DISPLAY DEVICE
    23.
    发明申请
    DISPLAY DEVICE 审中-公开
    显示设备

    公开(公告)号:US20160254257A1

    公开(公告)日:2016-09-01

    申请号:US15150744

    申请日:2016-05-10

    Abstract: A protective circuit includes a non-linear element, which further includes a gate electrode, a gate insulating layer covering the gate electrode, a pair of first and second wiring layers whose end portions overlap with the gate electrode over the gate insulating layer and in which a conductive layer and a second oxide semiconductor layer are stacked, and a first oxide semiconductor layer which overlaps with at least the gate electrode and which is in contact with side face portions of the gate insulating layer and the conductive layer of the first wiring layer and the second wiring layer and a side face portion and a top face portion of the second oxide semiconductor layer. Over the gate insulating layer, oxide semiconductor layers with different properties are bonded to each other, whereby stable operation can be performed as compared with Schottky junction. Thus, the junction leakage can be decreased and the characteristics of the non-linear element can be improved.

    Abstract translation: 保护电路包括非线性元件,其还包括栅电极,覆盖栅电极的栅极绝缘层,一对第一和第二布线层,其端部与栅极绝缘层上的栅极重叠,并且其中 堆叠导电层和第二氧化物半导体层,以及与至少栅电极重叠并与栅极绝缘层和第一布线层的导电层的侧面部分接触的第一氧化物半导体层和 第二布线层和第二氧化物半导体层的侧面部分和顶面部分。 在栅极绝缘层上,具有不同性质的氧化物半导体层彼此结合,由此可以进行与肖特基结的稳定操作。 因此,可以降低结漏电,提高非线性元件的特性。

    SEMICONDUCTOR DEVICE, METHOD FOR DRIVING SEMICONDUCTOR DEVICE, AND METHOD FOR DRIVING ELECTRONIC DEVICE
    24.
    发明申请
    SEMICONDUCTOR DEVICE, METHOD FOR DRIVING SEMICONDUCTOR DEVICE, AND METHOD FOR DRIVING ELECTRONIC DEVICE 有权
    半导体器件,用于驱动半导体器件的方法和用于驱动电子器件的方法

    公开(公告)号:US20150296162A1

    公开(公告)日:2015-10-15

    申请号:US14679172

    申请日:2015-04-06

    Abstract: To provide a solid-state imaging device with short image-capturing duration. A first photodiode in a pixel in an n-th row and an m-th column is connected to a second photodiode in a pixel in an (n+1)-th row and the m-th column through a transistor. The first photodiode and the second photodiode receive light concurrently, the potential in accordance with the amount of received light is held in a pixel in the n-th row and the m-th column, and the potential in accordance with the amount of received light is held in a pixel in the (n+1)-th row and the m-th column without performing a reset operation. Then, each potential is read out. Under a large amount of light, either the first photodiode or the second photodiode is used.

    Abstract translation: 提供具有短图像捕获持续时间的固态成像装置。 第n行和第m列的像素中的第一光电二极管通过晶体管连接到第(n + 1)行和第m列的像素中的第二光电二极管。 第一光电二极管和第二光电二极管同时接收光,根据接收光量的电位被保持在第n行和第m列的像素中,并且根据接收光量的电位 被保持在第(n + 1)行和第m列的像素中,而不执行复位操作。 然后,读出每个电位。 在大量的光下,使用第一光电二极管或第二光电二极管。

    MEMORY DEVICE
    25.
    发明申请

    公开(公告)号:US20250040116A1

    公开(公告)日:2025-01-30

    申请号:US18780752

    申请日:2024-07-23

    Abstract: A novel memory device is provided. A plurality of memory cells each including two vertical transistors are connected in series. One of the two transistors functions as a transistor for writing data, and the other functions as a transistor for reading the data that has been written to the memory cell. Data written to the memory cell is retained in a gate of the reading transistor. A transistor with low off-state current is used as the writing transistor.

    METHOD FOR FABRICATING DISPLAY DEVICE
    26.
    发明公开

    公开(公告)号:US20240155869A1

    公开(公告)日:2024-05-09

    申请号:US18279942

    申请日:2022-03-01

    CPC classification number: H10K59/1201 H10K71/166 H10K71/60

    Abstract: A method for fabricating a novel display device is provided. The method for fabricating the display device includes a step of forming an anode, a first EL layer, a first cathode, and a first layer in this order; a step of forming a first resist mask over the first layer; a step of selectively removing parts of the anode, the first EL layer, the first cathode, and the first layer; a step of removing part of the first resist mask; a step of selectively removing other parts of the first EL layer, the first cathode, and the first layer; and a step of removing the first resist mask. The first resist mask is formed using a multi-tone mask.

    STORAGE DEVICE, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE

    公开(公告)号:US20230112113A1

    公开(公告)日:2023-04-13

    申请号:US18081109

    申请日:2022-12-14

    Abstract: A novel storage device is provided. The storage device includes a first wiring, a second wiring, and a first memory cell. The first memory cell includes a first transistor and a first magnetic tunnel junction device. One of a source or a drain of the first transistor is electrically connected to a first wiring. The other of the source or the drain of the first transistor is electrically connected to one terminal of the first magnetic tunnel junction device. Another terminal of the first magnetic tunnel junction device is electrically connected to the second wiring. The first transistor includes an oxide semiconductor in its channel formation region.

    STORAGE DEVICE, ELECTRONIC COMPONENT, AND ELECTRONIC DEVICE

    公开(公告)号:US20210272614A1

    公开(公告)日:2021-09-02

    申请号:US17326441

    申请日:2021-05-21

    Abstract: A novel storage device is provided. The storage device includes a first wiring, a second wiring, and a first memory cell. The first memory cell includes a first transistor and a first magnetic tunnel junction device. One of a source or a drain of the first transistor is electrically connected to a first wiring. The other of the source or the drain of the first transistor is electrically connected to one terminal of the first magnetic tunnel junction device. Another terminal of the first magnetic tunnel junction device is electrically connected to the second wiring. The first transistor includes an oxide semiconductor in its channel formation region.

    MEMORY DEVICE AND ELECTRONIC DEVICE

    公开(公告)号:US20210257020A1

    公开(公告)日:2021-08-19

    申请号:US16972696

    申请日:2019-06-13

    Abstract: A novel memory device is provided. The memory device includes a plurality of memory cells, and one memory cell includes a first transistor and a second transistor. One of a source and a drain of the first transistor is electrically connected to a gate of the second transistor through a node SN. Data written through the first transistor is retained at the node SN. When an OS transistor is used as the first transistor, formation of a storage capacitor is not needed. A region with a low dielectric constant is provided outside the memory cell, whereby noise from the outside is reduced and stable operation is achieved.

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