公开(公告)号：US08569722B2

公开(公告)日：2013-10-29

申请号：US13042755

申请日：2011-03-08

申请人： Kouji Kakizaki ,  Tooru Abe ,  Osamu Wakabayashi

发明人： Kouji Kakizaki ,  Tooru Abe ,  Osamu Wakabayashi

IPC分类号： H05G2/00

CPC分类号： H05G2/008 ,  H01S3/2232 ,  H01S3/2316 ,  H05G2/003

摘要： An extreme ultraviolet light generation apparatus may include: a laser apparatus; a chamber provided with an inlet for introducing a laser beam outputted from the laser apparatus to the inside thereof; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a collector mirror disposed in the chamber for collecting extreme ultraviolet light generated when the target material is irradiated with the laser beam in the chamber; an extreme ultraviolet light detection unit for detecting energy of the extreme ultraviolet light; and an energy control unit for controlling energy of the extreme ultraviolet light.

摘要翻译： 极紫外光发生装置可以包括：激光装置; 设置有用于将从激光装置输出的激光束引入其内部的入口的室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 设置在所述室中的收集器反射镜，用于收集当所述靶材料在所述腔室中被激光束照射时产生的极紫外光; 用于检测极紫外光的能量的极紫外光检测单元; 以及用于控制极紫外光的能量的能量控制单元。

公开(公告)号：US20120243566A1

公开(公告)日：2012-09-27

申请号：US13492067

申请日：2012-06-08

申请人： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi

发明人： Tsukasa Hori ,  Kouji Kakizaki ,  Tatsuya Yanagida ,  Osamu Wakabayashi

IPC分类号： H01S3/13

CPC分类号： H05G2/008 ,  H01S3/02 ,  H01S3/094026 ,  H01S3/10061 ,  H01S3/1106 ,  H01S3/131 ,  H01S3/1636 ,  H01S3/1643 ,  H01S3/2232 ,  H01S3/2316 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005

摘要： A system includes a chamber, a laser beam apparatus configured to generate a laser beam to be introduced into the chamber, a laser controller for the laser beam apparatus to control at least a beam intensity and an output timing of the laser beam, and a target supply unit configured to supply a target material into the chamber, the target material being irradiated with the laser beam for generating extreme ultraviolet light.

摘要翻译： 一种系统，包括：室，激光束装置，被配置为产生要被引入到所述腔室中的激光束;激光控制器，用于激光束装置至少控制激光束的光束强度和输出定时;以及目标 供给单元，被配置为将目标材料供应到所述室中，所述目标材料被所述激光束照射以产生极紫外光。

公开(公告)号：US20110261844A1

公开(公告)日：2011-10-27

申请号：US13176483

申请日：2011-07-05

申请人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

发明人： Tamotsu ABE ,  Hideo Hoshino ,  Akira Endo ,  Osamu Wakabayashi ,  Kouji Kakizaki

IPC分类号： H01S3/10

CPC分类号： H01S3/2316 ,  H01S3/076 ,  H01S3/10007 ,  H01S3/2232

摘要： The higher efficiency and lower power consumption are realized in a laser system for generating a high-power short-pulse laser beam. The laser system includes a laser oscillator for generating a pulse laser beam by laser oscillation, plural amplifiers for sequentially inputting the pulse laser beam generated by the laser oscillator and amplifying the pulse laser beam, and a control unit for controlling the laser oscillator to perform burst oscillation and halting an amplification operation of at least one of the plural amplifiers in a burst halt period between burst oscillation periods.

摘要翻译： 在用于产生大功率短脉冲激光束的激光系统中实现更高的效率和更低的功率消耗。 激光系统包括用于通过激光振荡产生脉冲激光束的激光振荡器，用于顺序地输入由激光振荡器产生的脉冲激光束并放大脉冲激光束的多个放大器，以及用于控制激光振荡器进行突发的控制单元 在突发振荡周期之间的突发停止时段中振荡并停止多个放大器中的至少一个的放大操作。

公开(公告)号：US08901522B2

公开(公告)日：2014-12-02

申请号：US13196311

申请日：2011-08-02

申请人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Yoshifumi Ueno ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： H05G2/00 ,  G21K5/00 ,  G03F7/20

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70916 ,  H05G2/008

摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet through which a laser beam outputted from the laser apparatus enters the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber; a magnetic field generation unit for generating a magnetic field in the predetermined region; and a charged particle collection unit disposed in a direction of a magnetic flux of the magnetic field for collecting a charged particle thereinto, the charged particle being generated when the target material is irradiated with the laser beam inside the chamber and traveling along the magnetic flux.

