Memory device
    11.
    发明授权

    公开(公告)号:US11450684B2

    公开(公告)日:2022-09-20

    申请号:US17007141

    申请日:2020-08-31

    摘要: A memory device includes a lower structure and a plurality of upper structures stacked on the lower structure. The lower structure includes a peripheral circuit, and an upper bonding pad disposed on a top surface of the lower structure. Each of the plurality of upper structures includes a bit line, a through via, and a lower bonding pad disposed on a bottom surface of the upper structures and connected to the through via. Each of upper structures, other than an uppermost upper structure, further includes an upper bonding pad disposed on a top surface thereof and connected to the through via. The bit line includes a gap separating a first portion of the bit line from a second portion thereof in the horizontal direction, and the through via overlaps the gap of the bit line in a plan view.

    SEMICONDUCTOR DEVICE AND DATA STORAGE SYSTEM INCLUDING THE SAME

    公开(公告)号:US20220157838A1

    公开(公告)日:2022-05-19

    申请号:US17467568

    申请日:2021-09-07

    摘要: A semiconductor device and a data storage system including the same, the semiconductor device including: a first structure including a peripheral circuit; and a second structure, including: a pattern structure; an upper insulating layer; a stack structure between the first structure and the pattern structure and including first and second stack portions spaced apart from each other, the first and second stack portions respectively including horizontal conductive layers and interlayer insulating layers alternately stacked; separation structures penetrating through the stack structure; memory vertical structures penetrating through the first stack portion; and a contact structure penetrating through the second stack portion, the pattern structure, and the upper insulating layer, wherein the contact structure includes a lower contact plug penetrating through at least the second stack portion and an upper contact plug contacting the lower contact plug and extending upwardly to penetrate through the pattern structure and the upper insulating layer.