公开(公告)号：US07105814B2

公开(公告)日：2006-09-12

申请号：US10636626

申请日：2003-08-08

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28

Abstract: A probe-forming electron microscopy system 1 (SEM) is proposed which comprises a position-sensitive detector 15. As a result, position-dependent secondary electron intensities in the object plane 7 or angle-dependent secondary electron intensities in the object plane 7 may be observed.

Abstract translation: 提出了一种探针形成电子显微镜系统1（SEM），其包括位置敏感检测器15。 结果，可以观察到物平面7中的位置相关二次电子强度或物平面7中的角度依赖的二次电子强度。

公开(公告)号：US07084406B2

公开(公告)日：2006-08-01

申请号：US10294609

申请日：2002-11-15

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: G01K1/08

CPC classification number: H01J37/244

Abstract: A detector arrangement for detecting position information contained in a beam (5) of charged particles is provided, comprising a plurality of position-sensitive detectors (17), each for supplying an image containing the position information of a position-dependent distribution of intensity, integrated in terms of time, of charged particles impinging on a detection area (19) of the detector (17), a control system (47) configured to receive the image supplied by the detectors (17), and a deflector (3) configured to direct the beam (5) of charged particles to the detection area (19) of a first detector (17) selectable from the plurality of detectors (17), the deflector (3) being controllable by the control system (47) to select the detector (17) from the plurality of detectors (17) to which the beam (5) is to be directed.

Abstract translation: 提供一种用于检测包含在带电粒子束（5）中的位置信息的检测器装置，包括多个位置敏感检测器（17），每个位置敏感检测器用于提供包含强度位置相关分布的位置信息的图像， 在时间上集成了撞击在检测器（17）的检测区域（19）上的带电粒子，配置成接收由检测器（17）提供的图像的控制系统（47）和配置成 将带电粒子束（5）引导到可从多个检测器（17）中选择的第一检测器（17）的检测区域（19），偏转器（3）由控制系统（47）控制以选择 来自多个检测器（17）的检测器（17），梁（5）将被引导到该检测器。

公开(公告)号：US06903337B2

公开(公告)日：2005-06-07

申请号：US10185729

申请日：2002-07-01

Applicant: Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

Inventor： Oliver Kienzle ,  Dirk Stenkamp ,  Michael Steigerwald ,  Rainer Knippelmeyer ,  Max Haider ,  Heiko Müller ,  Stephan Uhlemann

IPC: G03F7/20 ,  H01J31/00 ,  H01J37/09 ,  H01J37/12 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J37/285

CPC classification number: H01J37/28 ,  H01J2237/082 ,  H01J2237/2446

Abstract: An examining system for imaging an object positionable in an object plane, includes an illumination device for supplying energy to a delimited field of the object such that charged particles emerge from locations of the field, the field being displaceable in the plane of the object, a first deflector for providing a variable deflection field for guiding charged particles emerging from locations of a selectable region of the object through a fixed, predetermined beam cross-section, and a position-sensitive detector disposed in the beam path such that the charged particles, after having passed through the first deflector, impinge on the position-sensitive detector, wherein particles emerging from different locations of the region are imaged on different locations of the position-sensitive detector which are allocated to the locations of emergence.

Abstract translation: 一种用于对物体平面中定位的物体进行成像的检查系统，包括用于向物体的界定场提供能量的照明装置，使得带电粒子从场的位置出现，该场可在物体的平面中移动， 第一偏转器，用于提供可变偏转场，用于引导通过固定的预定光束横截面从物体的可选择区域的位置出射的带电粒子，以及设置在光束路径中的位置敏感检测器，使得带电粒子在 已经穿过第一偏转器，撞击位置敏感检测器，其中从该区域的不同位置出现的颗粒被成像在位置敏感检测器的分配到出现位置的不同位置上。

公开(公告)号：US20130032729A1

公开(公告)日：2013-02-07

申请号：US13639491

申请日：2011-03-31

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: G01T1/00 ,  H01J3/18

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。

公开(公告)号：US08039813B2

公开(公告)日：2011-10-18

申请号：US11991546

申请日：2006-09-06

Applicant: Antonio Casares ,  Thomas Kemen ,  Rainer Knippelmeyer ,  Thomas Bayer ,  Georg Fritz ,  Johann Greschner ,  Samuel Kalt

Inventor： Antonio Casares ,  Thomas Kemen ,  Rainer Knippelmeyer ,  Thomas Bayer ,  Georg Fritz ,  Johann Greschner ,  Samuel Kalt

