公开(公告)号：US20150184296A1

公开(公告)日：2015-07-02

申请号：US14572087

申请日：2014-12-16

Applicant: Lam Research Corporation

Inventor： Lin Xu ,  Hong Shih ,  Nash Anderson ,  Tom Stevenson ,  John Daugherty ,  John Michael Kerns ,  Robert Griffith O'Neill

IPC: C23C16/455 ,  C23C16/46 ,  H01L21/67 ,  C23C16/52

CPC classification number: C23C14/564 ,  C23C16/045 ,  C23C16/4402 ,  C23C16/4404 ,  C23C16/45525 ,  Y10T29/41 ,  Y10T428/263 ,  Y10T428/31504 ,  Y10T428/31551 ,  Y10T428/31678 ,  Y10T428/31721 ,  Y10T428/31725 ,  Y10T428/31786

Abstract: A coating system for forming an atomic layer deposition (ALD) or a molecular layer deposition (MLD) barrier coating on interior fluid wetted surfaces of a fluid handling component for a vacuum chamber of a semiconductor substrate processing apparatus. The coating system includes the fluid handling component, wherein the interior fluid wetted surfaces define a process region of the coating system, a gas supply system in fluid communication with the process region of the component wherein the gas supply system supplies process gases to the process region of the component through the inlet port thereof such that an ALD or MLD barrier coating can be formed on the fluid wetted surfaces of the fluid handling component, and an exhaust system in fluid communication with the process region of the component wherein the exhaust system exhausts the process gases from the process region of the component through the outlet port thereof.

Abstract translation: 一种用于在半导体衬底处理设备的真空室的流体处理部件的内部流体润湿表面上形成原子层沉积（ALD）或分子层沉积（MLD）阻挡涂层的涂层系统。 涂层系统包括流体处理部件，其中内部流体润湿表面限定涂层系统的工艺区域，与部件的工艺区域流体连通的气体供应系统，其中气体供应系统将工艺气体提供给过程区域 的组件通过其入口使得可以在流体处理组件的流体润湿表面上形成ALD或MLD阻挡涂层，以及与组件的处理区域流体连通的排气系统，其中排气系统排出 从组件的工艺区域通过其出口处理气体。

公开(公告)号：US08945317B2

公开(公告)日：2015-02-03

申请号：US13650429

申请日：2012-10-12

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  Allan Ronne ,  John Daugherty ,  Catherine Zhou

IPC: B08B9/02

CPC classification number: B08B9/0328

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。

公开(公告)号：US20140315392A1

公开(公告)日：2014-10-23

申请号：US13867522

申请日：2013-04-22

Applicant: LAM RESEARCH CORPORATION

Inventor： Lin Xu ,  Hong Shih ,  Anthony Amadio ,  Rajinder Dhindsa ,  John Michael Kerns ,  John Daugherty

IPC: H01L21/67

CPC classification number: C23C16/4404 ,  H01J37/32477 ,  Y10T428/12736 ,  Y10T428/12806 ,  Y10T428/12819 ,  Y10T428/1284 ,  Y10T428/12861 ,  Y10T428/12896 ,  Y10T428/12903 ,  Y10T428/12944 ,  Y10T428/12951 ,  Y10T428/12979 ,  Y10T428/265 ,  Y10T428/31678

Abstract: A cold spray barrier coated component of a semiconductor plasma processing chamber comprises a substrate having at least one metal surface wherein a portion of the metal surface is configured to form an electrical contact. A cold spray barrier coating is formed from a thermally and electrically conductive material on at least the metal surface configured to form the electrical contact of the substrate. Further, the cold spray barrier coating may also be located on a plasma exposed and/or process gas exposed surface of the component.

