Abstract:
Approaches for performing in line wafer testing are provided. An approach includes a method that includes generating a radio frequency (RF) test signal, and applying the RF test signal to a device under test (DUT) in a wafer using a buckling beam probe set with a predefined pitch. The method also includes detecting an output RF signal from the DUT in response to the applying the RF test signal to the DUT, and sensing at least one frequency component of the detected output RF signal.
Abstract:
A reconfigurable branch line coupler and methods of designing and reconfiguring the branch line coupler are disclosed. The reconfigurable branch line coupler includes a plurality of transmission lines, each of which comprises a phase shifter. The reconfigurable branch line coupler further includes an input port, which is split into two quadrature signals providing a second and third port between adjacent of the plurality of transmission lines, with a fourth port isolated from the input port at a center frequency.
Abstract:
Embodiments of the present invention provide a circuit and method to characterize the impact of bias temperature instability on semiconductor devices. The circuit comprises a transistor having a gate, drain, source, and body terminal. Two AC pad sets each having a plurality of conductive pads. Two DC pads are in communication with a DC supply and/or meter. The gate terminal is in communication with a first conductive pad included in the plurality of conductive pads of each of the AC pad sets. The drain terminal is in communication with a second conductive pad of an AC pad set and the source terminal with a second conductive pad of another AC pad set. One DC pad is in communication with the gate terminal through a first serial resistor and another DC pad with the body terminal through a second serial resistor and provides an open-circuit for the gate and body terminals.
Abstract:
On-chip millimeter wave (mmW) notch filters with via stubs, methods of manufacture and design structures are disclosed. The notch filter includes a signal line comprising a metal trace line connected to a metal via stub partially extending into a semiconductor substrate. The notch filter further includes a defected ground plane connected to at least one or more additional metal via stubs partially extending into the semiconductor substrate.
Abstract:
Various embodiments include wafer level chip scale package (WLCSP) structures and methods of tuning such structures. In some embodiments, the WLCSP structure includes: a printed circuit board (PCB) trace connection including at least one PCB ground connection connected with a PCB ground plane; a set of ground solder balls each contacting the printed circuit board trace connection; a set of chip pads contacting each of the ground solder balls in the set of ground solder balls; a chip ground plane connecting the set of chip pads; and a signal interconnect interposed between two of the set of ground solder balls, the signal interconnect including: a signal trace connection electrically isolated from the PCB ground plane; a signal ball contacting the signal PCB trace connection; a chip pad contacting the signal ball, and a signal trace connection on a chip contacting the chip pad.
Abstract:
Tunable phase shifters and methods for using the same include a signal line; one or more grounding lines; one or more crossing lines below the signal line in proximity to the signal line and substantially perpendicular to a longitudinal direction of the signal line, where the crossing lines conform to the shape of the signal line along at least three surfaces of the signal line and where the crossing lines have a tunable capacitance; and an inductance return line below the crossing lines substantially parallel to the longitudinal direction of the signal line, where the inductance return line provides a tunable inductance.
Abstract:
A through-silicon via (TSV) capacitive test structure and method of determining TSV depth based on capacitance is disclosed. The TSV capacitive test structure is formed from a plurality of TSV bars that are evenly spaced. A first group of bars are electrically connected to form a first capacitor node, and a second group of bars is electrically connected to form a second capacitor node. The capacitance is measured, and a TSV depth is computed, prior to backside thinning. The computed TSV depth may then be fed to downstream grinding and/or polishing tools to control the backside thinning process such that the semiconductor wafer is thinned such that the backside is flush with the TSV.
Abstract:
Various embodiments include wafer level chip scale package (WLCSP) structures and methods of tuning such structures. In some embodiments, the WLCSP structure includes: a printed circuit board (PCB) trace connection including at least one PCB ground connection connected with a PCB ground plane; a set of ground solder balls each contacting the printed circuit board trace connection; a set of chip pads contacting each of the ground solder balls in the set of ground solder balls; a chip ground plane connecting the set of chip pads; and a signal interconnect interposed between two of the set of ground solder balls, the signal interconnect including: a signal trace connection electrically isolated from the PCB ground plane; a signal ball contacting the signal PCB trace connection; a chip pad contacting the signal ball, and a signal trace connection on a chip contacting the chip pad.
Abstract:
A set of metal line structures including a signal transmission metal line and a capacitively-grounded inductively-signal-coupled metal line is embedded in a dielectric material layer. A capacitor is serially connected between the capacitively-grounded inductively-signal-coupled metal line and a local electrical ground, which may be on the input side or on the output side. The set of metal line structures and the capacitor collective provide a frequency dependent inductor. The Q factor of the frequency dependent inductor has multiple peaks that enable the operation of the frequency dependent inductor at multiple frequencies. Multiple capacitively-grounded inductively-signal-coupled metal lines may be provided in the frequency-dependent inductor, each of which is connected to the local electrical ground through a capacitor. By selecting different capacitance values for the capacitors, multiple values of the Q-factor may be obtained in the frequency dependent inductor at different signal frequencies.
Abstract:
Aspects of the invention provide for an architecture and method for testing high frequency phase shifter arrays. In one embodiment, an architecture for testing a phase shifter array, includes: a plurality of power dividers, each power divider configured to receive an output from a phase shifter within the phase shifter array and split the output into a first signal and a second signal; a plurality of power clippers, each power clipper configured to receive the second signal and modify the second signal by limiting an amplitude of the second signal; a first power combiner configured to receive the first signal from each of the plurality of power dividers to generate a first output; and a second power combiner configured to receive the modified second signal from each of the plurality of power clippers to generate a second output.