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11.发明授权公开(公告)号：US06835523B1
公开(公告)日：2004-12-28
申请号：US09396381
申请日：1999-09-15
申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
发明人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
IPC分类号： G11B724
CPC分类号： C23C16/5096 , C23C16/26 , G11B5/72 , G11B5/74 , G11B5/78 , G11B5/82 , G11B5/8408 , G11B7/24056 , G11B11/10582 , G11B11/10584 , G11B11/10586 , Y10S430/146
摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic r cording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
摘要翻译： 在用于制造碳涂层的装置中，诸如磁性介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过轰击离子在物体的表面上制造涂层。
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12.发明授权
公开(公告)号：US4950624A
公开(公告)日：1990-08-21
申请号：US194206
申请日：1988-05-16
IPC分类号： C23C16/02 , C23C16/40 , C23C16/44 , C23C16/48 , C23C16/517 , C23C16/56 , H01L21/316
CPC分类号： H01L21/02164 , C23C16/0245 , C23C16/402 , C23C16/4405 , C23C16/482 , C23C16/488 , C23C16/517 , C23C16/56 , H01L21/0217 , H01L21/022 , H01L21/02211 , H01L21/02216 , H01L21/02274 , H01L21/02277 , H01L21/31608 , H01L21/31612 , Y10S148/017 , Y10S148/043 , Y10S148/045 , Y10S438/905
摘要： An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light source for photo CVD or a pair of electrode for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light or plasma evenly throughout the surfaces to be coated.
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公开(公告)号：US5369336A
公开(公告)日：1994-11-29
申请号：US9992
申请日：1993-01-27
IPC分类号： C23F4/00 , B29C59/14 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/46 , H01J7/24
CPC分类号： H01J37/32009 , B29C59/14 , H01J37/32082 , H01J37/32532 , H01J37/3266 , H01J37/32825 , H01L21/3065 , B29K2079/08 , H01J2237/334
摘要： A plasma generating device and a method for etching a minute region of a substrate under atmospheric pressure are disclosed. A gas containing helium as the main ingredient is glow discharged under atmospheric pressure, a halide is added to the discharge so as to activate the halogen element, and a solid material (substrate) such as silicon is chemically etched by using the radioals. At that time, a magnetic field acts on the discharge so as to draw out electrons and ions to the surface of the substrate, thereby increasing the radical density in the vicinity of the surface of the substrate and the etching rate.
摘要翻译： 公开了等离子体产生装置和在大气压下蚀刻基板的微小区域的方法。 含有氦气作为主要成分的气体在大气压下辉光放电，向放电物中加入卤化物以活化卤素元素，通过使用放射性物质化学蚀刻诸如硅的固体材料（衬底）。 此时，磁场作用于放电，以将电子和离子引出到衬底的表面，从而增加衬底表面附近的自由基密度和蚀刻速率。
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公开(公告)号：US5304407A
公开(公告)日：1994-04-19
申请号：US22759
申请日：1993-02-22
IPC分类号： C23C16/50 , C23C16/27 , C23C16/44 , C23C16/452 , C23C16/455 , B05D3/06
CPC分类号： C23C16/452 , C23C16/45519 , C23C16/45595
摘要： An apparatus for depositing a film at atmospheric pressure and a method used for this formation are offered. Radicals are produced inside a space in which an electric discharge is induced. This space is shrouded in a purge gas to isolate the space from the outside air, for preventing the radicals traveling to the surface of a substrate from being affected by the outside air. A magnetic field and a bias voltage are made to act on the produced plasma, so that the radicals can reach the substrate surface with greater ease. The arriving radicals promote the formation of the film on the surface of the substrate.
摘要翻译： 提供了一种用于在大气压下沉积膜的设备和用于该形成的方法。 在引起放电的空间内产生自由基。 该空间被覆盖在净化气体中以将空间与外部空气隔离，以防止移动到衬底表面的自由基受到外部空气的影响。 使磁场和偏置电压作用于所产生的等离子体，使得自由基更容易到达衬底表面。 到达的自由基促进膜在基材表面上的形成。
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公开(公告)号：US5230931A
公开(公告)日：1993-07-27
申请号：US725896
申请日：1991-07-01
IPC分类号： C23C16/26
CPC分类号： C23C16/26
摘要： Diamond films or I-Carbon films can be formed on a surface of an object by virtue of plasma-assisted chemical vapor deposition. The hardness of the films can be enhanced by applying a bias voltage to the object during deposition.
