公开(公告)号：US07724351B2

公开(公告)日：2010-05-25

申请号：US11341894

申请日：2006-01-30

申请人： Erik Roelof Loopstra ,  Adrianus Franciscus Petrus Engelen ,  Bernardus Antonius Johannes Luttikhuis ,  Maria Johanna Agnes Rubingh ,  Johannes Martinus Andreas Hazenberg ,  Laurentius Catrinus Jorritsma ,  Johannes Wilhelmus De Klerk ,  Bernhard Geuppert ,  Aart Adrianus Van Beuzekom ,  Petrus Franciscus Wilhelmus Maria Mandigers ,  Franz Sorg ,  Peter Deufel ,  Peter Schaap

发明人： Erik Roelof Loopstra ,  Adrianus Franciscus Petrus Engelen ,  Bernardus Antonius Johannes Luttikhuis ,  Maria Johanna Agnes Rubingh ,  Johannes Martinus Andreas Hazenberg ,  Laurentius Catrinus Jorritsma ,  Johannes Wilhelmus De Klerk ,  Bernhard Geuppert ,  Aart Adrianus Van Beuzekom ,  Petrus Franciscus Wilhelmus Maria Mandigers ,  Franz Sorg ,  Peter Deufel ,  Peter Schaap

IPC分类号： G03B27/54 ,  G03B27/72 ,  G03B27/52

CPC分类号： G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

摘要： A lithographic apparatus has an assembly to exchange optical elements in a pupil plane of its projection system. The optical elements may be pupil filters and may conform to the physical dimensions specified for a reticle standard, e.g. having sides substantially equal to 5, 6 or 9 inches.

摘要翻译： 光刻设备具有在其投影系统的光瞳平面中交换光学元件的组件。 光学元件可以是光瞳滤光器，并且可以符合对于掩模版标准规定的物理尺寸，例如。 侧面基本上等于5,6或9英寸。

公开(公告)号：US07616383B2

公开(公告)日：2009-11-10

申请号：US10847661

申请日：2004-05-18

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens

IPC分类号： G02B3/12

CPC分类号： G03F7/70875 ,  B05C9/12 ,  G03F7/70341

摘要： A lithographic projection apparatus is disclosed in which a liquid supply system provides a liquid between the projection system and the substrate. An active drying station is provided to actively remove the liquid from the substrate W or other objects after immersion of all or part of a surface of the substrate W or other objects.

摘要翻译： 公开了一种光刻投影装置，其中液体供应系统在投影系统和基板之间提供液体。 提供主动干燥站，以在浸没基材W或其它物体的表面的全部或部分之后主动地从基材W或其它物体中除去液体。

公开(公告)号：US20090207397A1

公开(公告)日：2009-08-20

申请号：US12411952

申请日：2009-03-26

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Richard Joseph Bruls ,  Marcel Mathijs Theodore Marie Dierichs ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Hans Jansen ,  Erik Roelof Loopstra ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Ronald Walther Jeanne Severijns ,  Sergei Shulepov ,  Herman Boom ,  Timotheus Franciscus Sengers

IPC分类号： G03B27/32 ,  G03B27/60 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/2041 ,  G03F7/70908 ,  G03F7/70958

摘要： An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.

摘要翻译： 公开了一种浸没式光刻投影装置，其中液体设置在装置的投影系统和基板之间。 为了防止在液体中形成气泡，有助于减少与液体接触后的元件上的残留物，就可以在设备的各种元件上使用液体和液体两层。

公开(公告)号：US07545481B2

公开(公告)日：2009-06-09

申请号：US10719683

申请日：2003-11-24

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Jan Haisma ,  Nicodemus Hattu ,  Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Bernard Gellrich

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Paul Graupner ,  Jan Haisma ,  Nicodemus Hattu ,  Christiaan Alexander Hoogendam ,  Erik Roelof Loopstra ,  Johannes Catharinus Hubertus Mulkens ,  Bernard Gellrich

IPC分类号： G03B27/54 ,  G03B27/58

CPC分类号： G03F7/70341 ,  G03F7/7095

摘要： The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.

