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公开(公告)号:US11304068B2
公开(公告)日:2022-04-12
申请号:US16641200
申请日:2017-12-15
Applicant: Samsung Electronics Co., Ltd.
Inventor: Namkoo Kang , Giwon Lee , Jaehyun Hwang , Jin Park , Kangeun Lee , Chiwoo Lim
Abstract: The present disclosure relates to a 5th generation (5G) or pre-5G communication system for supporting a higher data transmission rate beyond a 4th generation (4G) communication system such as long-term evolution (LTE). The present disclosure relates to beam management in a wireless communication system, and an operation method of a base station may comprise the steps of: transmitting first type reference signals; receiving feedback information on the first type reference signals; transmitting information on resources for second type reference signals, which are allocated on the basis of the feedback information, to at least one terminal; and transmitting the second type reference signals through the resources, wherein the second type reference signals are transmitted using fixed transmission beams by the base station. The present research has been conducted with the support of the “cross-departmental giga KOREA project” of the government (the ministry of science and ICT) in 2017 (No. GK17N0100, Development for mmWave-based 5G mobile communication system).
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42.
公开(公告)号:US11003081B2
公开(公告)日:2021-05-11
申请号:US16156264
申请日:2018-10-10
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jin Park , Hyun-woo Kim
IPC: G03F7/36 , G03F7/038 , C08F214/14 , G03F7/16 , G03F7/20 , G03F7/34 , C08G75/26 , G03F7/039 , C08F214/18 , C08F214/16
Abstract: A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.
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公开(公告)号:US10832655B2
公开(公告)日:2020-11-10
申请号:US16534395
申请日:2019-08-07
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jin Park , Jiyeon Jung
Abstract: A method for providing a context awareness service is provided. The method includes defining a control command for the context awareness service depending on a user input, triggering a playback mode and the context awareness service in response to a user selection, receiving external audio through a microphone in the playback mode, determining whether the received audio corresponds to the control command, and executing a particular action assigned to the control command when the received audio corresponds to the control command.
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公开(公告)号:US10691018B2
公开(公告)日:2020-06-23
申请号:US15702839
申请日:2017-09-13
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jin Park , Hyunwoo Kim
IPC: G03F7/004 , G03F7/038 , G03F7/16 , H01L21/027 , G03F7/26 , C08F112/14 , C08F120/28 , G03F7/20 , C08F12/24 , C09D125/18 , C08F20/18
Abstract: A photoresist composition includes a photosensitive polymer including a polymer chain and at least one first functional group coupled to the polymer chain, and a photoacid generator. The first functional group has a structure represented by the following Chemical Formula 1, where R1 is one of an alkyl group having a carbon number of 1 to 20 and an aryl group having a carbon number of 1 to 20, and R2 is one of —H, —F, —Cl, —Br, an alkyl group having a carbon number of 1 to 20, and an aryl group having a carbon number of 1 to 20.
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公开(公告)号:US10468250B2
公开(公告)日:2019-11-05
申请号:US15337145
申请日:2016-10-28
Applicant: Samsung Electronics Co., Ltd.
Inventor: Ju-young Kim , Jeong-ju Park , Jin Park , Hai-sub Na
IPC: G03F7/40 , H01L21/033 , C11D1/00 , C11D11/00 , H01L21/027 , G03F7/42
Abstract: A rinse solution includes a surfactant and deionized water. The surfactant includes a compound having a branched structure, the compound having a branched structure including a hydrophobic group-containing main chain and a plurality of side chains that are branched from the main chain and have at least one hydrophilic functional group. A method of fabricating an integrated circuit device includes forming a photoresist pattern, followed by applying the rinse solution onto the photoresist pattern.
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公开(公告)号:US10429969B2
公开(公告)日:2019-10-01
申请号:US14679664
申请日:2015-04-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Won-Seok Kwon , Jin Park
IPC: G06F3/048 , G06F3/041 , G06F3/0485 , G06F3/0488
Abstract: Methods, apparatuses, and systems for processing multi-touch input in a multi-tasking terminal with a touch screen are described. In one method herein, an electronic apparatus displays a first application program on its touch screen while both the first application program and a second application program are being multitasked, detects a flicking of four or more fingers in the displayed first application program on the touch screen; and, in response to detecting of the flicking of four or more fingers, switches the touch screen from the display of the first application program to a display of the second application program.
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公开(公告)号:US10395639B2
公开(公告)日:2019-08-27
申请号:US15901525
申请日:2018-02-21
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jin Park , Jiyeon Jung
Abstract: A method for providing a context awareness service is provided. The method includes defining a control command for the context awareness service depending on a user input, triggering a playback mode and the context awareness service in response to a user selection, receiving external audio through a microphone in the playback mode, determining whether the received audio corresponds to the control command, and executing a particular action assigned to the control command when the received audio corresponds to the control command.
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公开(公告)号:US10230039B2
公开(公告)日:2019-03-12
申请号:US15784565
申请日:2017-10-16
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jin Park , Woo-seok Chin , Ji-yeon Jung
Abstract: A flexible device includes a flexible body and a plurality of piezoelectric materials arranged on the flexible body that deform in response to drive signals causing deformation of the flexible body of the flexible device.
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公开(公告)号:US10062571B2
公开(公告)日:2018-08-28
申请号:US15342151
申请日:2016-11-03
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Hyun-chul Yoon , Kyoung-seon Kim , Hai-sub Na , Jin Park
IPC: H01L21/02 , H01L21/033 , H01L21/027 , H01L21/3213 , H01L27/11582 , H01L21/311 , H01L21/3105
CPC classification number: H01L21/0337 , H01L21/02118 , H01L21/02282 , H01L21/02299 , H01L21/02318 , H01L21/02345 , H01L21/0273 , H01L21/0332 , H01L21/0338 , H01L21/3105 , H01L21/31133 , H01L21/31138 , H01L21/31144 , H01L21/32139 , H01L27/11582 , H01L28/00
Abstract: A method of manufacturing a semiconductor device includes forming a feature layer on a substrate, forming a plurality of reference patterns, arranged at a first pitch, on the feature layer, forming an organic liner on a side wall of each of the plurality of reference patterns, forming a plurality of buried patterns on the organic liner, removing the organic liner exposed between the plurality of buried patterns and the plurality of reference patterns, and etching the feature layer by using the plurality of buried patterns and the plurality of reference patterns as etch masks to form a feature pattern. Each of the plurality of buried patterns covers a space between side walls of two adjacent reference patterns among the plurality of reference patterns.
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公开(公告)号:US09773673B2
公开(公告)日:2017-09-26
申请号:US15148622
申请日:2016-05-06
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jin Park , Hyun-woo Kim , Myeong-koo Kim
IPC: H01L51/00 , H01L21/033 , G03F7/11 , C09D179/08 , H01L21/027
CPC classification number: H01L21/0337 , C08G73/08 , C08G73/1042 , C08G73/1067 , C09D179/08 , G03F7/091 , G03F7/094 , G03F7/11 , H01L21/0276 , H01L21/0332
Abstract: A composition for manufacturing a semiconductor device includes at least one carbon-based compound that includes at least one of an alkyne group and an azide group, and a solvent. A method of manufacturing a semiconductor device includes forming a feature layer on a substrate, coating the feature layer with a composition including alkyne and azide, forming a carbon-containing layer including a triazole compound by performing a heat treatment on the coated composition, forming a photoresist film on the carbon-containing layer, forming photoresist patterns by exposing and developing the photoresist film, and patterning the carbon-containing layer and the feature layer using the photoresist patterns.
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