Method and apparatus for cleaving semiconductor wafers
    42.
    发明授权
    Method and apparatus for cleaving semiconductor wafers 失效
    用于切割半导体晶片的方法和装置

    公开(公告)号:US5740953A

    公开(公告)日:1998-04-21

    申请号:US193188

    申请日:1994-05-17

    摘要: A method and apparatus are described for cleaving a relatively thin semiconductor wafer for inspecting a target feature on a workface thereof by: producing, on a first lateral face of the semiconductor wafer, laterally of the workface on one side of the target feature, an indentation in alignment with the target feature; and inducing by impact, in a second lateral face of the semiconductor wafer, laterally of the workface on the opposite side of the target feature, a shock wave substantially in alignment with the target feature and the indentation on the first lateral face, to split the semiconductor wafer along a cleavage plane essentially coinciding with the target feature and the indentation.

    摘要翻译: PCT No.PCT / EP92 / 01867 Sec。 371日期:1994年5月17日 102(e)日期1994年5月17日PCT提交1992年8月14日PCT公布。 公开号WO93 / 04497 日期1993年3月4日描述了一种方法和装置,用于通过以下步骤来切割用于检查其工作面上的目标特征的相对薄的半导体晶片:在半导体晶片的第一侧面上,在 目标特征,与目标特征对齐的缩进; 并且通过冲击在所述半导体晶片的第二侧面中在所述目标特征的相对侧上的所述工作面的横向上引入基本上与所述目标特征和所述第一侧面上的所述凹陷对准的冲击波, 半导体晶片沿着解理平面基本上与目标特征和凹陷重合。

    Infra-red transparant materials
    43.
    发明授权
    Infra-red transparant materials 失效
    红外透明材料

    公开(公告)号:US5723207A

    公开(公告)日:1998-03-03

    申请号:US543804

    申请日:1990-07-23

    摘要: Material transparent at infra red wavelengths, 3-5 and 8-14 .mu.m is formed of ZrN, YN, CeN, TLN, or EuN. The material can be used as a self supporting material or as a coating on substrates such as infra red transparent material e.g. Ge, ZnS, ZnSe, As.sub.2 S.sub.3, As.sub.2 Se.sub.3, optically transparent materials e.g. sodium glass, or reflecting surfaces such as metal surfaces, e.g. Al or silvered surfaces. For some substrates e.g. Ge a thin, e.g. 10-1,000 Angstrom bonding layer may be used to improve adhesion. Bonding layers may be Ge, Si, Ge.sub.x C.sub.1-x, Si.sub.x C.sub.1-x (0

    摘要翻译: PCT No.PCT / GB89 / 00068 Sec。 371日期1990年7月23日第 102(e)日1990年7月23日PCT 1989年1月19日PCT PCT。 第WO89 / 06707号公报 日期:1987年7月27日材料在红外波长下透明,3-5和8-14μm由ZrN,YN,CeN,TLN或EuN形成。 该材料可以用作自支撑材料或用作基底上的涂层,例如红外透明材料,例如, Ge,ZnS,ZnSe,As2S3,As2Se3,光学透明材料。 钠玻璃或反射表面,例如金属表面,例如金属表面。 铝或镀银表面。 对于一些底物,例如 Ge薄,例如 可以使用10-1,000埃的粘合层来改善粘附性。 接合层可以是Ge,Si,GexC1-x,SixC1-x(0

    Insect trap
    44.
    发明授权
    Insect trap 有权
    昆虫陷阱

    公开(公告)号:US08959831B2

    公开(公告)日:2015-02-24

    申请号:US12865513

    申请日:2009-01-29

    申请人: Colin Smith

    发明人: Colin Smith

    IPC分类号: A01M1/10 A01M1/02 A01M1/14

    CPC分类号: A01M1/023 A01M1/14

    摘要: The invention relates to an insect trap (10), which mimics certain characteristics of a mammal and comprises a housing comprising a base (22) and a cover (24). The pad generates an infrared heat source (14) and can also generate water vapour (16). The trap has an insect retention surface (18) and is characterized in that the cover is positioned over the base in a manner such that it defines an opening (50) around the base/cover interface (52). The opening has a depth (d) of less than 1.5 cm and is sized and positioned such that at least one attractant signal (14′, 16′) is directed out of the opening in a manner allowing effective operation for at least 8 hours.

