Carbon nanotube columns and methods of making and using carbon nanotube columns as probes
    15.
    发明授权
    Carbon nanotube columns and methods of making and using carbon nanotube columns as probes 有权
    碳纳米管柱及其制备和使用碳纳米管柱作为探针的方法

    公开(公告)号:US08354855B2

    公开(公告)日:2013-01-15

    申请号:US12632428

    申请日:2009-12-07

    IPC分类号: G01R31/00 G01R31/20 G01R1/067

    摘要: Carbon nanotube columns each comprising carbon nanotubes can be utilized as electrically conductive contact probes. The columns can be grown, and parameters of a process for growing the columns can be varied while the columns grow to vary mechanical characteristics of the columns along the growth length of the columns. Metal can then be deposited inside and/or on the outside of the columns, which can enhance the electrical conductivity of the columns. The metalized columns can be coupled to terminals of a wiring substrate. Contact tips can be formed at or attached to ends of the columns. The wiring substrate can be combined with other electronic components to form an electrical apparatus in which the carbon nanotube columns can function as contact probes.

    摘要翻译: 每个包含碳纳米管的碳纳米管柱可用作导电接触探针。 柱可以生长,并且用于生长柱的方法的参数可以变化,同时柱生长以改变柱沿着生长长度的机械特性。 然后可以将金属沉积在柱的内部和/或外部,这可以增强柱的导电性。 金属化柱可以连接到布线基板的端子。 接触尖端可以形成在柱或端附近。 布线基板可以与其他电子部件组合以形成其中碳纳米管柱可用作接触探针的电气设备。

    Photoresist formulation for high aspect ratio plating
    19.
    发明授权
    Photoresist formulation for high aspect ratio plating 失效
    用于高纵横比电镀的光刻胶配方

    公开(公告)号:US07238464B2

    公开(公告)日:2007-07-03

    申请号:US11362695

    申请日:2006-02-27

    申请人: Treliant Fang

    发明人: Treliant Fang

    IPC分类号: G03F7/30

    摘要: SU-8 photoresist compositions are modified to improve their adhesion properties by adding 1% to 6% of an adhesion promoter selected from the group consisting of glycidoxypropanetrimethoxysilane, mercaptopropyltrimethoxysilane, and aminopropyltrimethoxysilane. SU-8 photoresist compositions are modified to improve their resistance to cracking and film stress by adding 0.5% to 3% of a plasticizer selected from the group consisting of dialkylphthalates, dialkylmalonates, dialkylsebacates, dialkyladipates, and diglycidyl hexahydrophthalates. The improvements can be obtained simultaneously by adding both the adhesion promoter and the plasticizer to SU-8 photoresist compositions.

    摘要翻译: 通过加入选自由缩水甘油氧基丙基三甲氧基硅烷,巯基丙基三甲氧基硅烷和氨基丙基三甲氧基硅烷组成的组的1%至6%的粘合促进剂,改性SU-8光致抗蚀剂组合物以改善其粘合性。 通过加入0.5%至3%的选自二烷基邻苯二甲酸酯,二烷基丙二酸酯,癸二酸二烷基酯,己二酸二烷基酯和六氢化邻苯二甲酸二缩水甘油酯的增塑剂,改性SU-8光致抗蚀剂组合物以提高其抗裂纹和薄膜应力。 通过向SU-8光致抗蚀剂组合物中加入粘合促进剂和增塑剂可以同时获得改进。