公开(公告)号：US08597011B2

公开(公告)日：2013-12-03

申请号：US12976746

申请日：2010-12-22

申请人： Andrzei Kaszuba ,  Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ashish Shah ,  Inna Shmurun

发明人： Andrzei Kaszuba ,  Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ashish Shah ,  Inna Shmurun

IPC分类号： B29C35/08

CPC分类号： B05D3/067 ,  B29C71/04 ,  B29C2035/0827 ,  F26B3/28 ,  H01L21/67115

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US20130122611A1

公开(公告)日：2013-05-16

申请号：US13669113

申请日：2012-11-05

申请人： YAO-HUNG YANG ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott A. Hendrickson

发明人： YAO-HUNG YANG ,  Abhijit Kangude ,  Sanjeev Baluja ,  Michael Martinelli ,  Liliya Krivulina ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Scott A. Hendrickson

IPC分类号： H05B37/02 ,  H01L21/26 ,  H01L21/66

CPC分类号： H05B41/3921 ,  H01L21/67115 ,  H05B41/3922

摘要： The present invention generally relates to methods of controlling UV lamp output to increase irradiance uniformity. The methods generally include determining a baseline irradiance within a chamber, determining the relative irradiance on a substrate corresponding to a first lamp and a second lamp, and determining correction or compensation factors based on the relative irradiances and the baseline irradiance. The lamps are then adjusted via closed loop control using the correction or compensation factors to individually adjust the lamps to the desired output. The lamps may optionally be adjusted to equal irradiances prior to adjusting the lamps to the desired output. The closed loop control ensures process uniformity from substrate to substrate. The irradiance measurement and the correction or compensation factors allow for adjustment of lamp set points due to chamber component degradation, chamber component replacement, or chamber cleaning.

摘要翻译： 本发明一般涉及控制UV灯输出以增加辐照度均匀性的方法。 方法通常包括确定室内的基线辐照度，确定对应于第一灯和第二灯的衬底上的相对辐照度，以及基于相对辐照度和基线辐照度确定校正或补偿因子。 然后通过使用校正或补偿因子的闭环控制来调节灯，以将灯单独调节到期望的输出。 在将灯调节到期望的输出之前，灯可以可选地被调整为相等的辐照度。 闭环控制确保从基板到基板的工艺均匀性。 辐照度测量和校正或补偿因素允许由于室部件劣化，腔室部件更换或腔室清洁而调节灯具设定点。

公开(公告)号：US20120205046A1

公开(公告)日：2012-08-16

申请号：US13456308

申请日：2012-04-26

申请人： Karthik Janakiraman ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Mark A. Fodor ,  Dale R. Du Bois ,  Amit Bansal ,  Mohamad A. Ayoub ,  Eller Y. Juco ,  Visweswaren Sivaramakrishnan ,  Hichem M'Saad

发明人： Karthik Janakiraman ,  Thomas Nowak ,  Juan Carlos Rocha-Alvarez ,  Mark A. Fodor ,  Dale R. Du Bois ,  Amit Bansal ,  Mohamad A. Ayoub ,  Eller Y. Juco ,  Visweswaren Sivaramakrishnan ,  Hichem M'Saad

IPC分类号： H01L21/3065

CPC分类号： C23C16/45565 ,  C23C16/4412 ,  C23C16/458 ,  C23C16/4586 ,  C23C16/503 ,  C23C16/505 ,  C23C16/5096 ,  H01J37/32091 ,  H01J37/32165 ,  H01J37/32532 ,  H01J37/32541

摘要： An apparatus and method are provided for controlling the intensity and distribution of a plasma discharge in a plasma chamber. In one embodiment, a shaped electrode is embedded in a substrate support to provide an electric field with radial and axial components inside the chamber. In another embodiment, the face plate electrode of the showerhead assembly is divided into zones by isolators, enabling different voltages to be applied to the different zones. Additionally, one or more electrodes may be embedded in the chamber side walls.

摘要翻译： 提供了一种用于控制等离子体室中的等离子体放电的强度和分布的装置和方法。 在一个实施例中，成形电极被嵌入到基板支撑件中以在腔室内提供具有径向和轴向分量的电场。 在另一个实施例中，喷头组件的面板电极被隔离器分成区域，使不同的电压能够施加到不同的区域。 此外，一个或多个电极可以嵌入在腔室侧壁中。

公开(公告)号：US20100095891A1

公开(公告)日：2010-04-22

申请号：US12684039

申请日：2010-01-07

申请人： Maosheng Zhao ,  Juan Carlos Rocha-Alvarez ,  Inna Shmurun ,  Soova Sen ,  Mao D. Lim ,  Shankar Venkataraman ,  Ju-Hyung Lee

发明人： Maosheng Zhao ,  Juan Carlos Rocha-Alvarez ,  Inna Shmurun ,  Soova Sen ,  Mao D. Lim ,  Shankar Venkataraman ,  Ju-Hyung Lee

IPC分类号： H01L21/465

CPC分类号： C23C16/4405 ,  C23C16/458 ,  C23C16/46 ,  H01J37/32082 ,  H01J37/32862 ,  H01L21/67103

摘要： The present invention is a method and apparatus for cleaning a chemical vapor deposition (CVD) chamber using cleaning gas energized to a plasma in a gas mixing volume separated by an electrode from a reaction volume of the chamber. In one embodiment, a source of RF power is coupled to a lid of the chamber, while a switch is used to couple a showerhead to ground terminals or the source of RF power.