摘要翻译： 通过等离子体辅助化学气相沉积可以在物体的表面上形成金刚石膜或I-Carbon膜。 通过在沉积期间向对象施加偏置电压可以提高膜的硬度。
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公开(公告)号：US5221427A
公开(公告)日：1993-06-22
申请号：US813758
申请日：1991-12-30
IPC分类号： C23F4/00 , B29C59/14 , H01J37/32 , H01L21/302 , H01L21/3065 , H05H1/46
CPC分类号： H01J37/32009 , B29C59/14 , H01J37/32082 , H01J37/32532 , H01J37/3266 , H01J37/32825 , H01L21/3065 , B29K2079/08 , H01J2237/334
摘要： A plasma generating device and a method for etching a minute region of a substrate under atmospheric pressure are disclosed. A gas containing helium as the main ingredient is glow discharged under atmospheric pressure, a halide is added to the discharge so as to activate the halogen element, and a solid material (substrate) such as silicon is chemically etched by using the radicals. At that time, a magnetic field acts on the discharge so as to draw out electrons and ions to the surface of the substrate, thereby increasing the radical density in the vicinity of the surface of the substrate and the etching rate.
摘要翻译： 公开了等离子体产生装置和在大气压下蚀刻基板的微小区域的方法。 含有氦气作为主要成分的气体在大气压下辉光放电，向放电物中加入卤化物以活化卤素元素，并通过使用自由基化学蚀刻诸如硅的固体材料（衬底）。 此时，磁场作用于放电，以将电子和离子引出到衬底的表面，从而增加衬底表面附近的自由基密度和蚀刻速率。
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17.发明授权Cyclotron resonance chemical vapor deposition method of forming a halogen-containing diamond on a substrate 失效在衬底上形成含卤素金刚石的回旋共振化学气相沉积方法
公开(公告)号：US5145711A
公开(公告)日：1992-09-08
申请号：US481720
申请日：1990-02-16
IPC分类号： C23C16/26
CPC分类号： C23C16/26
摘要： Diamond films or i-carbon films can be formed on a surface by virtue of cyclotron resonance chemical vapor deposition. The characteristics such as transmissivity, conductivity and hardness of the films can be easily controlled by introducing a halogen into the films.
摘要翻译： 借助回旋加速器共振化学气相沉积可以在表面上形成金刚石膜或i-碳膜。 通过在膜中引入卤素可以容易地控制膜的透射率，导电性和硬度等特性。
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18.发明授权公开(公告)号：US07700164B2
公开(公告)日：2010-04-20
申请号：US10978461
申请日：2004-11-02
申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
发明人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
CPC分类号： C23C16/5096 , C23C16/26 , G11B5/72 , G11B5/74 , G11B5/78 , G11B5/82 , G11B5/8408 , G11B7/24056 , G11B11/10582 , G11B11/10584 , G11B11/10586 , Y10S430/146
摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
摘要翻译： 在用于制造碳涂层的装置中，诸如磁记录介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过轰击离子在物体的表面上制造涂层。
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公开(公告)号：US06299957B1
公开(公告)日：2001-10-09
申请号：US09396382
申请日：1999-09-15
申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
发明人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
IPC分类号： B32B302
摘要： In an apparatus for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions.
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公开(公告)号：US5932302A
公开(公告)日：1999-08-03
申请号：US909573
申请日：1997-08-13
申请人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
发明人： Shunpei Yamazaki , Kenji Itoh , Shigenori Hayashi
IPC分类号： G11B7/254 , C23C16/26 , C23C16/27 , C23C16/509 , C23C16/54 , G11B5/72 , G11B5/74 , G11B5/78 , G11B5/82 , G11B5/84 , G11B7/005 , G11B7/24 , G11B7/257 , G11B11/105 , B05D3/06 , B06B1/00
CPC分类号： C23C16/26 , C23C16/5096 , C23C16/545 , G11B11/10584 , G11B11/10586 , G11B5/72 , G11B5/74 , G11B5/78 , G11B5/82 , G11B5/8408 , G11B11/10582 , Y10S427/104 , Y10S428/90 , Y10S428/913 , Y10S430/146 , Y10T428/12729 , Y10T428/21
摘要： In a process for fabricating a carbon coating, an object such as a magnetic recording medium is disposed on a side of an electrode connected to a high-frequency power supply. Ultrasonic vibrations are supplied to the object. Discharge is generated between the electrode connected to the high-frequency power supply and a grounded electrode to fabricate a carbon coating on the surface of the object. Also, an electrode interval is set to 6 mm or less, pressure between the electrodes is set to 15 Torr to 100 Torr, whereby high-density plasma is generated to form an ion sheath on an anode side. Therefore, a coating is fabricated on the surface of the object by bombardment of ions and the coating contains pin-holes having a density of 30/mm.sup.2 or less.
摘要翻译： 在制造碳涂层的方法中，诸如磁记录介质的物体设置在连接到高频电源的电极的一侧。 向对象提供超声波振动。 在连接到高频电源的电极和接地电极之间产生放电，以在物体表面上制造碳涂层。 此外，将电极间隔设定为6mm以下，将电极间的压力设定为15Torr〜100Torr，由此产生高密度等离子体，以在阳极侧形成离子鞘。 因此，通过离子轰击在物体的表面上制造涂层，并且涂层含有密度为30 / mm 2或更小的针孔。
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