-
公开(公告)号：US20240361702A1
公开(公告)日：2024-10-31
申请号：US18621218
申请日：2024-03-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Anagnostis TSIATMAS , Paul Christiaan Hinnen , Elliott Gerard MC NAMARA , Thomas Theeuwes , Maria Isabel DE LA FUENTE VALENTIN , Mir Homayoun SHAHRJERDY , Arie Jeffrey DEN BOEF , Shu-jin WANG
CPC classification number: G03F7/70633 , G03F7/70625 , G03F7/70683 , G06T7/0006 , G03F7/20 , G06T2207/30148
Abstract: A method including: obtaining a detected representation of radiation redirected by each of a plurality of structures from a substrate additionally having a device pattern thereon, wherein each structure has an intentional different physical configuration of the respective structure than the respective nominal physical configuration of the respective structure, wherein each structure has geometric symmetry at the respective nominal physical configuration, wherein the intentional different physical configuration of the structure causes an asymmetric optical characteristic distribution and wherein a patterning process parameter measures change in the physical configuration; and determining a value, based on the detected representations and based on the intentional different physical configurations, to setup, monitor or correct a measurement recipe for determining the patterning process parameter.
-
公开(公告)号：US12130246B2
公开(公告)日：2024-10-29
申请号：US17419653
申请日：2019-12-19
Applicant: ASML Netherlands B.V.
CPC classification number: G01N23/20 , G03F7/70633 , G06T5/10 , G06T2207/30148
Abstract: A method includes receiving an image formed in a metrology apparatus wherein the image comprises at least the resulting effect of at least two diffraction orders, and processing the image wherein the processing comprises at least a filtering step, for example a Fourier filter. The process of applying a filter may be obtained also by placing an aperture in the detection branch of the metrology apparatus.
-
公开(公告)号：US20240355578A1
公开(公告)日：2024-10-24
申请号：US18761319
申请日：2024-07-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Te-Sheng WANG , Szu-Po WANG , Kai-Yuan CHI
CPC classification number: H01J37/222 , H01J37/28
Abstract: Disclosed are non-transitory computer-readable media, systems, and computer-implemented methods that describe obtaining hot spot (HS) location information with respect to a printed pattern; obtaining LFP search criteria for searching the printed pattern to determine a local focus point (LFP) for an imaging device; selecting a HS area in the printed pattern that contains a HS; and determining the LFP proximate to the HS area based on the LFP search criteria, the LFP not containing the HS.
-
公开(公告)号：US12124177B2
公开(公告)日：2024-10-22
申请号：US17782622
申请日：2020-11-18
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Mohamed Swillam , Simon Reinald Huisman , Justin Lloyd Kreuzer
CPC classification number: G03F7/706851 , G03F7/70633 , G03F7/7085 , G03F9/7046 , G03F9/7088
Abstract: A detection system (200) includes an illumination system (210), a first optical system (232), a phase modulator (220), a lock-in detector (255), and a function generator (230). The illumination system is configured to transmit an illumination beam (218) along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target (204) on a substrate (202). The first optical system is further configured to transmit a signal beam including diffraction order sub-beams (222, 224, 226) that are diffracted by the diffraction target. The phase modulator is configured to modulate the illumination beam or the signal beam based on a reference signal. The lock-in detector is configured to collect the signal beam and to measure a characteristic of the diffraction target based on the signal beam and the reference signal. The function generator is configured to generate the reference signal for the phase modulator and the lock-in detector.
-
公开(公告)号：US20240345487A1
公开(公告)日：2024-10-17
申请号：US18681613
申请日：2022-08-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Rencheng SUN , Feng YANG , Meng LIU , Fei YAN
IPC: G03F7/00
CPC classification number: G03F7/705 , G03F7/70441
Abstract: Systems and methods for evaluating selected set of patterns of a design layout. A method herein includes obtaining (i) a first pattern set resulting from a pattern selection process, (ii) first pattern data associated with the first pattern set, (iii) characteristic data associated with the first pattern data, and (iv) second pattern data associated with a second pattern set. A machine learning model is trained based on the characteristic data, where the machine learning model being configured to predict pattern data for an input pattern. The second pattern set is input to the trained machine learning model to predict second pattern data of the second pattern set. The first pattern set is evaluated by comparing the second pattern data and the predicted second pattern data. If the evaluation indicates insufficient pattern coverage, additional patterns can be included to improve the pattern coverage.
