Photostructuring method
    24.
    发明授权
    Photostructuring method 失效
    光结构方法

    公开(公告)号:US5234794A

    公开(公告)日:1993-08-10

    申请号:US847881

    申请日:1992-03-10

    IPC分类号: G03F7/40

    CPC分类号: G03F7/405 G03F7/40

    摘要: A simple method for diminishing the trench width in a photoresist structure to below the resolution limit is provided. A photoresist structure is produced and treated with an agent then contains a bulging constituent that reacts with functional groups of the photoresist structure. The bulging constituent causes a volume increase of the photoresist structure. The extent of the volume increase of the photoresist structures is controllable by varying various parameters.

    摘要翻译: 提供了一种用于将光致抗蚀剂结构中的沟槽宽度减小到分辨率极限以下的简单方法。 制备光致抗蚀剂结构并用试剂处理,然后含有与光致抗蚀剂结构的官能团反应的凸起成分。 凸起成分导致光致抗蚀剂结构的体积增加。 通过改变各种参数可以控制光致抗蚀剂结构体积增加的程度。

    Device for transporting bulk material comprising a vibrator conveyor
which dips into a liquid
    25.
    发明授权
    Device for transporting bulk material comprising a vibrator conveyor which dips into a liquid 失效
    用于运输包裹在液体中的振动输送机的散装材料的装置

    公开(公告)号:US5215641A

    公开(公告)日:1993-06-01

    申请号:US752674

    申请日:1991-11-06

    摘要: The conveying trough of the vibrator conveyor is disposed spirally around a central pipe and is surrounded by a gasproof vessel. This vessel contains a treatment medium, preferably an electrolyte free of oxygen and water, into which the vibrator conveyor with thee central pipe dips partially. According to the invention, a gas cushion (10) is provided between the bottom (3) or the cover (4) of the central pipe (2) and the bottom (8) of the vessel (6). In this form of realization bulk material can be transported over great differences in height.

    摘要翻译: PCT No.PCT / EP90 / 00295 Sec。 371日期1991年11月6日 102(e)日期1991年11月6日PCT 1990年2月21日PCT PCT。 出版物WO90 / 10739 1990年9月20日。振动输送机的输送槽螺旋地设置在中心管周围,被气体容器包围。 该容器含有处理介质,优选不含氧和水的电解质,其中中心管的振动器输送器部分地浸入其中。 根据本发明,气垫(10)设置在中心管(2)的底部(3)或盖(4)和容器(6)的底部(8)之间。 在这种形式的实现中,散装材料可以运输高度差异很大。

    Metal insulator semiconductor field effect transistor
    27.
    发明授权
    Metal insulator semiconductor field effect transistor 失效
    金属绝缘子半导体场效应晶体管

    公开(公告)号:US5196907A

    公开(公告)日:1993-03-23

    申请号:US924422

    申请日:1992-07-31

    摘要: A Metal Insulator Semiconductor Field-Effect Transistor (MISFET) has an insulating layer arranged between a gate electrode and a semiconductor substrate. The insulating layer is a layer of amorphous, hydrogenated carbon (a-C:H) with a thickness--in the region of the gate electrode--of up to 1 .mu.m, and with a resistivity (.eta.) greater than or equal to 10.sup.6 .OMEGA..multidot.cm at the boundary surface to the semiconductor substrate. The semiconductor substrate consists of a semiconductor material other than silicon.

    摘要翻译: 金属绝缘体半导体场效应晶体管(MISFET)具有布置在栅电极和半导体衬底之间的绝缘层。 绝缘层是一层非晶氢化碳(aC:H),其厚度在栅电极的区域至多为1μm,电阻率(eta)大于或等于106欧米伽xcm 在与半导体基板的边界面。 半导体衬底由除硅之外的半导体材料组成。

    Surface-treating apparatus for agitatable material
    28.
    发明授权
    Surface-treating apparatus for agitatable material 失效
    表面处理设备用于可食用材料

    公开(公告)号:US5131996A

    公开(公告)日:1992-07-21

    申请号:US623213

    申请日:1990-12-06

    IPC分类号: C23G3/00 C25D17/22 C25D17/28

    CPC分类号: C25D17/22 C23G3/00 Y10S209/92

    摘要: An apparatus is provided for surface treating agitable material that includes a conveyor trough for transporting the agitatable material. The trough is at least partially submerged in a treatment bath and it includes at least a first and second shaking chute each having a length along which the material is conveyed. The first and second chutes are disposed at angles from the horizontal such that the conveying direction of the first chute is substantially opposite to the conveying direction of the second chute.

    摘要翻译: 提供了一种用于表面处理可消耗材料的装置,其包括用于输送可搅拌材料的输送槽。 槽至少部分地浸没在处理槽中,并且其至少包括第一和第二振动槽,每个具有材料沿其输送的长度。 第一和第二滑槽与水平面成角度设置,使得第一滑槽的输送方向基本上与第二滑槽的输送方向相反。

    Method for the manufacture of resist structures
    30.
    发明授权
    Method for the manufacture of resist structures 失效
    抗蚀剂结构的制造方法

    公开(公告)号:US4395481A

    公开(公告)日:1983-07-26

    申请号:US305798

    申请日:1981-09-25

    CPC分类号: G03F7/039 G05F1/577

    摘要: The invention relates to a method for the manufacture of positive resist structures by means of short-wave UV rays and has the objective to develop such a method in a manner such that increased sensitivity and resolution as well as high thermal stability and, in addition, transparency in the wave-length range above 260 nm can be achieved. According to the invention, it is provided for this purpose to use as the resist material copolymers of 1 to 70 mol % alkylmethacrylate with an alkyl radical having 1 to 4 C atoms, and 99 to 30 mol % of an ethylenically unsaturated monomer with chlorine and/or cyan substituents. The method according to the invention is particularly well suited for producing resist structures about 0.5 to 2 .mu.m thick by means of UV rays in the wave-length range between about 180 to 260 nm.

    摘要翻译: 本发明涉及通过短波紫外线制造正型抗蚀剂结构的方法,其目的是以增加灵敏度和分辨率以及高热稳定性的方式开发这种方法,另外, 可以实现260nm以上的波长范围的透明度。 根据本发明,为此目的提供了使用1至70摩尔%甲基丙烯酸烷基酯与具有1-4个碳原子的烷基的抗蚀剂材料共聚物和99至30摩尔%的具有氯的烯属不饱和单体的抗蚀剂材料共聚物,以及 /或青色取代基。 根据本发明的方法特别适用于通过在约180至260nm之间的波长范围内的紫外线生产约0.5至2μm厚的抗蚀剂结构。