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公开(公告)号：US20050260786A1
公开(公告)日：2005-11-24
申请号：US10524261
申请日：2003-08-06
申请人： Masato Yoshikawa , Shingo Ohno , Taichi Kobayashi , Takayuki Sugimura , Yoshinori Iwabuchi , Osamu Shiino , Hideo Sugiyama , Yasuo Horikawa , Shinichi Toyosawa
发明人： Masato Yoshikawa , Shingo Ohno , Taichi Kobayashi , Takayuki Sugimura , Yoshinori Iwabuchi , Osamu Shiino , Hideo Sugiyama , Yasuo Horikawa , Shinichi Toyosawa
CPC分类号： H01G9/2009 , H01G9/2031 , Y02E10/542 , Y02P70/521
摘要： An electrolyte for dye-sensitized solar cells, wherein an oxidation-reduction substance is carried by a vulcanized rubber, a phosphazene polymer, a porous body comprising a high molecular material which has a three-dimensional continuous network skeleton structure, or an EVA resin film. A dye-sensitized solar cell comprising dye-sensitized semiconductor electrodes 2, 3, a counter electrode 4 arranged at an opposed position to the electrodes, and an electrolyte 6 between the electrodes 2, 3 and the electrode 4. A solid electrolyte for dye-sensitized solar cells effective in improving the generation efficiency, durability, and safety of dye-sensitized solar cells and can be manufactured inexpensively.
摘要翻译： 用于染料敏化太阳能电池的电解质，其中氧化还原物质由硫化橡胶，磷腈聚合物，包含具有三维连续网状骨架结构的高分子材料的多孔体或EVA树脂膜 。 一种染料敏化太阳能电池，其包含染料敏化半导体电极2,3，配置在与电极相对的位置的对置电极4，以及电极2,3与电极4之间的电解质6.一种染料敏化太阳能电池， 敏化太阳能电池有效地提高染料敏化太阳能电池的发电效率，耐久性和安全性，并且可以廉价地制造。
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12.发明授权Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film 失效用于控制干电镀膜的折射率的方法和用于制造干电镀叠层膜的方法公开(公告)号：US06921465B2
公开(公告)日：2005-07-26
申请号：US10647251
申请日：2003-08-26
申请人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
发明人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
CPC分类号： C23C14/06 , C23C14/0084 , C23C14/3414 , C23C14/548
摘要： A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
摘要翻译： 制备干电镀叠层膜的方法包括提供碳化硅作为起始源并进行干电镀，同时连续或间歇地改变反应气体的浓度以沉积并在衬底上形成具有不同折射率的薄膜 沿其厚度的指数。 还描述了一种用于制造溅射组合膜的方法，其包括提供碳化硅作为靶，并且在连续或间歇地向靶提供电力的同时进行溅射，以沉积并形成沿着其的折射率不同的薄膜 厚度。
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13.发明申请ITO thin film, method of producing the same, transparent conductive film, and touch panel 审中-公开ITO薄膜，其制造方法，透明导电膜和触摸面板公开(公告)号：US20060003188A1
公开(公告)日：2006-01-05
申请号：US11184811
申请日：2005-07-20
CPC分类号： C23C14/3464 , C23C14/0021 , C23C14/086 , C23C14/3414
摘要： A crystalline ITO transparent conductive thin film is formed by heating a substrate at low temperature during the sputtering film formation. The crystalline ITO transparent conductive thin film is formed by using an ITO target comprising In2O3 and SnO2 where a weight percentage of SnO2 is 6% or less based on the total weight of In2O3 and SnO2 in the ITO target, and heating the substrate at 90 to 170° C. during the sputtering film formation. The crystalline ITO film with high strength and mechanical durability can be formed by heating at low temperature, which meets heat resistance of the substrate, without requiring annealing after the film formation. There are provided a transparent conductive film comprising a polymer film 4 and an ITO transparent conductive film 5 formed thereon, and a touch panel comprising the transparent conductive film.