摘要翻译： 本发明是一种方法和装置，该方法和设备使用在由电极与腔室的反应体积分离的气体混合容积中的等离子体通电的清洁气体来清洁化学气相沉积（CVD）室。 在一个实施例中，RF功率源耦合到室的盖，而开关用于将喷头连接到接地端子或RF功率源。

公开(公告)号：US07589336B2

公开(公告)日：2009-09-15

申请号：US11686897

申请日：2007-03-15

申请人： Andrzei Kaszuba ,  Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ndanka O. Mukuti

发明人： Andrzei Kaszuba ,  Juan Carlos Rocha-Alvarez ,  Thomas Nowak ,  Sanjeev Baluja ,  Ndanka O. Mukuti

IPC分类号： C23C16/453 ,  B05C11/10

CPC分类号： B05D3/067 ,  B29C71/04 ,  B29C2035/0827 ,  F26B3/28 ,  H01L21/67115

摘要： Embodiments of the invention relate generally to an ultraviolet (UV) cure chamber for curing a dielectric material disposed on a substrate and to methods of curing dielectric materials using UV radiation. A substrate processing tool according to one embodiment comprises a body defining a substrate processing region; a substrate support adapted to support a substrate within the substrate processing region; an ultraviolet radiation lamp spaced apart from the substrate support, the lamp configured to transmit ultraviolet radiation to a substrate positioned on the substrate support; and a motor operatively coupled to rotate at least one of the ultraviolet radiation lamp or substrate support at least 180 degrees relative to each other. The substrate processing tool may further comprise one or more reflectors adapted to generate a flood pattern of ultraviolet radiation over the substrate that has complementary high and low intensity areas which combine to generate a substantially uniform irradiance pattern if rotated. Other embodiments are also disclosed.

摘要翻译： 本发明的实施方案一般涉及用于固化设置在基底上的介电材料的紫外（UV）固化室和使用UV辐射固化电介质材料的方法。 根据一个实施例的基板处理工具包括限定基板处理区域的主体; 衬底支撑件，适于支撑衬底处理区域内的衬底; 与衬底支撑件间隔开的紫外线辐射灯，所述灯被配置为将紫外线辐射透射到位于所述衬底支撑件上的衬底; 以及可操作地耦合以使所述紫外线辐射灯或衬底支撑体中的至少一个相对于彼此旋转至少180度的电动机。 衬底处理工具还可以包括一个或多个反射器，其适于在衬底上产生具有互补的高和低强度区域的紫外线辐射的泛化图案，其结合以在旋转时产生基本上均匀的辐照度图案。 还公开了其他实施例。

公开(公告)号：US20070295012A1

公开(公告)日：2007-12-27

申请号：US11556642

申请日：2006-11-03

申请人： Dustin W. Ho ,  Juan Carlos Rocha-Alvarez ,  Dale R. Du Bois ,  Scott A. Hendrickson ,  Sanjeev Baluja ,  Ndanka O. Mukuti

发明人： Dustin W. Ho ,  Juan Carlos Rocha-Alvarez ,  Dale R. Du Bois ,  Scott A. Hendrickson ,  Sanjeev Baluja ,  Ndanka O. Mukuti

IPC分类号： F25D3/12

CPC分类号： H01L21/67109 ,  H01L21/67115

摘要： A re-circulating cooling system can be used with a curing system in order to reduce the exhaust requirements for the system. Further, using a cooling fluid such as nitrogen reduces the production of ozone and the sealing requirements for the system. A simple heat exchanger can be used between return and supply reservoirs in order to remove heat added to the re-circulating fluid during circulation past the curing radiation source. The nitrogen can come from a nitrogen source, or from a membrane or other device operable to split feed gas into its molecular components to provide a source of gas rich in nitrogen. An ozone destruction unit can be used with such a cooling system to reduce the amount of ozone to acceptable levels, and to minimize consumption of the nitrogen. A catalyst can be used to deplete the ozone that does not get consumed during the reaction.

摘要翻译： 再循环冷却系统可以与固化系统一起使用，以减少系统的排气要求。 此外，使用诸如氮气的冷却流体减少臭氧的产生和系统的密封要求。 在回流和供应储存器之间可以使用简单的热交换器，以便在循环通过固化辐射源之前除去添加到再循环流体中的热量。 氮气可以来自氮源，或者来自可以将进料气体分解成其分子组分以提供富含氮的气体源的膜或其它装置。 臭氧破坏装置可与这种冷却系统一起使用，以将臭氧的量减少至可接受的水平，并最大限度地减少氮的消耗。 可以使用催化剂来消耗在反应期间不消耗的臭氧。

公开(公告)号：US06946033B2

公开(公告)日：2005-09-20

申请号：US10245443

申请日：2002-09-16

申请人： Lun Tsuei ,  Soovo Sen ,  Ju-Hyung Lee ,  Juan Carlos Rocha-Alvarez ,  Inna Shmurun ,  Maosheng Zhao ,  Troy Kim ,  Shankar Venkataraman

发明人： Lun Tsuei ,  Soovo Sen ,  Ju-Hyung Lee ,  Juan Carlos Rocha-Alvarez ,  Inna Shmurun ,  Maosheng Zhao ,  Troy Kim ,  Shankar Venkataraman

IPC分类号： C23C16/44 ,  C23C16/455 ,  C23C16/509 ,  H01L21/00 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： C23C16/4557 ,  C23C16/45565 ,  C23C16/5096 ,  H01L21/67017

摘要： An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.

