公开(公告)号：US20140121831A1

公开(公告)日：2014-05-01

申请号：US14065730

申请日：2013-10-29

Applicant: SEMES CO. LTD.

Inventor： Woosung Kim ,  Myungchan Cho

IPC: B25J9/16 ,  H01L21/677 ,  B25J11/00

CPC classification number: B25J9/1651 ,  B25J11/0075 ,  B25J11/0095 ,  H01L21/67276 ,  H01L21/67742 ,  H01L21/68707

Abstract: Provided is a transfer unit. The transfer unit includes a robot transferring a substrate and a controller controlling a speed of the robot according to the number of substrates to be transferred by the robot for a preset period. When the number of substrates to be transferred for the preset period increases, the robot increases in moving speed by the controller.

Abstract translation: 提供了一个转运单元。 传送单元包括机器人传送基板和控制机器人的速度的控制器，该机器人将根据要由机器人传送的基板的数量达预定时间段。 当预设期间要传送的基板数量增加时，机器人通过控制器增加移动速度。

公开(公告)号：US20130319457A1

公开(公告)日：2013-12-05

申请号：US13905634

申请日：2013-05-30

Applicant: Semes Co., Ltd.

Inventor： Yong Hee LEE ,  Bok Kyu LEE ,  Jongsu CHOI

IPC: H01L21/02

CPC classification number: H01L21/02041 ,  H01L21/02052 ,  H01L21/67051

Abstract: Provided are an apparatus and a method of cleaning a substrate. The apparatus includes a substrate supporting unit supporting a substrate, a container surrounding the substrate supporting unit and collecting an organic solvent scattered from the substrate, and a fluid supplying unit provided on one side of the container and spraying a liquid organic solvent with bubbles to the substrate. The fluid supplying unit includes a nozzle head ejecting the organic solvent to the substrate, an organic solvent supplying line supplying the organic solvent from an organic solvent storage tank to the nozzle head, and a bubble providing element provided on the organic solvent supplying line and providing bubbles to the liquid organic solvent.

Abstract translation: 提供一种清洗基板的装置和方法。 该装置包括支撑基板的基板支撑单元，围绕基板支撑单元并收集从基板散射的有机溶剂的容器以及设置在容器的一侧上的流体供给单元，并且向液体有机溶剂喷射气泡 基质。 流体供给单元包括将有机溶剂喷射到基板的喷嘴头，将有机溶剂从有机溶剂容器供给到喷嘴头的有机溶剂供给管线和设置在有机溶剂供给管线上的气泡供给元件， 气泡到液体有机溶剂。

公开(公告)号：US20130318812A1

公开(公告)日：2013-12-05

申请号：US13905676

申请日：2013-05-30

Applicant: SEMES CO., LTD.

Inventor： Boong Kim ,  Ki Bong Kim ,  Gil Hun Song ,  Oh Jin Kwon

IPC: F26B21/12

CPC classification number: F26B21/12 ,  F26B5/005 ,  H01L21/67017 ,  H01L21/67034

Abstract: Provided is an apparatus and method for drying a substrate. The apparatus includes a housing, a substrate support member, a fluid supply member, and a discharge member. The housing provides a space in which a drying process is performed. The substrate support member is provided in the housing to support the substrate. The fluid supply member includes a supply line for supplying a process fluid of a supercritical state to the housing. The discharge member includes a discharge line for discharging the process fluid from the housing. Here, the supply line includes a first supply line provided to supply the process fluid to the housing at a first supply flow rate, and a second supply line provided to supply the process fluid to the housing at a second supply flow rate.

Abstract translation: 提供了一种用于干燥基板的装置和方法。 该装置包括壳体，基板支撑构件，流体供应构件和排出构件。 壳体提供进行干燥处理的空间。 衬底支撑构件设置在壳体中以支撑衬底。 流体供给构件包括用于将超临界状态的处理流体供给到壳体的供给管线。 排出构件包括用于从壳体排出工艺流体的排出管线。 这里，供应管线包括用于以第一供应流量将工艺流体供应到壳体的第一供应管线和设置成以第二供应流量将工艺流体供应到壳体的第二供应管线。

公开(公告)号：US20130284288A1

公开(公告)日：2013-10-31

申请号：US13873333

申请日：2013-04-30

Applicant: SEMES CO., LTD.

