TRANSMITTER
    34.
    发明申请
    TRANSMITTER 有权
    发射机

    公开(公告)号:US20110075756A1

    公开(公告)日:2011-03-31

    申请号:US12890732

    申请日:2010-09-27

    Inventor: Ryosuke WATANABE

    CPC classification number: H04L27/2607 H04L27/2626

    Abstract: A transmitter includes an OFDM symbol generator for generating an effective symbol including a plurality of sub-carriers orthogonal to each other in frequency and sequentially generating an OFDM symbol in which a signal in a first period from a first end of the effective symbol is added to a second end of the effective symbol as a guard interval, and a convolution filter for performing an convolution operation on data strings at a plurality of sampling points of the OFDM symbol, wherein when the convolution filter performs a convolution operation on the first data strings including a data string at the first end of the effective symbol, the convolution filter performs the convolution operation on the first data strings in which a data string at the second end of the effective symbol is cyclically added to a data string at the first end.

    Abstract translation: 发射机包括:OFDM符号发生器,用于生成包括频率彼此正交的多个子载波的有效符号,并且顺序地生成OFDM符号,其中从有效符号的第一个末尾起的第一周期中的信号被加到 所述有效符号的第二端作为保护间隔,以及卷积滤波器,用于对所述OFDM符号的多个采样点处的数据串进行卷积运算,其中当所述卷积滤波器对所述第一数据串进行卷积运算时,包括: 在有效符号的第一端的数据串,卷积滤波器对第一数据串执行卷积运算,其中有效符号的第二端的数据串被循环地添加到第一端的数据串。

    TRANSISTOR AND DISPLAY DEVICE
    35.
    发明申请
    TRANSISTOR AND DISPLAY DEVICE 审中-公开
    晶体管和显示器件

    公开(公告)号:US20110062436A1

    公开(公告)日:2011-03-17

    申请号:US12880343

    申请日:2010-09-13

    Abstract: To provide a transistor having a favorable electric characteristics and high reliability and a display device including the transistor. The transistor is a bottom-gate transistor formed using an oxide semiconductor for a channel region. An oxide semiconductor layer subjected to dehydration or dehydrogenation through heat treatment is used as an active layer. The active layer includes a first region of a superficial portion microcrystallized and a second region of the rest portion. By using the oxide semiconductor layer having such a structure, a change to an n-type, which is attributed to entry of moisture to the superficial portion or elimination of oxygen from the superficial portion, and generation of a parasitic channel can be suppressed. In addition, contact resistance between the oxide semiconductor layer and source and drain electrodes can be reduced.

    Abstract translation: 提供具有良好的电特性和高可靠性的晶体管以及包括该晶体管的显示装置。 晶体管是使用用于沟道区的氧化物半导体形成的底栅晶体管。 使用通过热处理进行脱水或脱氢的氧化物半导体层作为活性层。 有源层包括微结晶的浅表部分的第一区域和其余部分的第二区域。 通过使用具有这种结构的氧化物半导体层,可以抑制归因于表层部分的水分进入或从表面部分的氧的消除导致的n型变化,以及寄生通道的产生。 此外,可以减小氧化物半导体层与源极和漏极之间的接触电阻。

    Manufacturing method of semiconductor device
    40.
    发明申请
    Manufacturing method of semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US20070077691A1

    公开(公告)日:2007-04-05

    申请号:US11522455

    申请日:2006-09-18

    Inventor: Ryosuke Watanabe

    Abstract: It is an object of the present invention to provide a manufacturing method of a semiconductor device where a semiconductor element is prevented from being damaged and throughput speed thereof is improved, even in a case of thinning or removing a supporting substrate after forming the semiconductor element over the supporting substrate. According to one feature of the present invention, a method for manufacturing a semiconductor device includes the steps of forming a plurality of element groups over an upper surface of a substrate; forming an insulating film so as to cover the plurality of element groups; selectively forming an opening to the insulating film which is located in a region between neighboring two element groups in the plurality of element groups to expose the substrate; forming a first film so as to cover the insulating film and the opening; exposing the element groups by removing the substrate; forming a second film so as to cover the surface of the exposed element groups; and cutting off between the plurality of element groups so as not to expose the insulating film.

    Abstract translation: 本发明的目的是提供一种半导体器件的制造方法,即使在形成半导体元件之后,在使半导体元件变薄或去除支撑基板的情况下,也可以防止半导体元件受到损坏并且其吞吐速度得到改善 支撑基板。 根据本发明的一个特征,一种制造半导体器件的方法包括以下步骤:在衬底的上表面上形成多个元件组; 形成绝缘膜以覆盖所述多个元件组; 选择性地形成位于所述多个元件组中相邻的两个元件组之间的区域中的绝缘膜的开口以露出所述衬底; 形成第一膜以覆盖绝缘膜和开口; 通过去除衬底暴露元件组; 形成第二膜以覆盖暴露的元件组的表面; 并且在多个元件组之间切断以便不暴露绝缘膜。

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