摘要翻译： 一种用于在处理系统中分配气体的装置。 在一个实施例中，该系统包括具有气体分配板的气体分配组件。 气体分配板限定了多个孔，气体通过该孔被传输。 组件还包括联接到气体分配板的气体箱，气箱配置成将气体供应到多个孔中。 组件还包括用于减少从气箱到气体分配板的热传递的装置。

公开(公告)号：US10023954B2

公开(公告)日：2018-07-17

申请号：US13608389

申请日：2012-09-10

申请人： John J. Mazzocco ,  Dale Robert Du Bois ,  Juan Carlos Rocha-Alvarez

发明人： John J. Mazzocco ,  Dale Robert Du Bois ,  Juan Carlos Rocha-Alvarez

IPC分类号： C23C16/44 ,  H01L21/67 ,  C23C14/56 ,  C23C16/54 ,  F16K51/02 ,  F16K3/02 ,  F16K3/16 ,  F16K3/22 ,  F16K3/314

摘要： Slit valve apparatuses are described. In one aspect, a slit valve apparatus is disclosed having a gate with at least one sealing surface, a blocker element, and a connector member that structurally connects the gate and the blocker element. Systems and methods including the slit valve apparatus are also disclosed, as are numerous other aspects.

公开(公告)号：US08884524B2

公开(公告)日：2014-11-11

申请号：US13302012

申请日：2011-11-22

申请人： Jianhua Zhou ,  Dale R. Du Bois ,  Mohamad A. Ayoub ,  Juan Carlos Rocha-Alvarez

发明人： Jianhua Zhou ,  Dale R. Du Bois ,  Mohamad A. Ayoub ,  Juan Carlos Rocha-Alvarez

IPC分类号： H05B31/26 ,  H01J37/32

CPC分类号： H01J37/32091 ,  H01J37/32577

摘要： Embodiments of the present invention provide an RF conducting rod comprising a hollow portion. Particularly, the RF conducting rod comprises an elongated hollow body having a sidewall enclosing an inner volume, a first solid connector extending from a first end of the elongated hollow body, and a second solid connector extending from a second end of the elongated hollow body. Each of the elongated hollow body, the first solid connector and the second solid connector is formed from an electrically conductive material.

摘要翻译： 本发明的实施例提供一种包括中空部分的RF导电棒。 特别地，RF导杆包括细长的中空本体，其具有封闭内部容积的侧壁，从细长中空体的第一端延伸的第一固体连接器和从细长中空体的第二端延伸的第二固体连接器。 每个细长的中空体，第一固体连接器和第二固体连接器由导电材料形成。

公开(公告)号：US08455849B2

公开(公告)日：2013-06-04

申请号：US13301558

申请日：2011-11-21

申请人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos

发明人： Sanjeev Baluja ,  Juan Carlos Rocha-Alvarez ,  Alexandros T. Demos

IPC分类号： G01N21/23 ,  G02B13/14 ,  G02B21/16 ,  C23C16/48

CPC分类号： G02B5/22 ,  G02B5/208 ,  H01L21/67115

摘要： A method and apparatus for providing a uniform UV radiation irradiance profile across a surface of a substrate is provided. In one embodiment, a substrate processing tool includes a processing chamber defining a processing region, a substrate support for supporting a substrate within the processing region, an ultraviolet (UV) radiation source spaced apart from the substrate support and configured to transmit ultraviolet radiation toward the substrate positioned on the substrate support, and a light transmissive window positioned between the UV radiation source and the substrate support, the light transmissive window having an optical film layer coated thereon. In one example, the optical film layer has a non-uniform thickness profile in a radial direction, wherein a thickness of the optical film layer at the peripheral area of the light transmissive window is relatively thicker than at the center region of the optical film layer.

摘要翻译： 提供了一种用于在衬底的表面上提供均匀的UV辐射辐照度分布的方法和装置。 在一个实施例中，衬底处理工具包括限定处理区域的处理室，用于支撑处理区域内的衬底的衬底支撑件，与衬底支撑件间隔开并且被配置成向衬底支撑件发射紫外线辐射的紫外线（UV）辐射源 位于基板支撑件上的基板和位于UV辐射源和基板支撑件之间的透光窗口，透光窗口具有涂覆在其上的光学膜层。 在一个示例中，光学膜层在径向上具有不均匀的厚度分布，其中在透光窗的周边区域处的光学膜层的厚度比在光学膜层的中心区域处的厚度更厚 。