公开(公告)号：US20100279508A1

公开(公告)日：2010-11-04

申请号：US12838147

申请日：2010-07-16

申请人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

发明人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

IPC分类号： H01L21/311

CPC分类号： H01L21/76831 ,  H01L21/02046 ,  H01L21/02052 ,  H01L21/02126 ,  H01L21/02129 ,  H01L21/02131 ,  H01L21/02164 ,  H01L21/0234 ,  H01L21/3105 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/312 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/31629 ,  H01L21/31633 ,  H01L21/76801 ,  H01L21/76807 ,  H01L21/76826

摘要： Method for reducing resist poisoning. The method includes the steps of forming a first structure in a dielectric on a substrate, reducing amine related contaminants from the dielectric and the substrate prior to a formation of a second structure on the substrate such that the amine related contaminates will not diffuse out from either the substrate or the dielectric, wherein the reducing utilizes a plasma treatment which one of chemically ties up the amine related contaminates and binds, traps, or consumes the amine related contaminates during subsequent processing steps, forming the second structure on the substrate, and after the forming of the first structure, preventing poisoning of a resist layer in subsequent processing by the reducing.

摘要翻译： 降低抗药性中毒的方法 该方法包括以下步骤：在衬底上的电介质中形成第一结构，在衬底上形成第二结构之前，从电介质和衬底中还原胺相关的污染物，使得胺相关的污染物不会从任一种 基底或电介质，其中所述还原利用等离子体处理，其中所述等离子体处理中的一种化学结合所述胺相关的污染并在随后的处理步骤期间结合，捕集或消耗胺相关污染物，在所述基底上形成所述第二结构， 形成第一结构，防止在随后的还原过程中中和抗蚀剂层。

公开(公告)号：US20070161290A1

公开(公告)日：2007-07-12

申请号：US11306668

申请日：2006-01-06

申请人： John Fitzsimmons ,  William Cote ,  Nancy Greco ,  Thomas Ivers ,  Steven Moskowitz

发明人： John Fitzsimmons ,  William Cote ,  Nancy Greco ,  Thomas Ivers ,  Steven Moskowitz

IPC分类号： H01R13/648

CPC分类号： H01L21/76826 ,  H01L21/76802 ,  H01L21/76807 ,  H01L21/76825 ,  Y10T29/49117 ,  Y10T29/49155 ,  Y10T29/49165

摘要： Methods for forming conductor contacts provide for etching through a capping layer located upon a conductor contact region within a substrate. A first pair of methods provide for etching through at least a lower thickness of the capping layer with other than a reactive ion etch to provide an exposed conductor contact region. A partially overlapping second pair of methods provides for converting at least an upper thickness of the capping layer to a converted material layer that is removed incident to providing an exposed conductor contact region. As adjunct to any of the methods, a liner layer is formed and located upon the exposed conductor contact region in absence of an undesirable reactive environment.

摘要翻译： 用于形成导体触点的方法提供了通过位于衬底内的导体接触区域上的覆盖层的蚀刻。 第一对方法提供用除了反应离子蚀刻之外的至少较薄厚度的覆盖层的蚀刻以提供暴露的导体接触区域。 部分重叠的第二对方法提供了将覆盖层的至少上部厚度转换成被去除的转换材料层，以提供暴露的导体接触区域。 作为任何方法的辅助，在没有不期望的反应性环境的情况下，形成衬里层并且位于暴露的导体接触区域上。

公开(公告)号：US07153776B2

公开(公告)日：2006-12-26

申请号：US10605926

申请日：2003-11-06

申请人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

发明人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

IPC分类号： H01L21/302

CPC分类号： H01L21/76831 ,  H01L21/02046 ,  H01L21/02052 ,  H01L21/02126 ,  H01L21/02129 ,  H01L21/02131 ,  H01L21/02164 ,  H01L21/0234 ,  H01L21/3105 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/312 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/31629 ,  H01L21/31633 ,  H01L21/76801 ,  H01L21/76807 ,  H01L21/76826

摘要： A method for reducing resist poisoning is provided. The method includes forming a first structure in a dielectric on a substrate and reducing amine related contaminants from the dielectric and the substrate created after the formation of the first structure. The method further includes forming a second structure in the dielectric. A first organic film may be formed on the substrate which is then heated and removed from the substrate to reduce the contaminant. Alternatively, a plasma treatment or cap may be provided. A second organic film is formed on the substrate and patterned to define a second structure in the dielectric.