Inventor： Hyung Joon KIM

IPC: F16K15/00

Abstract: Provided is a substrate treating apparatus using a process gas and an adjustment plate used thereof. A substrate treating apparatus including a chamber providing a space in which a process is performed, a support member supporting a substrate in the chamber, a gas supply member supplying a process gas onto the substrate disposed on the support member, and an exhaust assembly coupled to the chamber to exhaust a gas in the chamber, wherein the exhaust assembly includes an exhaust pipe connected to the chamber, an exhaust member connected to the exhaust pipe to provide a vacuum pressure in the exhaust pipe, a valve adjusting an opening rate of the exhaust pipe, and an adjustment plate having a cover plate which is provided in the chamber to interfere with a flow of the process gas in an internal region of the chamber in a direction corresponding to, when the exhaust pipe is partially opened, an opened region of the exhaust pipe. Consequently, the process gas may be uniformly supplied onto the substrate.

Abstract translation: 提供了使用处理气体的基板处理装置及其使用的调整板。 一种基板处理装置，包括提供进行处理的空间的腔室，在腔室中支撑基板的支撑构件，将处理气体供应到设置在支撑构件上的基板上的气体供给构件以及与 所述室排出所述室中的气体，其中所述排气组件包括连接到所述室的排气管，连接到所述排气管以在所述排气管中提供真空压力的排气构件，调节所述排气口的开度的阀 管和调节板，其具有盖板，所述调整板设置在所述室中，以在所述室的内部区域中沿与所述排气管部分打开的方向相对应的方向干涉所述处理气体的流动，所述开口区域 排气管。 因此，可以将工艺气体均匀地供给到基板上。

公开(公告)号：US20130284209A1

公开(公告)日：2013-10-31

申请号：US13873516

申请日：2013-04-30

Applicant: SEMES CO., LTD.

Inventor： YU HWAN KIM ,  BYUNG MAN KANG ,  SE HOON OH ,  YEON JOON KIM

IPC: B08B3/10

CPC classification number: B08B3/10 ,  H01L21/67028 ,  H01L21/67051

Abstract: The substrate cleaning apparatus includes a first process chamber in which a liquid treating process is performed on a substrate by supplying a treating solution, a second process chamber in which a drying process is performed on the substrate, and a carrying unit carrying the substrate between the first process chamber and the second process chamber. The first process chamber includes a liquid treating housing providing a space in which the liquid treating process is performed on the substrate, a spin chuck supporting the substrate within the liquid treating housing, and a liquid supply member supplying the treating solution onto the substrate supported by the spin chuck. The second process chamber includes a drying housing providing a space in which the substrate is dried, a substrate support member supporting the substrate within the drying housing, and a heater heating the substrate.

Abstract translation: 基板清洗装置包括：第一处理室，其中通过提供处理溶液在基板上进行液体处理工艺;在基板上执行干燥处理的第二处理室;以及承载基板的承载单元， 第一处理室和第二处理室。 第一处理室包括：液体处理壳体，其在衬底上提供液体处理过程，在液体处理壳体内支撑衬底的旋转卡盘;以及将处理溶液供给到由 旋转卡盘。 第二处理室包括干燥壳体，其提供基板被干燥的空间，在干燥壳体内支撑基板的基板支撑构件和加热基板的加热器。

公开(公告)号：US20130108975A1

公开(公告)日：2013-05-02

申请号：US13665169

申请日：2012-10-31

Applicant: SEMES CO., LTD.