    摘要翻译: 本发明涉及昆虫捕获器(10),其模拟哺乳动物的某些特征,并且包括包括基部(22)和盖(24)的壳体。 衬垫产生红外热源(14)并且还可以产生水蒸汽(16)。 捕集器具有昆虫保持表面(18),其特征在于,所述盖以使得其限定围绕所述基部/覆盖物接触(52)的开口(50)的方式定位在所述基部上方。 开口具有小于1.5cm的深度(d),并且其尺寸和定位使得至少一个引诱信号(14',16')以允许有效操作至少8小时的方式被引导出开口。

    DATA PROCESSING SYSTEM AND METHOD
    46.
    发明申请
    DATA PROCESSING SYSTEM AND METHOD 有权
    数据处理系统和方法

    公开(公告)号:US20100094600A1

    公开(公告)日:2010-04-15

    申请号:US12443713

    申请日:2007-10-01

    IPC分类号: G06F17/50 G06F17/16

    CPC分类号: G06F17/5018

    摘要: Embodiments of the present invention relate to a system and method for analysing, designing and manufacturing a body to determine potential discontinuities within the body when subjected to an action.

    摘要翻译: 本发明的实施例涉及用于分析,设计和制造身体的系统和方法,以确定当受到动作时身体内的潜在不连续性。

    Directed Multi-Deflected Ion Beam Milling of a Work Piece and Determining and Controlling Extent Thereof
    48.
    发明申请
    Directed Multi-Deflected Ion Beam Milling of a Work Piece and Determining and Controlling Extent Thereof 审中-公开
    定向多折射离子束铣削工件,确定和控制范围

    公开(公告)号:US20080078750A1

    公开(公告)日:2008-04-03

    申请号:US11661201

    申请日:2005-08-24

    IPC分类号: B23K9/00 G21K1/087

    摘要: Method, device, and system, for directed multi-deflected ion beam milling of a work piece, and, determining and controlling extent thereof. Providing an ion beam; and directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece. Device includes an ion beam source assembly; and an ion beam directing and multi-deflecting assembly, for directing and at least twice deflecting the provided ion beam, for forming a directed multi-deflected ion beam, wherein the directed multi-deflected ion beam is directed towards, incident and impinges upon, and mills, a surface of the work piece.

    摘要翻译: 方法,装置和系统,用于工件的定向多偏转离子束铣削,以及确定和控制其程度。 提供离子束; 并且引导和至少两次偏转所提供的离子束,用于形成定向的多偏转离子束,其中定向多偏转离子束被引导朝向,入射并冲击在工件的表面上并磨削。 装置包括离子束源组件; 以及用于引导和至少两次偏转所提供的离子束的离子束引导和多偏转组件,用于形成定向的多偏转离子束,其中定向多偏转离子束被引导,入射和撞击, 和磨机,工件的表面。

    Transducer assembly
    50.
    发明授权
    Transducer assembly 有权
    传感器组件

    公开(公告)号:US06234017B1

    公开(公告)日:2001-05-22

    申请号:US09182374

    申请日:1998-10-29

    IPC分类号: G01F2300

    CPC分类号: B06B1/0215 G01F23/2961

    摘要: A transducer assembly adapted for the pulse-emission of a signal includes a transducer (10) with a drive-circuit (20) therefor. The drive circuit (20) includes a charge-storage device (21), a wound-coil device (23) and one or more switching-elements (24, 25). The assembly can be used to determine the level of a fluid in an enclosed vessel.

    摘要翻译: 适于信号的脉冲发射的换能器组件包括具有驱动电路(20)的换能器(10)。 驱动电路(20)包括充电存储装置(21),绕线线圈装置(23)和一个或多个开关元件(24,25)。 该组件可用于确定封闭容器中的流体的水平。