摘要翻译： 提供了减少抗蚀剂中毒的方法。 该方法包括在基板上的电介质中形成第一结构，并且在形成第一结构之后，从电介质和基板上还原胺相关的污染物。 该方法还包括在电介质中形成第二结构。 可以在衬底上形成第一有机膜，然后将其从衬底加热并除去以减少污染物。 或者，可以提供等离子体处理或盖。 在基板上形成第二有机膜并图案化以在电介质中限定第二结构。

公开(公告)号：US20060116862A1

公开(公告)日：2006-06-01

申请号：US11001654

申请日：2004-12-01

申请人： Jill Carrier ,  Alwin Carus ,  William Cote ,  John Dowd ,  Kathryn Femina ,  Alan Frankel ,  Wensheng Han ,  Larissa Lapshina ,  Bernardo Rechea ,  Ana Santisteban ,  Amy Uhrbach

发明人： Jill Carrier ,  Alwin Carus ,  William Cote ,  John Dowd ,  Kathryn Femina ,  Alan Frankel ,  Wensheng Han ,  Larissa Lapshina ,  Bernardo Rechea ,  Ana Santisteban ,  Amy Uhrbach

IPC分类号： G06F17/20

CPC分类号： G06F17/277

摘要： The present invention pertains to a system and method for the tokenization of text. The featurizer may be configured to receive input text and convert the input text into tokens. According to one aspect of the invention, the tokens may include only one type of character, the characters selected from the group consisting of letters, numbers, and punctuation. The tokenizer may also include a classifier. The classifier may be configured to receive the tokens from the featurizer. Furthermore, the classifier may be configured to analyze the tokens received from the featurizer to determine if the tokens may be input into a predetermined classification model using a preclassifier. If one of the tokens passes the preclassifier, then the token is classified using the predetermined classification model. Additionally, according to a first aspect of the invention, the tokenizer may also include a finalizer. The finalizer may be configured to receive the tokens and may be configured to produce a final output.

摘要翻译： 本发明涉及用于文本的标记化的系统和方法。 特征化器可以被配置为接收输入文本并将输入文本转换成令牌。 根据本发明的一个方面，令牌可以仅包括一种类型的字符，从由字母，数字和标点符号组成的组中选择的字符。 标记器还可以包括分类器。 分类器可以被配置为从成色器接收令牌。 此外，分类器可以被配置为分析从特征化器接收的令牌以确定令牌是否可以使用预分类器输入到预定分类模型中。 如果其中一个令牌通过预分类器，则使用预定分类模型对令牌进行分类。 另外，根据本发明的第一方面，标记器还可以包括终结器。 终结器可以被配置为接收令牌，并且可以被配置为产生最终输出。

公开(公告)号：US06812193B2

公开(公告)日：2004-11-02

申请号：US10231047

申请日：2002-08-30

申请人： Michael Todd Brigham ,  Donald Francis Canaperi ,  Michael Addison Cobb ,  William Cote ,  Kenneth Morgan Davis ,  Scott Alan Estes ,  Edward Jack Gordon ,  James Willard Hannah ,  Mahadevaiyer Krishnan ,  Michael Francis Lofaro ,  Michael Joseph MacDonald ,  Dean Allen Schaffer ,  George James Slusser ,  James Anthony Tornello ,  Eric Jeffrey White

