公开(公告)号：US20050199808A1

公开(公告)日：2005-09-15

申请号：US11020255

申请日：2004-12-27

Applicant: Kenji Obara ,  Toshifumi Honda ,  Toshiro Kubo

Inventor： Kenji Obara ,  Toshifumi Honda ,  Toshiro Kubo

IPC: G01N23/225 ,  H01J37/28 ,  H01L21/66

CPC classification number: H01J37/28 ,  H01J37/241 ,  H01J37/263 ,  H01J37/265 ,  H01J2237/2809 ,  H01J2237/2817

Abstract: To acquire defect images even when a defect exists below an optically transparent film, an electron optical system of an electron microscope is set to a first imaging condition. A defect position of a specimen is set so as to fall within the visual field of the electron microscope, using position data of a defect of the specimen. The position of the defect is imaged by the electron microscope set to the first imaging condition to obtain a first image corresponding to the defect position. The first image is processed to determine whether a defect exists. The electron optical system is then set to a second imaging condition on the basis of the result of determination. A point imaged under the first imaging condition is imaged by the electron microscope set to the second imaging condition to acquire a second image corresponding to a defect position.

Abstract translation: 为了获得缺陷图像，即使当缺陷存在于光学透明膜下方时，将电子显微镜的电子光学系统设置为第一成像条件。 使用试样的缺陷的位置数据，将试样的缺陷位置设定为落入电子显微镜的视野内。 通过设置为第一成像条件的电子显微镜对缺陷的位置成像，以获得对应于缺陷位置的第一图像。 处理第一个图像以确定是否存在缺陷。 然后基于确定的结果将电子光学系统设置为第二成像条件。 在第一成像条件下成像的点通过设置为第二成像条件的电子显微镜成像，以获得对应于缺陷位置的第二图像。

公开(公告)号：US20040188608A1

公开(公告)日：2004-09-30

申请号：US10764136

申请日：2004-01-23

Applicant: JEOL Ltd.

Inventor： Toshikatsu Kaneyama

IPC: H01J037/26

CPC classification number: H01J37/05 ,  H01J37/241 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/24485

Abstract: An electron beam apparatus having an electron analyzer is achieved which can control the illumination lens system by feedback without adversely affecting the imaging action even if a specimen is positioned within the magnetic field of the objective lens. The apparatus has an energy shift control module for controlling energy shift. On receiving instructions about setting of energy shift from the CPU, the control module issues an instruction for shifting the accelerating voltage to a specified value to an accelerating-voltage control module. The control module also sends information about the energy shift to an energy shift feedback control module, which calculates the feedback value and supplies information about corrections of lenses and deflection coils to a TEM optics control module. The feedback value is multiplied by a corrective coefficient that can be calibrated.

Abstract translation: 实现了具有电子分析器的电子束装置，其可以通过反馈来控制照明透镜系统，而不会对成像动作产生不利影响，即使样本位于物镜的磁场内。 该装置具有用于控制能量偏移的能量转换控制模块。 在接收到关于从CPU设置能量偏移的指令时，控制模块发出用于将加速电压移动到指定值的指令到加速电压控制模块。 控制模块还将能量偏移的信息发送到能量偏移反馈控制模块，该能量偏移反馈控制模块计算反馈值，并将关于透镜和偏转线圈校正的信息提供给TEM光学控制模块。 反馈值乘以可校准的校正系数。

公开(公告)号：US5872366A

公开(公告)日：1999-02-16

申请号：US908699

申请日：1997-08-08

Applicant: Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

Inventor： Yoshihisa Ooaeh ,  Tomohiko Abe ,  Akio Yamada ,  Hiroshi Yasuda ,  Kenj Kudoh ,  Kouzi Takahata

IPC: H01J37/07 ,  H01J37/065 ,  H01J37/24 ,  H01J37/30 ,  H01J37/09

CPC classification number: H01J37/241 ,  H01J37/065 ,  H01J2237/3175

Abstract: An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower than the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.

Abstract translation: 用于发射沿着光束轴线行进的电子束的电子枪包括具有尖端的阴极，该尖端具有基本上圆形的圆锥形形状和基本上在光束轴线处的尖端表面，阴极被施加第一电压，阳极具有 基本上在所述光束轴上的第一孔，并施加高于所述第一电压的第二电压;控制电极，其具有基本上在所述光束轴上的第二孔，并施加低于所述第一电压的电压以控制所述第一电压的电流 阴极，第二孔径大于尖端表面，具有基本上在梁轴上的第三孔的引导电极设置在阴极和阳极之间，并施加有比第一电压高的电压并且低于第二电压 电压，所述第三孔小于所述尖端表面，以及透镜电极，所述透镜电极具有基本上在所述光束轴上的第四孔 引导电极和阳极，并施加低于第一电压的电压以形成电子束的交叉图像，第四孔径大于第三孔径。

