Porous material formation by chemical vapor deposition onto colloidal crystal templates
    21.
    发明授权
    Porous material formation by chemical vapor deposition onto colloidal crystal templates 失效
    通过化学气相沉积在胶体晶体模板上形成多孔材料

    公开(公告)号:US07112615B2

    公开(公告)日:2006-09-26

    申请号:US10624959

    申请日:2003-07-22

    IPC分类号: C08J9/26

    摘要: Methods and systems are disclosed for fabricating ultra-low dielectric constant porous materials. In one aspect of the invention, a method for making porous low-k films is disclosed. The method uses polymer based porogens as sacrificial templates around which a chemical vapor deposition (CVD) or plasma enhanced chemical vapor deposition (PECVD) deposited matrix is formed. Upon pyrolysis, the porogens decompose resulting in a porous ultra-low dielectric material. This method can be used, for example, to produce porous organosilicate glass (OSG) materials, ultra-low dielectric nanoporous materials, porous ceramics, porous scaffolds, and/or porous metals. Various uses and embodiments of the methods and systems of this invention are disclosed.

    摘要翻译: 公开了用于制造超低介电常数多孔材料的方法和系统。 在本发明的一个方面,公开了一种制造多孔低k膜的方法。 该方法使用基于聚合物的致孔剂作为牺牲模板,在其周围形成化学气相沉积(CVD)或等离子体增强化学气相沉积(PECVD)沉积基质。 热解后,致孔剂分解,产生多孔超低介电材料。 该方法可用于例如生产多孔有机硅酸盐玻璃(OSG)材料,超低介电纳米多孔材料,多孔陶瓷,多孔支架和/或多孔金属。 公开了本发明的方法和系统的各种用途和实施例。

    Solventless, resistless direct dielectric patterning
    22.
    发明授权
    Solventless, resistless direct dielectric patterning 有权
    无溶剂,无阻抗的直接电介质图案化

    公开(公告)号:US06509138B2

    公开(公告)日:2003-01-21

    申请号:US09482193

    申请日:2000-01-12

    IPC分类号: G03F726

    CPC分类号: G03F7/32 G03F7/167 G03F7/36

    摘要: Processes for patterning radiation sensitive layers are disclosed. In one embodiment, the process includes depositing a radiation sensitive material on a substrate by chemical vapor deposition. The radiation sensitive material is exposed to radiation to form a pattern and the pattern is developed using a supercritical fluid (SCF).

    摘要翻译: 公开了用于图案化辐射敏感层的方法。 在一个实施例中,该方法包括通过化学气相沉积将辐射敏感材料沉积在基底上。 将辐射敏感材料暴露于辐射以形成图案,并且使用超临界流体(SCF)显影图案。

    Single-unit reactor design for combined oxidative, initiated, and plasma-enhanced chemical vapor deposition

    公开(公告)号:US09957618B2

    公开(公告)日:2018-05-01

    申请号:US13407075

    申请日:2012-02-28

    IPC分类号: C23C16/00 C23C16/509

    CPC分类号: C23C16/509

    摘要: Described herein are reactors capable of sequentially or simultaneously depositing thin-film polymers onto a substrate by oxidative chemical vapor deposition (oCVD), initiated chemical vapor deposition (iCVD), and plasma-enhanced chemical vapor deposition (PECVD). The single-unit CVD reactors allow for the use of more than one CVD process on the same substrate without the risk of inadvertently exposing the substrate to ambient conditions when switching processes. Furthermore, the ability to deposit simultaneously polymers made by two different CVD processes allows for the exploration of new materials. In addition to assisting in the deposition of polymer films, plasma processes may be used to pretreat substrate surfaces before polymer deposition, or to clean the internal surfaces of the reactor between experiments.

    Initiated chemical vapor deposition of vinyl polymers for the encapsulation of particles
    25.
    发明授权
    Initiated chemical vapor deposition of vinyl polymers for the encapsulation of particles 有权
    乙烯基聚合物的起始化学气相沉积用于颗粒的包封

    公开(公告)号:US09492805B2

    公开(公告)日:2016-11-15

    申请号:US11589683

    申请日:2006-10-30

    摘要: Described herein are all-dry encapsulation methods that enable well-defined polymers to be applied around particles. One aspect of the invention relates to a method of coating a particle, comprising the steps of: placing said particle in a vessel at a pressure; rotating said vessel at a rotating speed for a period of time; mixing together a first gaseous monomer at a first flow rate, and a gaseous initiator at a second flow rate, thereby forming a mixture; introducing said mixture into said vessel via a vapor feedline; heating said mixture, thereby forming a reactive mixture; contacting said particle with said reactive mixture; thereby forming a polymer coating on said particle. The methods may be modified forms of initiated chemical vapor deposition using a thermally-initiated radical polymerization to create conformal coatings around individual particles while avoiding agglomeration. Particle surfaces may be coated with a range of functional groups.