发明人： Michael Todd Brigham ,  Donald Francis Canaperi ,  Michael Addison Cobb ,  William Cote ,  Kenneth Morgan Davis ,  Scott Alan Estes ,  Edward Jack Gordon ,  James Willard Hannah ,  Mahadevaiyer Krishnan ,  Michael Francis Lofaro ,  Michael Joseph MacDonald ,  Dean Allen Schaffer ,  George James Slusser ,  James Anthony Tornello ,  Eric Jeffrey White

IPC分类号： C09K1300

CPC分类号： C11D3/046 ,  C11D7/34 ,  C11D11/0047 ,  H01L21/3212

摘要： Slurry compositions comprising an oxidizing agent, optionally a copper corrosion inhibitor, abrasive particles; surface active agent, a service of chloride and a source of sulfate ions.

摘要翻译： 包含氧化剂，任选的铜腐蚀抑制剂，磨料颗粒的浆料组合物; 表面活性剂，氯化物和硫酸根离子的使用。

公开(公告)号：US11588958B2

公开(公告)日：2023-02-21

申请号：US17493530

申请日：2021-10-04

申请人： Chen Chen ,  William Cote ,  Paul Ream

发明人： Chen Chen ,  William Cote ,  Paul Ream

IPC分类号： G03B11/04 ,  H04N5/225 ,  F27D21/02

摘要： A probe assembly for a process vessel for viewing the inside of the vessel, the probe assembly includes an elongated bracket, an elongated frame, an ICPC unit, and a camera unit. The elongated bracket has a front face and a rear face, the elongated bracket having an upper portion and a lower portion, the lower portion has a first aperture. The elongated frame has a proximal end and a distal end, the distal end of the elongated frame is coupled to the upper portion of the front face of the bracket. The ICPC unit includes a housing that has a front wall, a rear wall, and side wall extended between the front wall and the rear wall, the front wall has a second aperture, the rear wall has a third aperture. The ICPC unit further includes an actuator enclosed in the housing and an elongated tube operably coupled to the actuator, the tube extends through the second aperture and the first aperture away from the rear face of the bracket, the actuator configured to reciprocate the tube between an extended position and a retracted position. The camera unit includes a camera enclosure housing a camera, wherein the actuation member is configured to reciprocate the camera unit between the engage mode and stand-by mode, in the engage mode, the lens' hood is within the tube of the ICPC unit, and in the stand-by mode, the camera unit is away from the ICPC unit towards the proximal end of the elongated frame.

公开(公告)号：US08242544B2

公开(公告)日：2012-08-14

申请号：US11004845

申请日：2004-12-07

申请人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

发明人： Xiaomeng Chen ,  William Cote ,  Anthony K. Stamper ,  Arthur C. Winslow

IPC分类号： H01L21/70

CPC分类号： H01L21/76831 ,  H01L21/02046 ,  H01L21/02052 ,  H01L21/02126 ,  H01L21/02129 ,  H01L21/02131 ,  H01L21/02164 ,  H01L21/0234 ,  H01L21/3105 ,  H01L21/31111 ,  H01L21/31116 ,  H01L21/312 ,  H01L21/31612 ,  H01L21/31625 ,  H01L21/31629 ,  H01L21/31633 ,  H01L21/76801 ,  H01L21/76807 ,  H01L21/76826

摘要： A method for reducing resist poisoning is provided. The method includes forming a first structure in a dielectric on a substrate and reducing amine related contaminants from the dielectric and the substrate created after the formation of the first structure. The method further includes forming a second structure in the dielectric. A first organic film may be formed on the substrate which is then heated and removed from the substrate to reduce the contaminant. Alternatively, a plasma treatment or cap may be provided. A second organic film is formed on the substrate and patterned to define a second structure in the dielectric.