摘要翻译： 通过在溅射成膜期间在低温下加热基板来形成结晶ITO透明导电薄膜。 结晶ITO透明导电薄膜通过使用包含In 2 N 3 O 3和SnO 2 2的ITO靶形成，其中SnO 2的重量百分比 基于ITO靶中的In 2 N 3 O 3和SnO 2 N 2的总重量，SUB> 2 <6％或更小 在溅射成膜期间在90〜170℃下加热基板。 具有高强度和机械耐久性的结晶ITO膜可以通过在低温下加热而形成，其满足基板的耐热性，而不需要在成膜后退火。 提供了包含聚合物膜4和形成在其上的ITO透明导电膜5的透明导电膜，以及包括透明导电膜的触摸面板。
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14.发明申请Transparent electroconductive substrate, dye-sensitized solar cell electrode, and dye-sensitized solar cell 审中-公开透明导电基材，染料敏化太阳能电池电极和染料敏化太阳能电池公开(公告)号：US20060234065A1
公开(公告)日：2006-10-19
申请号：US11403943
申请日：2006-04-14
申请人： Shingo Ohno , Yoshinori Iwabuchi , Hidefumi Kotsubo , Yasuhiro Morimura , Shinichiro Sugi , Hideo Sugiyama , Masato Yoshikawa
发明人： Shingo Ohno , Yoshinori Iwabuchi , Hidefumi Kotsubo , Yasuhiro Morimura , Shinichiro Sugi , Hideo Sugiyama , Masato Yoshikawa
CPC分类号： C01G19/00 , C01G15/00 , C01G19/02 , C01P2002/52 , C01P2004/61 , C01P2004/62 , C01P2006/40 , H01G9/2031 , H01G9/2059 , H01L31/022466 , H01L31/022475 , H01L2251/308 , H01M14/005 , Y02E10/542
摘要： An acid-resistant transparent electroconductive substrate with an ITO layer includes a transparent base and the ITO layer formed over the transparent base. The ITO layer contains at least 30 percent by weight of tin oxide. A dye-sensitized solar cell electrode includes the transparent electroconductive substrate and a dye-adsorbed semiconductor layer formed over the ITO layer of the transparent electroconductive substrate. A dye-sensitized solar cell is provided which uses the dye-sensitized solar cell electrode as a dye-sensitized semiconductor electrode. A SnO2 content of 30 percent by weight or more enhances acid resistance. The dye-sensitized semiconductor electrode for the dye-sensitized solar cell is prepared by forming a layer-by-layer self-assembled film on the ITO layer by a layer-by-layer assembly technique, forming a replica layer by acid-treating the layer-by-layer self-assembled film to form irregularities, and forming a semiconductor layer on the replica layer.
摘要翻译： 具有ITO层的耐酸透明导电性基材包括透明基材和形成在透明基材上的ITO层。 ITO层含有至少30重量％的氧化锡。 染料敏化太阳能电池电极包括透明导电基材和形成在透明导电基材的ITO层上的吸收染料的半导体层。 提供了一种染料敏化太阳能电池，其使用染料敏化太阳能电池电极作为染料敏化半导体电极。 30重量％以上的SnO 2 N含量提高了耐酸性。 用于染料敏化太阳能电池的染料敏化半导体电极通过层叠组装技术在ITO层上形成层叠自组装膜而制备，通过酸处理形成复制层 逐层自组装膜形成凹凸，并在复制层上形成半导体层。
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公开(公告)号：US06896981B2
公开(公告)日：2005-05-24
申请号：US10194963
申请日：2002-07-15
CPC分类号： G06F3/045 , G06F2203/04103 , Y10T428/12618 , Y10T428/265 , Y10T428/2949 , Y10T428/30
摘要： A transparent conductive film has a polymer film 4 and a transparent conductive layer 5 formed on the polymer film 4. The transparent conductive layer includes indium oxide, a zinc oxide system and a tin oxide system. A covering layer 9, made of material different from that of the transparent conductive layer 5, is formed on the transparent conductive layer 5. A touch panel is provided with the transparent conductive film as its upper electrode 6A or lower electrode. The surface of the transparent conductive layer is covered with the covering layer, so that physical or chemical stresses generated during the input to the touch panel do not affect transparent conductive layer directly, thus preventing damages and delamination of the transparent conductive layer. Furthermore, the covering layer formed on the transparent conductive layer improves the strength of the transparent conductive film, thereby enhancing a resistance to wear.
