中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

64 records (took 0.016 seconds)

    Dual beam set-up for parousiameter
    41.
    发明授权
    Dual beam set-up for parousiameter 有权
    双梁设置可调节

    公开(公告)号：US07554665B2

    公开(公告)日：2009-06-30

    申请号：US12063126

    申请日：2006-08-04

    Applicant: Sipke Wadman

    Inventor： Sipke Wadman

    IPC: G01N21/47 ,  G01J1/04

    CPC classification number: G01N21/474 ,  G01N21/274 ,  G01N21/57 ,  G01N2021/4714 ,  G01N2201/0618 ,  G01N2201/0642

    Abstract: A parousiameter having a dual beam setup and method for use thereof is provided for producing measurements of optical parameters. The dual beam parousiameter includes a hemispherical dome enclosure 318 sealed at the bottom with a base 320. A radiation source 302 produces radiation in two beams, an illumination beam 304 for illuminating a sample surface 308 and a calibration beam 330 for providing optical characterization information about the illumination beam 304. Each beam is guided into the hemispherical dome enclosure 318 via separate optical paths. An optical imaging device 324 is positioned to acquire an image of scatter radiation 314 scattered by the sample surface 308 illuminated by the illumination beam 304, and acquire an image of the calibration beam, simultaneously. The calibration beam image is used to compensate for variability in optical output of the radiation source 302 when analyzing the scatter radiation data.

    Abstract translation: 提供了具有双光束设置的方法和用于其的方法用于产生光学参数的测量。 双光束测光仪包括在底部与底座320密封的半球形圆顶罩壳31.辐射源302产生两个光束的辐射，用于照射样品表面308的照明光束304和用于提供关于 照明光束304.每个光束经由分离的光路被引导到半球形圆顶壳体318中。 定位光学成像装置324以获取被照明光束304照射的样本表面308散射的散射辐射314的图像，并且同时获取校准光束的图像。 当分析散射辐射数据时，校准光束图像用于补偿辐射源302的光输出的变化。

    Method and system for wide-area ultraviolet detection of forensic evidence
    42.
    发明授权
    Method and system for wide-area ultraviolet detection of forensic evidence 有权
    广泛紫外检测方法和系统的法医证据

    公开(公告)号：US07545969B2

    公开(公告)日：2009-06-09

    申请号：US11014524

    申请日：2004-12-16

    Applicant: Mischell A. Bennett ,  Odell Huddleston, Jr.

    Inventor： Mischell A. Bennett ,  Odell Huddleston, Jr.

    IPC: G06K9/00

    CPC classification number: G01N21/6456 ,  G01N21/33 ,  G01N21/6486 ,  G01N2021/6421 ,  G01N2201/0618

    Abstract: The present invention comprises a method for detecting and analyzing forensic evidence. A digital image is taken of background radiation from a suspected-evidence area suspected to contain evidence. The suspected-evidence area is exposed to a high-intensity pulse of ultraviolet radiation. Another digital image is taken of fluorescence within the exposed suspected-evidence area. The digital images are processed to create a composite digital image showing regions of evidence. The composite digital image is analyzed to determine the wavelength of fluorescent radiation emitted by the regions of evidence. Composite evidence image and the analysis results are displayed. The present invention also comprises a forensic evidence detection and analysis system that includes a digital camera, an ultraviolet light source, a computer and display, and a computer program installed on the computer.

    Abstract translation: 本发明包括检测和分析法医证据的方法。 数字图像是从怀疑含有证据的疑似证据区域拍摄的背景辐射。 疑似证据区域暴露于高强度的紫外线脉冲。 在暴露的怀疑证据区域内，另一个数字图像是荧光的。 处理数字图像以创建显示证据区域的复合数字图像。 分析复合数字图像以确定由证据区域发射的荧光辐射的波长。 显示复合证据图像和分析结果。 本发明还包括一种法医证据检测和分析系统，其包括数字照相机，紫外光源，计算机和显示器以及安装在计算机上的计算机程序。

    Optical property measuring method and optical property measuring apparatus
    43.
    发明申请
    Optical property measuring method and optical property measuring apparatus 失效
    光学性能测量方法和光学性能测量仪器