IPC: G21K5/02

CPC classification number: H01J37/04 ,  H01J37/045 ,  H01J37/09 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/04922 ,  H01J2237/04924 ,  H01J2237/04926 ,  H01J2237/15 ,  H01J2237/2446 ,  H01J2237/2448 ,  H01J2237/2561 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: The present invention relates to a particle-optical component comprising a first multi-aperture plate, and a second multi-aperture plate forming a gap between them; wherein a plurality of apertures of the first multi-aperture plate is arranged such that each aperture of the plurality of apertures of the first multi-aperture plate is aligned with a corresponding aperture of a plurality of apertures of the second multi-aperture plate; and wherein the gap has a first width at a first location and a second width at a second location and wherein the second width is by at least 5% greater than the first width. In addition, the present invention pertains to charged particle systems and arrangements comprising such components and methods of manufacturing multi aperture plates having a curved surface.

Abstract translation: 本发明涉及一种包括第一多孔板和在其间形成间隙的第二多孔板的颗粒光学部件; 其中所述第一多孔板的多个孔被布置成使得所述第一多孔板的所述多个孔中的每个孔与所述第二多孔板的多个孔的对应孔对齐; 并且其中所述间隙在第一位置处具有第一宽度，在第二位置处具有第二宽度，并且其中所述第二宽度比所述第一宽度大至少5％。 此外，本发明涉及包含这些部件的带电粒子系统和布置以及制造具有弯曲表面的多孔板的方法。

公开(公告)号：US20100181479A1

公开(公告)日：2010-07-22

申请号：US12459078

申请日：2009-06-25

Applicant: Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

Inventor： Rainer Knippelmeyer ,  Oliver Kienzle ,  Thomas Kemen ,  Heiko Mueller ,  Stephan Uhlemann ,  Maximilian Haider ,  Antonio Casares

IPC: H01J3/00 ,  H01J37/02 ,  H01J37/26 ,  H01J37/30

CPC classification number: H01J37/04 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/09 ,  H01J37/10 ,  H01J37/14 ,  H01J37/153 ,  H01J37/28 ,  H01J37/3007 ,  H01J37/3177 ,  H01J2237/0435 ,  H01J2237/0453 ,  H01J2237/047 ,  H01J2237/04735 ,  H01J2237/04756 ,  H01J2237/06 ,  H01J2237/14 ,  H01J2237/2817 ,  H01J2237/31774

Abstract: A particle-optical arrangement comprises a charged-particle source for generating a beam of charged particles; a multi-aperture plate arranged in a beam path of the beam of charged particles, wherein the multi-aperture plate has a plurality of apertures formed therein in a predetermined first array pattern, wherein a plurality of charged-particle beamlets is formed from the beam of charged particles downstream of the multi-aperture plate, and wherein a plurality of beam spots is formed in an image plane of the apparatus by the plurality of beamlets, the plurality of beam spots being arranged in a second array pattern; and a particle-optical to element for manipulating the beam of charged particles and/or the plurality of beamlets; wherein the first array pattern has a first pattern regularity in a first direction, and the second array pattern has a second pattern regularity in a second direction electron-optically corresponding to the first direction, and wherein the second regularity is higher than the first regularity.

Abstract translation: 粒子光学装置包括用于产生带电粒子束的带电粒子源; 布置在带电粒子束的光束路径中的多孔板，其中多孔板具有以预定的第一阵列图案形成在其中的多个孔，其中多个带电粒子子束由束形成 在多孔板下游的带电粒子，并且其中通过所述多个子束在所述装置的图像平面中形成多个束斑，所述多个束斑以第二阵列图案布置; 以及用于操纵带电粒子束和/或多个子束的粒子光学元件; 其中所述第一阵列图案在第一方向上具有第一图案规则性，并且所述第二阵列图案在与所述第一方向对应的电子 - 光学上的第二方向上具有第二图案规则性，并且其中所述第二规则性高于所述第一规则性。

公开(公告)号：US20090212240A1

公开(公告)日：2009-08-27

申请号：US12090632

申请日：2005-10-28

Applicant: Elmar Platzgummer ,  Rainer Knippelmeyer

Inventor： Elmar Platzgummer ,  Rainer Knippelmeyer

IPC: G21K5/10 ,  A61N5/00

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3023 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

Abstract translation: 带电粒子束曝光系统具有由移位寄存器（75）控制的孔组（53）的消隐孔阵列（31），其中移位寄存器的不同输入（C）影响不同数量的孔。 与移位寄存器的时钟信号同步地，穿过孔径的带电粒子子束跨过带电粒子敏感衬底扫描。

