Galvanic isolation device
    34.
    发明授权

    公开(公告)号:US10121847B2

    公开(公告)日:2018-11-06

    申请号:US15462741

    申请日:2017-03-17

    Abstract: A galvanic isolation device includes a first integrated circuit (IC) die that has communication circuitry formed in a circuit layer below the top surface. A first conductive plate is formed on the IC die proximate the top surface, and is coupled to the communication circuitry. A dielectric isolation layer is formed over a portion of the top surface of the IC after the IC is fabricated such that the dielectric isolation layer completely covers the conductive plate. A second conductive plate is juxtaposed with the first conductive plate but separated by the dielectric isolation layer such that the first conductive plate and the second conductive plate form a capacitor. The second conductive plate is configured to be coupled to a second communication circuit.

    Galvanic Isolation Device
    35.
    发明申请

    公开(公告)号:US20180269272A1

    公开(公告)日:2018-09-20

    申请号:US15462741

    申请日:2017-03-17

    CPC classification number: H01L28/60 H01L23/49575 H01L23/66 H01L2223/6611

    Abstract: A galvanic isolation device includes a first integrated circuit (IC) die that has communication circuitry formed in a circuit layer below the top surface. A first conductive plate is formed on the IC die proximate the top surface, and is coupled to the communication circuitry. A dielectric isolation layer is formed over a portion of the top surface of the IC after the IC is fabricated such that the dielectric isolation layer completely covers the conductive plate. A second conductive plate is juxtaposed with the first conductive plate but separated by the dielectric isolation layer such that the first conductive plate and the second conductive plate form a capacitor. The second conductive plate is configured to be coupled to a second communication circuit.

    Bi-Layer Nanoparticle Adhesion Film
    37.
    发明申请

    公开(公告)号:US20180166369A1

    公开(公告)日:2018-06-14

    申请号:US15378236

    申请日:2016-12-14

    Abstract: A device comprises a substrate) of a first material with a surface, which is modified by depositing a bi-layer nanoparticle film. The film includes a nanoparticle layer of a second material on top of and in contact with surface, and a nanoparticle layer of a third material on top of and in contact with the nanoparticle layer of the second material. The nanoparticles of the third material adhere to the nanoparticles of the second material. The substrate region adjoining surface comprises an admixture of the second material in the first material. A fourth material contacts and chemically/mechanically bonds to the nanoparticle layer of the third material.

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