    公开(公告)号：US20080137086A1

    公开(公告)日：2008-06-12

    申请号：US11999273

    申请日：2007-12-05

    Applicant: Kenji Imura

    Inventor： Kenji Imura

    IPC: G01N21/59

    CPC classification number: G01N21/643 ,  G01N21/251 ,  G01N21/59 ,  G01N21/645 ,  G01N33/346 ,  G01N2021/3155 ,  G01N2021/6491 ,  G01N2201/0618 ,  G01N2201/062 ,  G01N2201/065 ,  G01N2201/0696

    Abstract: In an optical property measuring method and an optical property measuring apparatus, a spectral transmittance characteristic of a reference colored layer prepared as a reference is corrected based on a measured spectral reflection characteristic of a colored layer, and the spectral reflection characteristic of the reference colored layer. With this arrangement, information on the measured spectral transmittance characteristic of the colored layer can be obtained with sufficient precision in conformity with a printing condition of a sample to be measured. Thus, colorimetry of a printed color of a fluorescent sample i.e. a colored surface on a fluorescent substrate can be accurately performed by using the corrected spectral transmittance characteristic of the reference colored layer.

    Abstract translation: 在光学特性测量方法和光学特性测量装置中，基于测量的着色层的光谱反射特性校正作为基准准备的参考着色层的光谱透射率特性，并且参考着色层的光谱反射特性 。 利用这种布置，可以以与要测量的样品的打印条件一致的足够的精度获得关于着色层的测量的光谱透射率特性的信息。 因此，可以通过使用校正的参考着色层的光谱透射率特性来精确地进行荧光样品的印刷色，即荧光基板上的着色表面的比色。

    Sample analyzer
    44.
    发明申请
    Sample analyzer 有权
    样品分析仪

    公开(公告)号：US20070222973A1

    公开(公告)日：2007-09-27

    申请号：US11724934

    申请日：2007-03-16

    Applicant: Susumu Hoshiko ,  Naohiko Matsuo ,  Katsushi Kobayashi ,  Norimasa Yamamoto

    Inventor： Susumu Hoshiko ,  Naohiko Matsuo ,  Katsushi Kobayashi ,  Norimasa Yamamoto

    IPC: G01N21/00

    CPC classification number: G01N21/314 ,  G01J2003/123 ,  G01N21/0332 ,  G01N21/253 ,  G01N21/272 ,  G01N21/274 ,  G01N21/82 ,  G01N33/49 ,  G01N35/00603 ,  G01N2021/3148 ,  G01N2021/3155 ,  G01N2021/3174 ,  G01N2021/825 ,  G01N2035/00356 ,  G01N2035/0455 ,  G01N2201/0618 ,  G01N2201/0826

    Abstract: A sample analyzer comprising: a measuring part for measuring optical information of a sample at first wavelength, second wavelength, and third wavelength, first light of the first wavelength and second light of the second wavelength being absorbed by a second substance but substantially not absorbed by a first substance, and third light of the third wavelength being absorbed by the first substance; and an obtaining means for obtaining content of the first substance in the sample, and content of the second substance in the sample, influence by the second substance being excluded from the content of the first substance, based on the optical information at the first wavelength, second wavelength, and third wavelength measured by the measuring part.

    Abstract translation: 一种样本分析器，包括：测量部分，用于测量第一波长，第二波长和第三波长处的样品的光学信息，第一波长的第一光和第二波长的第二光被第二物质吸收，但基本上不被 第一物质和第三波长的第三光被第一物质吸收; 以及获取装置，用于根据第一波长的光学信息获得样品中第一物质的含量和样品中第二物质的含量，被第二物质排除在第一物质的含量之外的影响， 第二波长和由测量部分测量的第三波长。

    Method of Measuring Calorie of Object and Device of Measuring Calorie of Object
    45.
    发明申请
    Method of Measuring Calorie of Object and Device of Measuring Calorie of Object 有权
    测量对象热量的方法和测量对象热量的方法

    公开(公告)号：US20070218174A1

    公开(公告)日：2007-09-20

    申请号：US10592055

    申请日：2005-03-10

    Applicant: Kenkoh Hanamatsu ,  Hiroyuki Ono ,  Hideo Odagiri ,  Takahiro Sawa ,  Katsuyuki Miura

    Inventor： Kenkoh Hanamatsu ,  Hiroyuki Ono ,  Hideo Odagiri ,  Takahiro Sawa ,  Katsuyuki Miura