Inventor： UnKyu KANG ,  Sungun KIM

IPC: F03B11/02 ,  F27D7/00

CPC classification number: H01L21/67017 ,  Y10T137/8593

Abstract: Provided is a substrate treating apparatus. The substrate treating apparatus includes a chamber, a support member disposed within the chamber to support a substrate, and an exhaust member for exhausting a gas within an inner space of the chamber to the outside of the chamber. A trap space for collecting fumes contained in the gas is defined in the exhaust member.

Abstract translation: 提供了一种基板处理装置。 基板处理装置包括室，设置在室内以支撑基板的支撑构件以及用于将腔室的内部空间内的气体排出到室外的排气构件。 在排气构件中限定用于收集气体中所含的烟雾的捕集空间。

公开(公告)号：US20250167751A1

公开(公告)日：2025-05-22

申请号：US18951966

申请日：2024-11-19

Applicant: SEMES CO., LTD.

Inventor： Hak Gyun HONG ,  Jong Seok LEE ,  Seong Rok JOE ,  Gi Jae YOON

IPC: H03H7/38 ,  H01J37/32

Abstract: Disclosed are a microwave heat treatment apparatus and an impedance matching method between a microwave power supply and a chamber in the microwave heat treatment apparatus. The impedance matching method includes the steps of initially adjusting the impedance of a tuner circuit between the microwave power supply and the chamber based on pre-matching data for a heat treatment process, applying microwave power to the chamber from the microwave power supply through the tuner circuit having the initially adjusted impedance, measuring process data related to the impedance of the chamber to which the microwave power has been applied, determining an impedance tuning value of the tuner circuit by comparing the process data and the pre-matching data, and adjusting the impedance of the tuner circuit based on the impedance tuning value.

公开(公告)号：US20250166987A1

公开(公告)日：2025-05-22

申请号：US18954889

申请日：2024-11-21

Applicant: SEMES CO., LTD.

Inventor： Yong Jun KIM ,  Tae Keun KIM ,  Kang Sul KIM ,  Jun Hee CHOI ,  Kyeong Min LEE

IPC: H01L21/02 ,  B08B3/04 ,  B08B3/08 ,  B08B5/00

Abstract: Disclosed is a method of treating a substrate, the method including: a liquid treatment operation of treating a substrate by supplying a treatment solution to a rotating substrate to form a liquid film on the substrate; after the liquid treatment operation, a gas treatment operation of discharging gas to the substrate and removing an upper layer of the liquid film from the substrate; and after the gas treatment operation, a liquid film removal operation of removing a lower layer in the liquid film on the substrate.

公开(公告)号：US20250164898A1

公开(公告)日：2025-05-22

申请号：US18884071

申请日：2024-09-12

Applicant: SEMES CO., LTD.

Inventor： Ki Won HAN ,  Doo Hyun BAEK ,  Hee Chan KIM ,  Tae Kyung KONG ,  Dong Kyum KIM

IPC: G03F7/00

Abstract: A storage and transfer module includes a module body, a storage and transfer unit disposed in the module body, the storage and transfer unit including a liftable transfer portion, and a storage portion disposed on the outside of the transfer portion, the storage portion having a storage space therein, and a transfer target portion in which a substrate is transferred by the transfer portion. A pair of the storage and transfer units are provided. The pair of storage and transfer units are disposed to oppose each other with the transfer target portion interposed therebetween. A substrate loading portion is disposed on one side of the storage and transfer units.

公开(公告)号：US20250157848A1

公开(公告)日：2025-05-15

申请号：US18945498

申请日：2024-11-12

Applicant: SEMES CO., LTD.

Inventor： Mun Hyeok HWANG ,  Han Bin CHOI

IPC: H01L21/687 ,  H01L21/673

Abstract: A substrate lifting apparatus according to the present disclosure includes: a lift pin penetrating through a substrate support unit supporting a substrate in a processing space and lifting and lowering the substrate; a pin holder into which a lower portion of the lift pin is inserted; and a bellows surrounding the pin holder, wherein the pin holder is formed with a guide member whose lower portion is coupled with a bolt and guiding an air flow generated inside the bellows in a direction of the processing space.