Abstract translation: 半导体等离子体处理室的冷喷涂屏障涂层部件包括具有至少一个金属表面的基板，其中金属表面的一部分被配置成形成电接触。 至少金属表面上的热导电材料形成冷喷涂阻挡涂层，所述金属表面被构造成形成基板的电接触。 此外，冷喷涂阻挡涂层也可以位于组件的等离子体暴露和/或处理气体暴露表面上。

公开(公告)号：US20140261575A1

公开(公告)日：2014-09-18

申请号：US13833487

申请日：2013-03-15

Applicant: LAM RESEARCH CORPORATION

Inventor： Armen Avoyan ,  Cliff LaCroix ,  Hong Shih ,  John Daugherty

IPC: B08B3/12

CPC classification number: B08B3/12 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007 ,  H01L21/67017 ,  H01L21/67051

Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.

Abstract translation: 具有声场换能器，清洁室和开口密封面的颗粒去除工具。 清洁室具有从声场换能器延伸到打开的密封面的清洁流体引导室，与清洁流体引导室流体连通的清洁流体输送通道和清洁流体返回通道。 敞开的密封面具有与由开口密封面形成的平面邻接的清洁入口和与清洁表面平面形成流体密封的腔到表面的界面密封件。 声场传感器设置在清洁门口的视线内，并产生频率在大约20kHz到大约2MHz之间的声波。

公开(公告)号：US20130146095A1

公开(公告)日：2013-06-13

申请号：US13650429

申请日：2012-10-12

Applicant: LAM RESEARCH CORPORATION

Inventor： Armen Avoyan ,  Cliff La Croix ,  Hong Shih ,  Allan Ronne ,  John Daugherty ,  Catherine Zhou

IPC: B08B9/032 ,  B08B3/02

CPC classification number: B08B9/0328

Abstract: An injector cleaning apparatus with a concentric dual flow introducer and a flow-dispersing injector seat along with a method of cleaning an injector. The concentric dual flow introducer has concentric cleaning fluid flowpaths configured to communicate with a central passage and a plurality of peripheral passages of a gas injector. The input-side injector engaging interface of the concentric dual flow introducer and the flow-dispersing injector seat each have a compressible sealing portion having compressibility sufficient to yield under fluid cleaning surges attributable to initiation and termination of cleaning fluid flow through the injector cleaning apparatus along with resiliency sufficient to prevent abutment of the gas injector and a rigid facing portion of the input-side injector engaging interface and output-side injector engaging interface respectively.

Abstract translation: 具有同心双流引导器和分流喷射器座的喷射器清洁装置以及清洁喷射器的方法。 同心双流引导器具有配置成与气体注射器的中心通道和多个外围通道连通的同心清洁流体流动路径。 同心双流引导器和流量分散注射器座的输入侧注射器接合界面各自具有可压缩的密封部分，该密封部分具有足够的压缩性，足以产生由于通过喷射器清洁装置的清洁流体流动的起始和终止引起的流体清洁浪涌 其弹性足以防止气体注射器和输入侧注射器接合界面和输出侧注射器接合界面的刚性面对部分的邻接。

公开(公告)号：US11112773B2

公开(公告)日：2021-09-07

申请号：US15666866

申请日：2017-08-02

Applicant: Lam Research Corporation

Inventor： David D. Trussell ,  Alan J. Miller ,  John Daugherty ,  Alex Paterson

IPC: G05B19/418 ,  H01L21/67

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US20190115189A1

公开(公告)日：2019-04-18

申请号：US15785983

申请日：2017-10-17

Applicant: Lam Research Corporation

Inventor： Evan Edward Patton ,  John Daugherty

IPC: H01J37/32 ,  H01L21/3065 ,  H01L21/443

Abstract: An electrode for transmitting radiofrequency power to a plasma processing region includes a plate formed of semiconducting material and a high electrical conductivity layer formed on a top surface of the plate and integral with the plate. The high electrical conductivity layer has a lower electrical resistance than the semiconducting material of the plate. The electrode includes a distribution of through-holes. Each through-hole extends through an entire thickness of the electrode from a top surface of the high electrical conductivity layer to a bottom surface of the plate. In some embodiments, the plate can be formed of a silicon material and the high electrical conductivity layer can be a silicide material formed from the silicon material of the plate.

