公开(公告)号：US20220285140A1

公开(公告)日：2022-09-08

申请号：US17684903

申请日：2022-03-02

Applicant: Applied Materials, Inc.

Inventor： Marcus Blake Freitas ,  David Masayuki Ishikawa ,  Vijay D. Parkhe ,  Visweswaren Sivaramakrishnan

IPC: H01J37/32 ,  G01K11/32 ,  G01K1/14

Abstract: Apparatus and systems for temperature probe integration on pedestal heaters of a processing chamber including a cooling assembly for cooling temperature probes disposed within. Cooling assemblies can be actively water-cooled, passively cooled by fin stacks. Further cooling assemblies include a mechanical arm assembly for lowering or raising the temperature probes.

公开(公告)号：US11222809B2

公开(公告)日：2022-01-11

申请号：US16993069

申请日：2020-08-13

Applicant: Applied Materials, Inc.

Inventor： Joseph Yudovsky ,  Visweswaren Sivaramakrishnan ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen

IPC: H01L21/683 ,  G03F7/20 ,  H01L21/687

Abstract: Embodiments described herein relate to a substrate chucking apparatus having a plurality of cavities formed therein. The cavities are formed in a body of the chucking apparatus. In one embodiment, a first plurality of ports are formed in a chucking surface of the body and extend to a bottom surface of the body. In another embodiment, a second plurality of ports are formed in a bottom surface of the plurality of cavities and extend through the body to a bottom surface of the body.

公开(公告)号：US11180851B2

公开(公告)日：2021-11-23

申请号：US16438382

申请日：2019-06-11

Applicant: Applied Materials, Inc.

Inventor： Colin C. Neikirk ,  Pravin K. Narwankar ,  Kaushal Gangakhedkar ,  Visweswaren Sivaramakrishnan ,  Jonathan Frankel ,  David Masayuki Ishikawa ,  Quoc Truong ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated and coupled to the motors, a controller configured to cause the motors to rotate the chamber in a first direction about an axial axis at a rotation speed sufficient to force the particles to be centrifuged against an inner diameter of the chamber, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

公开(公告)号：US11180849B2

公开(公告)日：2021-11-23

申请号：US16546170

申请日：2019-08-20

Applicant: Applied Materials, Inc.

Inventor： Subramanya P. Herle ,  Vicente M. Lim ,  Basavaraj Pattanshetty ,  Ajay More ,  Marco Mohr ,  Bjoern Sticksel-Weis ,  Nilesh Chimanrao Bagul ,  Visweswaren Sivaramakrishnan

IPC: C23C16/455 ,  C23C16/448 ,  C23C14/24 ,  C23C16/50 ,  C23C14/08

Abstract: An apparatus for direct liquid injection (DLI) of chemical precursors into a processing chamber is provided. The apparatus includes a vaporizer assembly having an injection valve for receiving a liquid reactant, vaporizing the liquid reactant, and delivering the vaporized liquid reactant. The injection valve includes a valve body encompassing an interior region therein, a gas inlet port, a liquid inlet port, and a vapor outlet port all in fluid communication with the interior region. The vaporizer assembly further includes a first inlet line having a first end fluidly coupled with the liquid inlet port and a second end to be connected to a liquid source. The vaporizer assembly further includes a second inlet line with a first end fluidly coupled with the gas inlet port, a second end fluidly coupled with a carrier gas source, and a heater positioned between the first end and the second end.

公开(公告)号：US11174552B2

公开(公告)日：2021-11-16

申请号：US16438371

申请日：2019-06-11

Applicant: Applied Materials, Inc.

Inventor： Colin C. Neikirk ,  Pravin K. Narwankar ,  Kaushal Gangakhedkar ,  Visweswaren Sivaramakrishnan ,  Jonathan Frankel ,  David Masayuki Ishikawa ,  Quoc Truong ,  Joseph Yudovsky

IPC: C23C16/455 ,  C23C16/44 ,  C23C16/442

Abstract: A reactor for coating particles includes one or more motors, a rotary vacuum chamber configured to hold particles to be coated, wherein the rotary vacuum chamber is coupled to the motors, a controller configured to cause the motors to rotate the rotary vacuum chamber about an axial axis of the rotary vacuum chamber such that the particles undergo tumbling agitation, a vacuum port to exhaust gas from the rotary vacuum chamber, a paddle assembly including a rotatable drive shaft extending through the rotary vacuum chamber and coupled to the motors and at least one paddle extending radially from the drive shaft, such that rotation of the drive shaft by the motors orbits the paddle about the drive shaft in a second direction, and a chemical delivery system including a gas outlet on the paddle configured inject process gas into the particles.

公开(公告)号：US12201025B2

公开(公告)日：2025-01-14

申请号：US17967556

申请日：2022-10-17

Applicant: Applied Materials, Inc.

