公开(公告)号：US20150194781A1

公开(公告)日：2015-07-09

申请号：US14663086

申请日：2015-03-19

Applicant: Gigaphoton Inc.

Inventor： Takeshi ASAYAMA ,  Hakaru MIZOGUCHI ,  Kouji KAKIZAKI ,  Hiroaki TSUSHIMA ,  Osamu WAKABAYASHI ,  Kazuya TAKEZAWA

IPC: H01S3/038 ,  H01S3/08 ,  H01S3/104 ,  H01S3/225 ,  H01S3/034

CPC classification number: H01S3/038 ,  H01S3/03 ,  H01S3/034 ,  H01S3/036 ,  H01S3/0388 ,  H01S3/08009 ,  H01S3/09702 ,  H01S3/104 ,  H01S3/134 ,  H01S3/225 ,  H01S3/2251 ,  H01S3/2256

Abstract: A laser apparatus according to embodiments may include a laser chamber including a laser gain medium; a power source; a first electrode to which a voltage is applied from the power source and a second electrode that is grounded, the first and second electrodes being disposed in the laser chamber; and a connector connected to the power source, and supporting the first electrode in a way that allows the first electrode to move toward a side where the second electrode is disposed.

Abstract translation: 根据实施例的激光装置可以包括包括激光增益介质的激光室; 电源; 从电源施加电压的第一电极和接地的第二电极，第一和第二电极设置在激光室中; 以及连接到所述电源的连接器，并且以允许所述第一电极向所述第二电极设置的一侧移动的方式支撑所述第一电极。

公开(公告)号：US20140374605A1

公开(公告)日：2014-12-25

申请号：US14485355

申请日：2014-09-12

Applicant: GIGAPHOTON INC.

Inventor： Hakaru MIZOGUCHI ,  Takashi SUGANUMA ,  Hideo HOSHINO ,  Osamu WAKABAYASHI

IPC: H01S3/00 ,  H01S3/13

CPC classification number: H01S3/0071 ,  H01S3/0014 ,  H01S3/10061 ,  H01S3/1305 ,  H05G2/008

Abstract: An optical device may include: an optical module disposed in a beam delivery path of a laser beam; a beam adjusting unit disposed in the beam delivery path for adjusting the beam delivery path of the laser beam; a measuring unit disposed in the beam delivery path for detecting the beam delivery path; and a control unit for controlling the beam adjusting unit based on a detection result of the beam delivery path of the laser beam detected by the measuring unit.

Abstract translation: 光学装置可以包括：设置在激光束的光束输送路径中的光学模块; 设置在所述光束传送路径中用于调节所述激光束的光束传送路径的光束调节单元; 设置在所述光束传送路径中用于检测所述光束传送路径的测量单元; 以及控制单元，用于基于由测量单元检测到的激光束的光束传递路径的检测结果来控制光束调节单元。

公开(公告)号：US20140328364A1

公开(公告)日：2014-11-06

申请号：US14336023

申请日：2014-07-21

Applicant: GIGAPHOTON INC. ,  KOMATSU LTD. ,  USHIO DENKI KABUSHIKI KAISHA

Inventor： Junichi FUJIMOTO ,  Hakaru MIZOGUCHI ,  Tatsuo ENAMI

IPC: H01S3/23

CPC classification number: H01S3/2308 ,  H01S3/0014 ,  H01S3/03 ,  H01S3/10092 ,  H01S3/225 ,  Y10T29/49718 ,  Y10T29/49721 ,  Y10T29/4973 ,  Y10T29/49826

Abstract: When a chamber of an oscillator and one or more amplifiers is to be replaced at the timing when a predetermined period elapses, one of the chambers of the oscillator and the amplifiers having a low allowable deterioration limit is detached and this chamber is attached in place of one of the chambers of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. Thus, the chamber which has been used in one of the oscillator and amplifiers having a low allowable deterioration limit and has not reached the limit of deterioration is reused in one of the oscillator and the amplifiers other than the one having the low allowable deterioration limit. This enables efficient use of oscillator and amplifier chambers in a multistage amplification laser apparatus, minimizing the labor and parts consumed for replacement thereof.

Abstract translation: 当在预定时间段的时间内要更换振荡器和一个或多个放大器的腔室时，分离振荡器的腔室和具有低容许劣化极限的放大器之一，并且该腔室被附接以代替 振荡器的一个腔室以及具有低容许劣化极限的放大器之外的放大器。 因此，在具有低容许劣化极限且尚未达到劣化极限的振荡器和放大器之一中使用的腔室在具有低容许劣化极限的振荡器和放大器之外的其中之一中被重新使用。 这使得能够在多级放大激光装置中有效地使用振荡器和放大器腔室，从而最小化用于更换它们的人工和消耗的部件。

公开(公告)号：US20130228709A1

公开(公告)日：2013-09-05

申请号：US13689393

申请日：2012-11-29

Applicant: GIGAPHOTON INC.