公开(公告)号：US5854490A

公开(公告)日：1998-12-29

申请号：US680960

申请日：1996-07-16

Applicant: Yoshihisa Ooaeh ,  Akio Yamada ,  Hiroshi Yasuda

Inventor： Yoshihisa Ooaeh ,  Akio Yamada ,  Hiroshi Yasuda

IPC: H01J37/07 ,  H01J37/065 ,  H01J37/24 ,  H01J37/30 ,  H01J37/63

CPC classification number: H01J37/241 ,  H01J37/065 ,  H01J2237/3175

Abstract: An electron gun for emitting an electron beam traveling along a beam axis includes a cathode having a tip, the tip having substantially a circular conic shape and a tip surface substantially at the beam axis, the cathode being applied with a first voltage, an anode having a first aperture substantially on the beam axis and being applied with a second voltage higher than the first voltage, a control electrode having a second aperture substantially on the beam axis and being applied with a voltage lower than the first voltage to control a current of the cathode, the second aperture being larger than the tip surface, a guide electrode having a third aperture substantially on the beam axis, being arranged between the cathode and the anode, and being applied with a voltage higher than the first voltage and lower than the second voltage, the third aperture being smaller than the tip surface, and a lens electrode having a fourth aperture substantially on the beam axis, being arranged between the guide electrode and the anode, and being applied with a voltage lower than the first voltage to form a cross-over image of the electron beam, the fourth aperture being larger than the third aperture.

公开(公告)号：USRE35024E

公开(公告)日：1995-08-22

申请号：US217424

申请日：1994-03-24

Applicant: Charles W. Hanks

Inventor： Charles W. Hanks

IPC: H01J37/077 ,  H01J37/06 ,  H01J37/065 ,  H01J37/24 ,  H01J37/248 ,  H01J37/305

CPC classification number: H01J37/241 ,  H01J37/248 ,  H01J2237/0203 ,  H01J2237/0206 ,  H01J2237/31

Abstract: A grounded metallic shield which comprises an electrode enclosing the filament leads and emitters of an e-Gun in a high vacuum chamber of the type used in melting and casting metals and other materials and evaporation sources. The shield is spaced from the filament leads and emitters a distance in the order of the electron mean free path for the pressure uses within the high vacuum chamber. The structure and method of use thereof suppresses or eliminates arc-downs or glow discharges.

Abstract translation: 一种接地金属屏蔽，其包括在用于熔化和铸造金属和其它材料和蒸发源的类型的高真空室中包围电极枪的细丝引线和发射器的电极。 屏蔽层与灯丝引线和发射器间隔一定距离，用于在高真空室内使用的电子平均自由路径。 其结构及其使用方法抑制或消除掉弧或辉光放电。

公开(公告)号：US3866077A

公开(公告)日：1975-02-11

申请号：US26913972

申请日：1972-07-05

Applicant: NAT RES DEV

Inventor： BAKER FRANCIS SIDNEY ,  HARRISON CHARLES RICHARD ,  OSBORN ANTHONY RAYMOND ,  WILLIAMS JOHN

IPC: G01Q30/08 ,  G01Q30/16 ,  G01Q70/12 ,  H01J1/304 ,  H01J37/073 ,  H01J37/24 ,  H01J1/16

CPC classification number: H01J1/304 ,  H01J37/073 ,  H01J37/241 ,  H01J2201/30457

Abstract: A carbon filament such as a carbon fibre or graphite whisker is used as a source of field emission electrons in an electronic device such as an electron microscope or an electron beam machining device. A vacuum of only 10 7 torr is required, and electrical noise in the beam may be reduced by momentarily heating the source in vacuum before use, and/or by using an electrical current stabilisation circuit.

公开(公告)号：US3826889A

公开(公告)日：1974-07-30

申请号：US17091571

申请日：1971-08-11

Applicant: BRUKOVSKY I ,  GUTTERMAN K ,  YAKOLVLEV P

Inventor： YAKOLVLEV P ,  GUTTERMAN K ,  BRUKOVSKY I

IPC: H01J37/24 ,  B23F15/00

CPC classification number: H01J37/241

Abstract: A system is disclosed for automatic control of an electron beam heating device of the type in which a current-stablized powersupply source is coupled to the electron gun and is electrically connected with an automatic reset unit serving to cut off voltage to the electron gun upon an electric breakdown between the electrodes of the gun. The automatic reset system does not operate immediately following the breakdown between the electrodes of the gun, but only after a predetermined time interval to allow the voltage across the electron gun to return spontaneously to the original value when the discharge between the electrodes of the electron gun is unsteady in character. After voltage cut off, if the electrical breakdown still has not been corrected, the automatic reset system successively operates at different time intervals to cut off electron gun voltage. Specifically, and in the preferred embodiment, the instant inventive system is so designed that the time interval between the occurrence of voltage cut off as a result of electric breakdown and the occurrence of the subsequent automatic reset of the apparatus becomes increasingly larger during successive operation of the system.