摘要翻译： 与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，从激光装置输出的激光束通过该入口进入室; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室内的预定区域; 用于在预定区域中产生磁场的磁场产生单元; 以及带电粒子收集单元，其设置在所述磁场的磁通方向上，用于收集带电粒子，所述带电粒子是当所述靶材料被所述腔室内的所述激光束照射并且沿着所述磁通量行进时产生的。

公开(公告)号：US20130134326A1

公开(公告)日：2013-05-30

申请号：US13595312

申请日：2012-08-27

申请人： Takayuki Yabu ,  Youichi Sasaki ,  Yulaka Shiraishi ,  Shinji Nagai ,  Osamu Wakabayashi

发明人： Takayuki Yabu ,  Youichi Sasaki ,  Yulaka Shiraishi ,  Shinji Nagai ,  Osamu Wakabayashi

IPC分类号： G21K5/02 ,  B65B63/08

CPC分类号： H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/006

摘要： A target collection device may include a collection container having an opening through which a target material is collected into the collection container, and a temperature adjuster configured to adjust a temperature of the collection container to a temperature that is equal to or higher than a melting point of the target material. The target collection device may be part of an extreme ultraviolet light generation apparatus. Methods of target collection are also provided.

摘要翻译： 目标收集装置可以包括具有开口的收集容器，目标材料通过该开口被收集到收集容器中;温度调节器，被配置为将收集容器的温度调节到等于或高于熔点的温度 的目标材料。 目标收集装置可以是极紫外光发生装置的一部分。 还提供目标收集方法。

公开(公告)号：US20110204249A1

公开(公告)日：2011-08-25

申请号：US13032172

申请日：2011-02-22

申请人： Shinji NAGAI ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji NAGAI ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01J1/42 ,  G01J3/10 ,  H01J1/50

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US07903700B2

公开(公告)日：2011-03-08

申请号：US11631463

申请日：2005-07-07

申请人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

发明人： Shinji Nagai ,  Osamu Wakabayashi ,  Koji Kakizaki ,  Takayuki Yabu ,  Takahito Kumazaki

IPC分类号： H01S3/10 ,  H01S3/22

CPC分类号： H01S3/2366 ,  H01S3/134 ,  H01S3/225

摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.

摘要翻译： 通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E95）。 为了使测得的光谱纯度范围（E95）在目标光谱纯度范围（E950）的允许范围E950±dE95内，从通过振荡激光装置（100）开始放电的时间到放电为止的放电时间 由放大激光装置（300）开始的光谱纯度范围（E95）被控制为稳定。

公开(公告)号：US20120223257A1

公开(公告)日：2012-09-06

申请号：US13474100

申请日：2012-05-17

申请人： Shinji NAGAI ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

发明人： Shinji NAGAI ,  Tamotsu Abe ,  Hitoshi Nagano ,  Osamu Wakabayashi

IPC分类号： G21K5/04

CPC分类号： H05G2/008 ,  B23K10/00 ,  B23K26/12 ,  B23K26/36 ,  G03B27/32 ,  G03F7/70025 ,  G03F7/70033 ,  G21K1/067 ,  G21K5/00 ,  G21K5/02 ,  G21K2201/064 ,  H05G2/005

摘要： An apparatus for generating extreme ultraviolet light used with a laser apparatus and connected to an external device so as to supply the extreme ultraviolet light thereto includes a chamber provided with at least one inlet through which a laser beam is introduced into the chamber; a target supply unit provided on the chamber configured to supply a target material to a predetermined region inside the chamber; a discharge pump connected to the chamber; at least one optical element provided inside the chamber; an etching gas introduction unit provided on the chamber through which an etching gas passes; and at least one temperature control mechanism for controlling a temperature of the at least one optical element.

