Abstract:
Provided is a charged particle beam apparatus capable of realizing a highly reliable insulating structure. This charged particle beam apparatus emits a charged particle beam from a charged particle beam emission device onto a sample, detects charged particles generated from the sample, and creates a sample image or processes the sample. The charged particle beam emission device is provided with a charged particle source and a shield arranged in an interior of a metal housing that is filled with an insulating gas, and an acceleration electrode arranged below the charged particle source, power being supplied to the acceleration electrode via the shield.
Abstract:
Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.
Abstract:
Provided are a charged particle beam generator and a charged particle beam device that can improve insulation reliability as a result of reducing the high electric field generated around a connection section for a conductor. The charged particle beam generator 100 has: a plug 151 that guides high voltage from outside to a charged particle source that is in a vacuum; and a socket 251 having the charged particle source attached thereto. An electric field reduction ring 161 that electrically connects to one of a plurality of conductors that guide high voltage is embedded inside the tip of the plug 151. The plurality of conductors that guide the high voltage are arranged so as to penetrate the electric field reduction ring 161.
Abstract:
A charged particle beam device is described, which includes: a beam source configured to generate a charged particle beam propagating along an optical axis (A); an aperture device with a plurality of apertures configured to create a plurality of beamlets from the charged particle beam; and a field curvature corrector. The field curvature corrector includes: a first multi-aperture electrode with a first plurality of openings having diameters that vary as a function of a distance from the optical axis (A); a second multi-aperture electrode with a second plurality of openings; and an adjustment device configured to adjust at least one of a first electrical potential (U1) of the first multi-aperture electrode and a second electrical potential (U2) of the second multi-aperture electrode. Further, a field curvature corrector and methods of operating a charged particle beam device are described.
Abstract:
Sterilization apparatus for sterilizing packaging containers, the sterilization apparatus comprising a first carousel for supporting a plurality of sterilization devices, the sterilization devices being adapted to sterilize an interior of the packaging containers by electron beam irradiation, and a transport system for transporting the packaging containers, the transport system comprising a second carousel coaxial with the first carousel, wherein the first carousel comprises a first rotatable shaft and the second carousel comprises a separate second rotatable shaft coaxial with the first rotatable shaft.
Abstract:
The present invention is a charged-particle gun (EG) in which a negative electrode (1) and a positive electrode (9) are integrated and assembled in advance, and which can be stored and transported in a state in which the negative electrode and the positive electrode are integrated, wherein the negative electrode and the positive electrode are connected by a conductor (11) during storage and transportation of the charged-particle gun. It is thereby possible to prevent an electrode tip of the charged-particle gun from being damaged by electrical discharge caused by static electricity during storage and transportation.
Abstract:
The invention relates to a modulation device for use in a charged particle multi-beamlet lithography system. The device includes a body comprising an interconnect structure provided with a plurality of modulators and interconnects at different levels within the interconnect structure for enabling connection of the modulators to one or more pattern data receiving elements. A modulator includes a first electrode, a second electrode, and an aperture extending through the body. The electrodes are located on opposing sides of the aperture for generating an electric field across the aperture. At least one of the first electrode and the second electrode includes a first conductive element formed at a first level of the interconnect structure and a second conductive element formed at a second level of the interconnect structure. The first and second conductive elements are electrically connected with each other.
Abstract:
The invention relates to a method of generating a two-level pattern for lithographic processing by multiple beamlets. In the method, first a pattern in vector format is provided. The vector format pattern is then converted into a pattern in pixmap format. Finally, a two-level pattern is formed by application of error diffusion on the pixmap format pattern.
Abstract:
A scanning electron microscope having a unit for reducing image obstacle in an scanning electron microscope which is capable of inexpensively and readily reducing image obstacle caused by any external disturbance such as alternative magnetic field and mechanical vibration in relation to the location of installation of the microscope. In order to reduce the image obstacle, the electron beam deflectors or image shift coils for forming visual image by scanning the surface of sample by using collimated electron beam, is applied superimposing with alternative current for forming alternative magnetic field of the identical frequency, identical intensity, and inverted phase of vibration to the external disturbance to cancel out the fluctuation caused by the external disturbance in the sample surface at the focal plane of the electron beam.
Abstract:
In the electron beam generator cooling is provided by the electrical conductors of the incandescent cathode and control electrode which are configured as heat bridges and connected to cooling plates in the interior of the high-voltage insulator which in turn are connected in a heat-conducting manner to a pot-shaped cooling body. The cooling body, configured as part of a capsule for accommodating circuitry for the control of the electron beam generator, is surrounded by a heat exchanger which is connected to a cooling circuit and is at ground potential, and is insulated from the cooling body by a wall of the high-voltage insulator.