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198 条记录 (耗时 0.042 秒)

    Methods utilizing scanning probe microscope tips and products thereof or produced thereby
    21.
    发明授权
    Methods utilizing scanning probe microscope tips and products thereof or produced thereby 有权
    使用扫描探针显微镜尖端及其产品或由其制造的方法

    公开(公告)号：US08187673B2

    公开(公告)日：2012-05-29

    申请号：US11933251

    申请日：2007-10-31

    申请人： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

    发明人： Chad A. Mirkin ,  Richard Piner ,  Seunghun Hong

    IPC分类号： B05D3/00

    CPC分类号： B82B3/00 ,  B05D1/007 ,  B05D1/185 ,  B05D1/26 ,  G01Q80/00 ,  G03F7/0002 ,  G03F7/165 ,  Y10S977/849 ,  Y10S977/853 ,  Y10S977/854 ,  Y10S977/855 ,  Y10S977/856 ,  Y10S977/857 ,  Y10S977/86 ,  Y10S977/88 ,  Y10S977/884 ,  Y10S977/885 ,  Y10S977/886 ,  Y10S977/895 ,  Y10T428/24802

    摘要： The invention provides a lithographic method referred to as “dip pen” nanolithography (DPN). DPN utilizes a scanning probe microscope (SPM) tip (e.g., an atomic force microscope (AFM) tip) as a “pen,” a solid-state substrate (e.g., gold) as “paper,” and molecules with a chemical affinity for the solid-state substrate as “ink.” Capillary transport of molecules from the SPM tip to the solid substrate is used in DPN to directly write patterns consisting of a relatively small collection of molecules in submicrometer dimensions, making DPN useful in the fabrication of a variety of microscale and nanoscale devices. The invention also provides substrates patterned by DPN, including submicrometer combinatorial arrays, and kits, devices and software for performing DPN. The invention further provides a method of performing AFM imaging in air. The method comprises coating an AFM tip with a hydrophobic compound, the hydrophobic compound being selected so that AFM imaging performed using the coated AFM tip is improved compared to AFM imaging performed using an uncoated AFM tip. Finally, the invention provides AFM tips coated with the hydrophobic compounds.

    摘要翻译： 本发明提供了称为“浸笔”纳米光刻（DPN）的光刻方法。 DPN使用扫描探针显微镜（SPM）尖端（例如，原子力显微镜（AFM）尖端）作为“笔”，固态基底（例如，金）作为“纸”，并且具有化学亲和力的分子 固体底物作为“墨水”。DPN中使用分子从SPM尖端到固体基质的毛细管转运，以直接写入由亚微米尺寸的相对小的分子集合组成的图案，使得DPN可用于制造 各种微米级和纳米级器件。 本发明还提供由DPN图案化的衬底，包括亚微米组合阵列，以及用于执行DPN的试剂盒，装置和软件。 本发明还提供了一种在空气中进行AFM成像的方法。 该方法包括用疏水性化合物涂覆AFM尖端，选择疏水性化合物，使得与使用未涂覆的AFM尖端进行的AFM成像相比，使用涂覆的AFM尖端进行的AFM成像得到改善。 最后，本发明提供涂覆有疏水化合物的AFM尖端。

    Beam Pen Lithography
    22.
    发明申请
    Beam Pen Lithography 有权
    光笔平版印刷

    公开(公告)号：US20110305996A1

    公开(公告)日：2011-12-15

    申请号：US13202142

    申请日：2010-02-18

    申请人： Chad A. Mirkin ,  Gengfeng Zheng ,  Fengwei Huo

    发明人： Chad A. Mirkin ,  Gengfeng Zheng ,  Fengwei Huo

    IPC分类号： G03F7/20 ,  B05D3/12 ,  G03F7/26 ,  G01N21/01 ,  G01Q70/06

    CPC分类号： G03F7/2051 ,  G03F7/70291 ,  G03F7/70383 ,  G03F7/70466 ,  G03F7/70525 ,  G03F7/70958

    摘要： The disclosure relates to methods of beam pen lithography using a tip array having a plurality of transparent, elastomeric, reversibly-deformable tips coated with a blocking layer and apertures defined in the blocking layer to expose tip ends of the tips in the array. The tip array can be used to perform a photolithography process in which the tips are illuminated with a radiation that is channeled through the tips and out the apertures to expose a photosensitive substrate. Also disclosed are tip arrays formed of polymers and gels, apparatus including the tip arrays and radiation sources, and related apparatus for selectively masking tips in the tip array from radiation emitted from the radiation source.

    摘要翻译： 本公开涉及使用具有多个透明，弹性，可逆变形的尖端的尖端阵列的光笔笔光刻方法，所述尖端涂覆有阻挡层和限定在阻挡层中的孔，以暴露阵列中尖端的尖端。 尖端阵列可以用于执行光刻工艺，其中尖端被通过尖端引导的辐射照射并且出射孔以暴露感光基底。 还公开了由聚合物和凝胶形成的尖端阵列，包括尖端阵列和辐射源的装置以及用于从辐射源发射的辐射中选择性地遮蔽尖端阵列中的尖端的相关装置。

    Electrochemical miniaturization of organic micro-and nanostructures
    29.
    发明授权
    Electrochemical miniaturization of organic micro-and nanostructures 失效
    有机微纳米结构的电化学微型化

    公开(公告)号：US07611619B2

    公开(公告)日：2009-11-03

    申请号：US10520554

    申请日：2003-07-07

    申请人： Chad A. Mirkin ,  Yi Zhang ,  Khalid Salaita

    发明人： Chad A. Mirkin ,  Yi Zhang ,  Khalid Salaita

    IPC分类号： C25F3/00 ,  C25F1/00 ,  C23C22/82

    CPC分类号： C40B60/14 ,  B01J2219/00387 ,  B01J2219/00436 ,  B01J2219/00605 ,  B01J2219/00612 ,  B01J2219/0063 ,  B01J2219/00637 ,  B01L3/5027 ,  B81C1/00111 ,  B81C1/00714 ,  B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  C25F1/00 ,  C40B40/04 ,  G03F7/0002 ,  H01L51/0006 ,  H01L51/0017

    摘要： The invention provides a simple and convenient strategy for reducing the dimensions of organic micro- and nanostructures on metal surfaces. By varying electrochemical desorption conditions, organic structures patterned by Dip-Pen Nanolithography or any of the micro-contact printing procedures can be gradually desorbed in a controlled fashion. The electrochemical desorption is initiated at the exterior of the feature and moves inward as a function of time. The desorption process and adsorbate desorption are modified and controlled as a function of substrate morphology, adsorbate head and tail groups, and electrolyte solvent and salt. Different nanostructures made of different adsorbates can be miniaturized based upon judicious selection of adsorbate and supporting electrolyte.

    摘要翻译： 本发明提供了一种用于减少金属表面上的有机微结构和纳米结构的尺寸的简单和方便的策略。 通过改变电化学解吸条件，通过Dip-Pen Nanoithography或任何微接触印刷方法图案化的有机结构可以以受控的方式逐渐解吸。 电化学解吸在特征的外部开始，并随着时间的推移向内移动。 解吸过程和吸附物解吸被修饰和控制作为底物形态，吸附头和尾基团以及电解质溶剂和盐的函数。 基于对被吸附物和支持电解质的明智选择，可以使由不同吸附物制成的不同纳米结构小型化。