摘要翻译： 提供了减少抗蚀剂中毒的方法。 该方法包括在基板上的电介质中形成第一结构，并且在形成第一结构之后，从电介质和基板上还原胺相关的污染物。 该方法还包括在电介质中形成第二结构。 可以在衬底上形成第一有机膜，然后将其从衬底加热并除去以减少污染物。 或者，可以提供等离子体处理或盖。 在基板上形成第二有机膜并图案化以在电介质中限定第二结构。

公开(公告)号：US20100032829A1

公开(公告)日：2010-02-11

申请号：US12187646

申请日：2008-08-07

申请人： Felix P. Anderson ,  William Cote ,  Daniel C. Edelstein ,  Thomas L. McDevitt ,  Anthony K. Stamper

发明人： Felix P. Anderson ,  William Cote ,  Daniel C. Edelstein ,  Thomas L. McDevitt ,  Anthony K. Stamper

IPC分类号： H01L23/498 ,  H01L21/60

CPC分类号： H01L24/13 ,  H01L21/3105 ,  H01L21/76807 ,  H01L21/76814 ,  H01L21/76826 ,  H01L21/76831 ,  H01L23/53238 ,  H01L23/53295 ,  H01L24/11 ,  H01L24/45 ,  H01L24/48 ,  H01L24/85 ,  H01L2221/1036 ,  H01L2224/0401 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05647 ,  H01L2224/05666 ,  H01L2224/13022 ,  H01L2224/13027 ,  H01L2224/13099 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/45147 ,  H01L2224/48847 ,  H01L2924/00011 ,  H01L2924/01005 ,  H01L2924/01014 ,  H01L2924/01018 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01044 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/04953 ,  H01L2924/14 ,  H01L2924/19042 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/01006

摘要： Structures with improved solder bump connections and methods of fabricating such structures are provided herein. The structure includes a trench formed in a dielectric layer which has at least a portion thereof devoid of a fluorine boundary layer. The structure further includes a copper wire in the trench having at least a bottom portion thereof in contact with the non-fluoride boundary layer of the trench. A lead free solder bump is in electrical contact with the copper wire.

摘要翻译： 具有改善的焊料凸点连接的结构和制造这种结构的方法在本文中提供。 该结构包括在至少一部分没有氟边界层的电介质层中形成的沟槽。 该结构还包括在沟槽中的铜线，其至少其底部与沟槽的非氟化物边界层接触。 无铅焊料凸块与铜线电接触。

公开(公告)号：US20050207541A1

公开(公告)日：2005-09-22

申请号：US10951281

申请日：2004-09-27

申请人： William Cote

发明人： William Cote

IPC分类号： G10L15/26 ,  G11B20/10 ,  H04M11/04 ,  H04M11/10

CPC分类号： G11B20/10009 ,  G10L15/26 ,  G11B20/10527 ,  H04M11/10

摘要： A system and method is disclosed for detecting and repairing audio recordings that contain busy signals and extended periods of silence by searching for clusters of silence by reviewing the amplitude in an audio recording sample and listing each silence and sample time.

摘要翻译： 公开了一种系统和方法，用于通过检查音频记录样本中的幅度并列出每个静音和采样时间来检测和修复包含忙信号和延长的静音期的音频记录，通过搜索静音群集。

公开(公告)号：US20050192793A1

公开(公告)日：2005-09-01

申请号：US11069203

申请日：2005-02-28

申请人： William Cote ,  Jill Carrier

发明人： William Cote ,  Jill Carrier

IPC分类号： G06F17/28

CPC分类号： G10L13/08 ,  G10L15/187

摘要： A system and method for a speech recognition technology that allows language models to be customized through the addition of special pronunciations for components of phrases, which are added to the factory language models during customization. It allows components of a phrase to have different pronunciations inside customer-added phrases than are specified for those isolated components in the factory language models.

摘要翻译： 用于语音识别技术的系统和方法，其允许通过为定制期间添加到工厂语言模型的组件的特殊发音添加来定制语言模型。 它允许短语的组件在客户添加的短语内具有与为工厂语言模型中的隔离组件指定的发音不同的发音。