摘要翻译： 一种用于产生与激光装置并且连接到外部装置以便提供极紫外光的极紫外光的装置，包括设置有至少一个入口的腔室，激光束通过该入口引入腔室; 设置在所述室上的目标供给单元，其构造成将目标材料供应到所述室内的预定区域; 连接到所述室的排出泵; 设置在所述室内的至少一个光学元件; 蚀刻气体导入单元，设置在所述室上，蚀刻气体通过所述蚀刻气体导入单元; 以及用于控制所述至少一个光学元件的温度的至少一个温度控制机构。

公开(公告)号：US08242474B2

公开(公告)日：2012-08-14

申请号：US13032172

申请日：2011-02-22

申请人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

发明人： Shinji Nagai ,  Tamotsu Abe ,  Takanobu Ishihara ,  Osamu Wakabayashi

IPC分类号： G01N21/33 ,  H01J1/50 ,  G21K5/08

CPC分类号： H05G2/003 ,  G01J3/10 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

摘要： An extreme ultraviolet light generation apparatus used in combination with a laser system, the apparatus may include: a chamber provided with at least one inlet port for introducing a laser beam outputted from the laser system into the chamber; a target supply unit provided to the chamber for supplying a target material to a predetermined region inside the chamber, where the target material is irradiated with the laser beam; at least one optical element disposed inside the chamber; a magnetic field generation unit for generating a magnetic field around the predetermined region; an ion collection unit disposed in a direction of a line of magnetic force of the magnetic field for collection an ion which is generated when the target material is irradiated with the laser beam and is flowing along the line of magnetic force; and a gas introduction unit for introducing an etching gas into the chamber.

摘要翻译： 一种与激光系统组合使用的极紫外光发生装置，该装置可以包括：设置有至少一个入口的腔室，用于将从激光系统输出的激光束引入腔室; 目标供给单元，其设置在所述室中，用于将所述目标材料供给到所述室内的预定区域，所述目标材料用所述激光束照射; 设置在所述室内的至少一个光学元件; 用于产生围绕预定区域的磁场的磁场产生单元; 离子收集单元，设置在所述磁场的磁力线的方向上，用于收集当所述靶材料被所述激光束照射并沿着所述磁力线流动时产生的离子; 以及用于将蚀刻气体引入到室中的气体引入单元。

公开(公告)号：US06636297B2

公开(公告)日：2003-10-21

申请号：US09842230

申请日：2001-04-26

申请人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

发明人： Osamu Wakabayashi ,  Tatsuo Enami ,  Shinji Nagai

IPC分类号： G01J300

CPC分类号： G01J9/00 ,  G01J1/4257

摘要： A vacuum ultraviolet laser wavelength measuring apparatus capable of accurately measuring wavelength characteristics of a laser beam. The wavelength measuring apparatus has spectral devices for generating an optical pattern corresponding to wavelength characteristics of an incident laser beam and measuring wavelength characteristics of a laser beam in a vacuum ultraviolet region oscillating from a vacuum ultraviolet laser on the basis of the optical pattern. The apparatus has a fluorescent screen for generating a fluorescent pattern having an intensity distribution corresponding to an intensity distribution of the incident optical pattern, a pattern detector for measuring the intensity distribution of the fluorescent pattern, and arithmetic unit for calculating the wavelength characteristics of the laser beam on the basis of the measured intensity distribution.

摘要翻译： 一种能够精确地测量激光束的波长特性的真空紫外激光波长测量装置。 波长测量装置具有用于产生与入射激光束的波长特性相对应的光学图案的光谱装置，并且基于光学图案测量从真空紫外激光器振荡的真空紫外区域中的激光束的波长特性。 该装置具有用于产生具有对应于入射光学图案的强度分布的强度分布的荧光图案的荧光屏，用于测量荧光图案的强度分布的图案检测器和用于计算激光器的波长特性的算术单元 基于测量的强度分布。