Method of forming a sample image and charged particle beam apparatus
    41.
    发明授权
    Method of forming a sample image and charged particle beam apparatus 失效
    形成样品图像和带电粒子束装置的方法

    公开(公告)号:US07361894B2

    公开(公告)日:2008-04-22

    申请号:US11501229

    申请日:2006-08-09

    摘要: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed.In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.

    摘要翻译: 本发明的目的是提供一种在抑制由于带电粒子束的照射引起的充电的影响被抑制的情况下,能够高精度地实现视区域位移的抑制的样本图像形成方法和带电粒子束装置 。 为了实现上述目的,本发明提供一种通过在样品上扫描带电粒子束并基于从样品发射的二次信号形成图像来形成样品图像的方法,该方法包括以下步骤:形成多个 通过叠加通过多个扫描时间获得的多个图像的合成图像; 以及通过校正多个合成图像之间的位置偏移并叠加多个合成图像来形成另一个合成图像,以及用于实现上述方法的带电粒子束装置。

    Electron microscope application apparatus and sample inspection method

    公开(公告)号:US20060289755A1

    公开(公告)日:2006-12-28

    申请号:US11442566

    申请日:2006-05-30

    IPC分类号: G21K7/00

    摘要: A charge control electrode emitting photoelectrons is disposed just above a wafer (sample) in parallel thereto, and the electrode has a through hole so that ultraviolet light can be irradiated to the wafer through the charge control electrode. Specifically, a metal plate which is formed in mesh or includes one or plural holes is used as the charge control electrode. By disposing the charge control electrode just above the sample in parallel thereto, when negative voltage is applied to the electrode, electric field approximately perpendicular to the wafer is generated. Therefore, photoelectrons are efficiently absorbed in the wafer. Also, by using the charge control electrode having approximately the same size as that of the wafer, charges on a whole surface of the wafer can be removed collectively and uniformly. Therefore, time required for the process can be reduced.

    Electron beam device
    44.
    发明申请

    公开(公告)号:US20060284093A1

    公开(公告)日:2006-12-21

    申请号:US11499640

    申请日:2006-08-07

    IPC分类号: G21K7/00

    CPC分类号: H01J37/28 H01J37/244

    摘要: Disclosed here is a high resolution scanning electron microscope having an in-lens type objective lens. The microscope is structured so as to detect transmission electrons scattering at wide angles to observe high contrast STEM images according to each sample and purpose. A dark-field detector is disposed closely to the objective lens magnetic pole. The microscope is provided with means for moving the dark-field detector along a light axis so as to control the scattering angle of each detected dark-field signal.

    Charged particle beam equipment and charged particle microscopy
    46.
    发明申请
    Charged particle beam equipment and charged particle microscopy 有权
    带电粒子束设备和带电粒子显微镜

    公开(公告)号:US20060151697A1

    公开(公告)日:2006-07-13

    申请号:US11302323

    申请日:2005-12-14

    IPC分类号: G21K7/00

    摘要: On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.

    摘要翻译: 基于从包括通过使带电粒子束偏转预定量而记录的视野的位移的第一标本图像提取的带电粒子束的偏转之前和之后的视场位移的基础上, 通过在通过使用样本的样本放大图像作为放大标准校准的第一倍率捕获样本图像的图像中的光束偏转器,以及在充电的偏转之前和之后的视场位移 从第二标本图像中提取出的粒子束,包括通过使带电粒子束在第二放大倍数下拍摄样本图像的图像中的光束偏转器偏转预定量而记录的视野的位移, 校准第二放大倍数。

    Charged particle beam apparatus and dimension measuring method
    47.
    发明申请
    Charged particle beam apparatus and dimension measuring method 有权
    带电粒子束装置和尺寸测量方法

    公开(公告)号:US20060071166A1

    公开(公告)日:2006-04-06

    申请号:US11242129

    申请日:2005-10-04

    IPC分类号: G21K7/00

    摘要: There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.

    摘要翻译: 提供了一种带电粒子束装置,即使在样品的表面上存在高差也允许实现高可靠性和高精度尺寸测量。 带电粒子束装置包括以下配置部件:用于获取与焦点深度相对应的聚焦宽度变化的多个SEM图像的获取单元,确定单元,用于从所获取的多个SEM图像中确定SEM图像 包括尺寸测量区域的部分域的图像清晰度变为最大值;以及测量单元,用于从图像锐度度为最大值的SEM图像测量预定域的尺寸。

    Image evaluation method and microscope
    49.
    发明申请
    Image evaluation method and microscope 失效
    图像评估方法和显微镜

    公开(公告)号:US20050199811A1

    公开(公告)日:2005-09-15

    申请号:US11124252

    申请日:2005-05-09

    摘要: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.

    摘要翻译: 能够客观评价显微镜图像的图像分辨率的图像评价方法。 图像分辨方法的特征在于,在图像的整个区域或图像的一部分上获得图像的部分区域中的分辨率,在图像的整个区域或图像的整个区域上进行平均化, 建立平均值作为图像的整个区域或图像的部分的分辨率评估值。 该方法消除了评估者对显微镜图像分辨率评估的主观印象,因此可以获得高精度和良好重复性的图像分辨率评估值。