-
Patent Agency Ranking
公开(公告)号：US12117739B2
公开(公告)日：2024-10-15
申请号：US17629202
申请日：2020-06-30
Applicant: ASML Netherlands B.V.
CPC classification number: G03F7/70783 , G03F7/70266 , G03F7/70716 , G03F7/70891 , H02N2/009 , H02N2/028 , H02N2/062
Abstract: Disclosed is a thermo-mechanical actuator (100) comprising a piezo¬electric module (110), the piezo-electric module comprising at least one piezo-electric element (120), wherein the thermo-mechanical actuator is configured to: •o receive a thermal actuation signal (132) for controlling a thermal behaviour of the piezo-electric module, or •o provide a thermal sensing signal (132) representative of a thermal state of the piezo-electric module, and, wherein the thermo-mechanical actuator is configured to: •o receive a mechanical actuation (134) signal for controlling a mechanical behaviour of the piezo-electric module, or •o provide a mechanical sensing signal (134) representative of a mechanical state of the piezo-electric module.
-
公开(公告)号：US12117726B2
公开(公告)日：2024-10-15
申请号：US18220799
申请日：2023-07-11
Applicant: ASML NETHERLANDS B.V.
Inventor： David Ferdinand Vles , Chaitanya Krishna Ande , Antonius Franciscus Johannes De Groot , Adrianus Johannes Maria Giesbers , Johannes Joseph Janssen , Paul Janssen , Johan Hendrik Klootwijk , Peter Simon Antonius Knapen , Evgenia Kurganova , Marcel Peter Meijer , Wouter Rogier Meijerink , Maxim Aleksandrovich Nasalevich , Arnoud Willem Notenboom , Raymond Olsman , Hrishikesh Patel , Mária Péter , Gerrit van den Bosch , Wilhelmus Theodorus Anthonius Johannes van den Einden , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Johannes Petrus Martinus Bernardus Vermeulen , Willem-Pieter Voorthuijzen , Hendrikus Jan Wondergem , Aleksandar Nikolov Zdravkov
IPC: G03F1/64
CPC classification number: G03F1/64
Abstract: A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.
-
公开(公告)号：US12117721B2
公开(公告)日：2024-10-15
申请号：US18087320
申请日：2022-12-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Nicolaas Rudolf Kemper , Sjoerd Nicolaas Lambertus Donders , Joost Jeroen Ottens , Edwin Cornelis Kadijk , Sergei Shulepov
CPC classification number: G03B27/42 , G03F7/70341 , G03F7/70716
Abstract: Embodiments of a drain in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing.
-
59.发明公开公开(公告)号：US20240339292A1
公开(公告)日：2024-10-10
申请号：US18748758
申请日：2024-06-20
Applicant: ASML NETHERLANDS B.V.
Inventor： Yan REN , Marijke SCOTUZZI , Albertus Victor Gerardus MANGNUS , Erwin Paul SMAKMAN
IPC: H01J37/244 , H01J37/10 , H01J37/28
CPC classification number: H01J37/244 , H01J37/10 , H01J37/28
Abstract: There is provided a charged particle device for a charged particle inspection apparatus for projecting an array of sub-beams towards a sample, the charged particle device comprising: a charged particle optical element and a detector. The charged particle optical element has an up-beam surface having a plurality of openings to generate an array of sub-beams from a charged particle beam. In the charged particle optical element are defined: sub-beam apertures and monitoring apertures. The sub-beam aperture extend through the charged particle element for paths of the array of sub-beams towards a sample. The monitoring aperture extends through the charged particle element. The detector is in the monitoring aperture. At least part of the detector is down-beam of the up-beam surface. The detector measures a parameter of a portion of the charged particle beam incident on the detector.
-
公开(公告)号：US20240331971A1
公开(公告)日：2024-10-03
申请号：US18741204
申请日：2024-06-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Jurgen VAN SOEST , Vincent Sylvester KUIPER , Yinglong LI
IPC: H01J37/20 , H01J37/244 , H01J37/28
CPC classification number: H01J37/20 , H01J37/244 , H01J37/28 , H01J2237/2001
Abstract: A charged particle assessment apparatus comprising: a charged particle beam device; an actuated sample stage; a hot component and a thermal compensator. The actuated sample stage is configured to hold a sample. The hot component is configured to operate such that, during operation, heat is radiated toward a sample held on the sample holder. The hot component is smaller than the sample. The thermal compensator is configured to heat the sample so as to reduce thermal gradients therein.
-
-
-
-
-
-
-
-
-
Search Results
4971
records
(took 0.045 seconds)
