective layer is 1 atom % or less.
摘要翻译： 电子照相感光体包括导电性基体，形成在导电性基体上的有机光电导层和形成在有机光电导层上的保护层，其包含碳或碳类材料作为其主要成分，其中维氏硬度 有机光电导层和保护层之间的氧浓度为2500kg / mm 2以下，有机光电导层与保护层界面附近的氧浓度为1原子％以下。
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公开(公告)号：US4803095A
公开(公告)日：1989-02-07
申请号：US154290
申请日：1988-02-10
申请人： Shigenori Hayashi , Naoki Hirose , Takashi Inujima , Kenji Ito
发明人： Shigenori Hayashi , Naoki Hirose , Takashi Inujima , Kenji Ito
CPC分类号： C23C16/482
摘要： An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source, an obturating plate is placed so that the intensity of the light source is apparently reduced at the center position. With this light, the substrate is irradiated with light having uniform intensity over the surface of the substrate to be processed.
摘要翻译： 描述了改进的化学气相反应系统。 该系统的特征在于其光源将紫外光辐射到待处理的基板。 在光源之前，放置一个闭孔板，使得光源的强度在中心位置明显减小。 利用该光，在被处理基板的表面上照射具有均匀强度的光。
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公开(公告)号：US6013338A
公开(公告)日：2000-01-11
申请号：US188382
申请日：1998-11-10
IPC分类号： C23C16/02 , C23C16/40 , C23C16/44 , C23C16/48 , C23C16/517 , C23C16/56 , H01L21/316 , H05H1/24
CPC分类号： H01L21/02164 , C23C16/0245 , C23C16/402 , C23C16/4405 , C23C16/482 , C23C16/488 , C23C16/517 , C23C16/56 , H01L21/0217 , H01L21/022 , H01L21/02211 , H01L21/02216 , H01L21/02274 , H01L21/02277 , H01L21/31608 , H01L21/31612 , Y10S148/017 , Y10S148/043 , Y10S148/045 , Y10S438/905
摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
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公开(公告)号：US5629245A
公开(公告)日：1997-05-13
申请号：US376736
申请日：1995-01-23
IPC分类号： C23C16/02 , C23C16/40 , C23C16/44 , C23C16/48 , C23C16/517 , C23C16/56 , H01L21/316 , H01L21/20
CPC分类号： H01L21/02164 , C23C16/0245 , C23C16/402 , C23C16/4405 , C23C16/482 , C23C16/487 , C23C16/488 , C23C16/517 , C23C16/56 , H01L21/0217 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/02277 , H01L21/31608 , H01L21/31612
摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
摘要翻译： 示出了用于沉积均匀膜的改进的CVD装置。 该装置包括反应室，衬底保持器和用于光CVD的多个光源或用于等离子体CVD的一对电极。 衬底保持器是由光源包围的圆柱形手推车，并且通过驱动装置绕其轴线旋转。 利用这种结构，安装在推车和周围环境上的基板可以通过等离子体的光均匀地通过待涂覆的表面来激励。
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公开(公告)号：US5183511A
公开(公告)日：1993-02-02
申请号：US352644
申请日：1989-05-12
CPC分类号： H01J37/32458 , C23C16/482 , C23C16/488 , H01J37/32862
摘要： A photo CVD apparatus includes a reaction chamber, a light source for radiating light to the inside of the chamber through a light window, and a pair of electrodes disposed in the chamber for glow discharge, one of the electrodes being located on the light window. After deposition by photo CVD, a light window for transmission of UV light is cleaned by plasma etching by virtue of glow discharge taking place between the electrodes. The light source and the electrodes for plasma etching share one power supply for supplying high frequency electric power.
摘要翻译： 照相CVD装置包括反应室，通过光窗将光照射到室内的光源，以及设置在用于辉光放电的室中的一对电极，其中一个电极位于光窗上。 在通过光CVD沉积之后，通过在电极之间发生辉光放电，通过等离子体蚀刻来清洁用于透射UV光的光窗口。 用于等离子体蚀刻的光源和电极共享用于提供高频电力的一个电源。
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公开(公告)号：US5855970A
公开(公告)日：1999-01-05
申请号：US769115
申请日：1996-12-18
IPC分类号： C23C16/02 , C23C16/40 , C23C16/44 , C23C16/48 , C23C16/517 , C23C16/56 , H01L21/316 , H05H1/24
CPC分类号： H01L21/02164 , C23C16/0245 , C23C16/402 , C23C16/4405 , C23C16/482 , C23C16/487 , C23C16/488 , C23C16/517 , C23C16/56 , H01L21/0217 , H01L21/022 , H01L21/02211 , H01L21/02274 , H01L21/02277 , H01L21/31608 , H01L21/31612
摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
摘要翻译： 示出了用于沉积均匀膜的改进的CVD装置。 该装置包括反应室，衬底保持器和用于光CVD的多个光源或用于等离子体CVD的一对电极。 衬底保持器是由光源包围的圆柱形手推车，并且通过驱动装置绕其轴线旋转。 利用这种结构，安装在推车和周围环境上的基板可以通过等离子体的光均匀地通过待涂覆的表面来激励。
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公开(公告)号：US4768464A
公开(公告)日：1988-09-06
申请号：US097188
申请日：1987-09-16
申请人： Shigenori Hayashi , Naoki Hirose , Takashi Inujima , Kenji Ito
发明人： Shigenori Hayashi , Naoki Hirose , Takashi Inujima , Kenji Ito
CPC分类号： C23C16/482
摘要： An improved chemical vapor reaction system is described. The system is characterized by its light source which radiates ultraviolet light to a substrate to be processed. Before the light source, an obturating plate is placed so that the intensity of the light source is apparently reduced at the center position. With this light, the substrate is irradiated with light having uniform intensity over the surface of the substrate to be processed.
