公开(公告)号：US06940069B2

公开(公告)日：2005-09-06

申请号：US10637496

申请日：2003-08-11

申请人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

发明人： Takashi Hiroi ,  Asahiro Kuni ,  Masahiro Watanabe ,  Chie Shishido ,  Hiroyuki Shinada ,  Yasuhiro Gunji ,  Atsuko Takafuji

IPC分类号： G01N23/04 ,  G01N23/20 ,  G01N23/225 ,  G01Q30/04 ,  G02F1/13 ,  G06T1/00 ,  G21K7/00 ,  H01J37/22 ,  H01J37/244 ,  H01J37/28 ,  G01N23/00

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/2817

摘要： A pattern inspection method which irradiates a charged particle beam onto a surface of a specimen on which a pattern is formed, simultaneously detecting with plural sensors secondary particles emanated from the surface of the specimen by the irradiation, adding signals outputted from each sensor of the plural sensors which simultaneously detected the secondary particles, obtaining an image of the surface of the specimen on which the pattern is formed from the added signals and processing the image to detect a defect of the pattern.

摘要翻译： 将带电粒子束照射在其上形成有图案的样本的表面上的图案检查方法，同时利用多个传感器检测从照射后从样品表面发出的二次粒子，从多个传感器的每个传感器输出的相加信号 同时检测次级粒子的传感器，从附加的信号获得形成有图案的样本的表面的图像，并处理图像以检测图案的缺陷。

公开(公告)号：US5198676A

公开(公告)日：1993-03-30

申请号：US767027

申请日：1991-09-27

申请人： Victor M. Benveniste ,  Peter L. Kellerman ,  John J. Schussler

发明人： Victor M. Benveniste ,  Peter L. Kellerman ,  John J. Schussler

IPC分类号： G01T1/29 ,  C23C14/48 ,  H01J37/04 ,  H01J37/317 ,  H01L21/265

CPC分类号： H01J37/3171 ,  H01J2237/24465 ,  H01J2237/31703

摘要： An ion beam intensity and emittance measuring system. A substrate supports conductive zones or regions that are impacted by an ion beam. Periodically the conductive regions are discharged through an integrator circuit which produces an output corresponding to the charge buildup on the conductive region. By determining the charge for multiple such regions impacted by an ion beam, a two-dimensional mapping of ion beam intensity vs. position is obtained on essentially a real-time basis. An emittance mask is also placed over the substrate and a measure of the emittance or spread of the ion beam is obtained.

公开(公告)号：US4068123A

公开(公告)日：1978-01-10

申请号：US491835

申请日：1974-07-25

申请人： Yasushi Kokubo

发明人： Yasushi Kokubo

IPC分类号： H01J37/244 ,  H01J37/28 ,  H01J37/26

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/2441 ,  H01J2237/24465 ,  H01J2237/2447 ,  H01J2237/24592

摘要： A scanning electron microscope having a plurality of annular shaped electron detectors. The ratio of two detector output signals is compared with some constant value indicative of a component of the specimen. On the basis of the comparison the output signal of one detector is passed or not passed to an image display means to provide an image indicative of said component.

摘要翻译： 一种具有多个环形电子检测器的扫描电子显微镜。 将两个检测器输出信号的比率与指示样品的分量的一些常数值进行比较。 在比较的基础上，一个检测器的输出信号通过或不通过图像显示装置，以提供指示所述部件的图像。