    IPC: G01N33/02 ,  G01N21/62

    CPC classification number: G01N21/4738 ,  G01G19/4146 ,  G01J3/02 ,  G01J3/021 ,  G01J3/0232 ,  G01J3/0264 ,  G01J3/027 ,  G01J3/108 ,  G01J3/1256 ,  G01J3/42 ,  G01N21/3563 ,  G01N21/359 ,  G01N33/02 ,  G01N2021/151 ,  G01N2201/0618 ,  G01N2201/067 ,  G01N2201/0696 ,  G01N2201/1293

    Abstract: The invention makes it possible to measure a calorie by using near-infrared rays, thereby realizing calorie measurement of an object to be quickly and easily performed using a non-destructive method. A device of measuring calorie of an object includes an object holding unit (1) including a table (2) on which an inspection-target object (M) is placed; a light source unit (20) that supplies light in near-infrared regions to irradiate the inspection-target object (M) placed on the turning table (2); a light reception unit (30) that receives light reflected from or transmitted though the object (M); and a control unit (40) that calculates the calorie of the object (M) in accordance with the absorbances of the light received by the light reception unit (30). In the control unit (40), the calorie of object (M) is calculated in accordance with a regression expression and the absorbances of the light received by the light reception unit (30). In this case, the regression expression is preliminarily calculated in the manner that near-infrared rays are irradiated on a calorie known sample object (M), and multiple-regression analyses are performed on second derivative spectra at the absorbances of light reflected from or transmitted though the sample object (M).

    Abstract translation: 本发明可以通过使用近红外线测量卡路里，从而通过非破坏性方法实现快速且容易地进行的物体的卡路里测量。 测量物体卡路里的装置包括物体保持单元（1），其包括放置有检查对象物（M）的台（2） 光源单元（20），其在近红外区域中供应光以照射放置在所述转台（2）上的检查对象物体（M）; 接收从物体（M）反射或透过物体（M）的光的光接收单元（30）。 以及根据由光接收单元（30）接收的光的吸光度计算物体（M）的热量的控制单元（40）。 在控制单元（40）中，根据回归表达式和由光接收单元（30）接收的光的吸收度来计算物体（M）的热量。 在这种情况下，回归表达式以近红外线照射在热量已知样品（M）上的方式进行初步计算，并且对从二次导数光谱反射或透射的光的吸光度进行多元回归分析 虽然样本对象（M）。

    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected
    47.
    发明授权
    Manufacturing method of semiconductor substrate and method and apparatus for inspecting defects of patterns on an object to be inspected 失效
    半导体基板的制造方法以及检查被检体的图案的缺陷的方法和装置

    公开(公告)号：US06404498B1

    公开(公告)日：2002-06-11

    申请号：US09588201

    申请日：2000-06-06

    Applicant: Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    Inventor： Shunji Maeda ,  Yasuhiko Nakayama ,  Minoru Yoshida ,  Hitoshi Kubota ,  Kenji Oka

    IPC: G01B1100

    CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G01N2021/95615 ,  G01N2201/0618 ,  G01N2201/0634

    Abstract: A pattern detection method and apparatus for inspecting, with high resolution, a micro fine defect of a pattern on an inspected object, and a semiconductor substrate manufacturing method and system with a high yield. A micro fine pattern on the inspected object is inspected by annular-looped illumination through an objective lens onto a wafer, the wafer having micro fine patterns thereon. The illumination may be polarized and controlled according to an image detected on the pupil of the objective lens, and image signals are obtained by detecting a reflected light from the wafer. The image signals are compared with reference image signals and a part of the pattern showing inconsistency is detected as a defect. Simultaneously, micro fine defects on the micro-fine pattern are detected with high resolution. Further, process conditions of a manufacturing line are controlled by analyzing a cause of defect and a factor of defect.

    Abstract translation: 用于以高分辨率检查被检查物体上的图案的微细缺陷的图案检测方法和装置，以及高产率的半导体基板制造方法和系统。 被检查物体上的微细图案通过物镜通过环形照明被检查到晶片上，晶片上具有微细精细图案。 照明可以根据在物镜的光瞳上检测到的图像进行偏振和控制，并且通过检测来自晶片的反射光来获得图像信号。 将图像信号与参考图像信号进行比较，并且检测出显示不一致的图案的一部分作为缺陷。 同时，以高分辨率检测微细图案上的微细缺陷。 此外，通过分析缺陷的原因和缺陷因素来控制生产线的工艺条件。

Patent Agency Ranking