Inventor： Hiroshi UMEDA ,  Hakaru MIZOGUCHI

IPC: H01J43/00

CPC classification number: H01J43/00 ,  G03F7/0002 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

Abstract: A target supply device includes a reservoir for storing a liquid target material, a first electrode electrically connected to the liquid target material stored in the reservoir, a nozzle having a through-hole through which the liquid target material stored in the reservoir is discharged, a first power supply for applying a first potential to the first electrode, a circuit electrically connected to the first electrode and configured to suppress a potential variation of the first electrode, a second electrode provided to face the through-hole in the nozzle, and a second power supply for applying a second potential that is different from the first potential to the second electrode.

Abstract translation: 目标供应装置包括用于储存液体目标材料的储存器，与存储在储存器中的液体目标材料电连接的第一电极，具有通过储存在储存器中的液体目标材料排出的通孔的喷嘴， 用于向第一电极施加第一电位的第一电源，电连接到第一电极并被配置为抑制第一电极的电位变化的电路，设置成面对喷嘴中的通孔的第二电极，以及第二电极 用于向第二电极施加不同于第一电位的第二电位的电源。

公开(公告)号：US20130228695A1

公开(公告)日：2013-09-05

申请号：US13769166

申请日：2013-02-15

Applicant: GIGAPHOTON INC.

Inventor： Hakaru MIZOGUCHI ,  Osamu WAKABAYASHI

IPC: G02B5/08

CPC classification number: G02B5/0891 ,  G02B19/0023 ,  G02B19/0095 ,  G03F7/70033 ,  G03F7/70166 ,  G03F7/70175 ,  G21K1/067 ,  H05G2/003 ,  H05G2/006 ,  H05G2/008

Abstract: A device for collecting EUV light from a plasma generation region includes first and second EUV collector mirrors. The first EUV collector mirror has a first spheroidal reflective surface and arranged such that a first focus of the first spheroidal reflective surface lies in the plasma generation region and a second focus of the first spheroidal reflective surface lies in a predetermined intermediate focus region. The second EUV collector mirror has a second spheroidal reflective surface and arranged such that a third focus of the second spheroidal reflective surface lies in the plasma generation region and a fourth focus of the second spheroidal reflective surface lies in the predetermined intermediate focus region.

Abstract translation: 用于从等离子体产生区收集EUV光的装置包括第一和第二EUV收集器反射镜。 第一EUV收集镜具有第一球状反射表面，并且被布置成使得第一球状反射表面的第一焦点位于等离子体产生区域中，并且第一球状反射表面的第二焦点位于预定的中间聚焦区域中。 第二EUV收集镜具有第二球形反射表面，并且被布置为使得第二球状反射表面的第三焦点位于等离子体产生区域中，并且第二球状反射表面的第四焦点位于预定的中间聚焦区域中。

公开(公告)号：US20130148677A1

公开(公告)日：2013-06-13

申请号：US13759970

申请日：2013-02-05

Applicant: Gigaphoton Inc.

Inventor： Masato MORIYA ,  Hideo HOSHINO ,  Osamu WAKABAYASHI ,  Hakaru MIZOGUCHI

IPC: H01S3/10

CPC classification number: H01S3/10 ,  H01S3/005 ,  H01S3/0064 ,  H01S3/034 ,  H01S3/1061 ,  H01S3/1307 ,  H01S3/136 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

Abstract: An EUV light source device properly compensates the wave front of laser beam which is changed by heat. A wave front compensator and a sensor are provided in an amplification system which amplifies laser beam. The sensor detects and outputs changes in the angle (direction) of laser beam and the curvature of the wave front thereof. A wave front compensation controller outputs a signal to the wave front compensator based on the measurement results from the sensor. The wave front compensator corrects the wave front of the laser beam to a predetermined wave front according to an instruction from the wave front compensation controller.

Abstract translation: EUV光源装置适当地补偿由热量改变的激光束的波前。 在放大激光束的放大系统中提供波前补偿器和传感器。 传感器检测并输出激光束的角度（方向）和其波前的曲率的变化。 波前补偿控制器根据传感器的测量结果向波前补偿器输出信号。 波前补偿器根据波前补偿控制器的指令将激光束的波前校正到预定的波前。