High repetition rate laser produced plasma EUV light source

    公开(公告)号:US07087914B2

    公开(公告)日:2006-08-08

    申请号:US10803526

    申请日:2004-03-17

    IPC分类号: H01J35/20

    摘要: An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus. The apparatus and method may comprise a vessel having and intermediate wall with a low pressure trap allowing passage of EUV light and maintaining a differential pressure across the low pressure trap. The apparatus and method may comprise a magnetic plasma confinement mechanism creating a magnetic field in the vicinity of the target ignition site to confine the plasma to the target ignition site, which may be pulsed and may be controlled using outputs from the target tracking system.

    Electric discharge laser with active wavelength chirp correction
    45.
    发明授权
    Electric discharge laser with active wavelength chirp correction 有权
    具有有源波长啁啾校正的放电激光器

    公开(公告)号:US06621846B1

    公开(公告)日:2003-09-16

    申请号:US09501160

    申请日:2000-02-09

    IPC分类号: H01S322

    摘要: Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.

    摘要翻译: 具有主动啁啾校正的放电激光器。 本申请公开了用于调节和分配这些压力波的技术。 在一些激光器中,可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。 在优选实施例中,描述了一种简单的学习算法,以便在预期学习的啁啾模式中允许预调谐镜调节。 实施例包括具有非常精细调节的步进电动机,使得调节步骤的尺寸被显着减小以便更精确的调谐。 然而,完全消除波长啁啾通常不可行,在激光室的结构变化和提前调谐; 因此,申请人已经开发了用于非常快的主动啁啾校正的设备和技术。 改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。 在另一个优选实施例中,在脉冲对脉冲基础上进行啁啾校正,其中测量一个脉冲的波长,并且基于测量校正下一个脉冲的波长。 该校正技术能够以2000Hz及更高​​的重复速率工作。