Inventor： Abhijeet Laxman Sangle ,  Vijay Bhan Sharma ,  Ankur Kadam ,  Bharatwaj Ramakrishnan ,  Visweswaren Sivaramakrishnan ,  Yuan Xue

IPC: C23C14/34 ,  C23C14/06 ,  C23C14/35 ,  C23C14/54 ,  H10N30/00 ,  H10N30/076 ,  H10N30/079 ,  H10N30/853 ,  H10N30/87

Abstract: A physical vapor deposition system includes a deposition chamber, a support to hold a substrate in the deposition chamber, a target in the chamber, a power supply configured to apply power to the target to generate a plasma in the chamber to sputter material from the target onto the substrate to form a piezoelectric layer on the substrate, and a controller configured to cause the power supply to alternate between deposition phases in which the power supply applies power to the target and cooling phases in which power supply does not apply power to the target. Each deposition phase lasts at least 30 seconds and each cooling phase lasts at least 30 seconds.

公开(公告)号：US11807008B2

公开(公告)日：2023-11-07

申请号：US17647780

申请日：2022-01-12

Applicant: Applied Materials, Inc.

Inventor： Daihua Zhang ,  Kang Luo ,  Kazuya Daito ,  Kenneth S. Ledford ,  Elsa Massonneau ,  Alexey Stepanov ,  Ludovic Godet ,  Mahendran Chidambaram ,  Visweswaren Sivaramakrishnan ,  Bahubali S. Upadhye ,  Hemantha Raju

IPC: B41J2/165

CPC classification number: B41J2/1652 ,  B41J2/16547

Abstract: Embodiments described herein relate to an inkjet service station and methods of servicing an inkjet printer with the inkjet service station. The inkjet service station is disposed in an inkjet printer of an inkjet chamber. The inkjet service station is operable to perform servicing operations on a processing apparatus of the inkjet printer. The servicing operations include at least one of printhead spitting, printhead purging, printhead flushing, printhead cleaning, printhead drying, or vacuum suction.

公开(公告)号：US20230032638A1

公开(公告)日：2023-02-02

申请号：US17967556

申请日：2022-10-17

Applicant: Applied Materials, Inc.

Inventor： Abhijeet Laxman Sangle ,  Vijay Bhan Sharma ,  Ankur Kadam ,  Bharatwaj Ramakrishnan ,  Visweswaren Sivaramakrishnan ,  Yuan Xue

IPC: H01L41/319 ,  C23C14/54 ,  C23C14/06 ,  H01L41/08 ,  C23C14/35 ,  H01L41/187 ,  H01L41/047 ,  H01L41/316

Abstract: A physical vapor deposition system includes a deposition chamber, a support to hold a substrate in the deposition chamber, a target in the chamber, a power supply configured to apply power to the target to generate a plasma in the chamber to sputter material from the target onto the substrate to form a piezoelectric layer on the substrate, and a controller configured to cause the power supply to alternate between deposition phases in which the power supply applies power to the target and cooling phases in which power supply does not apply power to the target. Each deposition phase lasts at least 30 seconds and each cooling phase lasts at least 30 seconds.

公开(公告)号：US11557987B2

公开(公告)日：2023-01-17

申请号：US17455312

申请日：2021-11-17

Applicant: Applied Materials, Inc.

Inventor： Wayne McMillan ,  Visweswaren Sivaramakrishnan ,  Joseph C. Olson ,  Ludovic Godet ,  Rutger Meyer Timmerman Thijssen ,  Naamah Argaman

IPC: H02N13/00 ,  C23F1/00 ,  G02B6/34 ,  H01L21/683 ,  C23C16/453 ,  H05H1/24 ,  H01L21/265

Abstract: Embodiments of the present disclosure generally relate to substrate support assemblies for retaining a surface of a substrate having one or more devices disposed on the surface without contacting the one or more devices and deforming the substrate, and a system having the same. In one embodiment, the substrate support assembly includes an edge ring coupled to a body of the substrate support assembly. A controller is coupled to actuated mechanisms of a plurality of pixels coupled to the body of the substrate support assembly such that portions of pixels corresponding to a portion of the surface of a substrate to be retained are positioned to support the portion without contacting one or more devices disposed on the surface of the substrate to be retained on the support surface.

公开(公告)号：US11518100B2

公开(公告)日：2022-12-06

申请号：US17256628

申请日：2019-05-09

Applicant: APPLIED MATERIALS, INC.

Inventor： Wei-Sheng Lei ,  Mahendran Chidambaram ,  Visweswaren Sivaramakrishnan ,  Kashif Maqsood

IPC: B29C67/00 ,  B29C64/268 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  B23K26/082 ,  B23K26/342 ,  B23K26/70 ,  B29C64/153 ,  B29C64/393 ,  B22F12/49 ,  B22F12/41 ,  B22F10/28 ,  B22F10/366 ,  B23K26/06 ,  B28B1/00 ,  B28B17/00

Abstract: An additive manufacturing apparatus includes a platform, a dispenser configured to deliver a plurality of successive layers of feed material onto the platform, at least one light source configured to generate a first light beam and a second light beam, a polygon mirror scanner, an actuator, and a galvo mirror scanner. The polygon mirror scanner is configured to receive the first light beam and reflect the first light beam towards the platform. Rotation of the first polygon mirror causes the light beam to move in a first direction along a path on a layer of feed material on the platform. The actuator is configured to cause the path to move along a second direction at a non-zero angle relative to the first direction. The galvo mirror scanner system is configured to receive the second light beam and reflect the second light beam toward the platform.