公开(公告)号：US20180032062A1

公开(公告)日：2018-02-01

申请号：US15666866

申请日：2017-08-02

Applicant: Lam Research Corporation

Inventor： David D. Trussell ,  Alan J. Miller ,  John Daugherty ,  Alex Paterson

IPC: G05B19/418

CPC classification number: G05B19/418 ,  G05B19/41875 ,  G05B2219/32212 ,  G05B2219/45031 ,  G05B2219/50291 ,  H01L21/67167 ,  H01L21/6719 ,  Y02P90/22

Abstract: A cluster tool assembly includes a vacuum transfer module, a process module having a first side connected to the vacuum transfer module. An isolation valve having a first side and a second side, the first side of the isolation valve coupled to a second side of the process module. A replacement station is coupled to the second side of the isolation valve. The replacement station includes an exchange handler and a part buffer. The part buffer includes a plurality of compartments to hold new or used consumable parts. The process module includes a lift mechanism to enable placement of a consumable part installed in the process module to a raised position. The raised position provides access to the exchange handler to enable removal of the consumable part from the process module and store in a compartment of the part buffer. The exchange handler of the replacement station is configured to provide a replacement for the consumable part from the part buffer back to the process module. The lift mechanism is configured to receive the consumable part provided for replacement by the exchange handler and lower the consumable part to an installed position. The replacement by the exchange handler and the process module is conducted while the process module and the replacement station are maintained in a vacuum state.

公开(公告)号：US20170110351A1

公开(公告)日：2017-04-20

申请号：US14887959

申请日：2015-10-20

Applicant: Lam Research Corporation

Inventor： David Trussell ,  Richard Gould ,  John Daugherty

IPC: H01L21/67 ,  H01L21/673 ,  H01L21/677

CPC classification number: H01L21/67201 ,  H01L21/67063 ,  H01L21/67161 ,  H01L21/67207 ,  H01L21/6732 ,  H01L21/67727 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67757 ,  H01L21/67766

Abstract: A load lock assembly includes a first load lock connected between an equipment front end module (EFEM) and a wafer transport module, the EFEM being at a lab ambient condition, the wafer transport module being at a vacuum condition, the wafer transport module being part of a wafer transport assembly that is configured to transport wafers to and from one or more process modules that are connected to the wafer transport assembly; a second load lock disposed over the first load lock, the second load lock connected between the EFEM and the wafer transport module; a post-processing module disposed over the second load lock, the post-processing module configured for performing a post-processing operation on a processed wafer that has been processed in at least one of the process modules that are connected to the wafer transport assembly, the post-processing module being configured for connection to the wafer transport module.

公开(公告)号：US09505036B2

公开(公告)日：2016-11-29

申请号：US13833487

申请日：2013-03-15

Applicant: Lam Research Corporation

Inventor： Armen Avoyan ,  Cliff LaCroix ,  Hong Shih ,  John Daugherty

IPC: B08B3/12 ,  C11D11/00 ,  H01L21/67

CPC classification number: B08B3/12 ,  C11D11/0041 ,  C11D11/0047 ,  C11D11/007 ,  H01L21/67017 ,  H01L21/67051

Abstract: A particle removal tool having a sound field transducer, a cleaning chamber, and an open sealing face. The cleaning chamber having a cleaning fluid guiding chamber extending from the sound field transducer to the open sealing face, a cleaning fluid delivery channel in fluid communication with the cleaning fluid guiding chamber, and a cleaning fluid return channel. The open sealing face has a cleaning portal disposed contiguous with a plane formed by the open sealing face and a chamber-to-surface interface seal which forms a fluid tight seal with a cleaning surface plane. The sound field transducer is disposed within a line-of-sight of the cleaning portal and generates acoustic waves with a frequency between approximately 20 kHz and approximately 2 MHz.

Abstract translation: 具有声场换能器，清洁室和开口密封面的颗粒去除工具。 清洁室具有从声场换能器延伸到打开的密封面的清洁流体引导室，与清洁流体引导室流体连通的清洁流体输送通道和清洁流体返回通道。 敞开的密封面具有与由开口密封面形成的平面邻接的清洁入口和与清洁表面平面形成流体密封的腔到表面的界面密封件。 声场传感器设置在清洁门口的视线内，并产生频率在大约20kHz到大约2MHz之间的声波。