摘要翻译： 投影系统元件及其支撑体之间的接合部包括无机层或直接接合，因此液密，能够防止浸渍液体发生变形。 关节可以做温暖还是冷。 焊料，胶水和胶水保护都可用于形成这种接头。 在一个实施例中，元件及其支撑由石英制成。

公开(公告)号：US07542127B2

公开(公告)日：2009-06-02

申请号：US11312660

申请日：2005-12-21

申请人： Timotheus Franciscus Sengers ,  Nicolaas Antonius Allegondus Johannes Van Asten ,  Wilhelmus Josephus Box ,  Tjarko Adriaan Rudolf Van Empel ,  Leon Martin Levasier ,  Erik Roelof Loopstra ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Joseph Marie Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

发明人： Timotheus Franciscus Sengers ,  Nicolaas Antonius Allegondus Johannes Van Asten ,  Wilhelmus Josephus Box ,  Tjarko Adriaan Rudolf Van Empel ,  Leon Martin Levasier ,  Erik Roelof Loopstra ,  Marcel Johannus Elisabeth Hubertus Muitjens ,  Luberthus Ouwehand ,  Leon Joseph Marie Van Den Schoor ,  Marcel Beckers ,  Rob Jansen ,  Elke Van Loenhout

IPC分类号： G03B27/52 ,  G03B27/54

CPC分类号： G03F7/70883 ,  G03F7/7075 ,  G03F7/70858 ,  G03F9/7011 ,  G03F9/7034

摘要： A lithographic apparatus is disclosed. The apparatus includes a substrate table constructed to hold a substrate. The substrate table is moveable to transfer the substrate between a substrate measuring position and a substrate processing position. The apparatus also includes a measuring system configured to measure at least one aspect or characteristic of the substrate when the substrate table holds the substrate in the measuring position. The measuring system is configured to direct at least one measuring beam and/or field towards a surface of the substrate. A projection system is configured to project a patterned radiation beam onto a target portion of the substrate when the substrate table holds the substrate in the substrate processing position, and a conditioning system is configured to supply a conditioning fluid to at least part of a path of the measuring beam and/or field of the measuring system to condition the part of the path.

摘要翻译： 公开了一种光刻设备。 该装置包括构造成保持基板的基板台。 衬底台可移动以在衬底测量位置和衬底处理位置之间传送衬底。 该装置还包括测量系统，其被配置为当衬底台将衬底保持在测量位置时，测量衬底的至少一个方面或特征。 测量系统被配置为将至少一个测量光束和/或场朝向衬底的表面引导。 投影系统被配置为当衬底台将衬底保持在衬底处理位置时将图案化的辐射束投射到衬底的目标部分上，并且调节系统被配置为将调节流体提供给至少部分路径 测量系统的测量光束和/或场来调节路径的一部分。

公开(公告)号：US07522261B2

公开(公告)日：2009-04-21

申请号：US10948749

申请日：2004-09-24

申请人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

发明人： Carlo Cornelis Maria Luijten ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Rudolf Kemper ,  Martinus Hendrickus Antonius Leenders ,  Erik Roelof Loopstra ,  Bob Streefkerk ,  Marcel Beckers ,  Herman Boom ,  Richard Moerman

IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： An immersion lithographic projection apparatus has a liquid confinement structure configured to at least partly confine liquid to a space between a projection system and a substrate, the confinement structure having a buffer surface, when in use, positioned in close proximity to a plane substantially comprising the upper surface of the substrate and of a substrate table holding the substrate, to define a passage having a flow resistance. A recess is provided in the buffer surface, the recess, when in use, being normally full of immersion liquid to enable rapid filling of a gap between the substrate and substrate table as the gap moves under the buffer surface. The recess may be annular or radial and a plurality of recesses may be provided.

摘要翻译： 浸没式光刻投影设备具有液体限制结构，其被配置为至少部分地将液体限制在投影系统和基板之间的空间上，所述约束结构在使用时具有缓冲表面，该缓冲表面位于基本上包括 衬底的上表面和保持衬底的衬底台，以限定具有流动阻力的通道。 在缓冲表面设置凹部，当使用时凹部通常充满浸没液体，以便当间隙在缓冲表面下移动时能够快速填充基板和基板台之间的间隙。 凹部可以是环形的或径向的，并且可以设置多个凹部。

公开(公告)号：US20090090877A1

公开(公告)日：2009-04-09

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriel Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03B27/54

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US07492443B2

公开(公告)日：2009-02-17

申请号：US11023359

申请日：2004-12-29

申请人： Jan Evert Van Der Werf ,  Erik Roelof Loopstra ,  Hans Meiling ,  Johannes Hubertus Josephina Moors ,  Martinus Hendrikus Antonius Leenders

发明人： Jan Evert Van Der Werf ,  Erik Roelof Loopstra ,  Hans Meiling ,  Johannes Hubertus Josephina Moors ,  Martinus Hendrikus Antonius Leenders

IPC分类号： G03B27/68 ,  G03B27/42 ,  G03F9/00 ,  G03C5/00

CPC分类号： G03F7/707 ,  G03F7/70233 ,  G03F7/70258 ,  G03F7/70283 ,  G03F7/703

摘要： A device manufacturing method according to one embodiment of the invention includes positioning a reflective patterning structure to reflect at least a portion of a beam of radiation as a patterned beam of radiation having a pattern in its cross-section. The method also includes using a projection system to project the patterned beam of radiation to form an image on a target portion of a layer of radiation-sensitive material. Positioning includes at least one among shifting and tilting a nominal reflective surface of the reflective patterning structure with respect to a nominal object plane of the projection system according to a distortion value.