公开(公告)号：US3555347A

公开(公告)日：1971-01-12

申请号：US3555347D

申请日：1967-07-10

申请人： GEN ELECTRIC

发明人： DICKINSON THEODORE M

IPC分类号： H01J29/54 ,  H01J37/02 ,  H01J37/21 ,  H01J37/244 ,  H01J37/304 ,  B23K9/10

CPC分类号： H01J29/54 ,  H01J37/02 ,  H01J37/21 ,  H01J37/244 ,  H01J37/3045 ,  H01J2237/24465 ,  H01J2237/24578

摘要： Alignment between a focused electron beam and an aperture within a partition plate separating a low pressure electron beam generating zone from a higher pressure welding chamber is obtained by positioning four carbon sensing electrodes in a circular pattern coaxial with and slightly above the aperture in the partition plate. The internal diameter of the circular pattern formed by the electrode disposition is no greater than the aperture in the partition plate to assure continuous impingement of a portion of a properly focused bell-shaped electron beam on the electrodes. The negative voltages produced upon diametrically opposite electrodes by the electron beam bombardment are fed back to an elongated pair of electrostatic deflection plates in the low pressure zone of the welding apparatus to deflect the beam at an angle proportional to the difference between the voltage signals from the electrodes. When a charged particle beam is generated in a zone having sufficient gaseous pressure to produce an electrostatic discharge between deflection plates, electromagnetic windings are employed to deflect the beam with a current amplifier being inserted between the electrodes and the electromagnetic windings to allow use of low inductance windings thereby reducing the response time of the system.

公开(公告)号：US20240087838A1

公开(公告)日：2024-03-14

申请号：US18501863

申请日：2023-11-03

申请人： Carl Zeiss MultiSEM GmbH

发明人： Stefan Schubert

IPC分类号： H01J37/153 ,  H01J37/244 ,  H01J37/28

CPC分类号： H01J37/153 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24495 ,  H01J2237/24521 ,  H01J2237/24528 ,  H01J2237/24542 ,  H01J2237/24578 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

摘要： Multi-beam effects which reduce the accuracy, or the speed of a wafer inspection are corrected dependent on an inspection position using an improved multi-beam system and a wafer inspection method using the multi-beam system. The multi-beam system comprises a mechanism for influencing and homogenising an extraction field dependent on the inspection position, for example dependent on a distance from a wafer edge.

公开(公告)号：US20230197424A1

公开(公告)日：2023-06-22

申请号：US18168362

申请日：2023-02-13

申请人： Taiwan Semiconductor Manufacturing Co., Ltd.

发明人： Otto CHEN ,  Chi-Ying WU ,  Chia-Chih CHEN

IPC分类号： H01J37/32 ,  H01J37/244

CPC分类号： H01J37/32935 ,  H01J37/32155 ,  H01J37/32146 ,  H01J37/32449 ,  H01J37/244 ,  H01J37/3266 ,  H01J2237/24465 ,  H01J2237/24564 ,  H01J2237/24405 ,  H01J2237/24507

摘要： An ion collector includes a plurality of segments and a plurality of integrators. The plurality of segments are physically separated from one another and spaced around a substrate support. Each of the segments includes a conductive element that is designed to conduct a current based on ions received from a plasma. Each of the plurality of integrators is coupled to a corresponding conductive element. Each of the plurality of integrators is designed to determine an ion distribution for a corresponding conductive element based, at least in part, on the current conducted at the corresponding conductive element. An example benefit of this embodiment includes the ability to determine how uniform the ion distribution is across a wafer being processed by the plasma.

公开(公告)号：US09960010B2

公开(公告)日：2018-05-01

申请号：US13601303

申请日：2012-08-31

申请人： Motoki Kadowaki ,  Osamu Nagano

发明人： Motoki Kadowaki ,  Osamu Nagano

IPC分类号： H01J37/26 ,  H01J37/22 ,  H01J37/28

CPC分类号： H01J37/261 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/24465 ,  H01J2237/24485 ,  H01J2237/245 ,  H01J2237/2817

摘要： In accordance with an embodiment, a signal processing method includes scanning a pattern on a substrate with a charged particle beam, detecting secondary charged particles emitted from the substrate by using a detector, outputting a signal, and filtering the signal. The detector is separated or divided into a plurality of regions, and the secondary charged particles are detected separately in each region of the detector. Intensity of the filtering is defined in dependence on a function f(θ) of an angle θ between a reference axis and a direction along which the secondary charged particles enter a detector plane. The reference axis is an arbitrary direction in a plane parallel to a surface of the substrate.