Abstract translation: 公开了一种用于电子束加热装置的自动控制的系统，其中电流稳定的电源耦合到电子枪并与用于切断电子枪的电压的自动复位装置电连接 在枪的电极之间发生电击穿。 自动复位系统在枪的电极之间的击穿之后不会立即操作，而是仅在预定时间间隔之后才允许电子枪两端的电压自动返回到原始值，当电子枪的电极之间的放电 性格不稳定 电压切断后，如果电击穿仍未得到纠正，则自动复位系统以不同的时间间隔连续工作，以切断电子枪的电压。 具体地说，在优选实施例中，本发明的系统被设计成使得由于电击穿而产生的电压切断与设备随后的自动复位的发生之间的时间间隔在连续的操作期间变得越来越大 系统。

公开(公告)号：US3634645A

公开(公告)日：1972-01-11

申请号：US3634645D

申请日：1970-04-21

Applicant: WESTINGHOUSE ELECTRIC CORP

Inventor： LEMPERT JOSEPH ,  LOWRY JERALD F ,  BONNER FREDERICK M

IPC: H01J37/063 ,  H01J37/21 ,  H01J37/24 ,  H01J37/301 ,  B23K9/00

CPC classification number: H01J37/063 ,  H01J37/21 ,  H01J37/241 ,  H01J37/301

Abstract: The electron beam B is projected on work W, usually in the atmosphere outside of the chamber where the beam is generated, through a plurality of aperture members 11, 13, 15, 17. The holes in the aperture members are as small as practicable to suppress the feedback of air into the chamber. The beam B is focussed in regions 85 and 87 (FIG. 3) with reference to the aperture members so as to preclude damage to the members by impingement of the beam on the walls of the holes through which the beam passes. The beam current is varied in dependence on the demands of the work but the focus of the beam is maintained by bias resistor 115 (FIG. 1), without damage to the aperture member, by instantaneous change in the bias impressed on the beam by a control electrode G.

Abstract translation: 电子束B通过多个孔径构件11,13,15,17，通常在产生梁的室内的大气外部突出在工件W上。孔径构件中的孔尽可能地小到 抑制空气反馈到室内。 光束B参照光圈元件聚焦在区域85和87（图3）中，以防止光束撞击光束通过的孔的壁上的部件损坏。 光束电流根据工作的需要而变化，但是通过偏置电阻器115（图1）来保持光束的焦点，而不会损坏孔径部件，通过施加在光束上的偏置的瞬时变化由 控制电极G.

公开(公告)号：US3054896A

公开(公告)日：1962-09-18

申请号：US8236161

申请日：1961-01-12

Applicant: JONES WILLIAM H ,  REECE JUDSON B

Inventor： JONES WILLIAM H ,  REECE JUDSON B

IPC: B23K15/02 ,  H01J37/24

CPC classification number: H01J37/241 ,  B23K15/02

公开(公告)号：US12132411B2

公开(公告)日：2024-10-29

申请号：US17763840

申请日：2019-10-07

Applicant: Hitachi High-Tech Corporation

Inventor： Ryo Kadoi ,  Wen Li ,  Naoya Ishigaki

IPC: H02M7/10 ,  H01J19/02 ,  H01J37/24 ,  H02M1/14 ,  H02M7/06 ,  H05H5/04

CPC classification number: H02M7/103 ,  H01J19/02 ,  H01J37/241 ,  H02M1/14 ,  H02M7/062 ,  H02M7/10 ,  H05H5/045 ,  H01J2203/02

Abstract: The invention provides a power supply module and a charged particle beam device that are capable of reducing ripple noise. A high-voltage generation circuit 101 includes booster circuits CPa and CPb of two systems that are configured to be symmetrical to each other, and performs a boosting operation by using a capacitive element and a diode in the booster circuits CPa and CPb of the two systems. The high-voltage generation circuit is housed in a housing and a reference power supply voltage is applied thereto. A left electrode 102a is fixedly provided in the vicinity of one of the booster circuits CPa and CPb of the two systems in the housing, and a right electrode 102b is fixedly provided in the vicinity of the other of the booster circuits CPa and CPb of the two systems in the housing. A stray capacitance adjustment circuit 100a adjusts capacitance values of stray capacitances of the booster circuits CPa and CPb of the two systems by electrically controlling an electrical connection characteristic between the left electrode 102a and the reference power supply voltage 104 and an electrical connection characteristic between the right electrode 102b and the reference power supply voltage 104.