摘要翻译： 透明导电膜具有在聚合物膜4上形成的聚合物膜4和透明导电层5。 透明导电层包括氧化铟，氧化锌系和氧化锡系。 在透明导电层5上形成由不同于透明导电层5的材料制成的覆盖层9。 触摸面板设置有透明导电膜作为其上电极6A或下电极。 透明导电层的表面被覆盖层覆盖，使得在输入到触摸面板期间产生的物理或化学应力不直接影响透明导电层，从而防止透明导电层的损坏和分层。 此外，形成在透明导电层上的覆盖层提高了透明导电膜的强度，从而提高了耐磨性。
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16.发明授权Method for controlling a refractive index of a dry plating film and method for making a dry plating built-up film 失效用于控制干电镀膜的折射率的方法和用于制造干电镀叠层膜的方法公开(公告)号：US06666958B1
公开(公告)日：2003-12-23
申请号：US09407703
申请日：1999-09-28
申请人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
发明人： Masato Yoshikawa , Shingo Ohno , Sho Kumagai
IPC分类号： C23C1406
CPC分类号： C23C14/06 , C23C14/0084 , C23C14/3414 , C23C14/548
摘要： A method for making a dry plating built-up film comprises providing silicon carbide as a starting source and subjecting to dry plating while changing a concentration of a reactive gas continuously or intermittently to deposit and form, on a substrate, a thin film having different refractive indices along its thickness. A method for making a sputter built-up film is also described, which comprising providing silicon carbide as a target and subjecting to sputtering while changing making electric power against the target continuously or intermittently to deposit and form a thin film having different refractive indices along its thickness.
摘要翻译： 制备干电镀叠层膜的方法包括提供碳化硅作为起始源并进行干电镀，同时连续或间歇地改变反应气体的浓度以沉积并在衬底上形成具有不同折射率的薄膜 沿其厚度的指数。 还描述了一种用于制造溅射组合膜的方法，其包括提供碳化硅作为靶，并且在连续或间歇地向靶提供电力的同时进行溅射，以沉积并形成沿着其的折射率不同的薄膜 厚度。
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公开(公告)号：US06875478B2
公开(公告)日：2005-04-05
申请号：US10066380
申请日：2002-02-05
CPC分类号： C23C14/562
摘要： A film deposition apparatus equipped with a vacuum chamber, comprising a pair of rollers for vertically traveling a continuous sheet as a substrate, and a pair of sputtering cathodes for continuously depositing the film on the surfaces of the sheet in the vacuum chamber. The cathodes are vertically arranged and horizontally faced each other. The sheet is traveled between a pair of the cathodes. The apparatus and the film deposition process using it make it possible to deposit a film even on surfaces of a flexible sheet without causing problems such as defective film deposition or abnormal discharge, while ensuring stable, continuous, long-term operation.
摘要翻译： 一种装有真空室的成膜装置，包括用于垂直行进连续片材作为基底的一对辊子和用于在真空室中在片材表面上连续沉积薄膜的一对溅射阴极。 阴极垂直布置并水平面对。 片材在一对阴极之间行进。 使用它的装置和成膜方法使得可以在柔性片的表面上沉积膜，而不会导致诸如膜沉积错误或异常放电的问题，同时确保稳定，连续的长期操作。
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18.发明授权公开(公告)号：US07534500B2
公开(公告)日：2009-05-19
申请号：US10491568
申请日：2002-10-07
申请人： Taichi Kobayashi , Hidefumi Kotsubo , Yoshinori Iwabuchi , Mitsuhiro Nishida , Yukihiro Kusano , Shingo Oono , Masato Yoshikawa
发明人： Taichi Kobayashi , Hidefumi Kotsubo , Yoshinori Iwabuchi , Mitsuhiro Nishida , Yukihiro Kusano , Shingo Oono , Masato Yoshikawa
IPC分类号： B32B18/00 , B32B27/08 , B32B27/18 , B32B15/08 , G02F1/1333
CPC分类号： B32B27/08 , B29C45/14311 , B29C45/14811 , B29K2715/006 , B29K2995/0005 , B29K2995/0026 , B32B7/02 , B32B27/36 , B32B2264/102 , B32B2307/202 , B32B2310/022 , B32B2367/00 , B32B2457/208 , G06F3/045 , G06F2203/04103 , Y10T428/2878 , Y10T428/2891 , Y10T428/31511 , Y10T428/31529 , Y10T428/31605 , Y10T428/31609 , Y10T428/31663 , Y10T428/31678 , Y10T428/31681 , Y10T428/31692 , Y10T428/31699 , Y10T428/31721 , Y10T428/31786
摘要： A transparent conductive film comprising a polymer film and a transparent conductive layer provided thereon, especially a transparent conductive film improved in durability and mechanical and electrical properties, a process for the preparation thereof, and a touch panel provided with the transparent conductive film, as well as transparent conductive plate and the process for the preparation thereof. The transparent conductive film comprising a polymer film, an undercoat layer and a transparent conductive layer which are superposed in this order, and the undercoat layer contains a compound having at least one selected from an amino group and a phosphoric acid group.
