Cutting unit for a dry-shaving apparatus
    31.
    发明授权
    Cutting unit for a dry-shaving apparatus 失效
    用于干燥剃须设备的切割单元

    公开(公告)号:US4283849A

    公开(公告)日:1981-08-18

    申请号:US72277

    申请日:1979-09-04

    IPC分类号: B26B19/14 B26B19/42

    CPC分类号: B26B19/141 B26B19/42

    摘要: The movable cutting unit of a dry-shaver comprises a plurality of cutters (23) and a corresponding plurality of hair-pulling blades (24) each arranged in front of one of the cutters for movement therewith relative to the shear plate or foil of the shaver, and each movable relative to the associated cutter for its hair-pulling action. Each hair-pulling blade is mounted for pivoting motion on its associated cutter.

    摘要翻译: 干式剃须刀的可移动切割单元包括多个切割器(23)和相应的多个头发拉动叶片(24),每个切割器布置在一个切割器的前面,用于相对于剪切板或箔片 剃须刀,并且每个剃须刀相对于相关联的切割器可移动以用于其牵引动作。 每个拔毛刀被安装成在其相关联的切割器上枢转运动。

    Fabrication of micro lenses
    33.
    发明授权
    Fabrication of micro lenses 有权
    微型镜片的制造

    公开(公告)号:US09030744B2

    公开(公告)日:2015-05-12

    申请号:US13235707

    申请日:2011-09-19

    摘要: A method for fabricating a micro lens array is provided. The method includes forming a first lens material structure on a substrate. The first lens material structure includes a plurality of elevated portions. The elevated portions are separated by recesses. Moreover, the plurality of elevated portions have an average height of at least 3 micrometers. Furthermore, the method for fabricating a micro lens array includes depositing a dielectric material on the first lens material structure and the recesses to form a second lens material structure. The second lens material structure has an average thickness of at least 1 micrometer. Moreover, the first and second lens material structures form together the micro lens array.

    摘要翻译: 提供一种制造微透镜阵列的方法。 该方法包括在基底上形成第一透镜材料结构。 第一透镜材料结构包括多个升高部分。 升高部分由凹部分开。 此外,多个升高部分具有至少3微米的平均高度。 此外,制造微透镜阵列的方法包括在第一透镜材料结构和凹部上沉积介电材料以形成第二透镜材料结构。 第二透镜材料结构具有至少1微米的平均厚度。 此外,第一和第二透镜材料结构一起形成微透镜阵列。

    Method for etching substrate
    34.
    发明授权
    Method for etching substrate 有权
    蚀刻基板的方法

    公开(公告)号:US08993437B2

    公开(公告)日:2015-03-31

    申请号:US13282491

    申请日:2011-10-27

    摘要: One or more embodiments relate to a method of making a semiconductor structure, comprising: forming a patterned metallic layer over a semiconductor substrate; forming a second layer over the patterned metallic layer; and etching the substrate.

    摘要翻译: 一个或多个实施例涉及制造半导体结构的方法,包括:在半导体衬底上形成图案化金属层; 在所述图案化金属层上形成第二层; 并蚀刻衬底。

    Method of patterning a substrate
    35.
    发明授权
    Method of patterning a substrate 有权
    图案化基板的方法

    公开(公告)号:US08877610B2

    公开(公告)日:2014-11-04

    申请号:US13163792

    申请日:2011-06-20

    摘要: In various embodiments, a method of patterning a substrate may include: forming an auxiliary layer on or above a substrate and forming a plasma etch mask layer on or above the auxiliary layer, wherein the auxiliary layer is configured such that it may be removed from the substrate more easily than the plasma etch mask layer; patterning the plasma etch mask layer and the auxiliary layer such that at least a portion of the substrate is exposed; patterning the substrate by means of a plasma etch process using the patterned plasma etch mask layer as a plasma etch mask.

    摘要翻译: 在各种实施例中,图案化衬底的方法可以包括:在衬底上或上方形成辅助层,并在辅助层上或上方形成等离子体蚀刻掩模层,其中辅助层被配置为使得其可以从 衬底比等离子体蚀刻掩模层更容易; 图案化等离子体蚀刻掩模层和辅助层,使得至少一部分基板被暴露; 通过使用图案化等离子体蚀刻掩模层作为等离子体蚀刻掩模的等离子体蚀刻工艺图案化衬底。

    Device for detecting movement and forces
    37.
    发明授权
    Device for detecting movement and forces 有权
    用于检测运动和力的装置

    公开(公告)号:US08462358B2

    公开(公告)日:2013-06-11

    申请号:US12519246

    申请日:2007-10-18

    CPC分类号: G01L5/166 G01D5/26

    摘要: The invention relates to an apparatus for input of movements and/or registration of forces, comprising at least one light source, at least one position sensitive device (PSD) and at least one diaphragm, wherein at least one of these three elements is moveable with respect to the two other elements. The light source is arranged at a mounting so that light from the light source is emitted through an opening in the mounting and through the at least one diaphragm onto the at least one PSD.

    摘要翻译: 本发明涉及用于输入力的移动和/或配准的装置,包括至少一个光源,至少一个位置敏感装置(PSD)和至少一个隔膜,其中这三个元件中的至少一个可以与 尊重另外两个要素。 光源布置在安装件处,使得来自光源的光通过安装件中的开口并通过至少一个隔膜发射到至少一个PSD上。

    Method of making semiconductor device
    38.
    发明申请
    Method of making semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US20130115771A1

    公开(公告)日:2013-05-09

    申请号:US13288054

    申请日:2011-11-03

    IPC分类号: H01L21/768

    摘要: One or more embodiments may include a method of making a semiconductor structure, comprising: forming a first opening partially through a semiconductor substrate; forming a first dielectric layer over a sidewall surface of the first opening; and forming a second opening partially through a semiconductor substrate, the second opening being below the first opening.

    摘要翻译: 一个或多个实施例可以包括制造半导体结构的方法,包括:部分地通过半导体衬底形成第一开口; 在所述第一开口的侧壁表面上形成第一电介质层; 并且部分地通过半导体衬底形成第二开口,所述第二开口位于所述第一开口的下方。

    Fabrication of Micro Lenses
    39.
    发明申请
    Fabrication of Micro Lenses 有权
    微镜的制作

    公开(公告)号:US20130070343A1

    公开(公告)日:2013-03-21

    申请号:US13235707

    申请日:2011-09-19

    IPC分类号: G02B27/12 B05D5/06

    摘要: A method for fabricating a micro lens array is provided. The method includes forming a first lens material structure on a substrate. The first lens material structure includes a plurality of elevated portions. The elevated portions are separated by recesses. Moreover, the plurality of elevated portions have an average height of at least 3 micrometers. Furthermore, the method for fabricating a micro lens array includes depositing a dielectric material on the first lens material structure and the recesses to form a second lens material structure. The second lens material structure has an average thickness of at least 1 micrometer. Moreover, the first and second lens material structures form together the micro lens array.

    摘要翻译: 提供一种制造微透镜阵列的方法。 该方法包括在基底上形成第一透镜材料结构。 第一透镜材料结构包括多个升高部分。 升高部分由凹部分开。 此外,多个升高部分具有至少3微米的平均高度。 此外,制造微透镜阵列的方法包括在第一透镜材料结构和凹部上沉积介电材料以形成第二透镜材料结构。 第二透镜材料结构具有至少1微米的平均厚度。 此外,第一和第二透镜材料结构一起形成微透镜阵列。