公开(公告)号：US09881769B2

公开(公告)日：2018-01-30

申请号：US15023456

申请日：2014-10-07

申请人： Hitachi High-Technologies Corporation

发明人： Kenji Aoki ,  Tsutomu Saitou ,  Kotaro Hosoya ,  Mitsuhiro Nakamura ,  Kunji Shigeto

IPC分类号： H01J37/28 ,  H01J37/29 ,  H01J37/073 ,  H01J37/244

CPC分类号： H01J37/292 ,  H01J37/073 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/18 ,  H01J2237/24465 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/248 ,  H01J2237/2809

摘要： The objective of the present invention is to provide a charged particle beam device, wherein the positional relationship between reflected electron detection elements and a sample and the vacuum state of the sample surroundings are evaluated to select automatically a reflected electron detection element appropriate for acquiring an intended image. In this charged particle beam device, all the reflected electron detection elements are selected when the degree of vacuum inside the sample chamber is high and the sample is distant from the reflected electron detectors, while a reflected electron detection element appropriate for acquiring a compositional image or a height map image is selected when the degree of vacuum inside the sample chamber is high and the sample is close to the reflected electron detectors. When the degree of vacuum inside the sample chamber is low, all the reflected electron detection elements are selected.

公开(公告)号：US09779911B2

公开(公告)日：2017-10-03

申请号：US15013192

申请日：2016-02-02

申请人： JEOL Ltd.

发明人： Yuji Kohno

IPC分类号： H01H37/28 ,  H01J37/22 ,  H01J37/28 ,  H01J37/153

CPC分类号： H01J37/222 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/0453 ,  H01J2237/1534 ,  H01J2237/221 ,  H01J2237/24455 ,  H01J2237/24465 ,  H01J2237/2802

摘要： An electron microscope capable of measuring aberrations accurately is provided. The microscope is adapted to obtain scanning transmission electron (STEM) images by detecting electrons transmitted through a sample (S). The microscope (100) includes a segmented detector (20) having a detection surface (23) for detecting the electrons transmitted through the sample (S). The detection surface (23) is divided into detector segments (D1-D16) for detecting the electrons transmitted through the sample (S). The microscope (100) further includes an aperture plate (30) for limiting the active areas of the detector segments (D1-D16) on which the electrons impinge.

公开(公告)号：US09666405B1

公开(公告)日：2017-05-30

申请号：US15046905

申请日：2016-02-18

申请人： ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH

发明人： Stefan Lanio ,  Jürgen Frosien ,  Matthias Firnkes ,  Benjamin John Cook

IPC分类号： H01J37/147 ,  H01J37/29 ,  H01J37/244 ,  H01J37/12

CPC分类号： H01J37/244 ,  H01J2237/24465 ,  H01J2237/2449 ,  H01J2237/24592

摘要： The present disclosure provides a system for imaging a signal charged particle beam emanating from a sample by impingement of a primary charged particle beam. The system includes a detector arrangement having a first detection element for detecting a first signal charged particle sub-beam of the signal charged particle beam originating from a first spot on the sample and a second detection element for detecting a second signal charged particle sub-beam of the signal charged particle beam originating from a second spot on the sample, wherein the first detection element and the second detection element are separated from each other, and signal charged particle optics. The signal charged particle optics includes a coil configured to generate a magnetic field having a magnetic field component parallel to a longitudinal axis of the coil, wherein the magnetic field acts on the first signal charged particle sub-beam and the second signal charged particle sub-beam propagating along the longitudinal axis, and wherein an aspect ratio of the coil is at least 1, and a controller configured to adjust the magnetic field of the coil such that the first signal charged particle sub-beam is directed towards the first detection element and the second signal charged particle sub-beam is directed towards the second detection element.