Method for manufacturing semiconductor device
    31.
    发明申请
    Method for manufacturing semiconductor device 有权
    制造半导体器件的方法

    公开(公告)号:US20060177579A1

    公开(公告)日:2006-08-10

    申请号:US11376402

    申请日:2006-03-15

    IPC分类号: C23C16/00 H05H1/24

    摘要: Disclosed are PEALD (plasma-enhanced atomic layer deposition) apparatus and PEALD method for manufacturing a semiconductor device, the PEALD apparatus comprising: a housing including a reaction chamber in which a deposition reaction is performed; a rotary disk unit installed in the housing and provided with a plurality of susceptors for receiving wafers thereon so as to move the wafers; a gas spray unit mounted on the upper end of the housing above the rotary disk unit, and provided with first reactive gas sprayers, second reactive gas sprayers and inert gas sprayers on a lower surface of a circular disk for spraying respective gases into the housing; a gas feed unit connected to the gas spray unit for supplying first and second reactive gases and a purge gas into the housing; a gas exhaust port formed around the rotary disk unit; and a plasma generator for generating plasma to excite the second reactive gas.

    摘要翻译: 公开了用于制造半导体器件的PEALD(等离子体增强原子层沉积)装置和PEALD方法,该PEALD装置包括:壳体,包括执行沉积反应的反应室; 旋转盘单元,其安装在壳体中并且设置有用于在其上接收晶片以便移动晶片的多个基座; 安装在旋转盘单元上方的壳体上端的气体喷射单元,并且在圆盘的下表面上设置有第一反应气体喷雾器,第二反应气体喷雾器和惰性气体喷雾器,用于将各种气体喷射到壳体中; 连接到气体喷射单元的气体供给单元,用于将第一和第二反应气体和净化气体供应到壳体中; 形成在旋转盘单元周围的排气口; 以及用于产生等离子体以激发第二反应气体的等离子体发生器。

    Polishing slurry, method of producing same, and method of polishing substrate
    32.
    发明申请
    Polishing slurry, method of producing same, and method of polishing substrate 审中-公开
    抛光浆料,其制造方法以及抛光底物的方法

    公开(公告)号:US20060032149A1

    公开(公告)日:2006-02-16

    申请号:US11193094

    申请日:2005-07-28

    IPC分类号: C09K3/14 B24D3/02 C09C1/68

    摘要: Disclosed is a polishing slurry, particularly, a slurry for chemical mechanical polishing, which is used in a chemical mechanical polishing process for flattening a semiconductor laminate. More particularly, the present invention provides a method of producing a slurry which has high removal selectivity to a nitride layer used as a barrier film in a shallow trench isolation CMP process needed to fabricate ultra highly integrated semiconductors of 256 mega D-RAM or more (Design rule of 0.13 μm or less) and which decreases the occurrence of scratches on a flattened surface, and a method of polishing a substrate using the same.

    摘要翻译: 公开了一种抛光浆料,特别是用于化学机械抛光的浆料,其用于化学机械抛光工艺以使半导体层压体变平。 更具体地说,本发明提供一种制备浆料的方法,该方法对于在制造256兆D-RAM或更高的超高度集成半导体所需的浅沟槽隔离CMP工艺中,对用作阻挡膜的氮化物层具有高的去除选择性( 设计规则为0.13μm以下),并且减少了在平坦化表面上的划痕的发生,以及使用其抛光衬底的方法。

    Flexible tube for an exhaust pipe of an automobile
    33.
    发明申请
    Flexible tube for an exhaust pipe of an automobile 审中-公开
    用于汽车排气管的柔性管

    公开(公告)号:US20060017285A1

    公开(公告)日:2006-01-26

    申请号:US10929849

    申请日:2004-08-30

    申请人: Dae Kim

    发明人: Dae Kim

    IPC分类号: F16L27/12

    摘要: A flexible tube for an exhaust pipe of an automobile, which has a spring member provided along a circumferential surface of outer braids thereof, so that the vibration of the flexible tube and the generation of noise and harshness caused by over-vibration of an exhaust system can be suppressed and riding comfort of drivers and passengers can be improved. The flexible tube according to the present invention comprises a bellows member (10) corrugated to have alternate ridges (11) and furrows (12) along its outer periphery; outer braids (30) provided at a predetermined distance from the outer periphery of the bellows member (10); fixing caps (40) fitted onto both side ends of the outer braids (30) respectively; and a spring member (60) provided on a circumferential surface of the outer braids (30) to be closely contacted thereto.

    摘要翻译: 一种用于汽车排气管的柔性管,其具有沿着其外部编织物的周向表面设置的弹簧构件,使得柔性管的振动以及由排气系统的过度振动引起的噪声和粗糙度的产生 可以抑制乘坐舒适的驾驶员和乘客。 根据本发明的柔性管包括波纹状的波纹管构件(10),沿其外周具有交替的脊(11)和沟槽(12); 外部编织物(30),其设置在距离波纹管部件(10)的外周的预定距离处; 分别安装在外部编织物(30)的两个侧端上的固定帽(40) 以及设置在外编织物(30)的周面上以与其紧密接触的弹簧构件(60)。

    Polishing slurry, method of producing same, and method of polishing substrate
    36.
    发明申请
    Polishing slurry, method of producing same, and method of polishing substrate 有权
    抛光浆料,其制造方法以及抛光底物的方法

    公开(公告)号:US20050198912A1

    公开(公告)日:2005-09-15

    申请号:US11078538

    申请日:2005-03-11

    IPC分类号: B24D3/02 C08J3/14 H01L21/304

    摘要: Disclosed herein is a polishing slurry for chemical mechanical polishing. The polishing slurry comprises polishing particles, which have a particle size distribution including separated fine and large polishing particle peaks. The polishing slurry also comprises polishing particles, which have a median size of 50-150 nm. The present invention provides the slurry having an optimum polishing particle size, in which the polishing particle size is controlled and which is useful to produce semiconductors having fine design rules by changing the production conditions of the slurry. The present invention also provides the polishing slurry and a method of producing the same, in which a desirable CMP removal rate is assured and scratches are suppressed by controlling a polishing particle size distribution, and a method of polishing a substrate.

