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    Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method
    31.
    发明授权
    Inspection apparatus and method, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
    检测装置和方法，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：US09223227B2

    公开(公告)日：2015-12-29

    申请号：US13361349

    申请日：2012-01-30

    申请人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Stefan Carolus Jacobus Antonius Keij ,  Peter Clement Paul Vanoppen

    发明人： Kaustuve Bhattacharyya ,  Arie Jeffrey Den Boef ,  Stefan Carolus Jacobus Antonius Keij ,  Peter Clement Paul Vanoppen

    IPC分类号： G03B27/54 ,  G03F7/20 ,  G01N21/956

    CPC分类号： G03F7/70625 ,  G01B2210/56 ,  G01N21/956 ,  G03F7/705 ,  G03F7/70633

    摘要： Asymmetry properties of a periodic target on a substrate, such as a grating on a wafer, are determined. An inspection apparatus has a broadband illumination source with illumination beams point mirrored in the pupil plane of a high numerical aperture objective lens. The substrate and target are illuminated via the objective lens from a first direction and a second direction mirror reflected with respect to the plane of the substrate. A quad wedge optical device separately redirects diffraction orders of radiation scattered from the substrate and separates diffraction orders from illumination along each of the first and second directions. For example the zeroth and first orders are separated for each incident direction. After capture in multimode fibers, spectrometers are used to measure the intensity of the separately redirected diffraction orders as a function of wavelength.

    摘要翻译： 确定基板（例如晶片上的光栅）上的周期性靶的不对称性质。 检查装置具有宽带照明源，其具有在高数值孔径物镜的光瞳平面中镜像的照明光束点。 从第一方向通过物镜照射衬底和靶，并且相对于衬底的平面反射的第二方向镜。 四楔形光学器件分别重新引导从衬底散射的辐射的衍射级，并沿着第一和第二方向沿着照射分离衍射级。 例如，为每个事件方向分离第零个和第一个命令。 在多模光纤捕获之后，使用光谱仪测量单独重定向的衍射级的强度作为波长的函数。

    Metrology method and apparatus, lithographic apparatus, and device manufacturing method
    32.
    发明授权
    Metrology method and apparatus, lithographic apparatus, and device manufacturing method 有权
    测量方法和设备，光刻设备和器件制造方法

    公开(公告)号：US09110385B2

    公开(公告)日：2015-08-18

    申请号：US12867415

    申请日：2009-02-23

    申请人： Arie Jeffrey Den Boef

    发明人： Arie Jeffrey Den Boef

    IPC分类号： G03B27/68 ,  G03F7/20

    CPC分类号： G01J3/18 ,  G01J3/28 ,  G03F7/70483 ,  G03F7/70625 ,  G03F7/70633

    摘要： A metrology apparatus includes first (21) and second (22) radiation sources which generate first (iB1) and second (iB2) illumination beams of different spatial extent and/or angular range. One of the illumination beams is selected, e.g. according to the size of target to be measured. The beam selection can be made by a tillable mirror (254) at a back-projected substrate plane in a Kohler illumination setup.

    摘要翻译： 测量装置包括产生不同空间范围和/或角度范围的第一（iB1）和第二（iB2）照明光束的第一（21）和第二（22）辐射源。 选择一个照明光束，例如。 根据要测量的目标的大小。 光束选择可以由Kohler照明设置中的背投影基板平面上的可压扁反射镜（254）制成。

    Methods and scatterometers, lithographic systems, and lithographic processing cells
    33.
    发明授权
    Methods and scatterometers, lithographic systems, and lithographic processing cells 有权
    方法和散射仪，光刻系统和光刻处理单元

    公开(公告)号：US09081303B2

    公开(公告)日：2015-07-14

    申请号：US12846652

    申请日：2010-07-29

    申请人： Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Adrianus Johannes Hendrikus Schellekens ,  Michael Kubis

    发明人： Hugo Augustinus Joseph Cramer ,  Arie Jeffrey Den Boef ,  Henricus Johannes Lambertus Megens ,  Hendrik Jan Hidde Smilde ,  Adrianus Johannes Hendrikus Schellekens ,  Michael Kubis

    IPC分类号： G03F7/20 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01B11/02 ,  G01B11/22 ,  G01N21/88

    CPC分类号： G03F7/70641 ,  G01B11/02 ,  G01B11/22 ,  G01B11/24 ,  G01B11/30 ,  G01N21/47 ,  G01N21/88 ,  G03F7/70608 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7065

    摘要： In a method of determining the focus of a lithographic apparatus used in a lithographic process on a substrate, the lithographic process is used to form a structure on the substrate, the structure having at least one feature which has an asymmetry in the printed profile which varies as a function of the focus of the lithographic apparatus on the substrate. A first image of the periodic structure is formed and detected while illuminating the structure with a first beam of radiation. The first image is formed using a first part of non-zero order diffracted radiation. A second image of the periodic structure is formed and detected while illuminating the structure with a second beam of radiation. The second image is formed using a second part of the non-zero order diffracted radiation which is symmetrically opposite to the first part in a diffraction spectrum. The ratio of the intensities of the measured first and second portions of the spectra is determined and used to determine the asymmetry in the profile of the periodic structure and/or to provide an indication of the focus on the substrate. In the same instrument, an intensity variation across the detected portion is determined as a measure of process-induced variation across the structure. A region of the structure with unwanted process variation can be identified and excluded from a measurement of the structure.

