Abstract:
The invention concerns a method of forming a semiconductor layer having uniaxial stress including: forming, in a semiconductor structure having a stressed semiconductor layer, one or more first isolation trenches in a first direction for delimiting a first dimension of at least one transistor to be formed in said semiconductor structure; forming, in the semiconductor structure, one or more second isolation trenches in a second direction for delimiting a second dimension of the at least one transistor, the first and second isolation trenches being at least partially filled with an insulating material; and before or after the formation of the second isolation trenches, decreasing the viscosity of the insulating material in the first isolation trenches by implanting atoms of a first material into the first isolation trenches, wherein atoms of the first material are not implanted into the second isolation trenches.
Abstract:
An integrated modulator of the Mach-Zehnder type includes two optical arms containing waveguides with PN junctions and biasing circuits for reverse biasing the PN junctions in response to a control signal. The two optical arms are situated within a semiconductor substrate of a first element that also has an interconnection region. The biasing circuits are situated, in part, within a substrate of a second element that also contains an interconnection region. The first and second elements are rigidly attached to each other via their respective interconnection regions.
Abstract:
A back side illumination photodiode includes a light-receiving back side surface of a semiconductor material substrate. An area of the light-receiving back side surface includes a recess. The recess is filled with a material having an optical index that is lower than an optical index of the semiconductor material substrate. Both the substrate and the filling material are transparent to an operating wavelength of the photodiode. The recess may be formed to have a ring shape.
Abstract:
A semiconductor electro-optical phase shifter may include a substrate, an optical waveguide segment (12) formed on the substrate, and first and second zones of opposite conductivity types configured to form a first bipolar junction perpendicular to the substrate. The phase shifter may also include a dynamic control structure configured to reverse bias the first junction and a static control structure configured to direct a quiescent current in the second zone, parallel to the first junction.
Abstract:
A semiconductor electro-optical phase shifter may include an optical action zone configured to be inserted in an optical waveguide, and a bipolar transistor structure configured so that, in operation, collector current of the bipolar transistor structure crosses the optical action zone perpendicular to the axis of the optical waveguide.
Abstract:
A device includes a chip assembled on an interposer. An electrically-insulating layer coats an upper surface of the interposer around the chip. First metal lines run on the upper surface of the interposer and are arranged between conductive elements of connection to the chip. An end of each first metal line is arranged to extend beyond a projection of the chip on the interposer. A thermally-conductive via connects the end of the first metal line to a heat sink supported at an upper surface of the device.
Abstract:
A resistive ladder has first, second and third resistors coupled in series between first and second voltage terminals. A first node of the first resistor is coupled to the first voltage terminal and a first node of the third resistor is coupled to the second voltage terminal. A voltage selection unit has a first input coupled to a first node of the second resistor and a second input coupled to a second node of the second resistor and is adapted to selectively couple one of the first and second inputs to an output node of said resistive ladder. The resistive ladder also includes a first switch coupled between a second node of the third resistor and the second voltage terminal.
Abstract:
The present disclosure concerns a high frequency imager including a pixel matrix, each pixel including a high frequency oscillator, a transmission line positioned at a distance from an active surface of the imager smaller than the operating wavelength of the oscillator, a first end of the line being coupled to the oscillator, and a read circuit coupled to a second end of the line.
Abstract:
A chain of switches is connected between a first power supply line coupled to a first voltage and a second power supply line coupled to the sector. These switches are controllable by a control signal. The control signal is propagated from a first end of the first chain towards a second end of the first chain without control of the switches during this first propagation. The control signal is then propagated in the reverse direction from the second end towards the first end with a control of the switches during this second propagation starting from a group of at least one switch situated at the second end. There is a detection of the arrival of the control signal at the first end of the chain at the end of its propagation in the reverse direction.
Abstract:
A substrate of the silicon-on-insulator type is formed from an initial substrate of the silicon-on-insulator type having a semiconductor film on top of a buried insulating layer itself situated on top of a carrier substrate. A localized modification of a thickness of the semiconductor film is made so as to form a semiconductor film having different thicknesses in different regions.