摘要翻译： 描述了改进的化学气相反应系统。 该系统的特征在于其光源将紫外光辐射到待处理的基板。 在光源之前，放置一个闭孔板，使得光源的强度在中心位置明显减小。 利用该光，在被处理基板的表面上照射具有均匀强度的光。
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18.发明申请公开(公告)号：US20120034750A1
公开(公告)日：2012-02-09
申请号：US13264660
申请日：2010-10-28
IPC分类号： H01L21/336 , C23C16/50 , C23C16/455
CPC分类号： H01L29/66803 , H01J37/32422 , H01J37/3244 , H01J37/32449 , H01L21/2236
摘要： After a fin-semiconductor region (13) is formed on a substrate (11), impurity-containing gas and oxygen-containing gas are used to perform plasma doping on the fin-semiconductor region (13). This forms impurity-doped region (17) in at least side portions of the fin-semiconductor region (13).
摘要翻译： 在衬底（11）上形成鳍状半导体区域（13）之后，使用含杂质的气体和含氧气体在鳍状半导体区域（13）上进行等离子体掺杂。 这在散热片半导体区域（13）的至少侧边部形成杂质掺杂区域（17）。
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19.发明授权公开(公告)号：US06835523B1
公开(公告)日：2004-12-28
申请号：US09396381
申请日：1999-09-15
申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
发明人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
IPC分类号： G11B724
CPC分类号： C23C16/5096 , C23C16/26 , G11B5/72 , G11B5/74 , G11B5/78 , G11B5/82 , G11B5/8408 , G11B7/24056 , G11B11/10582 , G11B11/10584 , G11B11/10586 , Y10S430/146
摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic r cording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
摘要翻译： 在用于制造碳涂层的装置中，诸如磁性介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过轰击离子在物体的表面上制造涂层。
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公开(公告)号：US6105225A
公开(公告)日：2000-08-22
申请号：US600863
申请日：1996-02-09
申请人： Hideo Torii , Takeshi Kamada , Shigenori Hayashi , Ryoichi Takayama , Takashi Hirao , Masumi Hattori
发明人： Hideo Torii , Takeshi Kamada , Shigenori Hayashi , Ryoichi Takayama , Takashi Hirao , Masumi Hattori
CPC分类号： G01P15/0922 , G01P15/0802 , H01L41/0478 , H01L41/0815 , H01L41/313 , Y10T29/42 , Y10T29/4981
摘要： A method of manufacturing a small, light, highly accurate and inexpensive thin film sensor element is disclosed. The thin film sensor element comprises a sensor holding substrate having an opening part and a multilayer film structure adhered thereon. The multilayer film structure comprises a first electrode film, a second electrode film, and a piezoelectric dielectric oxide film present between the first and second electrode films. The method of manufacturing the thin film sensor element comprises the steps of: forming the multilayer film structure by forming the first electrode film having a (100) plane orientation on a surface of an alkali halide substrate, forming the piezoelectric dielectric oxide thereon, and forming the second electrode film on the piezoelectric dielectric oxide; adhering the multilayer film structure on the surface of the sensor holding substrate having the opening part; and dissolving and removing the alkali halide substrate with water.
摘要翻译： 公开了一种制造小型，轻型，高精度和廉价的薄膜传感器元件的方法。 薄膜传感器元件包括具有开口部分和粘附在其上的多层膜结构的传感器保持基板。 多层膜结构包括第一电极膜，第二电极膜和存在于第一和第二电极膜之间的压电电介质氧化物膜。 制造薄膜传感器元件的方法包括以下步骤：通过在碱金属卤化物衬底的表面上形成具有（100）面取向的第一电极膜来形成多层膜结构，在其上形成压电电介质氧化物，并形成 压电电介质氧化物上的第二电极膜; 将多层膜结构粘附在具有开口部的传感器保持基板的表面上; 并用水溶解和除去碱金属卤化物基质。
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