摘要翻译： 一种透明导电膜，包括聚合物膜和设置在其上的透明导电层，特别是提高耐久性和机械和电学性能的透明导电膜，其制备方法以及设置有透明导电膜的触摸面板，以及 作为透明导电板及其制备方法。 透明导电膜包含依次重叠的聚合物膜，底涂层和透明导电层，底涂层含有具有选自氨基和磷酸基中的至少一种的化合物。
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19.发明申请Antireflection film, electromagnetic wave shielding light transmitting window material, gas discharge type light emitting panel, flat display panel, show window material and solar cell module 审中-公开防反射膜，电磁波屏蔽透光窗材料，气体放电型发光面板，平板显示屏，展示窗材料和太阳能电池组件公开(公告)号：US20060269731A1
公开(公告)日：2006-11-30
申请号：US11449811
申请日：2006-06-09
IPC分类号： B32B7/02
CPC分类号： B32B17/10018 , B32B17/10174 , G02B1/111 , G02F1/133502 , Y10T428/24942
摘要： An antireflection film is formed by laminating a hard coat layer 2, a high refractive index layer 3, and a low refractive index layer 4 in that order on a transparent base film 1. Alternatively, an antireflection film is formed by laminating an electrically conductive high refractive index hard coat layer and a low refractive index layer in that order on a transparent base film. The low refractive index layer 4 is composed of a coating film cured by ultraviolet irradiation in an atmosphere having an oxygen concentration of 0 to 10,000 ppm, the coating film containing hollow silica fine particles, a polyfunctional (meth)acrylic compound, and a photopolymerization initiator.
摘要翻译： 通过在透明基膜1上依次层叠硬涂层2，高折射率层3和低折射率层4而形成防反射膜。或者，通过层叠导电性高 折射率硬涂层和低折射率层。 低折射率层4由在氧浓度为0〜10,000ppm的气氛中通过紫外线照射而固化的涂膜，含有中空二氧化硅微粒的涂膜，多官能（甲基）丙烯酸类化合物和光聚合引发剂 。
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公开(公告)号：US07056603B2
公开(公告)日：2006-06-06
申请号：US10788308
申请日：2004-03-01
IPC分类号： B32B9/04
CPC分类号： G06F3/041 , G06F3/045 , H01B1/08 , H01B1/22 , Y10T428/10 , Y10T428/1036 , Y10T428/1045 , Y10T428/1068 , Y10T428/25 , Y10T428/31663 , Y10T428/31667
摘要： A touch panel includes a transparent electro-conductive film. The transparent electro-conductive film comprises a primary layer formed on a polymer film, and a transparent electro-conductive thin film or a multi-lamination film composed of at least one metal-compound layer and at least one electro-conductive-metal layer is formed on the primary layer. The primary layer is made of silicon compound. The primary layer is formed by sputtering, using a target having a density of 2.9 g/cm3 or more.
摘要翻译： 触摸面板包括透明导电膜。 透明导电膜包括在聚合物膜上形成的主层，以及由至少一个金属化合物层和至少一个导电金属层构成的透明导电薄膜或多层叠膜， 形成在主层上。 主层由硅化合物制成。 通过溅射形成主层，使用密度为2.9g / cm 3以上的靶。
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