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    Laminated heater with different heater trace materials
    11.
    发明授权
    Laminated heater with different heater trace materials 有权

    公开(公告)号：US10764966B2

    公开(公告)日：2020-09-01

    申请号：US15586178

    申请日：2017-05-03

    Applicant: LAM RESEARCH CORPORATION

    Inventor： Yuma Ohkura ,  Darrell Ehrlich ,  Eric A. Pape

    IPC: H05B3/03 ,  H05B3/06 ,  H05B3/28 ,  H05K1/11 ,  H05K3/10 ,  H05B3/26

    Abstract: A substrate support for a substrate processing system includes a plurality of heating zones, a baseplate, at least one of a heating layer and a ceramic layer arranged on the baseplate, and a plurality of heating elements provided within the at least one of the heating layer and the ceramic layer. The plurality of heating elements includes a first material having a first electrical resistance. Wiring is provided through the baseplate in a first zone of the plurality of heating zones. An electrical connection is routed from the wiring in the first zone to a first heating element of the plurality of heating elements. The first heating element is arranged in a second zone of the plurality of heating zones and the electrical connection includes a second material having a second electrical resistance that is less than the first electrical resistance.

    MULTI ZONE GAS INJECTION UPPER ELECTRODE SYSTEM
    12.
    发明申请
    MULTI ZONE GAS INJECTION UPPER ELECTRODE SYSTEM 审中-公开

    公开(公告)号：US20200243307A1

    公开(公告)日：2020-07-30

    申请号：US16845723

    申请日：2020-04-10

    Applicant: Lam Research Corporation

    Inventor： Ryan Bise ,  Rajinder Dhindsa ,  Alexei Marakhtanov ,  Lumin Li ,  Sang Ki Nam ,  Jim Rogers ,  Eric Hudson ,  Gerardo Delgadino ,  Andrew D. Bailey, III ,  Mike Kellogg ,  Anthony de la Llera ,  Darrell Ehrlich

    IPC: H01J37/32

    Abstract: A plasma processing system includes a plasma chamber having a substrate support, and a multi-zone gas injection upper electrode disposed opposite the substrate support. An inner plasma region is defined between the upper electrode and the substrate support. The multi-zone gas injection upper electrode has a plurality of concentric gas injection zones. A confinement structure, which surrounds the inner plasma region, has an upper horizontal wall that interfaces with the outer electrode of the upper electrode. The confinement structure has a lower horizontal wall that interfaces with the substrate support, and includes a perforated confinement ring and a vertical wall that extends from the upper horizontal wall to the lower horizontal wall. The lower surface of the upper horizontal wall, an inner surface of the vertical wall, and an upper surface of the lower horizontal wall define a boundary of an outer plasma region, which surrounds the inner plasma region.

    CONNECTIONS BETWEEN LAMINATED HEATER AND HEATER VOLTAGE INPUTS
    13.
    发明申请
    CONNECTIONS BETWEEN LAMINATED HEATER AND HEATER VOLTAGE INPUTS 审中-公开

    公开(公告)号：US20170332481A1

    公开(公告)日：2017-11-16

    申请号：US15586203

    申请日：2017-05-03

    Applicant: Lam Research Corporation

    Inventor： Yuma Ohkura ,  Darrell Ehrlich ,  Eric A. Pape

    IPC: H05K1/02 ,  H05B3/26 ,  H05K1/03 ,  H05K1/11

    Abstract: A substrate support for a substrate processing system includes a plurality of heating zones, a baseplate, a heating layer arranged on the baseplate, a ceramic layer arranged on the heating layer, and wiring provided through the baseplate, the heating layer, and into the ceramic layer in a first zone of the plurality of heating zones. An electrical connection is routed from the wiring in the first zone, across the ceramic layer to a second zone of the plurality of heating zones, and to a heating element in the heating layer in the second zone.

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