    摘要翻译: 本文描述的是全干封装方法,使得能够将明确定义的聚合物施加在颗粒周围。 本发明的一个方面涉及一种涂覆颗粒的方法,包括以下步骤:在压力下将所述颗粒置于容器中; 以一段时间的旋转速度旋转所述容器; 以第一流速将第一气态单体和第二流速的气态引发剂混合在一起,从而形成混合物; 通过蒸气供给线将所述混合物引入所述容器; 加热所述混合物,从而形成反应性混合物; 使所述颗粒与所述反应性混合物接触; 从而在所述颗粒上形成聚合物涂层。 所述方法可以是使用热引发的自由基聚合来引发的化学气相沉积的修饰形式,以在避免团聚的同时产生围绕单个颗粒的保形涂层。 颗粒表面可以涂覆一系列官能团。

    Biosensors
    26.
    发明授权
    Biosensors 有权
    生物传感器

    公开(公告)号:US09034659B2

    公开(公告)日:2015-05-19

    申请号:US13548521

    申请日:2012-07-13

    摘要: A chemiresistive biosensor for detecting an analyte can include a high specific surface area substrate conformally coated with a conductive polymer, and a binding reagent immobilized on the conductive polymer, wherein the binding reagent has a specific affinity for the analyte. The conductive polymer can be deposited on a substrate by oCVD.

    摘要翻译: 用于检测分析物的化学生物传感器可以包括由导电聚合物共形涂覆的高比表面积底物和固定在导电聚合物上的结合试剂,其中结合试剂对分析物具有特异性亲和力。 导电聚合物可以通过oCVD沉积在基底上。

    Conductive Polymer Films Grafted on Organic Substrates
    27.
    发明申请
    Conductive Polymer Films Grafted on Organic Substrates 有权
    导电聚合物膜接枝在有机基板上

    公开(公告)号:US20150079282A1

    公开(公告)日:2015-03-19

    申请号:US14331891

    申请日:2014-07-15

    IPC分类号: H01L51/00

    摘要: One aspect of the invention relates to a linker-free, one-step method of grafting polymer films onto organic substrates, and the films obtained by such a method. In certain embodiments, the grafted polymer films are conductive. In certain embodiments, said grafting method utilizes the ability for Friedel-Crafts catalyst to form radical cations from organic substrates. In one embodiment, the method provides poly-3,4-ethylenedioxythiophene (PEDOT) thin films grafted to organic substrates. In other embodiments, the method is applicable to the polymerization of other monomers to yield conducting polymers, such as polyanilines, polypyrroles, polyfurans, polythiophenes and their derivatives. Remarkably, the polymer films grafted by the inventive methods show enormous increases in adhesion strength. Further, in certain embodiments, polymer patterns were easily obtained using the inventive methods and soft lithography techniques. In certain embodiments, well-defined high-density line-and-space patterns were successfully obtained. In certain embodiments, e.g., when the polymer film is conducting, the obtained conducting polymer pattern grafted on common organic substrates can be used for integrated circuitry in flexible electronics.

    摘要翻译: 本发明的一个方面涉及将聚合物膜接枝到有机基底上的无接头的一步法,以及通过这种方法获得的膜。 在某些实施方案中,接枝的聚合物膜是导电的。 在某些实施方案中,所述接枝方法利用了Friedel-Crafts催化剂从有机底物形成自由基阳离子的能力。 在一个实施方案中,该方法提供接枝到有机基底上的聚3,4-亚乙基二氧噻吩(PEDOT)薄膜。 在其它实施方案中,该方法适用于其它单体的聚合以产生导电聚合物,例如聚苯胺,聚吡咯,聚呋喃,聚噻吩及其衍生物。 显着地,通过本发明方法接枝的聚合物膜显示出粘合强度的巨大增加。 此外,在某些实施方案中,使用本发明的方法和软光刻技术容易地获得聚合物图案。 在某些实施例中,成功地获得了明确定义的高密度线和空间图案。 在某些实施方案中,例如,当聚合物膜导电时,所获得的接枝在共同有机衬底上的导电聚合物图案可用于柔性电子器件中的集成电路。

    Methods of Coating Surfaces Using Initiated Plasma-Enhanced Chemical Vapor Deposition
    29.
    发明申请
    Methods of Coating Surfaces Using Initiated Plasma-Enhanced Chemical Vapor Deposition 有权
    使用引发的等离子体增强化学气相沉积法涂覆表面的方法

    公开(公告)号:US20130040102A1

    公开(公告)日:2013-02-14

    申请号:US13571814

    申请日:2012-08-10

    IPC分类号: C23C16/50 B32B3/10

    摘要: Disclosed is an organic coating with a high degree of global planarization. Further disclosed is an iPECVD-based method of coating a substrate with an organic layer having a high degree of global planarization. Disclosed is a flexible, alternating organic and inorganic multi-layer coating with low water permeability, a high-degree of transparency, and a high-degree of global planarization. Also disclosed is an iPECVD-based method of coating a substrate with the alternating organic and inorganic multi-layer coating.

    摘要翻译: 公开了具有高度全局平坦化的有机涂层。 还公开了一种基于iPECVD的方法,该方法用具有高度全局平坦化的有机层涂覆衬底。 公开了一种具有低透水性,高度透明度和高度全局平坦化的柔性交替有机和无机多层涂层。 还公开了一种使用交替的有机和无机多层涂层涂覆基材的基于iPECVD的方法。