公开(公告)号：US20090159810A1

公开(公告)日：2009-06-25

申请号：US12095198

申请日：2006-11-28

Applicant: Rainer Knippelmeyer ,  Stefan Schubert

Inventor： Rainer Knippelmeyer ,  Stefan Schubert

IPC: H01J1/50

CPC classification number: H01J37/141 ,  H01J37/145 ,  H01J37/20 ,  H01J37/21 ,  H01J37/24 ,  H01J37/28 ,  H01J2237/002 ,  H01J2237/04922 ,  H01J2237/04926 ,  H01J2237/12 ,  H01J2237/1215 ,  H01J2237/14 ,  H01J2237/1405 ,  H01J2237/141 ,  H01J2237/1415 ,  H01J2237/2817

Abstract: An objective lens arrangement includes a first, second and third pole pieces, each being substantially rotationally symmetric. The first, second and third pole pieces are disposed on a same side of an object plane. An end of the first pole piece is separated from an end of the second pole piece to form a first gap, and an end of the third pole piece is separated from an end of the second pole piece to form a second gap. A first excitation coil generates a focusing magnetic field in the first gap, and a second excitation coil generates a compensating magnetic field in the second gap. First and second power supplies supply current to the first and second excitation coils, respectively. A magnetic flux generated in the second pole piece is oriented in a same direction as a magnetic flux generated in the second pole piece.

Abstract translation: 物镜配置包括第一，第二和第三极片，每个极片基本上是旋转对称的。 第一，第二和第三极片设置在物平面的同一侧。 第一极靴的端部与第二极靴的端部分离以形成第一间隙，并且第三极靴的端部与第二极靴的端部分离以形成第二间隙。 第一激励线圈在第一间隙中产生聚焦磁场，第二激励线圈在第二间隙中产生补偿磁场。 第一和第二电源分别向第一和第二励磁线圈提供电流。 在第二极靴中产生的磁通量在与第二极靴中产生的磁通量相同的方向上定向。

公开(公告)号：US06878936B2

公开(公告)日：2005-04-12

申请号：US10619690

申请日：2003-07-16

Applicant: Oliver Kienzle ,  Rainer Knippelmeyer

Inventor： Oliver Kienzle ,  Rainer Knippelmeyer

IPC: G03F7/20 ,  G01N23/00 ,  G01Q10/00 ,  G01Q30/02 ,  G02B21/06 ,  G21K1/08 ,  G21K7/00 ,  H01J29/70 ,  H01J37/04 ,  H01J37/12 ,  H01J37/14 ,  H01J37/141 ,  H01J37/145 ,  H01J37/147 ,  H01J37/244 ,  H01J37/26 ,  H01J37/28 ,  H01J37/30 ,  H01J37/305 ,  H01L21/027

CPC classification number: H01J37/141 ,  H01J37/12 ,  H01J37/14 ,  H01J2237/121 ,  H01J2237/28 ,  H01J2237/3175

Abstract: A particle-optical apparatus is proposed which comprises a particle-optical lens for deflecting a plurality of separate beam-charged particles which is provided by a plurality of finger electrodes provided along an opening of the lens.

Abstract translation: 提出了一种粒子光学装置，其包括用于偏转由沿着透镜的开口设置的多个指状电极提供的多个单独的束带电粒子的粒子光学透镜。

公开(公告)号：US09336981B2

公开(公告)日：2016-05-10

申请号：US13639491

申请日：2011-03-31

Applicant: Rainer Knippelmeyer

Inventor： Rainer Knippelmeyer

IPC: H01J37/09 ,  H01J37/244

CPC classification number: H01J37/244 ,  H01J37/09 ,  H01J2237/0437 ,  H01J2237/0453 ,  H01J2237/2446 ,  H01J2237/24592 ,  H01J2237/2817

Abstract: A charged particle detection system comprises plural detection elements and a multi-aperture plate in proximity of the detection elements. Charged particle beamlets can traverse the apertures of the multi-aperture plate to be incident on the detection elements. More than one multi-aperture plate can be provided to form a stack of multi-aperture plates in proximity of the detector. A suitable electric potential supplied to the multi-aperture plate can have an energy filtering property for the plural charged particle beamlets traversing the apertures of the plate.

Abstract translation: 带电粒子检测系统包括检测元件附近的多个检测元件和多孔板。 带电粒子子束可穿过多孔板的入射到检测元件上的孔。 可以提供多于一个的多孔板以在检测器附近形成多孔板的堆叠。 提供给多孔板的合适电位可以对穿过板的孔的多个带电粒子子束具有能量过滤特性。