    摘要翻译： 在确定在基板上的光刻工艺中使用的光刻设备的焦点的方法中，使用光刻工艺在基板上形成结构，该结构具有至少一个特征，该特征在印刷图案中具有不对称性 作为光刻设备在基板上的焦点的函数。 在用第一辐射束照射结构的同时形成和检测周期性结构的第一图像。 第一图像使用非零阶衍射辐射的第一部分形成。 在用第二辐射束照射结构的同时形成和检测周期性结构的第二图像。 使用在衍射光谱中与第一部分对称相对的非零级衍射辐射的第二部分形成第二图像。 确定测量的第一和第二部分光谱的强度的比率并用于确定周期性结构的轮廓的不对称性和/或提供焦点在基底上的指示。 在相同的仪器中，被检测部分的强度变化被确定为整个结构的过程引起的变化的量度。 可以从结构的测量中识别并排除具有不期望的工艺变化的结构区域。

    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    35.
    发明授权
    Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method 有权
    检测方法和装置，光刻设备，光刻处理单元和器件制造方法

    公开(公告)号：US08885150B2

    公开(公告)日：2014-11-11

    申请号：US12867416

    申请日：2009-02-18

    申请人： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

    发明人： Henricus Petrus Maria Pellemans ,  Arie Jeffrey Den Boef

    IPC分类号： G01C3/08 ,  G03F7/20

    CPC分类号： G01B11/24 ,  G03F7/70191 ,  G03F7/70633 ,  G03F7/7085

    摘要： A scatterometer, configured to measure a property of a substrate, includes a radiation source which produces a radiation spot on a target formed on the surface of the substrate, the size of the radiation spot being smaller than the target in one direction along the target, the position of the radiation spot being moved along the surface in a series of discrete steps. A detector detects a spectrum of the radiation beam reflected from the target and produces measurement signals representative of the spectrum corresponding to each position of the radiation spot. A processor processes the measurement signals produced by the detector corresponding to each position of the radiation spot and derives a single value for the property.

    摘要翻译： 被配置为测量衬底性质的散射仪包括辐射源，其在形成在衬底表面上的靶上产生辐射点，辐射点的尺寸小于目标沿目标的一个方向的尺寸， 辐射光斑在一系列离散步骤中沿着表面移动的位置。 检测器检测从目标反射的辐射束的光谱，并产生表示与辐射光斑的每个位置对应的光谱的测量信号。 处理器处理由检测器产生的与辐射点的每个位置相对应的测量信号，并为该属性导出单个值。

    Substrate measurement method and apparatus
    38.
    发明授权
    Substrate measurement method and apparatus 失效
    基板测量方法和装置

    公开(公告)号：US08497976B2

    公开(公告)日：2013-07-30

    申请号：US12574231

    申请日：2009-10-06

    申请人： Wilhelmus Maria Corbeij ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

    发明人： Wilhelmus Maria Corbeij ,  Arie Jeffrey Den Boef ,  Everhardus Cornelis Mos

    IPC分类号： G01B11/00 ,  G01N21/86 ,  G03B27/32 ,  G03B27/42 ,  G03B27/54

    CPC分类号： G03B27/32 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/7085

    摘要： A method and apparatus for measurement of a characteristic of a substrate. A target is present on the substrate and a measurement is performed during a scanning movement of the substrate. The scanning movement of the substrate is a linear movement and the measurement includes obtaining a reflected image of the target using a pulsed light source, the duration of a single light pulse being less than 100 psec. A lithographic apparatus includes such a measurement apparatus, and a device manufacturing method includes such a measurement method.

    摘要翻译： 一种用于测量衬底特性的方法和装置。 在基板上存在靶，并且在基板的扫描运动期间进行测量。 基板的扫描运动是线性运动，并且测量包括使用脉冲光源获得目标的反射图像，单个光脉冲的持续时间小于100psec。 光刻设备包括这样的测量设备，并且包括这种测量方法的设备制造方法。

    Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments
    39.
    发明授权
    Lithographic apparatus and device manufacturing method involving a level sensor having a detection grating including three or more segments 有权
    涉及具有包括三个或更多个段的检测光栅的液位传感器的平版印刷设备和设备制造方法

    公开(公告)号：US08351024B2

    公开(公告)日：2013-01-08

    申请号：US12722924

    申请日：2010-03-12

    申请人： Arie Jeffrey Den Boef

    发明人： Arie Jeffrey Den Boef

    IPC分类号： G03B27/58

    CPC分类号： G01B11/0608 ,  G03F9/7034

    摘要： A level sensor configured to determine a height level of a substrate is disclosed. The level sensor includes a projection unit to project a measurement beam having a substantially periodic radiation intensity on the substrate; a detection unit to receive the measurement beam after reflection on the substrate, the detection unit having a detection grating arranged to receive the reflected measurement beam, the detection grating comprising at least one array of three or more segments together having a length substantially equal to a length of a period of the measurement beam projected on the detection grating, and configured to split the reflected measurement beam in three or more reflected measurement beam parts, and three or more detectors each arranged to receive one of the three or more measurement beam parts; and a processing unit to calculate a height level on the basis of the measurement beam parts.

    摘要翻译： 公开了一种配置成确定基板的高度水平的液位传感器。 液位传感器包括：投影单元，用于将具有基本上周期性辐射强度的测量光束投射到基板上; 检测单元，用于在所述基板上反射之后接收所述测量光束，所述检测单元具有布置成接收所述反射的测量光束的检测光栅，所述检测光栅包括三个或更多个段的至少一个阵列，所述三个或更多个段的长度基本上等于 投影在检测光栅上的测量光束的周期的长度，并且被配置为将反射的测量光束分成三个或更多个反射的测量光束部分，以及三个或更多个检测器，每个检测器被布置成接收三个或更多个测量光束部分中的一个; 以及处理单元，其基于测量光束部分来计算高度水平。