摘要翻译： 根据本发明的一个实施例的器件制造方法包括定位反射图案形成结构以将辐射束的至少一部分反射为在其横截面中具有图案的图案化辐射束。 该方法还包括使用投影系统投影图案化的辐射束以在辐射敏感材料层的目标部分上形成图像。 定位包括根据失真值相对于投影系统的标称物平面移动和倾斜反射图案形成结构的标称反射表面中的至少一个。

公开(公告)号：US07459808B2

公开(公告)日：2008-12-02

申请号：US11273634

申请日：2005-11-15

申请人： Sven Antoin Johan Hol ,  Angelo Cesar Peter De Klerk ,  Erik Roelof Loopstra ,  Fransicus Mathijs Jacobs ,  Mark Scholten ,  Arjan Franklin Bakker

发明人： Sven Antoin Johan Hol ,  Angelo Cesar Peter De Klerk ,  Erik Roelof Loopstra ,  Fransicus Mathijs Jacobs ,  Mark Scholten ,  Arjan Franklin Bakker

IPC分类号： H02K41/00 ,  H02K3/00 ,  G03B27/42

CPC分类号： H02K41/03 ,  G03F7/70758 ,  H02K2201/18

摘要： A motor includes a magnet assembly to generate a magnetic field. The field includes along the first direction parts which are alternately orientated in the first and the second direction. The parts extend in a third direction which is perpendicular to the first and the second direction. The motor further includes a first coil winding to carry a first current. The first coil winding to extend in the first direction between parts of the magnetic field orientated in the second direction, to generate the force in the first direction. The motor also includes a second coil winding to carry a second current. The second coil winding to extend in the first direction between parts of the magnetic field substantially orientated in the first direction, to generate the force in the second direction.

摘要翻译： 电动机包括用于产生磁场的磁体组件。 该场包括沿着第一方向的部分，其沿第一方向和第二方向交替取向。 这些部件在垂直于第一和第二方向的第三方向上延伸。 电动机还包括用于承载第一电流的第一线圈绕组。 所述第一线圈绕组在所述第一方向上沿着在所述第二方向上定向的所述磁场的部分之间延伸，以在所述第一方向上产生力。 电动机还包括用于承载第二电流的第二线圈绕组。 所述第二线圈绕组在所述磁场的各部分之间沿所述第一方向沿所述第一方向大致取向，以在所述第二方向上产生所述力。

公开(公告)号：US20080278702A1

公开(公告)日：2008-11-13

申请号：US11797901

申请日：2007-05-08

申请人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

发明人： Engelbertus Antonius Fransiscus Van Der Pasch ,  Emiel Jozef Melanie Eussen ,  Stefan Gertrud Marie Hendriks ,  Erik Roelof Loopstra ,  Jacob Willem Vink ,  Ruud Antonius Catharina Maria Beerens ,  Lodewijk Alexander Schijvenaars ,  Tom Van Zutphen

IPC分类号： G03B27/42

CPC分类号： G03F7/70775 ,  G03F7/70516

摘要： A method for calibrating an auxiliary sensor system is provided. The auxiliary sensor system measures a position of a grating relative to a reference, the grating forming part of an encoder measurement system. The encoder measurement system is adapted to measure a position of a substrate table of a lithographic apparatus and further comprises a sensor mounted to the substrate table. The method comprises exciting the grating to make a movement in at least one measurement direction of the auxiliary sensor system, obtaining an auxiliary sensor system output signal from the sensor system during the movement, and adjusting a parameter of the auxiliary sensor system based on the output signal obtained during the movement to thereby calibrate the auxiliary sensor system.

摘要翻译： 提供了一种用于校准辅助传感器系统的方法。 辅助传感器系统测量光栅相对于参考的位置，光栅形成编码器测量系统的一部分。 编码器测量系统适于测量光刻设备的衬底台的位置，还包括安装到衬底台的传感器。 该方法包括激励光栅以在辅助传感器系统的至少一个测量方向上移动，在运动期间从传感器系统获得辅助传感器系统输出信号，并且基于输出调整辅助传感器系统的参数 信号，从而校准辅助传感器系统。