    摘要翻译: 本文公开了用于化学机械抛光的抛光浆料。 抛光浆料包括抛光颗粒,其具有包括分离的精细和大的抛光颗粒峰的粒度分布。 抛光浆料还包括中值粒径为50-150nm的抛光颗粒。 本发明提供了具有最佳抛光粒度的浆料,其中抛光粒度被控制,并且通过改变浆料的生产条件,可用于制备具有精细设计规则的半导体。 本发明还提供了研磨浆料及其制造方法,其中通过控制抛光粒度分布来确保理想的CMP去除速率和抑制刮痕,以及抛光基材的方法。

    Method of fabricating transistor in semiconductor device
    37.
    发明申请
    Method of fabricating transistor in semiconductor device 失效
    在半导体器件中制造晶体管的方法

    公开(公告)号:US20050142777A1

    公开(公告)日:2005-06-30

    申请号:US11024678

    申请日:2004-12-30

    申请人: Dae Kim

    发明人: Dae Kim

    IPC分类号: H01L21/336 H01L29/78

    摘要: A method of fabricating a transistor in a semiconductor device. A gate oxide layer and a gate are formed on a semiconductor substrate. An oxide layer and a silicon nitride layer are stacked on the substrate. The stacked oxide and silicon nitride layers are etched back to expose a surface of the substrate. The silicon nitride layer is removed to form a gate sidewall spacer. Impurity ions are implanted into the substrate through the exposed surface of the substrate.

    摘要翻译: 一种在半导体器件中制造晶体管的方法。 栅极氧化物层和栅极形成在半导体衬底上。 在基板上层叠氧化物层和氮化硅层。 将层叠的氧化物和氮化硅层回蚀刻以暴露衬底的表面。 去除氮化硅层以形成栅极侧壁间隔物。 杂质离子通过衬底的暴露表面注入到衬底中。

    Latch type optical module
    38.
    发明申请
    Latch type optical module 有权
    锁模型光模块

    公开(公告)号:US20050117855A1

    公开(公告)日:2005-06-02

    申请号:US10999447

    申请日:2004-11-29

    IPC分类号: G02B6/36 G02B6/42

    CPC分类号: G02B6/4292 G02B6/4246

    摘要: A latch type optical communication module, designed to9 be easily mounted and detached to a system port having a cage by means of a latch. The optical communication module is provided with a latch: The latch may be rotated around a hinge shaft fixed to both sides of a receptacle while being inserted into latch holes penetrating both ends of the latch. When the latch is rotated and then allows latch drivers to force a slider upward, the slider raises a fixing tap of the optical communication module inserted into the system port, thereby allowing the optical communication module to be detached from the system port. With the construction of the optical communication module, the plurality of additional components are not required for the optical communication module, thereby lowering manufacturing costs, and the optical communication module can be detached from the system port without any tool and any influence against adjacent optical communication module.

    摘要翻译: 一种闩锁式光通信模块,其被设计成能够通过闩锁容易地安装和拆卸到具有保持架的系统端口。 光通信模块设置有闩锁:闩锁可以围绕固定到插座两侧的铰链轴旋转,同时插入穿过闩锁的两端的闩锁孔中。 当闩锁旋转,然后允许闩锁驱动器向上推动滑块时,滑块升高插入系统端口的光通信模块的固定分接头,从而允许光通信模块从系统端口拆卸。 通过光通信模块的结构,光通信模块不需要多个附加组件,从而降低制造成本,并且可以在没有任何工具的情况下将光通信模块从系统端口拆卸并且对相邻光通信的任何影响 模块。

    Color reproduction method and system, and video display method and device using the same
    40.
    发明申请
    Color reproduction method and system, and video display method and device using the same 有权
    彩色再现方法和系统,以及视频显示方法和使用该设备的设备

    公开(公告)号:US20070171309A1

    公开(公告)日:2007-07-26

    申请号:US11723890

    申请日:2007-03-22

    IPC分类号: H04N9/69

    CPC分类号: H04N9/67 H04N9/69

    摘要: A color reproduction correcting system and method, and a video display device and method can reproduce original color by considering signal source and display device. Each signal source information and each display device information can be stored. The signal source and the display device, which are currently used (e.g., corrected), can be determined, for example, by a user selection. In one embodiment, the signal provided from a transmission side can be inverse gamma-corrected based on a corresponding signal source, and a colorimetric error of the inverse gamma-corrected signal is preferably corrected using corresponding signal source information and display device information. The corrected colorimetric error signal can be gamma-corrected based on a corresponding display device and then can be displayed on the corresponding display device.

    摘要翻译: 色彩再现校正系统和方法以及视频显示装置和方法可以通过考虑信号源和显示装置来再现原始颜色。 可以存储每个信号源信息和每个显示设备信息。 当前使用(例如,校正)的信号源和显示装置可以例如通过用户选择来确定。 在一个实施例中,从发送侧提供的信号可以基于对应的信号源进行反伽马校正,并且优选地使用相应的信号源信息和显示设备信息来校正反伽马校正信号的比色误差。 校正的比色误差信号可以基于相应的显示装置进行伽马校正,然后可以显示在相应的显示装置上。